| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/20/2002 | US20020076490 Variable gas conductance control for a process chamber |
| 06/20/2002 | US20020076481 Introducing first gas into chamber for reacting with surface of substrate to form layer on substrate, first gas creating first pressure, detecting change in pressure, supplying second gas in response to detection of change in pressure |
| 06/20/2002 | US20020076367 Plasma processing apparatus |
| 06/20/2002 | US20020076363 Scaleable inter-digitized tine non-thermal plasma reactor |
| 06/20/2002 | US20020074946 Microwave plasma generator, method of decomposing organic halide, and system for decomposing organic halide |
| 06/20/2002 | US20020074939 Charged particle beam apparatus |
| 06/20/2002 | US20020074524 Magnetically shielded electromagnetic lens assemblies for charged-particle-beam microlithography systems |
| 06/20/2002 | US20020074519 Electron beam treatment device |
| 06/20/2002 | US20020074510 Curved I-core |
| 06/20/2002 | US20020074509 Contaminant collector trap for ion implanter |
| 06/20/2002 | US20020074506 Multiple numerical aperture electron beam projection lithography system |
| 06/20/2002 | US20020074496 Tem sample slicing process |
| 06/20/2002 | US20020074495 Sectored magnetic lens and method of use |
| 06/20/2002 | US20020074494 Precise, in-situ endpoint detection for charged particle beam processing |
| 06/20/2002 | US20020074226 Film forming apparatus |
| 06/20/2002 | US20020073925 Apparatus and method for exposing a substrate to plasma radicals |
| 06/20/2002 | US20020073924 Gas introduction system for a reactor |
| 06/20/2002 | US20020073922 Can provide high temperature deposition, heating and efficient cleaning, for forming dielectric films having thickness uniformity, good gap fill capability, high density and low moisture |
| 06/19/2002 | EP1215947A2 Scaleable inter-digitized tine non-thermal plasma reactor |
| 06/19/2002 | EP1215717A1 Magnetron plasma processing apparatus |
| 06/19/2002 | EP1215710A2 Method and apparatus for vacuum processing, semiconductor device manufacturing method and semiconductor device |
| 06/19/2002 | EP1215709A2 Vacuum processing method |
| 06/19/2002 | EP1215706A2 Electron beam treatment device |
| 06/19/2002 | EP1215302A1 Sputtering device and film forming method |
| 06/19/2002 | EP1214459A1 Pulsed plasma processing method and apparatus |
| 06/19/2002 | CN1086512C Charged-beam exposure mask and charged-beam exposure method |
| 06/18/2002 | US6407850 Auto tilt stage |
| 06/18/2002 | US6407399 Uniformity correction for large area electron source |
| 06/18/2002 | US6407398 Electron beam exposure apparatus and exposure method |
| 06/18/2002 | US6407397 Charged particle beam exposure apparatus |
| 06/18/2002 | US6407388 Corpuscular beam device |
| 06/18/2002 | US6407387 Particle beam apparatus |
| 06/18/2002 | US6407384 Energy filter and electron microscope using same |
| 06/18/2002 | US6407373 Apparatus and method for reviewing defects on an object |
| 06/18/2002 | US6407001 Integrated circuits |
| 06/18/2002 | US6406759 Remote exposure of workpieces using a recirculated plasma |
| 06/18/2002 | US6406599 Magnetron with a rotating center magnet for a vault shaped sputtering target |
| 06/18/2002 | US6406590 Method and apparatus for surface treatment using plasma |
| 06/18/2002 | US6406589 Plasma etching in vacuum chamber using sulfur hexafluoride |
| 06/18/2002 | US6405423 Method for producing vacuum processing chambers |
| 06/13/2002 | WO2002047135A1 Electron beam exposure system and electron lens |
| 06/13/2002 | WO2002047131A1 Electron beam exposure system, irradiating position detecting method, and electron detector |
| 06/13/2002 | WO2002047110A1 Magnetron sputtering apparatus |
| 06/13/2002 | WO2002047109A2 Arc electrodes for synthesis of carbon nanostructures |
| 06/13/2002 | WO2002046692A1 A method ad system for measuring in patterned structures |
| 06/13/2002 | WO2002046489A1 Method for integrated in-situ cleaning and subsequent atomic layer deposition within a single processing chamber |
| 06/13/2002 | WO2002029849A3 System, apparatus, and method for processing wafer using single frequency rf power in plasma processing chamber |
| 06/13/2002 | WO2002027754A3 An apparatus for the backside gas cooling of a wafer in a batch ion implantation system |
| 06/13/2002 | WO2002025695A3 Tunable focus ring for plasma processing |
| 06/13/2002 | WO2002015222A3 Use of pulsed voltage in a plasma reactor |
| 06/13/2002 | WO2001084130A3 A nanotube-based electron emission device and systems using the same |
| 06/13/2002 | US20020072244 Photo-assisted remote plasma apparatus and method |
| 06/13/2002 | US20020072240 Plasma etching apparatus with focus ring and plasma etching method |
| 06/13/2002 | US20020072012 Charged beam exposure method and charged beam exposure apparatus |
| 06/13/2002 | US20020071998 Forming a reticle by exposing a first portion of a photoresist layer to a first writing pattern, then exposing a second portion of the photoresist to a second writing pattern; photolithography |
| 06/13/2002 | US20020071996 Lithographic projection apparatus; includes beam shaping device, positioning device for moving the beam, and a sensor dependent on the number of charged particles impinging on a mark region of a mask |
| 06/13/2002 | US20020071994 Dividing the mask into partial areas, forming partial masks which have apertures with patterns identical with plurality of partial areas, exposing the patterns of masks on a mask substrate by electron beam proximity exposure method |
| 06/13/2002 | US20020070699 Stage apparatus including non-containing gas bearings and microlithography apparatus comprising same |
| 06/13/2002 | US20020070672 Electron beam ion source with integral low-temperature vaporizer |
| 06/13/2002 | US20020070670 Microwave plasma generator, method of decomposing organic halide, and system for decomposing organic halide |
| 06/13/2002 | US20020070669 Microwave plasma generator, method of decomposing organic halide, and system for decomposing organic halide |
| 06/13/2002 | US20020070647 Nanostructure plasma source |
| 06/13/2002 | US20020070361 Gas cluster ion beam size diagnostics and workpiece processing |
| 06/13/2002 | US20020070357 Magnetron negative ion sputter source |
| 06/13/2002 | US20020070356 Electron beam proximity exposure apparatus and mask unit therefor |
| 06/13/2002 | US20020070347 Faraday system for ion implanters |
| 06/13/2002 | US20020070346 Split magnetic lens for controlling a charged particle beam |
| 06/13/2002 | US20020070345 Evacuation use sample chamber and circuit pattern forming apparatus using the same |
| 06/13/2002 | US20020070340 Apparatus for inspection of semiconductor wafers and masks using a low energy electron microscope with two illuminating beams |
| 06/13/2002 | US20020069971 Plasma processing apparatus and plasma processing method |
| 06/13/2002 | US20020069970 Temperature controlled semiconductor processing chamber liner |
| 06/13/2002 | US20020069968 Suspended gas distribution manifold for plasma chamber |
| 06/13/2002 | US20020069966 Scanning plasma reactor |
| 06/13/2002 | US20020069827 Allows the quality of milk supplied by each animal to be accurately monitored and also allows the health of the udders of the milked animals to be monitored |
| 06/13/2002 | US20020069824 Ion implantation system having increased implanter source life |
| 06/13/2002 | DE10147133A1 Elektronenstrahl-Belichtungsvorrichtung Electron beam exposure apparatus |
| 06/13/2002 | DE10061798A1 Monochromator for charged particles has Wien filters arranged serially in particle propagation direction, each rotated about optical axis in azimuth by 90 degrees relative to others |
| 06/13/2002 | DE10058326C1 Induktiv gekoppelte Hochfrequenz-Elektronenquelle mit reduziertem Leistungsbedarf durch elektrostatischen Einschluss von Elektronen Inductively coupled radio-frequency electron source with reduced power consumption by electrostatic confinement of electrons |
| 06/12/2002 | EP1213749A1 Plasma processing apparatus and method of plasma processing |
| 06/12/2002 | EP1213744A2 Ion implantation systems and methods |
| 06/12/2002 | EP1212777A1 Ion beam vacuum sputtering apparatus and method |
| 06/12/2002 | EP1212775A1 Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof |
| 06/12/2002 | EP1212692A1 Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasma |
| 06/12/2002 | EP1212611A2 Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma |
| 06/12/2002 | EP0585445B1 Sputtering apparatus with a magnet array having a geometry for a specified target erosion profile |
| 06/12/2002 | CN1353859A Apparatus for improving plasmia distribution and performance in inductively coupled plasma |
| 06/12/2002 | CN1353445A Method and equipment for radiating ion beam, related method and its equipment |
| 06/12/2002 | CN1353443A Ion source and its operating method |
| 06/12/2002 | CN1353442A Apparatus and method for producing indium ion beam |
| 06/12/2002 | CN1353306A Equipment and method for directly observing water-contained biologic sample in ambient scanning electronic microscope |
| 06/11/2002 | US6404134 Plasma processing system |
| 06/11/2002 | US6404115 Particle beam emitting assembly |
| 06/11/2002 | US6403973 Electron beam exposure method and apparatus and semiconductor device manufactured using the same |
| 06/11/2002 | US6403972 Methods and apparatus for alignment of ion beam systems using beam current sensors |
| 06/11/2002 | US6403971 Beam-adjustment methods and apparatus for charged-particle-beam microlithography |
| 06/11/2002 | US6403969 Ion implantation system and ion implantation method |
| 06/11/2002 | US6403968 Scanning electron microscope |
| 06/11/2002 | US6403967 Magnet system for an ion beam implantation system using high perveance beams |
| 06/11/2002 | US6403958 Method for preparing a sample for a transmission electron microscope |
| 06/11/2002 | US6403491 Etch method using a dielectric etch chamber with expanded process window |