| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/03/2002 | EP0873574B1 Method to determine depth profiles in an area of thin coating |
| 04/02/2002 | US6366346 Method and apparatus for optical detection of effluent composition |
| 04/02/2002 | US6365905 Focused ion beam processing apparatus |
| 04/02/2002 | US6365903 Method of forming a quadrupole device for projection lithography by means of charged particles |
| 04/02/2002 | US6365898 Scanning electron microscope |
| 04/02/2002 | US6365897 Electron beam type inspection device and method of making same |
| 04/02/2002 | US6365896 Environmental SEM with a magnetic field for improved secondary electron direction |
| 04/02/2002 | US6365894 Electromagnet and magnetic field generating apparatus |
| 04/02/2002 | US6365492 Apparatus for manufacturing a semiconductor device and a method for manufacturing a semiconductor device |
| 04/02/2002 | US6365063 Plasma reactor having a dual mode RF power application |
| 04/02/2002 | US6365060 Method for controlling plasma processor |
| 04/02/2002 | US6365016 Method and apparatus for arc plasma deposition with evaporation of reagents |
| 04/02/2002 | US6365010 Process control; deposit material on moving target |
| 04/02/2002 | US6364995 Dome-shaped inductive coupling wall having a plurality of radii for an inductively coupled plasma reactor |
| 04/02/2002 | US6363882 Lower electrode design for higher uniformity |
| 04/02/2002 | US6363881 Plasma chemical vapor deposition apparatus |
| 03/28/2002 | WO2002025722A2 Method and system for determining pressure compensation factors in an ion implanter |
| 03/28/2002 | WO2002025708A2 Methods and systems for semiconductor fabrication processes |
| 03/28/2002 | WO2002025697A2 Apparatus for etching semiconductor samples and a source for providing a gas by sublimation thereto |
| 03/28/2002 | WO2002025696A2 Reducing deposition of process residues on a surface in a chamber |
| 03/28/2002 | WO2002025695A2 Tunable focus ring for plasma processing |
| 03/28/2002 | WO2002025694A2 System and method for controlling sputtering and deposition effects in a plasma immersion implantation device |
| 03/28/2002 | WO2002025693A1 Method and device for treating surfaces using a glow discharge plasma |
| 03/28/2002 | WO2002025692A1 Real time monitoring for simultaneous imaging and exposure in charged particle beam systems |
| 03/28/2002 | WO2002025691A1 Electron beam inspecting method and its device |
| 03/28/2002 | WO2002025685A1 Ion source magnet assembly |
| 03/28/2002 | WO2001097245A3 Sectored magnetic lens and method of use |
| 03/28/2002 | WO2001093646A3 Integrated resonator and amplifier system |
| 03/28/2002 | WO2001088966A3 Method of adjusting the thickness of an electrode in a plasma processing system |
| 03/28/2002 | WO2001084590A3 Method and apparatus for imaging a specimen using indirect in-column detection of secondary electrons in a microcolumn |
| 03/28/2002 | WO2001077402A3 Method and apparatus for magnetron sputtering |
| 03/28/2002 | WO2001065314A3 Patterning methods and systems using reflected interference patterns |
| 03/28/2002 | US20020037653 Chamber having improved gas energizer and method |
| 03/28/2002 | US20020037652 Semiconductor device manufacturing apparatus and method for manufacturing a semiconductor device |
| 03/28/2002 | US20020037459 Method of and apparatus for designing EB mask |
| 03/28/2002 | US20020037374 Applying a supply voltage to the two electrodes, characterized in that supply voltage is an alternating current voltage whose amplitude and frequency are adapted in order to maintain portion of the components of the gas in the excited state |
| 03/28/2002 | US20020036761 Apparatus and method applied to exposure by charged beam |
| 03/28/2002 | US20020036273 Methods for manufacturing reticles for charged-particle-beam microlithography exhibiting reduced proximity effects, and reticles produced using same |
| 03/28/2002 | US20020036272 Charged-particle-beam microlithography methods and apparatus providing reduced reticle heating |
| 03/28/2002 | US20020036264 Sheet beam-type inspection apparatus |
| 03/28/2002 | US20020036261 Gas cluster ion beam size diagnostics and workpiece processing |
| 03/28/2002 | US20020036187 Plasma processing device |
| 03/28/2002 | US20020036133 Magnetron sputtering source |
| 03/28/2002 | US20020036132 Vapor deposition using electrical fields (magnets) for angular distribution of ionized particles |
| 03/28/2002 | US20020036066 Method and apparatus for processing substrates |
| 03/28/2002 | US20020036064 Reactor with heated and textured electrodes and surfaces |
| 03/28/2002 | DE10043748A1 Zylinderförmiges Sputtertarget und Verfahren zu seiner Herstellung Cylindrical sputtering target and process for its preparation |
| 03/27/2002 | EP1191570A2 Performance evaluation method for plasma processing apparatus for continuously maintainning a desired performance level |
| 03/27/2002 | EP1191569A2 Method for reducing plasma-induced damage |
| 03/27/2002 | EP1191527A2 Master disc manufacturing apparatus |
| 03/27/2002 | EP1191399A2 Method of and apparatus for designing EB mask |
| 03/27/2002 | EP1190604A1 Apparatus for plasma treatment using capillary electrode discharge plasma shower |
| 03/27/2002 | EP1190437A1 Plasma processing system, apparatus, and method for delivering rf power to a plasma processing chamber |
| 03/27/2002 | EP1190436A1 Plasma processor with coil responsive to variable amplitude rf envelope |
| 03/27/2002 | EP1190435A1 A plasma reaction chamber component having improved temperature uniformity |
| 03/27/2002 | EP1190434A1 Real-time prediction of proximity resist heating and correction of raster scan electron beam lithography |
| 03/27/2002 | EP1190433A1 Electrostatic corrector for eliminating the chromatic aberration of particle lenses |
| 03/27/2002 | EP0986777B1 Lithography system |
| 03/27/2002 | CN1342340A Power supplies having protection circuit |
| 03/27/2002 | CN1342213A Processing chamber for atomic layer deposition processes |
| 03/26/2002 | US6362490 Ion implanter |
| 03/26/2002 | US6362489 Charged-particle-beam microlithography methods exhibiting reduced thermal deformation of mark-defining member |
| 03/26/2002 | US6362486 Magnetic lens for focusing a charged particle beam |
| 03/26/2002 | US6362110 Enhanced resist strip in a dielectric etcher using downstream plasma |
| 03/26/2002 | US6361911 Computer support softwear, design patterns |
| 03/26/2002 | US6361707 Apparatus and methods for upgraded substrate processing system with microwave plasma source |
| 03/26/2002 | US6361668 Sputtering installation with two longitudinally placed magnetrons |
| 03/26/2002 | US6361667 Ionization sputtering apparatus |
| 03/26/2002 | US6361663 Vacuum arc evaporator |
| 03/26/2002 | US6361662 Method for fabricating a semiconductor device in a magnetron sputtering system |
| 03/26/2002 | US6361661 Hybrid coil design for ionized deposition |
| 03/26/2002 | US6361644 Parallel-plate electrode reactor having an inductive antenna coupling power through a parallel plate electrode |
| 03/26/2002 | US6360754 Method of protecting quartz hardware from etching during plasma-enhanced cleaning of a semiconductor processing chamber |
| 03/26/2002 | US6360686 Plasma reactor with a deposition shield |
| 03/21/2002 | WO2002023960A1 Electrode for glow-discharge atmospheric plasma treatment |
| 03/21/2002 | WO2002023610A1 Plasma machining device, and electrode plate, electrode supporter, and shield ring of the device |
| 03/21/2002 | WO2002023609A1 High speed silicon etching method |
| 03/21/2002 | WO2002023588A2 Capacitively coupled plasma reactor |
| 03/21/2002 | WO2002023587A2 Tungsten chamber with stationary heater |
| 03/21/2002 | WO2002023586A2 Apparatus for etching noble metals using ion implantation and method of use |
| 03/21/2002 | WO2002023585A2 Method and apparatus for detecting leaks in a plasma etch chamber |
| 03/21/2002 | WO2002023584A2 Ion implanter optimized scan waveform retention and recovery |
| 03/21/2002 | WO2002023583A2 Monitor system and method for semiconductor processes |
| 03/21/2002 | WO2002023582A2 Faraday system for ion implanters |
| 03/21/2002 | WO2002023581A1 Apparatus for inspecting mask |
| 03/21/2002 | WO2002023580A1 Field emission photocathode array for lithography system and lithography system provided with such an array |
| 03/21/2002 | WO2002023576A1 Field emission photocathode array comprising an additional layer to improve the yield and electron optical imaging system using the same |
| 03/21/2002 | WO2002023160A1 Afterglow emission spectroscopy monitor |
| 03/21/2002 | WO2002022300A1 Method of manufacturing sputter targets with internal cooling channels |
| 03/21/2002 | WO2001093315A3 Methods and apparatus for plasma processing |
| 03/21/2002 | WO2001075931A3 Inductively coupled plasma etching apparatus |
| 03/21/2002 | US20020035717 Navigation method and device for pattern observation of semiconductor device |
| 03/21/2002 | US20020034880 Wherein gas is introduced into a vacuum chamber for treating a substrate to be processed |
| 03/21/2002 | US20020034590 Average current density of the plasma generated is set to satisfy a given formula; dielectric between electrodes, and an electrical power source for alternating current or pulsed current; monitoring current or voltage waveform |
| 03/21/2002 | US20020034433 Method and apparatus for processing wafers |
| 03/21/2002 | US20020034152 Substrate rotating device, and manufacturing method and apparatus of recording medium master |
| 03/21/2002 | US20020033458 Charged particle beam exposure system |
| 03/21/2002 | US20020033457 Pattern lock system |
| 03/21/2002 | US20020033455 Electron energy filter with magnetic deflecting regions |
| 03/21/2002 | US20020033451 Electron microscope |