Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
06/2014
06/04/2014EP2738786A1 Method of performing tomographic imaging of a sample in a charged-particle microscope
06/04/2014EP2737516A2 Method and apparatus for protecting passive components connected to a radio-frequency generator
06/04/2014EP2737515A1 Tool and process for treating an object by plasma generators
06/04/2014CN203631484U 半导体晶片蚀刻辅助装置 Semiconductor wafer etching assist device
06/04/2014CN203631483U 晶圆承载装置 Wafer carrying device
06/04/2014CN203631482U 离子源及离子注入机 Ion source and ion implanter
06/04/2014CN1945338B Cluster tool for microscopic processing of samples
06/04/2014CN103843107A High voltage isolation of an inductively coupled plasma ion source with a liquid that is not actively pumped
06/04/2014CN103843106A Electron-microscopic examination method for examining biosample while keeping said biosample unchanged, and composition for evaporation inhibition under vacuum, scanning electron microscope, and transmission electron microscope for use in said method
06/04/2014CN103843105A Aberration-correcting dark-field electron microscopy
06/04/2014CN103843104A Electron gun and charged particle beam device
06/04/2014CN103842471A Solid scintillator and electron beam detector employing same
06/04/2014CN103839748A Plasma processing apparatus and plasma processing method
06/04/2014CN103839747A Plasma apparatus
06/04/2014CN103839746A Etching equipment process gas gas-feeding device
06/04/2014CN103839745A Swing-type plasma restraining device
06/04/2014CN103839744A Device used for wafer processing
06/04/2014CN103839743A Method of sampling a sample and displaying obtained information
06/04/2014CN103839742A Magnetic field distribution regulation device and method for plasma processor
06/04/2014CN102390069B Atmospheric-pressure and low-temperature plasma continuous treatment device of wooden thin plates
06/04/2014CN102163530B Plasma processing apparatus
06/04/2014CN101501812B Throughput enhancement for scanned beam ion implanters
06/03/2014US8742376 Method and apparatus of mask drawing using a grounding body at lowest resistance value position of the mask
06/03/2014US8742375 Scanning electron microscope device, evaluation point generating method, and program
06/03/2014US8742374 Ion implantation apparatus
06/03/2014US8742373 Method of ionization
06/03/2014US8742365 Ultraviolet water treatment apparatus
06/03/2014US8742361 Focused charged particle column for operation at different beam energies at a target
06/03/2014US8742346 Sputter removal of material from microscopy samples with RF generated plasma
06/03/2014US8742345 Method for detecting electron beam of scanning electron microscope and for detecting fine patterns
06/03/2014US8742343 Charged particle beam system and method of axial alignment of charged particle beam
06/03/2014US8742342 Electron microscope
06/03/2014US8742341 Testing apparatus using charged particles and device manufacturing method using the testing apparatus
06/03/2014US8741782 Charging-free electron beam cure of dielectric material
06/03/2014US8741779 Plasma processing apparatus and plasma processing method
06/03/2014US8741547 Multi charged particle beam writing apparatus and multi charged particle beam writing method
06/03/2014US8739732 Plasma treatment container internal member, and plasma treatment apparatus having the plasma treatment container internal member
05/2014
05/30/2014WO2014081040A1 Sample stage, charged particle beam device and sample observation method
05/30/2014WO2014080987A1 Charged particle beam device, sample stage unit, and sample observation method
05/30/2014WO2014080823A1 Magnetoresistive effect element manufacturing method and device manufacturing method
05/30/2014WO2014080782A1 Method for manufacturing magnetoresistive effect element
05/30/2014WO2014057345A3 Ion guide for mass spectrometry
05/29/2014US20140149052 Methods and Systems for Material Characterization
05/29/2014US20140147603 Plasma Based Surface Augmentation Method
05/29/2014US20140145636 Method for matching the impedance of the Output Impedance of a High-Frequency Power Supply Arrangement to the Impedance of a Plasma Load and High-Frequency Power Supply Arrangement
05/29/2014US20140145091 Electron beam exposure apparatus
05/29/2014US20140145089 Apparatus having a magnetic lens configured to diverge an electron beam
05/29/2014US20140145077 Method of performing tomographic imaging of a sample in a charged-particle microscope
05/29/2014US20140144877 Plasma generating device with moving carousel and method of use
05/29/2014US20140144584 Plasma antenna and apparatus for generating plasma having the same
05/28/2014EP2735867A1 Method of sampling a sample and displaying obtained information
05/28/2014EP2735866A1 Method of sampling a sample and displaying obtained information
05/28/2014EP2735018A1 Method and device for producing low-particle layers on substrates
05/28/2014DE102012022168A1 Verfahren zum bearbeiten eines materialstücks A method for editing a material-tee
05/28/2014DE102012012275B4 Bearbeitungssystem zur mikro-materialbearbeitung Processing system for micro-material processing
05/28/2014CN203617249U 模塑互联器件的制备装置 Molded interconnect device preparation device
05/28/2014CN203617248U 一种改进型常压等离子体处理装置 An improved atmospheric plasma processing apparatus
05/28/2014CN203617247U 一种芯片等离子体表面处理装置 A chip plasma surface treatment device
05/28/2014CN203617246U 一种微空心阴极等离子体处理装置 A micro hollow cathode plasma processing apparatus
05/28/2014CN203617245U 一种新型粉体等离子体处理装置 The plasma processing apparatus of a new type of powder
05/28/2014CN203608531U 一种种子等离子体处理装置 The plasma processing apparatus in the seed
05/28/2014CN1973350B 控制多微柱中的电子束的方法以及使用所述方法的多微柱 Method of controlling a multi-micro-column in the multi electron beam micro-column, and the use of the method
05/28/2014CN103827347A 溅射装置与方法 A sputtering apparatus and method
05/28/2014CN103824747A 用于电弧源的点火装置 Ignition apparatus for an arc source
05/28/2014CN103824746A 用于沟槽与介层洞轮廓修饰的方法与设备 For trench and via profile modification method and apparatus
05/28/2014CN103824745A 一种反应腔室 One reaction chamber
05/28/2014CN103824744A 在衬底上利用离子束以及可变孔隙来进行离子注入的方法 On the substrate using an ion beam and a variable porosity of the ion implantation method is performed
05/28/2014CN103824743A 偏差监测系统及偏差监测方法、等离子体加工设备 Deviation monitoring system and deviation monitoring methods, plasma processing equipment
05/28/2014CN103824742A 一种大功率离子源稳定长脉冲运行方法 One kind of stable long-pulse high power ion source operation method
05/28/2014CN103824741A 一种高能量电子枪 A high-energy electron gun
05/28/2014CN102479651B 一种用于深紫外激光器与光发射电子显微镜连接的连接杆 A connecting rod DUV laser light emission electron microscope for the connection
05/28/2014CN102292790B 电子显微镜 Electron microscope
05/28/2014CN101165855B 基板平台和等离子处理装置 Substrate stage and a plasma processing apparatus
05/27/2014USRE44908 Electron beam exposure system
05/27/2014US8735849 Detector for use in charged-particle microscopy
05/22/2014WO2014078821A1 Atmospheric pressure plasma processing of polymeric materials utilizing close proximity indirect exposure
05/22/2014WO2014078402A1 A method for forming an electrical connection to a sample support in an electron microscope holder
05/22/2014WO2014076831A1 Semiconductor inspection device, and inspection method using charged particle beam
05/22/2014WO2014075896A1 Sputter target having optimised use properties
05/22/2014WO2014031208A8 Shock-resistant image intensifier
05/22/2014US20140138558 Method for forming an electrical connection to an sample support in an electron microscope holder
05/22/2014US20140138542 Scanning electron microscope and scanning transmission electron microscope
05/22/2014US20140138527 Charged particle beam writing apparatus and charged particle beam dose check method
05/22/2014US20140138356 Plasma Processing Apparatus, Plasma Processing Method and Storage Mediuim
05/22/2014US20140138029 Plasma generator and cleaning and purifying apparatus including the same
05/22/2014DE102013111860A1 Prozesswerkzeuge und Verfahren zur Bildung von Vorrichtungen unter Verwendung von Prozesswerkzeugen Process tools and methods of forming devices using process tools
05/22/2014DE102012111186A1 Method for generating magnetron discharge for removing surface of substrate in vacuum chamber, involves producing plasma having different electrical potential in area of race track with respect to plasma in other area of race track
05/21/2014EP2733722A2 Dual laser beam system used with an fib and/or electron microscope
05/21/2014EP2733721A2 Automated sample orientation
05/21/2014EP2732065A2 Method for forming a layer on a substrate at low temperatures
05/21/2014CN103811585A 离子注入装置及离子注入方法 Means of ion implantation and ion implantation method
05/21/2014CN103811332A 一种干法刻蚀设备的下部电极基台和干法刻蚀设备 A lower electrode dry etching equipment base stations and dry etching equipment
05/21/2014CN103811296A 关键尺寸控制系统 Critical dimension control system
05/21/2014CN103811264A 用于加速染污硅橡胶材料表面憎水性迁移速率的放电装置 Silicone rubber material used to accelerate the soiled surface hydrophobicity migration rate of the discharge device
05/21/2014CN103811263A 等离子体约束装置及具有其的等离子体处理装置 Plasma confinement apparatus and a plasma processing apparatus having the same
05/21/2014CN103811262A 电感耦合等离子体处理装置 Inductively coupled plasma processing apparatus
05/21/2014CN103811261A 降低晶圆漏电流的结构及设置该结构的等离子体处理室 Reducing the leakage current of the structure of the wafer and the setting of the configuration of a plasma processing chamber
05/21/2014CN103811260A 一种等离子反应器及其处理方法 A plasma reactor and processing methods
05/21/2014CN103811259A 一种调节多线圈磁铁的方法 A method of adjusting method of multi-coil magnet
05/21/2014CN103811258A 等离子体反应腔 Plasma reaction chamber
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