| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/18/2002 | US20020043274 Processing a semiconductor wafer in a chamber having upper and lower chambers, decoupling upper from lower chamber, cleaning upper chamber, determining that a leak rate and particle count for upper chamber meets predetermined criteria |
| 04/18/2002 | DE19957824C2 Verfahren zur Herstellung von feinsten Spitzen im Subnanometerbereich Process for the preparation of finest peaks in the subnanometer range |
| 04/18/2002 | DE10050046A1 Process for etching in a plasma chamber comprises adjusting an upper electrode and a receiver, etching at a first distance over a first specified time, adjusting the upper electrode |
| 04/17/2002 | EP1197986A2 Autoadjusting charged-particle probe-forming apparatus |
| 04/17/2002 | EP1197985A2 Scanning charged-particle microscope |
| 04/17/2002 | EP1197578A2 Sputtering apparatus for coating at least one substrate and process for controlling the apparatus |
| 04/17/2002 | EP1197124A1 Method and apparatus for forming polycrystalline particles |
| 04/17/2002 | EP1196939A1 Object inspection and/or modification system and method |
| 04/17/2002 | EP1196938A2 Apparatus and method for exposing a substrate to plasma radicals |
| 04/17/2002 | EP0881918B1 Medical implant based on tetracarbon |
| 04/17/2002 | CN1344952A Heatable sample platform for scanning probe microscope |
| 04/17/2002 | CN1083105C Chemically differentiated imaging by screening atomic force microscopey |
| 04/16/2002 | US6373246 Cantilever magnetic force sensor for magnetic force microscopy and method of manufacturing magnetic force sensor |
| 04/16/2002 | US6373071 Real-time prediction of proximity resist heating and correction of raster scan electron beam lithography |
| 04/16/2002 | US6373070 Method apparatus for a coaxial optical microscope with focused ion beam |
| 04/16/2002 | US6373054 Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same |
| 04/16/2002 | US6373022 Plasma reactor with antenna of coil conductors of concentric helices offset along the axis of symmetry |
| 04/16/2002 | US6372523 Etching method and etching device |
| 04/16/2002 | US6372391 Template mask lithography utilizing structured beam |
| 04/16/2002 | US6372305 Locating a substrate tube along cylindrical axis and within inner wall of resonant cavity, substrate tube having an inner surface and length; using plasma chemical vapor deposition to deposit layers of doped silica on inside surface of substrate |
| 04/16/2002 | US6372303 Method and device for vacuum-coating a substrate |
| 04/16/2002 | US6372098 High target utilization magnet array and associated methods |
| 04/16/2002 | US6372084 Plasma processing apparatus with a dielectric plate having a thickness based on a wavelength of a microwave introduced into a process chamber through the dielectric plate |
| 04/16/2002 | US6371045 Physical vapor deposition device for forming a metallic layer on a semiconductor wafer |
| 04/11/2002 | WO2002029877A1 Vacuum processing device |
| 04/11/2002 | WO2002029868A1 Electron beam exposure system |
| 04/11/2002 | WO2002029867A1 Method for correcting electron beam and electron beam exposure system |
| 04/11/2002 | WO2002029866A1 Electron beam exposure system and method for calibrating irradiating position of electron beam |
| 04/11/2002 | WO2002029849A2 System, apparatus, and method for processing wafer using single frequency rf power in plasma processing chamber |
| 04/11/2002 | WO2002029848A2 Wafer area pressure control for plasma confinement |
| 04/11/2002 | WO2002029491A1 Method for high yield reticle formation |
| 04/11/2002 | WO2001037310A3 Method and apparatus for ionized physical vapor deposition |
| 04/11/2002 | WO2001035438A9 Particle beam processing apparatus |
| 04/11/2002 | US20020042906 Apparatus for and method of preparing pattern data of electronic part |
| 04/11/2002 | US20020042206 Plasma etching apparatus and plasma etching method |
| 04/11/2002 | US20020042204 Plasma processing apparatus with reduced parasitic capacity and loss in RF power |
| 04/11/2002 | US20020042009 Configuring charged particle beam to have within projected subfield at projected-image plane distribution and cutoff half-angles such that at maximum lateral deflection of beam blur is held to no greater than threshold values |
| 04/11/2002 | US20020042006 Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portion |
| 04/11/2002 | US20020042005 Technique of exposing a resist using electron beams having different accelerating voltages, and method of manufacturing a photomask using the technique |
| 04/11/2002 | US20020041160 Method for controlling etch uniformity |
| 04/11/2002 | US20020041158 Interlocking cylindrical magnetron cathodes and targets |
| 04/11/2002 | US20020040969 Apparatus and method for preventing the short circuit of a filament of a source head to a cathode |
| 04/11/2002 | US20020040766 Etching silicon oxide with fluorohydrocarbon or fluorine; controlling temperature |
| 04/11/2002 | US20020040765 Apparatus and methods for processing surface of semiconductor substrate |
| 04/10/2002 | EP1195793A2 Passive bipolar arc control system and method |
| 04/10/2002 | EP1195792A2 Film forming apparatus |
| 04/10/2002 | EP1194947A1 Methods and apparatus for alignment of ion beam systems using beam current sensors |
| 04/10/2002 | EP1194607A2 Copper sputtering target assembly and method of making same |
| 04/10/2002 | EP1051729B1 Plasma reactor |
| 04/10/2002 | EP0972092A4 Multipurpose processing chamber for chemical vapor deposition processes |
| 04/10/2002 | CN1344001A Ferroelectric emitter body |
| 04/10/2002 | CN1082569C Microwave plasma processing appts. and method therefor |
| 04/09/2002 | US6370441 Method and apparatus of correcting design-patterned data, method of electron beam and optical exposure, method of fabricating semiconductor and photomask devices |
| 04/09/2002 | US6369891 Method of determining accuracy error in line width metrology device |
| 04/09/2002 | US6369494 Cathode structure and electron gun for cathode ray tubes |
| 04/09/2002 | US6369493 Microwave plasma applicator having a thermal transfer medium between a plasma containing tube and a cooling jacket |
| 04/09/2002 | US6369397 SPM base focal plane positioning |
| 04/09/2002 | US6369396 Calibration target for electron beams |
| 04/09/2002 | US6369385 Integrated microcolumn and scanning probe microscope arrays |
| 04/09/2002 | US6369349 Plasma reactor with coil antenna of interleaved conductors |
| 04/09/2002 | US6369348 Plasma reactor with coil antenna of plural helical conductors with equally spaced ends |
| 04/09/2002 | US6368678 Plasma processing system and method |
| 04/09/2002 | US6368477 Adjustable energy quantum thin film plasma processing system |
| 04/09/2002 | US6368469 Inductive coils serves as additional target in sputtering; improves uniformity of deposited metal; independent bias of coils allows for additional control over sputtering |
| 04/09/2002 | US6368452 Plasma treatment apparatus and method of semiconductor processing |
| 04/09/2002 | US6368451 High voltage feedthrough for non-thermal plasma reactor |
| 04/09/2002 | US6367413 Apparatus for monitoring substrate biasing during plasma processing of a substrate |
| 04/09/2002 | US6367412 Porous ceramic liner for a plasma source |
| 04/09/2002 | US6367411 Plasma CVD apparatus |
| 04/09/2002 | US6367329 Acoustic time of flight and acoustic resonance methods for detecting endpoint in plasma processes |
| 04/04/2002 | WO2002027755A2 Chamber configuration for confining a plasma |
| 04/04/2002 | WO2002027754A2 An apparatus for the backside gas cooling of a wafer in a batch ion implantation system |
| 04/04/2002 | WO2002027753A2 System and method for delivering cooling gas from atmospheric pressure to a high vacuum through a rotating seal in a batch ion implanter |
| 04/04/2002 | WO2002027062A1 Plasma processing system with gas permeable electrode |
| 04/04/2002 | WO2002003763A8 Vacuum plasma processor apparatus and method |
| 04/04/2002 | WO2001091164A3 Plasma reactor with a tri-magnet plasma confinement apparatus |
| 04/04/2002 | WO2001086697A3 Inductive plasma loop enhancing magnetron sputtering |
| 04/04/2002 | WO2001084593A3 A lens for a scanning electron microscope |
| 04/04/2002 | WO2001080290A3 A method of operating a dual chamber reactor with neutral density decoupled from ion density |
| 04/04/2002 | WO2001072093A3 Plasma accelerator arrangement |
| 04/04/2002 | US20020039829 Semiconductor device manufacturing system and electron beam exposure apparatus |
| 04/04/2002 | US20020039828 Method for exposing a layout comprising multiple layers on a wafer |
| 04/04/2002 | US20020039626 Formation of said plasma is performed by applying an RF power and a DC power, and said DC power is applied to an electrode carrying the deposition target object. |
| 04/04/2002 | US20020039516 Three degree of freedom joint |
| 04/04/2002 | US20020038853 Electron beam exposure apparatus |
| 04/04/2002 | US20020038852 Magnetic shielding method for charged particle beam microlithography apparatus |
| 04/04/2002 | US20020038791 Plasma processing method and apparatus |
| 04/04/2002 | US20020038692 Plasma Processing apparatus |
| 04/04/2002 | US20020038691 Plasma processing system |
| 04/04/2002 | US20020038688 Plasma processing apparatus and system, performance validation system and inspection method therefor |
| 04/04/2002 | US20020038632 Plasma treatment method and plasma treatment apparatus |
| 04/04/2002 | US20020038631 Plasma processing apparatus and method using active matching |
| 04/04/2002 | US20020038630 Apparatus and method for forming deposited film |
| 04/04/2002 | DE10045958A1 Unit introducing gas into and from plasma processing chamber has lines of identical flow resistance connecting between gas connection and chamber |
| 04/04/2002 | DE10042629A1 Igniter for vapor deposition arc, includes source supplying ions between cathode and anode |
| 04/03/2002 | EP1193746A1 Apparatus for plasma processing |
| 04/03/2002 | EP1193729A2 Method and apparatus for magnetron sputtering |
| 04/03/2002 | EP1192637A1 Method and device for electronic cyclotronic resonance plasma deposit of carbon nanofibre layers in fabric form and resulting fabric layers |
| 04/03/2002 | EP1192291A1 Device for monitoring intended or unavoidable layer deposits and corresponding method |
| 04/03/2002 | EP0947047B1 Method of and apparatus for matching a load to a source |