| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/03/2002 | CN1356860A Ion generator for ion beam radiator |
| 07/03/2002 | CN1087099C Simulation method in lithographic process |
| 07/02/2002 | US6415432 Lithography pattern data generation method, lithography pattern fabrication method and charged particle lithography system |
| 07/02/2002 | US6414648 Plasma reactor having a symmetric parallel conductor coil antenna |
| 07/02/2002 | US6414329 Method and system for microwave excitation of plasma in an ion beam guide |
| 07/02/2002 | US6414327 Method and apparatus for ion beam generation |
| 07/02/2002 | US6414325 Charged particle beam exposure apparatus and exposure method capable of highly accurate exposure in the presence of partial unevenness on the surface of exposed specimen |
| 07/02/2002 | US6414323 Charged particle beam apparatus and method of controlling charged particle beam |
| 07/02/2002 | US6414322 Sample mount for a scanning electron microscope |
| 07/02/2002 | US6414319 Electron optical lens system with a slot-shaped aperture cross section |
| 07/02/2002 | US6414313 Multiple numerical aperture electron beam projection lithography system |
| 07/02/2002 | US6414309 Methods and apparatus for improving resolution and reducing noise in an image detector for an electron microscope |
| 07/02/2002 | US6414308 Method for determining opened/unopened semiconductor contacts using a scanning electron microscope |
| 07/02/2002 | US6414307 Method and apparatus for enhancing yield of secondary ions |
| 07/02/2002 | US6413876 Method for plasma processing high-speed semiconductor circuits with increased yield |
| 07/02/2002 | US6413592 Apparatus for forming a deposited film by plasma chemical vapor deposition |
| 07/02/2002 | US6413392 Sputtering device |
| 07/02/2002 | US6413387 Generator from non-graphite targets having magnets and coils for thin films and multilayers having fewer macroparticles; impactors; linings |
| 07/02/2002 | US6413383 Flowing a gas into a magnetron, generating a plasma, then depressuring and increasing the power; plasma gas vapor deposition of copper |
| 07/02/2002 | US6413382 Pulsed sputtering with a small rotating magnetron |
| 07/02/2002 | US6413380 Beams/radiation/ and plasma/gases/ vapor deposition apparatus for thin films on wafers without degradation |
| 07/02/2002 | US6413359 Plasma reactor with high selectivity and reduced damage |
| 07/02/2002 | US6413358 Method and apparatus for improving etch uniformity in remote source plasma reactors with powered wafer chucks |
| 07/02/2002 | US6413320 Integrated processing system having multiple reactors connected to a central chamber |
| 07/02/2002 | US6412438 Downstream sapphire elbow joint for remote plasma generator |
| 07/02/2002 | US6412437 Plasma enhanced chemical vapor deposition reactor and plasma enhanced chemical vapor deposition process |
| 06/27/2002 | WO2002050877A1 Electron beam exposure system, correcting member, correcting method, and exposure method |
| 06/27/2002 | WO2002050867A2 Centrifugal type contaminant collector trap for ion implanter |
| 06/27/2002 | WO2002050865A1 Apparatus for evaporation of materials for coating of objects |
| 06/27/2002 | WO2002050864A1 Apparatus for evaporation of materials for coating of objects |
| 06/27/2002 | WO2002050863A1 Sample carrier fixing mechanism |
| 06/27/2002 | WO2002050335A1 Injector and method for prolonged introduction of reagents into plasma |
| 06/27/2002 | WO2002049785A1 Low temperature sputter target/backing plate joining technique and assemblies made thereby |
| 06/27/2002 | WO2002023586A3 Apparatus for etching noble metals using ion implantation and method of use |
| 06/27/2002 | WO2002023584A3 Ion implanter optimized scan waveform retention and recovery |
| 06/27/2002 | WO2002023583A3 Monitor system and method for semiconductor processes |
| 06/27/2002 | WO2002015225A3 Multiple chamber plasma reactor |
| 06/27/2002 | WO2001073814A3 Method and apparatus for controlling power delivered to a multiple segment electrode |
| 06/27/2002 | US20020082789 Calibration plate having accurately defined calibration pattern |
| 06/27/2002 | US20020081815 Fiducial mark bodies for charged-particle-beam (CPB) microlithography, methods for making same, and CPB microlithography apparatus comprising same |
| 06/27/2002 | US20020081788 Ion implanter optimized scan waveform retention and recovery |
| 06/27/2002 | US20020081395 Magnesium fluoride coating of high density and purity as protective coating against fluorine ion bombardment of aluminum or aluminum nitride substrate used in vapor chemical deposition chamber |
| 06/27/2002 | US20020080356 Apparatus and method for measuring dose and engery of ion implantation by employing reflective optics |
| 06/27/2002 | US20020079803 Low power schottky emitter |
| 06/27/2002 | US20020079467 Alignment-mark patterns defined on a stencil reticle and detectable, after lithographic transfer to a substrate, using an optical-based detector |
| 06/27/2002 | US20020079465 In-process wafer charge monitor and control system for ion implanter |
| 06/27/2002 | US20020079462 Alignment mark detection method, and alignment method, exposure method and device, and device production method, making use of the alignment mark detection method |
| 06/27/2002 | US20020079449 SEM having a detector surface segmented into a number of separate regions |
| 06/27/2002 | US20020079448 Scanning charged-particle microscope |
| 06/27/2002 | US20020079447 Particle-optical inspection device especially for semiconductor wafers |
| 06/27/2002 | US20020079058 Method and apparatus for plasma processing |
| 06/27/2002 | US20020078895 Plasma treatment apparatus |
| 06/27/2002 | US20020078893 Plasma enhanced chemical processing reactor and method |
| 06/27/2002 | US20020078881 Sputtering a group III metal in a nitrogen or ammonia environment and depositing it on a growth surface |
| 06/27/2002 | CA2431017A1 Injector and method for prolonged introduction of reagents into plasma |
| 06/26/2002 | EP1216483A1 Electron-optical lens arrangement with an axis that can be largely displaced |
| 06/26/2002 | EP1216106A1 Improved apparatus and method for growth of a thin film |
| 06/26/2002 | EP1171900A4 Large area atmospheric-pressure plasma jet |
| 06/26/2002 | EP0782763B1 An ion beam apparatus |
| 06/26/2002 | CN1355558A Device for testing defect in semiconductor device and method for using said device |
| 06/25/2002 | US6411490 Integrated power modules for plasma processing systems |
| 06/25/2002 | US6411377 Optical apparatus for defect and particle size inspection |
| 06/25/2002 | US6411023 Vacuum processing apparatus and ion pump capable of suppressing leakage of ions and electrons from ion pump |
| 06/25/2002 | US6410925 Single tilt rotation cryotransfer holder for electron microscopes |
| 06/25/2002 | US6410924 Energy filtered focused ion beam column |
| 06/25/2002 | US6410923 Magnetic lens apparatus for use in high-resolution scanning electron microscopes and lithographic processes |
| 06/25/2002 | US6410450 Useful for continuously producing negative ions in high density and also negative ions can be made incident on the semiconductor substrate to be processed to conduct ashing, etching and cleaning of the substrate to remove impurities |
| 06/25/2002 | US6410449 Method of processing a workpiece using an externally excited torroidal plasma source |
| 06/25/2002 | US6410448 Etching a wafer in a gas apparatus having upper, lower and peripheral electrodes attached to high and low frequency power sources and magnets to control plasma gases; high density semiconductors |
| 06/25/2002 | US6409933 Plasma reactor having a symmetric parallel conductor coil antenna |
| 06/25/2002 | US6409898 Cooling system for cathodic arc cathodes |
| 06/25/2002 | US6409897 Rotatable sputter target |
| 06/25/2002 | US6409896 Method and apparatus for semiconductor wafer process monitoring |
| 06/25/2002 | US6409877 Apparatus and method for plasma etching |
| 06/25/2002 | US6409876 Apparatus for etching a workpiece |
| 06/25/2002 | US6409851 Microwave plasma chemical synthesis of ultrafine powders |
| 06/25/2002 | US6408786 Semiconductor processing equipment having tiled ceramic liner |
| 06/25/2002 | CA2366175A1 Method of treatment with a microwave plasma |
| 06/25/2002 | CA2220605C Ion source block filament with labyrinth conductive path |
| 06/25/2002 | CA2181076C Method and apparatus for in situ removal of contaminants from ion beam neutralization and implantation apparatuses |
| 06/25/2002 | CA2081552C Selective radiation of pathological material |
| 06/20/2002 | WO2002049088A1 Sheet type plasma processing device, method of assembling and disassembling electrode for plasma processing device, and exclusive jig for the method |
| 06/20/2002 | WO2002049080A2 Method and apparatus for inspecting a substrate |
| 06/20/2002 | WO2002049066A1 Charged particle beam microscope, charged particle beam application device, charged particle beam microscopic method, charged particle beam inspecting method, and electron microscope |
| 06/20/2002 | WO2002049065A1 Electron beam device and semiconductor device production method using the device |
| 06/20/2002 | WO2002048427A1 Thin film forming method and thin film forming device |
| 06/20/2002 | WO2002047865A1 Friction fit target assembly for high power sputtering operation |
| 06/20/2002 | WO2002017346A3 Optical coupling to gated photocathodes |
| 06/20/2002 | WO2002015650A3 Externally excited torroidal plasma source |
| 06/20/2002 | WO2002011732A8 Novel bicyclic and tricyclic pyrrolidine derivatives as gnrh antagonists |
| 06/20/2002 | WO2002009141A3 Automated electrode replacement apparatus for a plasma processing system |
| 06/20/2002 | WO2002008486A3 Electrode apparatus and method for plasma processing |
| 06/20/2002 | WO2002007184A3 Adjustable segmented electrode apparatus and method |
| 06/20/2002 | WO2002005308A3 A plasma reactor having a symmetric parallel conductor coil antenna |
| 06/20/2002 | WO2001088949A3 High efficiency scanning in ion implanters |
| 06/20/2002 | WO2001069642A3 Plasma deposition method and system |
| 06/20/2002 | WO2001045141A8 Method and apparatus for smoothing thin conductive films by gas cluster ion beam |
| 06/20/2002 | WO2001041183A9 Dose monitor for plasma doping system |
| 06/20/2002 | US20020076508 Varying conductance out of a process region to control gas flux in an ALD reactor |
| 06/20/2002 | US20020076507 Process sequence for atomic layer deposition |