| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/11/2002 | US6403490 Method of producing a plasma by capacitive-type discharges with a multipole barrier, and apparatus for implementing such a method |
| 06/11/2002 | US6403489 Method for removing polymer stacked on a lower electrode within an etching reaction chamber |
| 06/11/2002 | US6403452 Ion implantation method and ion implantation equipment |
| 06/11/2002 | US6403410 Plasma doping system and plasma doping method |
| 06/11/2002 | US6403167 Method for surface modification of 3-dimensional bulk polymers |
| 06/11/2002 | US6402904 System and method for performing sputter deposition using independent ion and electron sources and a target biased with an a-symmetric bi-polar DC pulse signal |
| 06/11/2002 | US6402903 Rotating magnet |
| 06/11/2002 | US6402902 Apparatus and method for a reliable return current path for sputtering processes |
| 06/11/2002 | US6402901 Incline surface; optics; uniform thickness |
| 06/11/2002 | US6402900 Generating ions; optics |
| 06/11/2002 | US6402885 Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma |
| 06/11/2002 | US6402882 Device and method for ion beam etching using space-time detection |
| 06/11/2002 | US6402847 Dry processing apparatus and dry processing method |
| 06/11/2002 | US6402806 Method for unreacted precursor conversion and effluent removal |
| 06/11/2002 | US6402380 Fluid bearing operable in a vacuum region |
| 06/11/2002 | US6401728 Method for cleaning interior of etching chamber |
| 06/11/2002 | US6401653 Microwave plasma generator |
| 06/11/2002 | US6401652 Plasma reactor inductive coil antenna with flat surface facing the plasma |
| 06/06/2002 | WO2002045153A1 Inspection method and apparatus using electron beam, and device production method using it |
| 06/06/2002 | WO2002045126A1 Ion source |
| 06/06/2002 | WO2002045125A1 Device and method for the examination of samples in a non-vacuum environment using a scanning electron microscope |
| 06/06/2002 | WO2002045124A2 Measurement device with remote adjustment of electron beam stigmation by using mosfet ohmic properties and isolation devices |
| 06/06/2002 | WO2002045123A1 Electron beam generating device, and testing device |
| 06/06/2002 | WO2002045116A1 Material for electrodes of low temperature plasma generators |
| 06/06/2002 | WO2002045112A1 Acceleration and focalization unit with improved vacuum for ion implanters |
| 06/06/2002 | WO2002044674A1 Method and apparatus for 2-d spatially resolved optical emission and absorption spectroscopy |
| 06/06/2002 | WO2002044634A1 Electrode cooler of processing device |
| 06/06/2002 | WO2002044444A1 Method and apparatus for producing miiin columns and miiin materials grown thereon |
| 06/06/2002 | WO2002044443A1 Methods and apparatus for producing m'n based materials |
| 06/06/2002 | WO2002044079A1 Method and apparatus for manufacturing ultra fine three-dimensional structure |
| 06/06/2002 | WO2002043905A2 A method and apparatus for the production of metal powder granules by electric discharge |
| 06/06/2002 | WO2002043803A1 Ion implantation system and control method |
| 06/06/2002 | WO2002043466A2 Non-thermionic sputter material transport device, methods of use, and materials produced thereby |
| 06/06/2002 | WO2002019374A3 Methods and apparatus for adjusting beam parallelism in ion implanters |
| 06/06/2002 | WO2002016667A3 Sputtering targets |
| 06/06/2002 | WO2001082327A3 Collection of secondary electrons through the objective lens of a scanning electron microscope |
| 06/06/2002 | WO2001078103A3 Bi-directional electron beam scanning apparatus |
| 06/06/2002 | US20020068464 Pulsed-mode RF bias for side-wall coverage improvement |
| 06/06/2002 | US20020068458 Method for integrated in-situ cleaning and susequent atomic layer deposition within a single processing chamber |
| 06/06/2002 | US20020068386 Methods of forming physical vapor deposition target/backing plate assemblies |
| 06/06/2002 | US20020068132 Method and apparatus for smoothing thin conductive films by gas cluster ion beam |
| 06/06/2002 | US20020067482 Particle beam system |
| 06/06/2002 | US20020067133 Method for lighting an inductively coupled plasma at low pressure |
| 06/06/2002 | US20020066872 Ion implantation system and ion implantation method |
| 06/06/2002 | US20020066871 Ion implantation system |
| 06/06/2002 | US20020066863 Real time monitoring simultaneous imaging and exposure in charged particle beam systems |
| 06/06/2002 | US20020066669 Facing-targets-type sputtering apparatus and method |
| 06/06/2002 | US20020066668 Sputter depositing a thin film of nitinol metal material onto the substrate comprising silicon dioxide over silicon |
| 06/06/2002 | US20020066537 Plasma reactor |
| 06/06/2002 | US20020066536 Plasma processing apparatus |
| 06/06/2002 | US20020066535 Exhaust system for treating process gas effluent |
| 06/06/2002 | US20020066532 Corrosion-resistant protective coating for an apparatus and method for processing a substrate |
| 06/06/2002 | US20020066531 Manufactured by charging to heated dryer surface at same time but from separate sources organic polymer having amine groups in backbone and sufficient amount of zirconium compound having valence of plus four to crosslink polymer to fibrous web |
| 06/06/2002 | DE10151127A1 Defect detection method for semiconductor device manufacture, involves estimating similarity between the conductive pad groups based on the secondary electron emission after accumulation of electrons and holes in pads |
| 06/06/2002 | DE10058768A1 Igniting plasma involves applying electric voltage between cathode and anode in magnetic field that is moved through gas chamber until plasma is ignited |
| 06/06/2002 | DE10057824A1 Vorrichtung und Verfahren zur Anpassung einer Ionenstrahlfleckgröße in der Tumorbestrahlung Apparatus and method for adapting an ion beam spot size in tumor irradiation |
| 06/06/2002 | DE10044199A1 Teilchenoptische Komponente und System mit Teilchenoptischer Komponente A particle component and system with particle-component |
| 06/06/2002 | CA2436237A1 Device and method for the examination of samples in a non-vacuum environment using a scanning electron microscope |
| 06/05/2002 | EP1211560A1 Gas-actuated stages including reaction-force-canceling mechanisms for use in charged-particle-beam microlithography systems |
| 06/05/2002 | EP1211332A1 Magnetron unit and sputtering device |
| 06/05/2002 | EP1210724A1 Method of determining etch endpoint using principal components analysis of optical emission spectra |
| 06/05/2002 | EP1210723A1 Shaped and low density focused ion beams |
| 06/05/2002 | EP1114435B1 Method for examining and/or modifying surface structures of a sample |
| 06/05/2002 | EP1060499B1 Device and method for forming lithographic patterns using an interferometer |
| 06/05/2002 | EP0889976B1 Apparatus for uniform distribution of plasma |
| 06/05/2002 | EP0880792B1 Loadlock assembly for an ion implantation system |
| 06/04/2002 | US6400458 Interferometric method for endpointing plasma etch processes |
| 06/04/2002 | US6400090 Electron emitters for lithography tools |
| 06/04/2002 | US6399954 Charged-particle beam lithography apparatus and system capable of readily detecting abnormality in controlling on-off operation |
| 06/04/2002 | US6399953 Scanning electronic microscope and method for automatically observing semiconductor wafer |
| 06/04/2002 | US6399945 Backscattered-electron detection systems and associated methods |
| 06/04/2002 | US6399934 Optical coupling to gated photocathodes |
| 06/04/2002 | US6399507 Stable plasma process for etching of films |
| 06/04/2002 | US6399151 For depositing a diamond thick film on a large substrate such as a silicon wafer; direct current plasma assisted chemical vapor deposition; includes holder for fixing the cathode to the chamber and has a cooling line for the cathode |
| 06/04/2002 | US6398929 Plasma reactor and shields generating self-ionized plasma for sputtering |
| 06/04/2002 | US6398920 Separating metal and gas ions according to their mass in a chamber with crossed electric and magnetic fields |
| 06/04/2002 | US6398872 Circuit forming apparatus of semiconductor device |
| 06/04/2002 | US6397776 Apparatus for large area chemical vapor deposition using multiple expanding thermal plasma generators |
| 06/04/2002 | US6397775 Deposited film forming system and process |
| 05/30/2002 | WO2002043452A1 Plasma generating apparatus using microwave |
| 05/30/2002 | WO2002043116A2 Etching of high aspect ratio features in a substrate |
| 05/30/2002 | WO2002043104A2 Hybrid scanning system and methods for ion implantation |
| 05/30/2002 | WO2002043103A2 Extraction and deceleration of low energy beam with low beam divergence |
| 05/30/2002 | WO2002043102A1 Electron-beam generating apparatus and electron-beam exposure apparatus |
| 05/30/2002 | WO2002043100A2 Radio frequency ion source |
| 05/30/2002 | WO2002042521A1 Fabrication apparatus and method |
| 05/30/2002 | WO2002042518A1 Target comprising thickness profiling for an rf magnetron |
| 05/30/2002 | WO2002041948A1 Device and method for adapting the size of an ion beam spot in the domain of tumor irradiation |
| 05/30/2002 | WO2002027753A3 System and method for delivering cooling gas from atmospheric pressure to a high vacuum through a rotating seal in a batch ion implanter |
| 05/30/2002 | WO2001099159A3 Reduction of black silicon in deep trench etch |
| 05/30/2002 | WO2001095352A3 Apparatus and method for accelerating electrons in a plasma reactor |
| 05/30/2002 | WO2001090437A3 Configurable vacuum system and method |
| 05/30/2002 | WO2001059804A3 Device and method for coupling two circuit components which have different impedances |
| 05/30/2002 | WO2001046489A9 Ion beam modification of residual stress gradients in thin film polycrystalline silicon membranes |
| 05/30/2002 | WO2001041181A9 Gas cluster ion beam smoother apparatus |
| 05/30/2002 | US20020065309 For therapy of sex-hormone related conditions, as contraceptives |
| 05/30/2002 | US20020063567 Measurement device with remote adjustment of electron beam stigmation by using MOSFET ohmic properties and isolation devices |
| 05/30/2002 | US20020063537 Appaaratus for generating low temperature plasma at atmospheric pressure |
| 05/30/2002 | US20020063530 Microwave plasma generator, method of decomposing organic halide, and system for decomposing organic halide |
| 05/30/2002 | US20020063054 Low temperature cathodic magnetron sputtering |