| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/25/2002 | WO2002058119A1 Electron beam deflection device, method of producing electron beam deflection device, and electron beam exposure device |
| 07/25/2002 | WO2002058118A1 Electron beam exposure device and electron beam deflection device |
| 07/25/2002 | WO2002058103A2 In situ ion beam incidence angle and beam divergence monitor |
| 07/25/2002 | WO2002058102A2 Adjustable conductance limiting aperture for ion implanters |
| 07/25/2002 | WO2002058101A1 Electrostatic corrector |
| 07/25/2002 | WO2002057507A2 Method for making a film by pulsed laser ablation |
| 07/25/2002 | WO2002057506A2 Low contamination plasma chamber components and methods for making the same |
| 07/25/2002 | WO2001004926A9 Methods and apparatus for alignment of ion beam systems using beam current sensors |
| 07/25/2002 | US20020098708 Method and apparatus for dry etching |
| 07/25/2002 | US20020097406 Methods and systems for determining a thickness of a structure on a specimen and at least one additional property of the specimen |
| 07/25/2002 | US20020096999 Inductively coupled RF plasma source |
| 07/25/2002 | US20020096998 Plasma generation apparatus and method |
| 07/25/2002 | US20020096651 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 07/25/2002 | US20020096650 Ion implantation apparatus suited for low energy ion implantation and tuning method for ion source system thereof |
| 07/25/2002 | US20020096646 Electron beam proximity exposure apparatus and method |
| 07/25/2002 | US20020096645 Electron-beam lithography method and electron-beam lithography system |
| 07/25/2002 | US20020096644 Magnetic lenses, charged-particle-beam optical systems, and charged-particle-beam pattern-transfer apparatus |
| 07/25/2002 | US20020096641 Electromagnetic field superimposed lens and electron beam device using this electromagnetic field superimposed lens |
| 07/25/2002 | US20020096640 Magnetic shielding for charged-particle-beam optical systems |
| 07/25/2002 | US20020096632 Energy spectrum measuring apparatus, electron energy loss spectrometer, electron microscope provided therewith, and electron energy loss spectrum measuring method |
| 07/25/2002 | US20020096430 Hollow cylindrical cathode sputtering target and process for producing it |
| 07/25/2002 | US20020096427 Uniformily eroded metal targets; a hollow cathode magnetron able to produce both a high magnetic field for PVD and a low magnetic field to remove redeposited materials from a top portion of the target within; semiconductors |
| 07/25/2002 | US20020096259 Regenerative thermal oxidizer process and so2 scrubbing |
| 07/25/2002 | US20020096258 Systems and methods for enhancing plasma processing of a semiconductor substrate |
| 07/25/2002 | US20020096257 RF power delivery for plasma processing using modulated power signal |
| 07/25/2002 | US20020096227 Liner for use in processing chamber |
| 07/25/2002 | DE10200279A1 Gasinjektor mit einem Keramikmaterialblock mit Gasinjektionslöchern, die sich durch diesen erstrecken, und ein den Gasinjektor enthaltendes Ätzgerät Gas injector with a ceramic block with gas injection holes extending therethrough, and a gas injector containing etcher |
| 07/25/2002 | DE10102527A1 Electrostatic corrector for removing color aberrations in particle lenses has a straight optical axis and two correcting pieces behind each other along the optical axis each with electrical quadrupolar and round lens fields. |
| 07/24/2002 | EP1225794A1 Matching device and plasma processing apparatus |
| 07/24/2002 | EP1225249A1 Tubular target and method for its production |
| 07/24/2002 | EP1224687A2 Surface structure and method of making, and electrostatic wafer clamp incorporating surface structure |
| 07/24/2002 | EP1224684A1 Method and apparatus for eliminating displacement current from current measurements in a plasma processing system |
| 07/24/2002 | EP1224683A1 Method and apparatus for low voltage plasma doping using dual pulses |
| 07/24/2002 | EP1224682A1 Wide parameter range ion beam scanners |
| 07/24/2002 | EP1068633B1 Method and device for specifically manipulating and depositing particles |
| 07/24/2002 | CN1360305A Optical disk and apparatus for mfg. its mother disk |
| 07/23/2002 | US6424879 System and method to correct for distortion caused by bulk heating in a substrate |
| 07/23/2002 | US6424232 Method and apparatus for matching a variable load impedance with an RF power generator impedance |
| 07/23/2002 | US6424091 Plasma treatment apparatus and plasma treatment method performed by use of the same apparatus |
| 07/23/2002 | US6424052 Alignment mark for electron beam lithography |
| 07/23/2002 | US6423976 Ion implanter and a method of implanting ions |
| 07/23/2002 | US6423968 Method for structured energy transmission using electron beams |
| 07/23/2002 | US6423383 Converting reactive carbon compounds into a gas plasma by resonance using microwaves and magnetic fields, then coating amorphous carbon films on substrates |
| 07/23/2002 | US6423278 Plasma dry scrubber |
| 07/23/2002 | US6423192 Sputtering apparatus and film forming method |
| 07/23/2002 | US6423191 Sputtering method and apparatus for depositing a coating onto substrate |
| 07/23/2002 | US6423177 Apparatus for performing plasma process on particles |
| 07/23/2002 | US6423176 Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles |
| 07/23/2002 | US6423175 Apparatus and method for reducing particle contamination in an etcher |
| 07/23/2002 | US6422825 Plasma vacuum pumping cell |
| 07/23/2002 | US6422173 Apparatus and methods for actively controlling RF peak-to-peak voltage in an inductively coupled plasma etching system |
| 07/23/2002 | US6422172 Plasma processing apparatus and plasma processing method |
| 07/18/2002 | WO2002056357A1 Sheet-fed treating device |
| 07/18/2002 | WO2002056354A1 Method for forming a pattern and a semiconductor device |
| 07/18/2002 | WO2002056338A2 Device for the plasma-mediated working of surfaces on planar substrates |
| 07/18/2002 | WO2002056333A1 Plasma processing apparatus |
| 07/18/2002 | WO2002056332A1 Inspection apparatus and inspection method with electron beam, and device manufacturing method comprising the inspection apparatus |
| 07/18/2002 | WO2002056259A1 Three-dimensional verification supporting apparatus, three-dimensional structure verification method, record medium, and program |
| 07/18/2002 | WO2002055756A1 Apparatus for exhaust whie powder elimination in substrate processing |
| 07/18/2002 | WO2002035895A3 A method and an apparatus for excitation of a plasma |
| 07/18/2002 | WO2002033722A3 Low input power schottky emitter |
| 07/18/2002 | WO2002025694A3 System and method for controlling sputtering and deposition effects in a plasma immersion implantation device |
| 07/18/2002 | US20020094694 Bombarding in a vacuum a portion of the substrate with a focused particle beam from a particle source, and exposing the substrate to an organic chloride or hydroxide |
| 07/18/2002 | US20020094692 Method for carrying out a plasma etching process |
| 07/18/2002 | US20020094591 Apparatus and method for monitoring substrate biasing during plasma processing of a substrate |
| 07/18/2002 | US20020094482 Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures |
| 07/18/2002 | US20020094389 Method for making films utilizing a pulsed laser for ion injection and deposition |
| 07/18/2002 | US20020094378 Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof |
| 07/18/2002 | US20020093779 Ionizing apparatus and discharge electrode bar for the same |
| 07/18/2002 | US20020093648 Methods and systems for determining an implant characterstic and a presence of defects on a specimen |
| 07/18/2002 | US20020093350 Semiconductor device test method and semiconductor device tester |
| 07/18/2002 | US20020093148 Electronic device processing equipment having contact gasket between chamber parts |
| 07/18/2002 | US20020092986 Method and an apparatus of an inspection system using an electron beam |
| 07/18/2002 | US20020092985 Focused ion beam machining method and focused ion beam machining apparatus |
| 07/18/2002 | US20020092826 Low ceiling temperature process for a plasma reactor with heated source of a polymer-hardening precursor material |
| 07/18/2002 | US20020092766 Sputtering deposition apparatus and method for depositing surface films |
| 07/18/2002 | US20020092619 Discharge plasma processing device |
| 07/18/2002 | US20020092618 Parallel-plate electrode plasma reactor having an inductive antenna coupling power through a parallel plate electrode |
| 07/18/2002 | US20020092617 Single wafer LPCVD apparatus |
| 07/18/2002 | US20020092616 Apparatus for plasma treatment using capillary electrode discharge plasma shower |
| 07/18/2002 | US20020092473 Ion source |
| 07/18/2002 | US20020092421 Integrated ion implant scrubber system |
| 07/18/2002 | DE10155627A1 Geteilte Magnetlinse zum Steuern eines Strahls geladener Teilchen Split magnetic lens for controlling a beam of charged particles |
| 07/18/2002 | DE10155624A1 Technik zum Herstellen eines elektrostatischen Elements zum Steuern eines Strahls geladener Teilchen Technique for manufacturing an electrostatic element for controlling a beam of charged particles |
| 07/18/2002 | DE10126698A1 Detektor für variierende Druckbereiche und Elektronenmikroskop mit einem entsprechenden Detektor Detector for varying pressure ranges and electron microscope with an appropriate detector |
| 07/17/2002 | EP1222679A1 Method and apparatus for controlling wafer uniformity using spatially resolved sensors |
| 07/17/2002 | EP1222677A2 Electron impact ion source |
| 07/17/2002 | CN1359531A Gas distribution apparatus for semiconductor processing |
| 07/16/2002 | US6420863 Method for monitoring alternating current discharge on a double electrode and apparatus |
| 07/16/2002 | US6420717 Method and apparatus for real-time correction of resist heating in lithography |
| 07/16/2002 | US6420714 Electron beam imaging apparatus |
| 07/16/2002 | US6420713 Image position and lens field control in electron beam systems |
| 07/16/2002 | US6420703 Method for forming a critical dimension SEM calibration standard of improved definition and standard formed |
| 07/16/2002 | US6420702 Non-charging critical dimension SEM metrology standard |
| 07/16/2002 | US6420701 Method of determining average crystallite size of material and apparatus and method for preparing thin film of the material |
| 07/16/2002 | US6420700 Charged-particle-beam exposure device and charged-particle-beam exposure method |
| 07/16/2002 | US6420007 Recording medium and method of manufacturing same |
| 07/16/2002 | US6419846 Determining endpoint in etching processes using principal components analysis of optical emission spectra |
| 07/16/2002 | US6419800 Film-forming apparatus and film-forming method |
| 07/16/2002 | US6419752 Structuring device for processing a substrate |