| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/21/2002 | US20020033449 Inspection system by charged particle beam and method of manufacturing devices using the system |
| 03/21/2002 | US20020033446 Neutral beam processing apparatus and method |
| 03/21/2002 | US20020033328 Use of variable RF generator to control coil voltage distribution |
| 03/21/2002 | US20020033233 Icp reactor having a conically-shaped plasma-generating section |
| 03/21/2002 | US20020033231 Apparatus and method for plasma etching |
| 03/21/2002 | US20020033229 Apparatus for etching semiconductor samples and a source for providing a gas by sublimination thereto |
| 03/20/2002 | EP1189493A2 Plasma processing apparatus provided with microwave applicator having annular waveguide and processing method |
| 03/20/2002 | EP1189491A1 Apparatus for detecting plasma anomalous discharge and method of detecting the same |
| 03/20/2002 | EP1189258A2 Vacuum arc evaporation apparatus |
| 03/20/2002 | EP1189240A1 Multi-probe measuring device and method of use |
| 03/20/2002 | EP1188847A2 Plasma processing method and apparatus |
| 03/20/2002 | CN1340913A Method for heat conversion plasma tuner |
| 03/20/2002 | CN1340634A Sputtering equipment |
| 03/19/2002 | US6359388 Cold cathode ion beam deposition apparatus with segregated gas flow |
| 03/19/2002 | US6359250 RF matching network with distributed outputs |
| 03/19/2002 | US6358573 Mixed frequency CVD process |
| 03/19/2002 | US6358481 Electrically safe dual electrode plasma treatment chamber system |
| 03/19/2002 | US6358382 Retaining ring and target and method for producing same |
| 03/19/2002 | US6358376 Biased shield in a magnetron sputter reactor |
| 03/19/2002 | US6358362 Methods and arrangements for determining an endpoint for an in-situ local interconnect etching process |
| 03/19/2002 | US6358361 Plasma processor |
| 03/19/2002 | US6358359 Apparatus for detecting plasma etch endpoint in semiconductor fabrication and associated method |
| 03/19/2002 | US6358324 Microwave plasma processing apparatus having a vacuum pump located under a susceptor |
| 03/19/2002 | US6357385 Plasma device |
| 03/14/2002 | WO2002021585A1 Magnetic field generator for magnetron plasma, and plasma etching apparatus and method comprising the magnetic field generator |
| 03/14/2002 | WO2002021567A1 Plasma enhanced gas reactor |
| 03/14/2002 | WO2002021566A2 Bulk gas delivery system for ion implanters |
| 03/14/2002 | WO2002021565A2 Apparatus for magnetically scanning and/or switching a charged-particle beam |
| 03/14/2002 | WO2002020866A1 Cylindrical target and method of manufacturing the cylindrical target |
| 03/14/2002 | WO2002005315A3 System and method for improving thin films by gas cluster ion be am processing |
| 03/14/2002 | WO2001075932A3 An enhanced resist strip in a dielectric etcher using downstream plasma |
| 03/14/2002 | WO2001073813A3 Method and apparatus for varying a magnetic field to control a volume of a plasma |
| 03/14/2002 | WO2001045135A3 Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates |
| 03/14/2002 | WO2001027964A3 Electron impact ion source |
| 03/14/2002 | US20020030167 Dose monitor for plasma doping system |
| 03/14/2002 | US20020030166 Pattern inspection method and apparatus using electron beam |
| 03/14/2002 | US20020029960 Sputtering apparatus and film manufacturing method |
| 03/14/2002 | US20020029959 Suitable for film deposition using a plurality of targets of different materials; uniform film without need for rotation of the substrate; sputtering device rotates the target |
| 03/14/2002 | US20020029851 Plasma processing method and apparatus using dynamic sensing of a plasma environment |
| 03/14/2002 | US20020029850 System for the plasma treatment of large area substrates |
| 03/14/2002 | US20020029746 Operation method of ion source and ion beam irradiation apparatus |
| 03/14/2002 | US20020029745 Worktable device and plasma processing apparatus for semiconductor process |
| 03/14/2002 | DE10042098A1 Gasversorgung für Additive Lithographie Gas supply for additives lithography |
| 03/14/2002 | CA2418807A1 Cylindrical target and its production method |
| 03/13/2002 | EP1187250A2 Microwave device |
| 03/13/2002 | EP1187187A1 Plasma processing apparatus |
| 03/13/2002 | EP1187172A2 Sputtering apparatus and film manufacturing method |
| 03/13/2002 | EP1187171A2 Processor and method for processing |
| 03/13/2002 | EP1187170A2 Plasma resistant quartz glass jig |
| 03/13/2002 | EP1187169A2 Corpuscular optical components and assembly using same |
| 03/13/2002 | EP1187121A2 Substrate rotating device, and manufacturing method and apparatus of recording medium master |
| 03/13/2002 | EP1186682A2 Cylindrical sputtering target and process for its manufacture |
| 03/13/2002 | EP1186681A1 Vacuum treatment apparatus having dockable substrate holder |
| 03/13/2002 | EP1185857A2 Method and apparatus for enhancing yield of secondary ions |
| 03/13/2002 | EP1185617A2 Method for decontaminating yeast |
| 03/13/2002 | EP1185248A2 Supercritical fluid-assisted nebulization and bubble drying |
| 03/13/2002 | EP0886880B1 Method and apparatus for the coating of workpieces |
| 03/12/2002 | US6356097 Capacitive probe for in situ measurement of wafer DC bias voltage |
| 03/12/2002 | US6356026 Ion implant source with multiple indirectly-heated electron sources |
| 03/12/2002 | US6356025 Shielded rf antenna |
| 03/12/2002 | US6355994 Precision stage |
| 03/12/2002 | US6355933 Ion source and method for using same |
| 03/12/2002 | US6355574 Method and device for treating a semiconductor surface |
| 03/12/2002 | US6355573 Plasma processing method and apparatus |
| 03/12/2002 | US6355384 Lithographic mask |
| 03/12/2002 | US6355383 Electron-beam exposure system, a mask for electron-beam exposure and a method for electron-beam exposure |
| 03/12/2002 | US6355350 Tetracarbon |
| 03/12/2002 | US6355183 Apparatus and method for plasma etching |
| 03/12/2002 | US6355109 Vacuum processing apparatus |
| 03/12/2002 | US6355108 Film deposition using a finger type shadow frame |
| 03/12/2002 | US6354438 Focused ion beam apparatus for forming thin-film magnetic recording heads |
| 03/12/2002 | US6354240 Plasma etch reactor having a plurality of magnets |
| 03/12/2002 | CA2065581C Plasma enhancement apparatus and method for physical vapor deposition |
| 03/07/2002 | WO2002019395A1 Ion-ion plasma processing with bias modulation sychronized to time-modulated discharges |
| 03/07/2002 | WO2002019387A2 Transmission line based inductively coupled plasma source with stable impedance |
| 03/07/2002 | WO2002019380A1 Plasma processing |
| 03/07/2002 | WO2002019379A1 Device and process for producing dc glow discharge |
| 03/07/2002 | WO2002019378A2 System and method for removing particles entrained in an ion beam |
| 03/07/2002 | WO2002019377A2 Electrostatic trap for particles entrained in an ion beam |
| 03/07/2002 | WO2002019376A2 System and method for removing contaminant particles relative to an ion beam |
| 03/07/2002 | WO2002019375A1 Device, set and method for carrying a gas or a liquid to a surface through a tube |
| 03/07/2002 | WO2002019374A2 Methods and apparatus for adjusting beam parallelism in ion implanters |
| 03/07/2002 | WO2002019366A2 Cold cathode ion beam deposition apparatus with segregated gas flow |
| 03/07/2002 | WO2002019364A2 Inductively coupled plasma using an internal inductive element |
| 03/07/2002 | WO2001078101A3 Method and apparatus for plasma processing |
| 03/07/2002 | WO2001073812A3 Method and apparatus for forming inner magnetic bucket to control a volume of a plasma |
| 03/07/2002 | WO2000075393A3 Carbon plasma pulsed source |
| 03/07/2002 | US20020029093 Method and apparatus for depositing a tantalum-containing layer on a substrate |
| 03/07/2002 | US20020028399 Detecting defects using scanning radiation |
| 03/07/2002 | US20020028398 Charged particle beam exposure method and charged particle beam exposure apparatus |
| 03/07/2002 | US20020028290 Rotation in gas flow; forming polycrystalline silicon |
| 03/07/2002 | US20020027440 Method and apparatus for inspecting integrated circuit pattern |
| 03/07/2002 | US20020027205 Enhanced plasma mode and system for plasma immersion ion implantation |
| 03/07/2002 | US20020027204 Electron beam exposure apparatus, device for shaping a beam of charged particles and method for manufacturing the device |
| 03/07/2002 | US20020027199 Method and device for observing a specimen in a field of view of an electron microscope |
| 03/07/2002 | US20020027198 Method and apparatus for charged particle beam exposure |
| 03/07/2002 | US20020026983 Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor |
| 03/07/2002 | DE10041065A1 Device for exciting and generating ionized gas or plasma using high frequency resonance to trigger or excite ionization, comprises resonant circuit for generating trigger or excitation voltage in capacitor |
| 03/07/2002 | DE10041040A1 Vorrichtung und Verfahren zur Belichtung einer strahlungsempfindlichen Schicht mittels geladener Teilchen sowie Maske hierfür Apparatus and method for exposing a radiation-sensitive layer by means of charged particles as well as mask for this |
| 03/06/2002 | EP1184891A1 Electron beam lithography |