| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/30/2002 | CA2429737A1 Radio frequency ion source |
| 05/29/2002 | EP1209721A2 Inductive type plasma processing chamber |
| 05/29/2002 | EP1209720A2 Energy spectrum measurement |
| 05/29/2002 | EP1208587A1 Wafer holder assembly |
| 05/29/2002 | EP1208583A1 Plasma reactor for treating substrates having large surfaces |
| 05/29/2002 | DE19948410A1 Optical mark detectors used in electron beam lithography system, detects position of each position detection mark optically from detected reflection electron |
| 05/29/2002 | DE10057182A1 Monitoring pulsed metal ion source involves evaluating current and voltage signals forming high voltage pulse in sputter pulser to logically detect one of two possible sputter process states |
| 05/29/2002 | CN1351756A Electrostatically focused addressable field emission arraychips (AFEA' s) for high-speed maskless digital e-beam direct write lithography and scanning electron microscopy |
| 05/28/2002 | US6396215 Ion-implantation apparatus and method of ion-implantation by use of this apparatus |
| 05/28/2002 | US6396214 Device for producing a free cold plasma jet |
| 05/28/2002 | US6396064 Differential pumping via core of annular supersonic jet |
| 05/28/2002 | US6396063 Radiofrequency gaseous detection device (RF-GDD) |
| 05/28/2002 | US6396059 Using a crystallographic etched silicon sample to measure and control the electron beam width of a SEM |
| 05/28/2002 | US6395641 Apparatus and method for pulsed plasma processing of a semiconductor substrate |
| 05/28/2002 | US6395347 Vapor spraying |
| 05/28/2002 | US6395157 Method and apparatus for sputter etch conditioning a ceramic body |
| 05/28/2002 | US6395156 Sputtering chamber with moving table producing orbital motion of target for improved uniformity |
| 05/28/2002 | US6395151 Vacuum ARC vapor deposition method and apparatus for applying identification symbols to substrates |
| 05/28/2002 | US6395128 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition |
| 05/28/2002 | US6395095 Process apparatus and method for improved plasma processing of a substrate |
| 05/28/2002 | US6394138 Manifold system of removable components for distribution of fluids |
| 05/28/2002 | US6394109 Method and apparatus for removing carbon contamination in a sub-atmospheric charged particle beam lithography system |
| 05/28/2002 | US6394026 Low contamination high density plasma etch chambers and methods for making the same |
| 05/28/2002 | US6394025 Vacuum film growth apparatus |
| 05/23/2002 | WO2002041672A1 Apparatus for fixing an electrode in plasma polymerizing apparatus |
| 05/23/2002 | WO2002041377A1 Cvd thin film manufacturing apparatus |
| 05/23/2002 | WO2002041374A1 Electron beam exposure system, electron beam correction method, electron beam exposure method, and method of producing semiconductor element |
| 05/23/2002 | WO2002041373A1 Electron beam correction method and electron beam exposure system |
| 05/23/2002 | WO2002041372A1 Electron beam exposure system, electron beam exposure method, and production method for semiconductor element |
| 05/23/2002 | WO2002041356A2 Sputter cathode with magnetic shunt |
| 05/23/2002 | WO2002041355A2 Plasma processing comprising three rotational motions of an article being processed |
| 05/23/2002 | WO2002041354A1 Multi-beam lithography apparatus provided with a differential vacuum system |
| 05/23/2002 | WO2002041353A2 Magnetic scanning system with a nonzero field |
| 05/23/2002 | WO2002040980A1 Wafer inspecting method, wafer inspecting instrument, and electron beam apparatus |
| 05/23/2002 | WO2002040742A1 Method and device for atmospheric plasma processing |
| 05/23/2002 | WO2002040736A1 Conical sputtering target |
| 05/23/2002 | WO2002040733A1 Sputtering target producing few particles, backing plate or sputtering apparatus and sputtering method producing few particles |
| 05/23/2002 | WO2002009241A3 Electrode for plasma processing system |
| 05/23/2002 | WO2002003415A3 Switched uniformity control |
| 05/23/2002 | WO2001075930A3 Apparatus and methods for actively controlling rf peak-to-peak voltage in an inductively coupled plasma etching system |
| 05/23/2002 | WO2001075188A3 Method of and apparatus for gas injection |
| 05/23/2002 | WO2001041183A8 Dose monitor for plasma doping system |
| 05/23/2002 | US20020061656 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition |
| 05/23/2002 | US20020060573 Method for determining an operational condition of a thermal field electron emitter, a method for operating the thermal field electron emitter and an electron beam utilizing system having the thermal field electron emitter |
| 05/23/2002 | US20020060523 Plasma processing apparatus |
| 05/23/2002 | US20020060201 Ions of an ion beam with predetermined polarity are extracted from an ion source and accelerated, which is then reflected and neutralizedm |
| 05/23/2002 | US20020059981 Lower electrode design for higher uniformity |
| 05/23/2002 | CA2435852A1 A method for plasma treatment under the atmospheric pressure and an equipment therefor |
| 05/22/2002 | EP1207546A2 Apparatus and method for plasma-treating of a substrate |
| 05/22/2002 | EP1207545A2 Method for determining and setting an operational condition of a thermal field electron emitter |
| 05/22/2002 | EP1206908A1 Microwave cvd method for deposition of robust barrier coatings |
| 05/22/2002 | CN1350284A System and method for controlling passive bipolar electric arc |
| 05/21/2002 | US6393604 Process for preparing data for direct-writing by a charged particle ray, process for verifying data for direct-writing by a charged particle ray, process for displaying data for direct-writing by a charged particle ray, and exposure device |
| 05/21/2002 | US6392351 Inductive RF plasma source with external discharge bridge |
| 05/21/2002 | US6392333 Electron gun having magnetic collimator |
| 05/21/2002 | US6392245 Scanning wheel for ion implantation process chamber |
| 05/21/2002 | US6392243 Electron beam exposure apparatus and device manufacturing method |
| 05/21/2002 | US6392242 Fiducial beam position monitor |
| 05/21/2002 | US6392231 Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method |
| 05/21/2002 | US6392230 Focused ion beam forming method |
| 05/21/2002 | US6392228 Energy filter, transmission electron microscope and associated method for filtering energy |
| 05/21/2002 | US6392210 Methods and apparatus for RF power process operations with automatic input power control |
| 05/21/2002 | US6391789 Dry etching system for patterning target layer at high reproducibility and method of dry etching used therein |
| 05/21/2002 | US6391787 Stepped upper electrode for plasma processing uniformity |
| 05/21/2002 | US6391215 Diamond marking |
| 05/21/2002 | US6391171 Flangeless feed through |
| 05/21/2002 | US6391164 Deposition of coatings and thin films using a vacuum arc with a non-consumable hot anode |
| 05/21/2002 | US6391147 Plasma treatment method and apparatus |
| 05/21/2002 | US6390020 Dual face shower head magnetron, plasma generating apparatus and method of coating substrate |
| 05/21/2002 | US6390019 Chamber having improved process monitoring window |
| 05/21/2002 | US6390018 Microwave plasma treatment apparatus |
| 05/16/2002 | WO2002039495A1 Plasma processing device and method of assembling the plasma processing device |
| 05/16/2002 | WO2002039493A1 Plasma processing device and exhaust ring |
| 05/16/2002 | WO2002038826A1 Alternating current rotatable sputter cathode |
| 05/16/2002 | WO2002023585A3 Method and apparatus for detecting leaks in a plasma etch chamber |
| 05/16/2002 | WO2002014952A3 Scan butting error reduction in a raster scan pattern generation system |
| 05/16/2002 | WO2001084591A3 Pulsed rf power delivery for plasma processing |
| 05/16/2002 | US20020058400 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same |
| 05/16/2002 | US20020057641 Optical disc and apparatus for manufacturing a master disc therefor |
| 05/16/2002 | US20020056814 Method and device for irradiating an ion beam, and related method and device thereof |
| 05/16/2002 | US20020056813 Target locking system for electron beam lithography |
| 05/16/2002 | US20020056808 Method and apparatus for charged particle beam microscopy |
| 05/16/2002 | US20020056416 With calcium carbonate; papermaking; continuous process |
| 05/16/2002 | US20020056415 Apparatus and method for production of solar cells |
| 05/16/2002 | US20020056342 Apparatus and method for generating indium ion beam |
| 05/16/2002 | DE10147132A1 Herstellungssystem für Halbleiterbauteile sowie Elektronenstrahl-Belichtungsvorrichtung Manufacturing system for semiconductor devices as well as electron beam exposure apparatus |
| 05/15/2002 | EP1205967A2 Method for water vapour enhanced ion-beam machining |
| 05/15/2002 | EP1204986A1 System and method for providing implant dose uniformity across the surface of a substrate |
| 05/15/2002 | EP1204985A1 Implanting system and method |
| 05/15/2002 | EP1204984A1 Electron beam shielding apparatus and methods for shielding electron beams |
| 05/15/2002 | EP1204507A1 Arc-free electron gun |
| 05/15/2002 | EP1092109B1 Vacuum tight coupling for tube sections |
| 05/15/2002 | CN1349567A Device for treating a container with microwave plasma |
| 05/15/2002 | CN1349566A Apparatus for simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor |
| 05/15/2002 | CN1349131A Mask used for beam exposing, and mfg. method therefor |
| 05/15/2002 | CN1349099A 输电系统 Transmission System |
| 05/15/2002 | CN1084925C Device for removing ion from electronic beam |
| 05/14/2002 | US6388632 Slot antenna used for plasma surface processing apparatus |
| 05/14/2002 | US6388386 Process of crystallizing semiconductor thin film and laser irradiation |
| 05/14/2002 | US6388384 Pulse mode electron generator |