| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 08/22/2002 | US20020112819 Remote plasma generator with sliding short tuner |
| 08/22/2002 | US20020112794 Microwave plasma chemical synthesis of ultrafine powders |
| 08/22/2002 | US20020112667 Vacuum apparatus of ion implantation system and evacuation method |
| 08/22/2002 | US20020112666 High density plasma chemical vapor deposition chamber |
| 08/22/2002 | DE10107910A1 Teilchenstrahlsystem mit einem Spiegelkorrektor Particle beam with a mirror corrector |
| 08/22/2002 | DE10107725A1 Verfahren zur plasmaaktivierten Bedampfung, Einrichtung zur Durchführung des Verfahrens sowie Verwendung des Verfahrens A method for plasma-activated vapor deposition device for performing the method and use of the method |
| 08/22/2002 | DE10104614A1 Plasmaanlage und Verfahren zur Erzeugung einer Funktionsbeschichtung Plasma system and method for generating a functional coating |
| 08/22/2002 | DE10104613A1 Plasmaanlage und Verfahren zur Erzeugung einer Funktionsbeschichtung Plasma system and method for generating a functional coating |
| 08/21/2002 | EP1232515A1 Particle beam processing apparatus |
| 08/21/2002 | EP1232293A2 Method for regulating sputtering processes |
| 08/21/2002 | CN1365596A Apparatus for detecting plasma anomalous discharge and method of detecting the same |
| 08/21/2002 | CN1365534A Radio frequency power source for genrating an inducively coupled plasma |
| 08/21/2002 | CN1365138A Gas projector and etching device comprising said projector |
| 08/20/2002 | US6437512 Plasma generator |
| 08/20/2002 | US6437353 Particle-optical apparatus and process for the particle-optical production of microstructures |
| 08/20/2002 | US6437352 Charged particle beam projection lithography with variable beam shaping |
| 08/20/2002 | US6437351 Method and apparatus for controlling a workpiece in a vacuum chamber |
| 08/20/2002 | US6437350 Methods and apparatus for adjusting beam parallelism in ion implanters |
| 08/20/2002 | US6437348 Simultaneous heating and exposure of reticle with pattern placement correction |
| 08/20/2002 | US6437347 Target locking system for electron beam lithography |
| 08/20/2002 | US6437342 Charge amplifier with bias compensation |
| 08/20/2002 | US6437330 Method and apparatus for adjusting a charged particle beam of a beam optical system |
| 08/20/2002 | US6436607 Edges and scanning beam lithography with masking for semiconductors |
| 08/20/2002 | US6436594 Electron-beam exposure method utilizing specific alignment mask selection |
| 08/20/2002 | US6436509 Electrically insulating sealing structure and its method of use in a semiconductor manufacturing apparatus |
| 08/20/2002 | US6436466 Method for the operation of an electron beam |
| 08/20/2002 | US6436304 Plasma processing method |
| 08/20/2002 | US6436254 Cathode mounting system for cathodic arc cathodes |
| 08/20/2002 | US6436253 Sputter etching chamber with improved uniformity |
| 08/20/2002 | US6436252 Method and apparatus for magnetron sputtering |
| 08/20/2002 | US6436251 Vault-shaped target and magnetron having both distributed and localized magnets |
| 08/20/2002 | US6436230 Process device |
| 08/20/2002 | US6436193 Gas processing apparatus baffle member, and gas processing method |
| 08/20/2002 | US6435428 Showerhead apparatus for radical-assisted deposition |
| 08/20/2002 | US6435215 Gas panel |
| 08/20/2002 | US6435197 Method of cleaning a semiconductor fabricating apparatus |
| 08/20/2002 | US6435131 Ion flow forming method and apparatus |
| 08/20/2002 | US6435130 Plasma CVD apparatus and plasma processing method |
| 08/15/2002 | WO2002063667A1 Plasma treatment device and plasma treatment method |
| 08/15/2002 | WO2002063663A1 Electron beam exposure apparatus and exposure method |
| 08/15/2002 | WO2002063662A1 Method for making slit, slit, and electron beam exposure system |
| 08/15/2002 | WO2002063654A2 System and method for amplifying an angle of divergence of a scanned ion beam |
| 08/15/2002 | WO2002063653A1 Ion source for ion implantation |
| 08/15/2002 | WO2002063066A1 Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge |
| 08/15/2002 | WO2002063065A1 Film forming device |
| 08/15/2002 | WO2002063064A1 Spatter device and spatter film forming method |
| 08/15/2002 | WO2002049080A3 Method and apparatus for inspecting a substrate |
| 08/15/2002 | WO2002043100A3 Radio frequency ion source |
| 08/15/2002 | WO2002025696A3 Reducing deposition of process residues on a surface in a chamber |
| 08/15/2002 | WO2002023582A3 Faraday system for ion implanters |
| 08/15/2002 | WO2002022300A8 Method of manufacturing sputter targets with internal cooling channels |
| 08/15/2002 | WO2001045135A9 Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates |
| 08/15/2002 | US20020110648 Diamond film depositing apparatus and method thereof |
| 08/15/2002 | US20020109106 Hybrid scanning system and methods for ion implantation |
| 08/15/2002 | US20020109099 Apparatus for magnetically scanning and/or switching a charged-particle beam |
| 08/15/2002 | US20020109090 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus |
| 08/15/2002 | US20020109089 SEM provided with an adjustable final electrode in the electrostatic objective |
| 08/15/2002 | US20020108933 Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression |
| 08/15/2002 | US20020108847 Non-thermionic sputter material transport device, methods of use, and materials produced thereby |
| 08/15/2002 | US20020108714 Processing chamber for atomic layer deposition processes |
| 08/15/2002 | US20020108713 High-frequency electrostatically shielded toroidal plasma and radical source |
| 08/15/2002 | US20020108712 Apparatus for plasma processing |
| 08/15/2002 | US20020108711 Gas distribution apparatus of semiconductor equipment |
| 08/15/2002 | CA2437322A1 Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge |
| 08/14/2002 | EP1230668A2 Method and apparatus for producing uniform process rates |
| 08/14/2002 | EP1230667A2 Method and apparatus for controlling the volume of a plasma |
| 08/14/2002 | EP1230666A1 Plasma processing systems and method therefor |
| 08/14/2002 | EP1230665A1 Plasma processing system with dynamic gas distribution control |
| 08/14/2002 | EP1230664A1 Materials and gas chemistries for processing systems |
| 08/14/2002 | EP1230663A1 Temperature control system for plasma processing apparatus |
| 08/14/2002 | EP0958400A4 Method and apparatus for plasma deposition of a thin film onto the interior surface of a container |
| 08/14/2002 | DE10111515A1 Plasma-Beschichtungsanlage, Plasma-Beschichtungsverfahren und Verwendung des Verfahrens Plasma coating system, plasma coating process and using the method |
| 08/14/2002 | DE10102493A1 Rohrförmiges Target und Verfahren zur Herstellung eines solchen Targets Tubular target and process for producing such a target |
| 08/14/2002 | CN1363721A Processing method and apparatus for plasma |
| 08/14/2002 | CN1363718A Processing apparatus for plasma |
| 08/14/2002 | CN1089186C Fast magnetic scanning of heavy ion beams |
| 08/13/2002 | US6433553 Method and apparatus for eliminating displacement current from current measurements in a plasma processing system |
| 08/13/2002 | US6433484 Wafer area pressure control |
| 08/13/2002 | US6433348 Lithography using multiple pass raster-shaped beam |
| 08/13/2002 | US6433347 Charged-particle-beam projection-exposure methods and apparatus that selectively expose desired exposure units of a reticle pattern |
| 08/13/2002 | US6433314 Direct temperature control for a component of a substrate processing chamber |
| 08/13/2002 | US6433298 Plasma processing apparatus |
| 08/13/2002 | US6433297 Plasma processing method and plasma processing apparatus |
| 08/13/2002 | US6432831 Gas distribution apparatus for semiconductor processing |
| 08/13/2002 | US6432730 Plasma processing method and apparatus |
| 08/13/2002 | US6432594 Charged particle beam microlithography |
| 08/13/2002 | US6432493 Method of carrying out plasma-enhanced chemical vapor deposition |
| 08/13/2002 | US6432492 HF-Plasma coating chamber or PECVD coating chamber, its use and method of plating CDs using the chamber |
| 08/13/2002 | US6432325 Electrodes with metal oxynitrides and carbides |
| 08/13/2002 | US6432286 Conical sputtering target |
| 08/13/2002 | US6432285 Planar magnetron sputtering apparatus |
| 08/13/2002 | US6432261 Plasma etching system |
| 08/13/2002 | US6432260 Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof |
| 08/13/2002 | US6432259 Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates |
| 08/13/2002 | US6432256 Improving the corrosion resistance of ceramic parts in a substrate processing chamber by implanting the parts with rare-earth ions for semiconductors |
| 08/13/2002 | US6431115 Plasma treatment method and apparatus |
| 08/13/2002 | US6431114 Method and apparatus for plasma processing |
| 08/13/2002 | US6431113 Plasma vacuum substrate treatment process and system |
| 08/13/2002 | US6431112 Apparatus and method for plasma processing of a substrate utilizing an electrostatic chuck |
| 08/08/2002 | WO2002062115A1 Plasma installation and method for producing a functional coating |