| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/14/2002 | US6388383 Method of an apparatus for obtaining neutral dissociated gas atoms |
| 05/14/2002 | US6388382 Plasma processing apparatus and method |
| 05/14/2002 | US6388381 Constricted glow discharge plasma source |
| 05/14/2002 | US6388263 Vacuum system with mist prevention apparatus for manufacturing semiconductor devices and method using the same |
| 05/14/2002 | US6388262 Double tilt and rotate specimen holder for a transmission electron microscope |
| 05/14/2002 | US6388261 Charged-particle-beam microlithography apparatus and methods exhibiting reduced astigmatisms and linear distortion |
| 05/14/2002 | US6388252 Self-detecting type of SPM probe and SPM device |
| 05/14/2002 | US6388249 Surface analyzing apparatus |
| 05/14/2002 | US6388226 Toroidal low-field reactive gas source |
| 05/14/2002 | US6387817 Plasma confinement shield |
| 05/14/2002 | US6387816 Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor |
| 05/14/2002 | US6387288 High selectivity etch using an external plasma discharge |
| 05/14/2002 | US6387208 Inductive coupling plasma processing apparatus |
| 05/14/2002 | US6387207 Integration of remote plasma generator with semiconductor processing chamber |
| 05/14/2002 | US6387185 Processing chamber for atomic layer deposition processes |
| 05/14/2002 | US6385977 ESRF chamber cooling system and process |
| 05/10/2002 | WO2002037906A2 Mechanism for containment of neutron radiation in ion implanter beamline |
| 05/10/2002 | WO2002037905A2 Mechanism for prevention of neutron radiation in ion implanter beamline |
| 05/10/2002 | WO2002037544A1 Electron beam exposure apparatus and electron beam exposure method |
| 05/10/2002 | WO2002037541A2 Etch chamber for etching dielectric layer with expanded process window |
| 05/10/2002 | WO2002037529A2 Pulsed sputtering with a small rotating magnetron |
| 05/10/2002 | WO2002037528A2 Magnetron with a rotating center magnet for a vault shaped sputtering target |
| 05/10/2002 | WO2002037527A1 Electron beam apparatus and device production method using the apparatus |
| 05/10/2002 | WO2002037526A1 Electron beam apparatus and method for manufacturing semiconductor device comprising the apparatus |
| 05/10/2002 | WO2002037525A2 A probe assembly for detecting an ion in a plasma generated in an ion source |
| 05/10/2002 | WO2002037524A2 Bi mode ion implantation with non-parallel ion beams |
| 05/10/2002 | WO2002037523A2 Sem provided with an adjustable voltage of the final electrode in the electrostatic objective |
| 05/10/2002 | WO2002037085A1 Process control methods for use with e-beam fabrication technology |
| 05/10/2002 | WO2002036851A1 Method and device for treating the surface of electrically insulating substrates |
| 05/10/2002 | WO2002019378A3 System and method for removing particles entrained in an ion beam |
| 05/10/2002 | WO2002019377A3 Electrostatic trap for particles entrained in an ion beam |
| 05/10/2002 | WO2002019376A3 System and method for removing contaminant particles relative to an ion beam |
| 05/10/2002 | WO2002012972A3 Direct temperature control for a component of a substrate processing chamber |
| 05/10/2002 | WO2001088948A3 Through-the-lens sample neutralizing electron beam for focused ion beam system |
| 05/10/2002 | WO2001045141A3 Method and apparatus for smoothing thin conductive films by gas cluster ion beam |
| 05/09/2002 | US20020055263 Etching in a chamber with high frequency generated plasma of a fluorocarbon (C4F6) gas and an oxygen (O2) gas, and the ratio C4F6/O2 is specified; etch selectivity of the oxide film |
| 05/09/2002 | US20020054284 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 05/09/2002 | US20020053880 Ion source and operation method thereof |
| 05/09/2002 | US20020053645 Apparatus for manufacturing a semiconductor device and a method for manufacturing a semiconductor device |
| 05/09/2002 | US20020053643 Convergent charged particle beam apparatus and inspection method using same |
| 05/09/2002 | US20020053642 System and method for rapidly controlling the output of an ion source for ion implantation |
| 05/09/2002 | US20020053638 Apparatus and method for examing specimen with a charged particle beam |
| 05/09/2002 | US20020053634 Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus |
| 05/09/2002 | US20020053513 Apparatus for improved power coupling through a workpiece in a semiconductor waffer processing system |
| 05/09/2002 | US20020053322 Vacuum system with separable work piece support |
| 05/08/2002 | EP1204134A2 RF plasma processor |
| 05/08/2002 | EP1204133A2 Method and apparatus for processing a micro sample |
| 05/08/2002 | EP1204110A2 Optical disc and apparatus for manufacturing a master disc therefor |
| 05/08/2002 | EP1203513A2 High-speed symmetrical plasma treatment system |
| 05/08/2002 | EP1203441A1 Radio frequency power source for generating an inductively coupled plasma |
| 05/08/2002 | EP1203396A1 Device and method for etching a substrate using an inductively coupled plasma |
| 05/08/2002 | EP1202776A1 Method apparatus and article of manufacture for a branding diamond branding with a focused ion beam |
| 05/08/2002 | DE19681168C2 Ion implanter for implantation of ions into substrates e.g. semiconductor wafers in electronic device mfr. |
| 05/08/2002 | DE10147995A1 Kompakter Szintillator mit hoher Sammlungseffizienz zum Nachweis von Sekundärelektronen Compact scintillator with high collection efficiency for the detection of secondary electrons |
| 05/08/2002 | DE10141423A1 Verfahren und Gerät zur Prüfung auf Musterfehler Method and apparatus for testing for pattern defects |
| 05/08/2002 | DE10141422A1 Verfahren zur Prüfung auf Maskenfehler und Gerät zur Elektronenstrahlbelichtung Method to check for errors and mask device for electron beam exposure |
| 05/08/2002 | DE10047688A1 Ion source used in plasma deposition, implantation and ion etching of microstructures comprises gas volumes on either side of a separating wall to form a pressure difference between the gas volumes |
| 05/07/2002 | US6384412 Electron microscope with an energy filter having hexapole correctors which are coupled with a projective system downstream of the energy filter |
| 05/07/2002 | US6384408 Calibration of a scanning electron microscope |
| 05/07/2002 | US6383896 Thin film forming method and thin film forming apparatus |
| 05/07/2002 | US6383565 Vapor deposition coating apparatus |
| 05/07/2002 | US6383554 Process for fabricating plasma with feedback control on plasma density |
| 05/07/2002 | US6383334 Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor |
| 05/07/2002 | US6383333 Protective member for inner surface of chamber and plasma processing apparatus |
| 05/07/2002 | US6382129 Semiconductor wafer processor, plasma generating apparatus, magnetic field generator, and method of generating a magnetic field |
| 05/07/2002 | CA2094252C Rotating magnetron incorporating a removable cathode |
| 05/02/2002 | WO2002035895A2 A method and an apparatus for excitation of a plasma |
| 05/02/2002 | WO2002035586A2 Monitoring substrate processing using reflected radiation |
| 05/02/2002 | WO2002035576A1 An atmospheric pressure plasma assembly |
| 05/02/2002 | WO2002035575A1 Device for treating gas with plasma |
| 05/02/2002 | WO2002034669A1 Method and device for electronic cyclotron resonance plasma deposit of single-wall carbon nanotubes and resulting nanotubes |
| 05/02/2002 | WO2002034451A1 Method of and structure for controlling electrode temperature |
| 05/02/2002 | WO2002015649A3 Close coupled match structure for rf drive electrode |
| 05/02/2002 | WO2001082328A3 Magnetic barrier for plasma in chamber exhaust |
| 05/02/2002 | WO2001075934A3 Integrated full wavelength spectrometer for wafer processing |
| 05/02/2002 | WO2001003159A9 Gas distribution apparatus for semiconductor processing |
| 05/02/2002 | US20020052668 Control apparatus for plasma utilizing equipment |
| 05/02/2002 | US20020052114 Enhanced resist strip in a dielectric etcher using downstream plasma |
| 05/02/2002 | US20020051333 Low voltage modular room ionization system |
| 05/02/2002 | US20020050577 Device and method for detecting the drive state of a turbo pump in a tendetron accelerator of an ion implantation device |
| 05/02/2002 | US20020050573 Ion implantation apparatus, ion generating apparatus and semiconductor manufacturing method with ion implantation processes |
| 05/02/2002 | US20020050569 Magnetic scanning system with a nonzero field |
| 05/02/2002 | US20020050565 Method and apparatus for processing a micro sample |
| 05/02/2002 | US20020050486 Plasma processing apparatus |
| 05/02/2002 | US20020050453 Vapor deposition coating apparatus |
| 05/02/2002 | US20020050323 Device for the plasma treatment of gases |
| 05/02/2002 | EP1202321A2 Vaporization of precursors at point of use |
| 05/02/2002 | EP1202320A2 Method and apparatus for charged particle beam microscopy |
| 05/02/2002 | EP1200988A2 Method and apparatus for milling copper interconnects in a charged particle beam system |
| 05/02/2002 | EP1200981A1 Gas distribution apparatus for semiconductor processing |
| 05/02/2002 | EP1200980A1 Adaptive gas cluster ion beam for smoothing surfaces |
| 05/02/2002 | EP1200979A1 Minimization of electron fogging in electron beam lithography |
| 05/02/2002 | EP1200978A1 Electron beam column using high numerical aperture illumination of the photocathode |
| 05/02/2002 | EP1200977A2 Patterned heat conducting photocathode for electron beam source |
| 05/02/2002 | EP1200974A1 Diamond supported photocathodes for electron sources |
| 05/02/2002 | EP1200175A1 Electron beam irradiation apparatus and method |
| 05/02/2002 | DE10135802A1 Sputterbeschichtungsanlage zur Beschichtung von zumindest einem Substrat und Verfahren zur Regelung dieser Anlage Sputter coating for coating at least one substrate and method for controlling this complex |
| 05/02/2002 | DE10052198A1 Method and device for production testing of semiconductor wafers comprising microelectronic components by generation of potential contrast images that are then analyzed for the presence of defects |
| 05/02/2002 | DE10051831A1 Inductively-coupled plasma-etching equipment for silicon substrates includes two stacked coils producing field between substrate and ICP source |
| 05/02/2002 | CA2426545A1 A method and an apparatus for excitation of a plasma |