| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 08/08/2002 | WO2002062114A1 Plasma unit and method for generation of a functional coating |
| 08/08/2002 | WO2002061813A1 Electron beam exposure device, electron beam forming member, and method of manufacturing the electron beam forming member |
| 08/08/2002 | WO2002061812A1 Electron beam exposure device and electron lens |
| 08/08/2002 | WO2002061797A2 Icp window heater integrated with faraday shield or floating electrode between the source power coil and the icp window |
| 08/08/2002 | WO2002061787A2 Method and apparatus having pin electrode for surface treatment using capillary discharge plasma |
| 08/08/2002 | WO2002061464A1 On-line measurement of absorbed electron beam dosage in irradiated product |
| 08/08/2002 | WO2002061458A1 Electron beam detector, scanning type electron microscope, mass spectrometer, and ion detector |
| 08/08/2002 | WO2002061179A1 Method and apparatus for gas injection system with minimum particulate contamination |
| 08/08/2002 | WO2002061167A2 Target/backing plate assemblies |
| 08/08/2002 | WO2002037526A9 Electron beam apparatus and method for manufacturing semiconductor device comprising the apparatus |
| 08/08/2002 | WO2002027755A3 Chamber configuration for confining a plasma |
| 08/08/2002 | WO2001099144A3 Ion implantation uniformity correction using beam current control |
| 08/08/2002 | WO2001091154A3 Sample support for mass spectrometers |
| 08/08/2002 | WO2001009915A9 Diamond supported photocathodes for electron sources |
| 08/08/2002 | WO2000067289A9 Apparatus and method for reducing charge accumulation on a substrate |
| 08/08/2002 | US20020107660 Methods and systems for determining a critical dimension and a thin film characteristic of a specimen |
| 08/08/2002 | US20020105277 Ion implanter |
| 08/08/2002 | US20020104970 Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field |
| 08/08/2002 | US20020104969 Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method |
| 08/08/2002 | US20020104966 Monochromator for charged particles |
| 08/08/2002 | US20020104964 Apparatus and method for secondary electron emission microscope |
| 08/08/2002 | US20020104832 Plasma processing apparatus and method |
| 08/08/2002 | US20020104825 Nanotopography removing method |
| 08/08/2002 | US20020104756 Sputtering apparatus |
| 08/08/2002 | US20020104753 Electric supply unit and method for reducing arcing during sputtering |
| 08/08/2002 | US20020104752 Multi-layer deposition process using four ring sputter sources |
| 08/08/2002 | US20020104751 Method and apparatus for ionized physical vapor deposition |
| 08/08/2002 | US20020104617 Method and apparatus for supplying gas used in semiconductor processing |
| 08/08/2002 | US20020104482 Plasma-assisted processing apparatus |
| 08/07/2002 | EP1229575A2 Nanotopography removing method |
| 08/07/2002 | EP1229068A1 Method and apparatus for modifying the inner surface of containers made of polymeric compound |
| 08/07/2002 | EP1228673A2 Plural foils shaping intensity profile of ion beams |
| 08/07/2002 | EP1228522A1 Vacuum circuit for a device for treating a receptacle with low pressure plasma |
| 08/07/2002 | CN1363111A Apparatus for evaluating plasma polymerized polymer layer using UV spectrometer |
| 08/07/2002 | CN1088765C Plasma treatment apparatus |
| 08/06/2002 | US6429928 Method and apparatus employing external light source for endpoint detection |
| 08/06/2002 | US6429897 Confocal microscope with a motorized scanning table |
| 08/06/2002 | US6429607 Constant power dynamic focus coil |
| 08/06/2002 | US6429445 Electron beam irradiating apparatus having cathode plate formed of non-metal conductive material |
| 08/06/2002 | US6429443 Multiple beam electron beam lithography system |
| 08/06/2002 | US6429442 Ion implanter |
| 08/06/2002 | US6429441 Charged-particle-beam microlithography apparatus and methods exhibiting variable beam velocity, and device-manufacturing methods using same |
| 08/06/2002 | US6429439 Organic field ionization source |
| 08/06/2002 | US6429427 Method and apparatus for surface imaging |
| 08/06/2002 | US6429425 Method for forming a calibation standard to adjust a micro-bar of an electron microscope |
| 08/06/2002 | US6429090 Preventing charge accumulation without reducing contrast; maintaining low thermal expansion; plate, heavy metal mark of such as tantalum, tungsten or platinum and electro-conductive layer of such as titanium, chromium or aluminum |
| 08/06/2002 | US6427703 Oxidation of carbon deposits; semiconductors |
| 08/06/2002 | US6427623 Chemical vapor deposition system |
| 08/06/2002 | US6427621 Plasma processing device and plasma processing method |
| 08/06/2002 | CA2188997C Chromatically compensated particle-beam column |
| 08/01/2002 | WO2002059954A1 Plasma processing apparatus and plasma processing method |
| 08/01/2002 | WO2002059934A2 Plasma generation apparatus and method |
| 08/01/2002 | WO2002059933A2 Vertically translatable chuck assembly and method for a plasma reactor system |
| 08/01/2002 | WO2002037905A3 Mechanism for prevention of neutron radiation in ion implanter beamline |
| 08/01/2002 | WO2002033729A3 Plasma reactor with reduced reaction chamber |
| 08/01/2002 | WO2002023587A3 Tungsten chamber with stationary heater |
| 08/01/2002 | WO2002021566A3 Bulk gas delivery system for ion implanters |
| 08/01/2002 | WO2002016667B1 Sputtering targets |
| 08/01/2002 | WO2002013225A3 Plasma processing method and apparatus |
| 08/01/2002 | WO2001029874A9 Planar magnetron sputtering apparatus |
| 08/01/2002 | US20020103564 Methods and systems for determining a composition and a thickness of a specimen |
| 08/01/2002 | US20020102858 Low contamination high density plasma etch chambers and methods for making the same |
| 08/01/2002 | US20020102749 Methods and systems for determining a characteristic of a layer formed on a specimen by a deposition process |
| 08/01/2002 | US20020102361 Jet plasma process and apparatus for deposition of coatings and the coatings thereof |
| 08/01/2002 | US20020101167 Capacitively coupled reactive ion etch plasma reactor with overhead high density plasma source for chamber dry cleaning |
| 08/01/2002 | US20020101162 Microwave plasma generator, method of decomposing organic halide, and system for decomposing organic halide |
| 08/01/2002 | US20020101159 Inductively coupled high-frequency electron source with a reduced power requirement as a result of an electrostatic inclusion of electrons |
| 08/01/2002 | US20020100881 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 08/01/2002 | US20020100880 Apparatus for decelerating ion beams for reducing the energy contamination |
| 08/01/2002 | US20020100877 X-ray detector and charged-patricle apparatus |
| 08/01/2002 | US20020100873 Electron microscope and method of photographing TEM images |
| 08/01/2002 | US20020100872 Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same |
| 08/01/2002 | US20020100871 Focused ion beam apparatus |
| 08/01/2002 | US20020100680 Backing plate used for sputtering apparatus and sputtering method |
| 08/01/2002 | US20020100557 ICP window heater integrated with faraday shield or floating electrode between the source power coil and the ICP window |
| 08/01/2002 | US20020100556 Method and apparatus having pin electrode for surface treatment using capillary discharge plasma |
| 08/01/2002 | US20020100555 Linear drive system for use in a plasma processing system |
| 08/01/2002 | US20020100554 Substrate processing using a member comprising an oxide of a group IIIB metal |
| 08/01/2002 | US20020100422 Absorptive filter for semiconductor processing systems |
| 08/01/2002 | US20020100421 Deposited film forming apparatus and deposited film forming method |
| 08/01/2002 | US20020100420 Method and device for vacuum-coating a substrate |
| 07/31/2002 | EP1227315A2 X-Ray detector and charged-particle trap |
| 07/31/2002 | EP1133581A4 Method and device for plasma vapor chemical deposition of homogeneous films on large flat surfaces |
| 07/31/2002 | EP1102616A4 Esrf coolant degassing process |
| 07/31/2002 | EP0708688B1 Method for the improved microwave deposition of thin films |
| 07/31/2002 | CN1362003A Apparatus for plasma treatment using capillary electrode discharge plasma shower |
| 07/31/2002 | CN1361889A Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasma |
| 07/31/2002 | CN1361863A Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma |
| 07/30/2002 | US6426507 Particle beam processing apparatus |
| 07/30/2002 | US6426501 Defect-review SEM, reference sample for adjustment thereof, method for adjustment thereof, and method of inspecting contact holes |
| 07/30/2002 | US6426477 Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate |
| 07/30/2002 | US6426302 Useful for continuously producing negative ions in high density and also negative ions can be made incident on the semiconductor substrate to be processed to conduct ashing, etching and cleaning of the substrate to remove impurities |
| 07/30/2002 | US6425953 Heating, injecting cleaning gas |
| 07/25/2002 | WO2002058441A1 Plasma device and plasma generating method |
| 07/25/2002 | WO2002058127A1 Plasma treatment device, baffle plate, and method of manufacturing the baffle plate |
| 07/25/2002 | WO2002058126A1 Device and method for treatment |
| 07/25/2002 | WO2002058125A1 Plasma processing device and plasma processing method |
| 07/25/2002 | WO2002058124A1 Plasma device and plasma generating method |
| 07/25/2002 | WO2002058123A1 Plasma device and plasma generating method |
| 07/25/2002 | WO2002058121A1 Method and device for plasma cvd |