| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 07/16/2002 | US6418874 Toroidal plasma source for plasma processing |
| 07/15/2002 | WO2002056649A1 Plasma generator |
| 07/11/2002 | WO2002054835A2 Addition of power at selected harmonics of plasma processor drive frequency |
| 07/11/2002 | WO2002054465A1 Electron beam exposure system and electron beam shaping member |
| 07/11/2002 | WO2002054454A2 Diamond coatings on reactor wall and method of manufacturing thereof |
| 07/11/2002 | WO2002054453A1 Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof |
| 07/11/2002 | WO2002054444A1 Electrode for plasma processes and method for manufacture and use thereof |
| 07/11/2002 | WO2002054443A2 Ion accelaration method and apparatus in an ion implantation system |
| 07/11/2002 | WO2002054442A2 Ion beam collimating system |
| 07/11/2002 | WO2002054441A1 Method and device for separating ion mass, and ion doping device |
| 07/11/2002 | WO2002053799A1 Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof |
| 07/11/2002 | WO2002053797A1 Fullerene coated component of semiconductor processing equipment |
| 07/11/2002 | WO2002053795A1 Device and method for deposition, electron beam exposure device, deflecting device, and method of manufacturing deflecting device |
| 07/11/2002 | WO2002053794A1 Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof |
| 07/11/2002 | WO2001009923A9 Integrated electron gun and electronics module |
| 07/11/2002 | US20020090744 Method and system for measuring in patterned structures |
| 07/11/2002 | US20020089677 Apparatus for monitoring intentional or unavoidable layer depositions and method |
| 07/11/2002 | US20020089657 Stage devices configured for use in a vacuum environment of a charged-particle-beam microlithography apparatus |
| 07/11/2002 | US20020089332 Probe assembly for detecting an ion in a plasma generated in an ion source |
| 07/11/2002 | US20020089288 Extraction and deceleration of low energy beam with low beam divergence |
| 07/11/2002 | US20020088950 Ion production device for ion beam irradiation apparatus |
| 07/11/2002 | US20020088949 Semiconductor processing apparatus having a moving member and a force compensator therefor |
| 07/11/2002 | US20020088941 Scanning electronic beam apparatus |
| 07/11/2002 | US20020088940 Electron beam inspection system and inspection method and method of manufacturing devices using the system |
| 07/11/2002 | US20020088939 Particle detectors |
| 07/11/2002 | US20020088776 Plasma processing apparatus suitable for power supply of higher frequency |
| 07/11/2002 | US20020088771 Physical vapor deposition apparatus with modified shutter disk and cover ring |
| 07/11/2002 | US20020088711 Sputtering without creating internal stresses; noncracking; wear resistant waterproof protective film; efficiency |
| 07/11/2002 | US20020088548 Apparatus for generating inductively coupled plasma |
| 07/11/2002 | US20020088547 Plasma treatment method and apparatus |
| 07/11/2002 | US20020088546 Dry etching apparatus |
| 07/11/2002 | US20020088545 Gas injector comprising block of ceramic material having gas injection holes extending therethrough, and etching apparatus incorporating the same |
| 07/11/2002 | US20020088542 Plasma processing apparatus |
| 07/11/2002 | US20020088400 Plasma processing apparatus including a plurality of plasma processing units having reduced variation |
| 07/11/2002 | DE10121082C1 Magnetic system for vacuum arc vaporizer for vaporization of cathodic target has central permanent magnet beneath target carrier and outer permanent magnet deformed inwards at center |
| 07/11/2002 | DE10108717C1 Apparatus for removing electric charge from a plastic sheet, paper web or polymer fibers, comprises a plasma generator producing plasma containing charged particles and rollers which feed sheet through the region containing plasma |
| 07/10/2002 | EP1221495A2 Magnetron sputtering system and photomask blank production method based on the same |
| 07/10/2002 | EP1221175A1 Electric supply unit and a method for reducing sparking during sputtering |
| 07/10/2002 | EP1221174A1 Method and apparatus for etching and deposition using micro-plasmas |
| 07/10/2002 | EP1221173A1 Process and apparatus for implanting oxygen ions into silicon wafers |
| 07/10/2002 | EP1221172A1 Determining beam alignment in ion implantation using rutherford back scattering |
| 07/10/2002 | CN1358324A Plasma processing system, apparatus, and mehtod for delivering RF power to plasma processing chamber |
| 07/10/2002 | CN1358108A Electron beam irradiation apparatus and method |
| 07/09/2002 | US6417626 Immersed inductively—coupled plasma source |
| 07/09/2002 | US6417625 Apparatus and method for forming a high pressure plasma discharge column |
| 07/09/2002 | US6417581 Circuit for automatically inverting electrical lines connected to a device upon detection of a miswired condition to allow for operation of device even if miswired |
| 07/09/2002 | US6417516 Electron beam lithographing method and apparatus thereof |
| 07/09/2002 | US6417515 In-situ ion implant activation and measurement apparatus |
| 07/09/2002 | US6417512 Sample distortion removing method in thin piece forming |
| 07/09/2002 | US6417111 Plasma processing apparatus |
| 07/09/2002 | US6417079 Discharge electrode, high-frequency plasma generator, method of power feeding, and method of manufacturing semiconductor device |
| 07/09/2002 | US6416640 Sputter station |
| 07/09/2002 | US6416639 Erosion compensated magnetron with moving magnet assembly |
| 07/09/2002 | US6416638 Power supply unit for sputtering device |
| 07/09/2002 | US6416635 Changes in film uniformity due to changes in the geometry of the surface as the target erodes are avoided by changing the relative positions of a substrate holder and a target support on a cathode assembly |
| 07/09/2002 | US6416633 Resonant excitation method and apparatus for generating plasmas |
| 07/09/2002 | CA2121614C Electron accelerator for sterilizing packaging material in an aseptic packaging machine |
| 07/04/2002 | WO2002052628A1 Plasma processing method and plasma processor |
| 07/04/2002 | WO2002052623A1 Electron beam exposure system and electron beam irradiation position calibrating member |
| 07/04/2002 | WO2002052612A2 In-process wafer charge monitor and control system for ion implanter |
| 07/04/2002 | WO2002052611A1 Electron beam projector provided with a linear thermionic emitting cathode for electron beam heating. |
| 07/04/2002 | WO2002052610A1 Sem provided with a secondary electron detector having a central electrode |
| 07/04/2002 | WO2002052609A2 Compact beamline and ion implanter system using same |
| 07/04/2002 | WO2002052608A2 Charging control and dosimetry system for gas cluster ion beam |
| 07/04/2002 | WO2002052224A1 Particle-optical inspection device especially for semiconductor wafers |
| 07/04/2002 | WO2002052060A1 Inductively coupled plasma reactor |
| 07/04/2002 | WO2002051707A1 Production device for dlc film-coated plastic container and production method therefor |
| 07/04/2002 | WO2000070646A9 Secondary electron spectroscopy method and system |
| 07/04/2002 | US20020086554 Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof |
| 07/04/2002 | US20020086553 Fullerene coated component of semiconductor processing equipment and method of manufacturing thereof |
| 07/04/2002 | US20020086545 Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof |
| 07/04/2002 | US20020086534 Providing template having epitaxial-initiating growth surface; sputtering Group III metal target to produce Group III metal source vapor; mixing with nigrogen-containing gas vapors; depositing to produce single-crystal Group III metal nitride |
| 07/04/2002 | US20020086501 Diamond coatings on reactor wall and method of manufacturing thereof |
| 07/04/2002 | US20020086317 Sequencing preferential nucleotide sequences; obtain nucleotide sequences, insert preferential heavy elements into compound, insert into microscope, monitor base preferential labels, determine nucleotide sequence |
| 07/04/2002 | US20020086153 Coated with lightly crosslinked copolymers of vinyl pyrrolidone (VP) and dimethylaminopropyl methacrylamide (DMAPMA) |
| 07/04/2002 | US20020086118 Plasma spraying coating material onto plasma exposed surface of component to form a coating having surface roughness characteristics that promote adhesion of polymer deposits |
| 07/04/2002 | US20020085192 Gas-actuated stages including reaction-force-canceling mechanisms for use in charged-particle-beam microlithography systems |
| 07/04/2002 | US20020084427 Method and apparatus for improved ion acceleration in an ion implantation system |
| 07/04/2002 | US20020084426 Focused ion beam system |
| 07/04/2002 | US20020084422 Particle-optical component and system comprising a particle-optical component |
| 07/04/2002 | US20020084412 Electron microscope equipped with electron biprism |
| 07/04/2002 | US20020084411 Substrate inspection system and method for controlling same |
| 07/04/2002 | US20020084258 Apparatus and method for distribution of dopant gases or vapors in an arc chamber for use in an ionization source |
| 07/04/2002 | US20020084253 Apparatus and method of detecting endpoint of a dielectric etch |
| 07/04/2002 | US20020084181 Alternate steps of IMP and sputtering process to improve sidewall coverage |
| 07/04/2002 | US20020084180 Particle source |
| 07/04/2002 | US20020084035 Plasma processing apparatus and method |
| 07/04/2002 | US20020084034 Dry etching apparatus and a method of manufacturing a semiconductor device |
| 07/04/2002 | US20020083897 Full glass substrate deposition in plasma enhanced chemical vapor deposition |
| 07/03/2002 | EP1220292A2 Monochromator for charged particles |
| 07/03/2002 | EP1220281A2 Method of treatment with a microwave plasma |
| 07/03/2002 | EP1220280A2 Scanning and high resolution x-ray photoelectron spectroscopy and imaging |
| 07/03/2002 | EP1220272A1 Beam source |
| 07/03/2002 | EP1220271A2 Ion source having replaceable and sputterable solid source material |
| 07/03/2002 | EP1219956A2 Method for providing a substantially uniform surface potential on an insulating specimen |
| 07/03/2002 | EP1218935A2 Interferometric method for endpointing plasma etch processes |
| 07/03/2002 | EP1218934A1 Method for determining the endpoint of etch process steps |
| 07/03/2002 | EP1218919A1 Electron image detector coupled by optical fibers with absorbing outer cladding to reduce blurring |
| 07/03/2002 | EP1218918A2 Immersion lens with magnetic shield for charged particle beam system |
| 07/03/2002 | EP1218917A2 High transmission, low energy beamline apparatus for ion implanter |