| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/01/2002 | CN1347012A Method and device for designing electron beam mask |
| 04/30/2002 | US6381013 Test slide for microscopes and method for the production of such a slide |
| 04/30/2002 | US6380684 Plasma generating apparatus and semiconductor manufacturing method |
| 04/30/2002 | US6380612 Thin film formed by inductively coupled plasma |
| 04/30/2002 | US6380546 Focusing assembly and method for a charged particle beam column |
| 04/30/2002 | US6380545 Uniform raster pattern generating system |
| 04/30/2002 | US6379851 Agglomerating flashes during energy beam lithography; defining cell upon impact of flash; writing subsequent flash; determination if termination; constructing library of standard cells; integrated circuits |
| 04/30/2002 | US6379756 Plasma treatment method and apparatus |
| 04/30/2002 | US6379576 Systems and methods for variable mode plasma enhanced processing of semiconductor wafers |
| 04/30/2002 | US6379575 Treatment of etching chambers using activated cleaning gas |
| 04/30/2002 | US6379492 Of magnesium fluoride on the surface of a component part such as heater in a semiconductor processing apparatus; chemical resistance to corrosive fluorine gases |
| 04/25/2002 | WO2002033764A2 Apparatus and method for charged particle filtering and apparatus and method for ion implantation |
| 04/25/2002 | WO2002033729A2 Plasma reactor with reduced reaction chamber |
| 04/25/2002 | WO2002033728A1 Device and method for the etching of a substrate by means of an inductively coupled plasma |
| 04/25/2002 | WO2002033727A1 Focused ion beam system |
| 04/25/2002 | WO2002033725A2 System and method for rapidly controlling the output of an ion source for ion implantation |
| 04/25/2002 | WO2002033722A2 Low input power schottky emitter |
| 04/25/2002 | US20020049127 Glass, plasma resisting component, component for electromagnetic wave-transparent window and plasma processing apparatus |
| 04/25/2002 | US20020048963 Plasma enhanced chemical vapor deposition process |
| 04/25/2002 | US20020048026 Laser interferometer displacement measuring system, exposure apparatus, and elecron beam lithography apparatus |
| 04/25/2002 | US20020048019 Monitoring substrate processing with optical emission and polarized reflected radiation |
| 04/25/2002 | US20020047767 Electromagnetic field generator and method of operation |
| 04/25/2002 | US20020047580 Process of crystallizing semiconductor thin film and laser irradiation system |
| 04/25/2002 | US20020047579 Process of crystallizing semiconductor thin film and laser irradiation system |
| 04/25/2002 | US20020047543 Plasma density information measuring method, probe used for measuring plasma density information, and plasma density information measuring apparatus |
| 04/25/2002 | US20020047542 Exposure system |
| 04/25/2002 | US20020047541 Plasma processsing method and apparatus thereof |
| 04/25/2002 | US20020047540 Radio frequency ion plating apparatus |
| 04/25/2002 | US20020047539 Process and switching arrangement for pulsing energy introduction into magnetron discharges |
| 04/25/2002 | US20020047536 Plasma processing apparatus |
| 04/25/2002 | US20020047321 Linear motors and stages comprising same that produce reduced magnetic fields at an optical axis for charged-particle-beam lithography |
| 04/25/2002 | US20020047116 Coil for sputter deposition |
| 04/25/2002 | US20020047098 Substrate defect inspection method and substrate defect inspection system |
| 04/25/2002 | US20020047096 Electron beam exposure apparatus, electron lens, and device manufacturing method |
| 04/25/2002 | US20020047093 Method of capturing scanning electron microscope images and scanning electron microscope apparatus for performing the method |
| 04/25/2002 | US20020046992 Plasma resistant quartz glass jig |
| 04/25/2002 | US20020046991 Toroidal low-field reactive gas source |
| 04/25/2002 | US20020046989 RF matching network with distributed outputs |
| 04/25/2002 | US20020046987 Device and method for etching a substrate by using an inductively coupled plasma |
| 04/25/2002 | US20020046945 High performance magnetron for DC sputtering systems |
| 04/25/2002 | US20020046944 Method and apparatus for reducing noise in a sputtering chamber |
| 04/25/2002 | US20020046808 Plasma processing apparatus |
| 04/25/2002 | US20020046807 Plasma processing apparatus |
| 04/25/2002 | US20020046775 Gas panel |
| 04/25/2002 | DE10141844A1 Hochfrequenz-Anpassungseinheit RF matching unit |
| 04/25/2002 | DE10010448C1 Cathode used for coating a substrate comprises yoke sides with magnets surrounding a yoke plate |
| 04/24/2002 | EP1199739A2 A device and method for suppressing space charge induced abberations in charged-particle projection lithography systems |
| 04/24/2002 | EP1198822A2 New methodologies to reduce process sensitivity to the chamber condition |
| 04/24/2002 | EP1198821A1 Techniques for improving etch rate uniformity |
| 04/24/2002 | EP1198611A1 Device for treating a container with microwave plasma |
| 04/24/2002 | EP1198610A1 Low-temperature compatible wide-pressure-range plasma flow device |
| 04/24/2002 | EP1198608A1 Electron beam physical vapor deposition apparatus and viewport therefor |
| 04/24/2002 | EP1198607A1 Vacuum treatment installation and method for producing workpieces |
| 04/23/2002 | US6377149 Magnetic field generator for magnetron plasma generation |
| 04/23/2002 | US6377004 Thin vacuum valve for particle accelerator beam lines |
| 04/23/2002 | US6376985 Gated photocathode for controlled single and multiple electron beam emission |
| 04/23/2002 | US6376984 Patterned heat conducting photocathode for electron beam source |
| 04/23/2002 | US6376978 Quartz antenna with hollow conductor |
| 04/23/2002 | US6376977 Silicon electrode plate |
| 04/23/2002 | US6376850 Electron beam aperture element |
| 04/23/2002 | US6376848 Apparatus and methods for charged-particle-beam microlithography exhibiting reduced aberrations caused by beam deflection to correct errors in stage-position control |
| 04/23/2002 | US6376847 Charged particle lithography method and system |
| 04/23/2002 | US6376842 Optical system for charged-particle-beam microlithography apparatus exhibiting reduced third- and fifth-order aberrations |
| 04/23/2002 | US6376839 SEM for transmission operation with a location-sensitive detector |
| 04/23/2002 | US6376833 Projection having a micro-aperture, probe or multi-probe having such a projection and surface scanner, aligner or information processor comprising such a probe |
| 04/23/2002 | US6376796 Plasma processing system |
| 04/23/2002 | US6376385 Method of manufacturing assembly for plasma reaction chamber and use thereof |
| 04/23/2002 | US6376281 Multilayer; metal or alloy layer, bonding layer and backing plate |
| 04/23/2002 | US6376137 Charged-particle-beam microlithography apparatus and methods including correction of stage-positioning errors using a deflector |
| 04/23/2002 | US6376136 Scanning a mask formed on sample with charged beams; pattern exposure; applying calibration voltage |
| 04/23/2002 | US6376132 Mask for electron beam exposure, manufacturing method for the same, and manufacturing method for semiconductor device |
| 04/23/2002 | US6376028 Device and method for treating the inside surface of a plastic container with a narrow opening in a plasma enhanced process |
| 04/23/2002 | US6375860 Controlled potential plasma source |
| 04/23/2002 | US6375815 Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly |
| 04/23/2002 | US6375814 Magnetron with parallel race track and modified end portions thereof |
| 04/23/2002 | US6375810 Plasma vapor deposition with coil sputtering |
| 04/23/2002 | US6375790 Adaptive GCIB for smoothing surfaces |
| 04/23/2002 | US6375750 Plasma enhanced chemical processing reactor and method |
| 04/23/2002 | US6374871 Liner for use in processing chamber |
| 04/23/2002 | US6374859 Manifold system for enabling a distribution of fluids |
| 04/23/2002 | US6374833 Removing a residue remaining in a metal etching chamber and on a wafer after completing a metal etching process; bcl3 reactive gas; applying an electromagnetic power to said metal etching chamber for producing a plasma |
| 04/23/2002 | US6374832 Performing a dry cleaning process in the etching chamber with oxygen/hydrogen bromide plasma to restore an etching environment in the etching chamber, wherein the etching chamber is free of wafers |
| 04/18/2002 | WO2002031891A1 Electrode and electron emission applications for n-type doped nanocrystalline materials |
| 04/18/2002 | WO2002031859A2 Stepped upper electrode for plasma processing uniformity |
| 04/18/2002 | WO2002031839A1 N-type doping of nanocrystalline diamond films with nitrogen and electrodes made therefrom |
| 04/18/2002 | WO2001082958A3 Methods of producing membrane vesicles |
| 04/18/2002 | WO2001065596A3 Method for controlling uniformity of treatment of a surface of material for microelectronics with an electrically charged particle beam and equipment therefor |
| 04/18/2002 | WO2001063266A3 System for imaging a cross-section of a substrate |
| 04/18/2002 | US20020045109 Mask for beam exposure having membrane structure and stencil structure and method for manufacturing the same |
| 04/18/2002 | US20020045107 Reticle for creating resist-filled vias in a dual damascene process |
| 04/18/2002 | US20020043629 Process for electron beam lithography, and electron-optical lithography system |
| 04/18/2002 | US20020043628 Apparatus for detecting defects in semiconductor devices and methods of using the same |
| 04/18/2002 | US20020043621 Apparatus and method relating to charged particles |
| 04/18/2002 | US20020043457 Sputtering apparatus |
| 04/18/2002 | US20020043342 Plasma generator |
| 04/18/2002 | US20020043341 Plasma process apparatus |
| 04/18/2002 | US20020043340 Apparatus for processing samples |
| 04/18/2002 | US20020043339 Apparatus for processing samples |
| 04/18/2002 | US20020043338 Plasma etching apparatus and plasma etching method |
| 04/18/2002 | US20020043335 Dry etching device |