| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 09/05/2002 | US20020121613 Adjustable conductance limiting aperture for ion implanters |
| 09/05/2002 | US20020121609 Stigmator assembly |
| 09/05/2002 | US20020121505 Plasma etching apparatus |
| 09/05/2002 | US20020121504 Electron beam irradiation system and electron beam irradiation method |
| 09/05/2002 | US20020121501 Reduction of sodium contamination in a semiconductor device |
| 09/05/2002 | US20020121345 Multi-chamber system for semiconductor process |
| 09/05/2002 | US20020121344 Plasma generating device and plasma processing apparatus comprising such a adevice |
| 09/05/2002 | US20020121343 Plasma reactor |
| 09/04/2002 | EP1236381A1 Device for hybrid plasma processing |
| 09/04/2002 | EP1236275A1 Variable load switchable impedance matching system |
| 09/04/2002 | EP1236221A1 Dose monitor for plasma doping system |
| 09/04/2002 | EP1236220A1 Detector for a scanning electron microscope with variable pressure and a scanning electron microscope comprising a detector of this type |
| 09/04/2002 | EP1235945A1 Rotating magnet array and sputter source |
| 09/04/2002 | EP1040506B1 Device for producing excited/ionized particles in a plasma |
| 09/04/2002 | EP0892984B1 Magnet array for magnetrons |
| 09/03/2002 | US6445197 Electron beam tester, recording medium therefor and signal data detecting method |
| 09/03/2002 | US6445042 Method and apparatus for making MOSFETs with elevated source/drain extensions |
| 09/03/2002 | US6444991 Scanning charged-particle beam instrument |
| 09/03/2002 | US6444982 Dissolution stage for an environmental scanning electron microscope |
| 09/03/2002 | US6444981 Scanning electron microscope |
| 09/03/2002 | US6444945 Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source |
| 09/03/2002 | US6444399 Methods for achieving reduced effects of overlayer and subfield-stitching errors in charged-particle-beam microlithography, and device manufacturing methods comprising such microlithography methods |
| 09/03/2002 | US6444374 Dividing the mask into partial areas, forming partial masks which have apertures with patterns identical with plurality of partial areas, exposing the patterns of masks on a mask substrate by electron beam proximity exposure method |
| 09/03/2002 | US6444137 Sputtering, ion etching, vapor deposition |
| 09/03/2002 | US6444105 Physical vapor deposition reactor including magnet to control flow of ions |
| 09/03/2002 | US6444104 Sputtering target having an annular vault |
| 09/03/2002 | US6444100 Coated architectural gass and multilayer optical coatings |
| 09/03/2002 | US6444099 Ionizing sputtering method |
| 09/03/2002 | US6444087 Cells having carbon or silicon carbide electrodes with dielectric quartz or silicon nitride coverings and gas generators used for vacuum deposition; noncontamination |
| 09/03/2002 | US6444085 Plasma gases generators cells having semiconductors ceillings and side walls connected to power sources, supports and coils |
| 09/03/2002 | US6444084 Low density high frequency process for a parallel-plate electrode plasma reactor having an inductive antenna |
| 09/03/2002 | US6444037 Can provide high temperature deposition, heating and efficient cleaning, for forming dielectric films having thickness uniformity, good gap fill capability, high density and low moisture |
| 09/03/2002 | US6444036 Construction of a film on a semiconductor wafer |
| 09/03/2002 | US6443440 Device for unilateral etching of a semiconductor wafer |
| 09/03/2002 | US6443435 Vaporization of precursors at point of use |
| 09/03/2002 | US6443092 Apparatus for synthesizing diamond film by DC PACVD |
| 08/29/2002 | WO2002067313A1 Plasma etching method and device |
| 08/29/2002 | WO2002067312A1 Parts of apparatus for plasma treatment and method for manufacture thereof, and apparatus for plasma treatment |
| 08/29/2002 | WO2002067311A1 Plasma processing system |
| 08/29/2002 | WO2002067286A2 Particle beam system comprising a mirror corrector |
| 08/29/2002 | WO2002067285A2 Device and method for discharging dielectric surfaces |
| 08/29/2002 | WO2002004691A3 Systems and methods for remote plasma clean |
| 08/29/2002 | WO2001098788A3 Diagnosting reliability of vias by e-beam probing |
| 08/29/2002 | US20020120389 Method of presuming traffic conditions by using floating car data and system for presuming and presenting traffic conditions by using floating data |
| 08/29/2002 | US20020119670 Plasma etching apparatus and plasma etching method |
| 08/29/2002 | US20020118897 Stage device, exposure apparatus, device manufacturing method and movement guidance method |
| 08/29/2002 | US20020117969 Magnetic shielding devices and methods involving active cancellation of external magnetic fields at the column of a charged-particle-beam optical system |
| 08/29/2002 | US20020117967 Electron beam system using multiple electron beams |
| 08/29/2002 | US20020117637 Ion generation chamber |
| 08/29/2002 | US20020117636 Electron beam irradiation system and electron beam irradiation method |
| 08/29/2002 | US20020117635 Patterned wafer inspection method and apparatus therefor |
| 08/29/2002 | US20020117634 Ion implanter vacuum integrity check process and apparatus |
| 08/29/2002 | US20020117628 Detection system |
| 08/29/2002 | US20020117619 Inspecting system using electron beam and inspecting method using same |
| 08/29/2002 | US20020117473 Capable of becoming rare earth hydroxide in reaction with water vapor; noncracking, nonswelling, nonchipping; disk drives |
| 08/29/2002 | US20020117472 Cleaning of multicompositional etchant residues |
| 08/29/2002 | US20020117399 Barrier composed of highly resistive materials include metal oxides, and tantalum nitride, coated onto the sidewalls and bottom of via hole intented for copper metallization |
| 08/29/2002 | US20020117114 Method and apparatus for modifying surface of container made of polymeric compound |
| 08/29/2002 | US20020117112 Vacuum processing apparatus |
| 08/28/2002 | EP1235252A2 Method and apparatus for ion beam scanning in an ion implanter |
| 08/28/2002 | EP1235251A1 Electron beam apparatus |
| 08/28/2002 | EP1235195A2 Method of presuming traffic conditions by using floating cars |
| 08/28/2002 | EP1235115A2 Stage device and movement guidance method |
| 08/28/2002 | EP1235081A1 System for detecting X-ray radiation |
| 08/28/2002 | EP1090408B1 Cam-based arrangement for positioning confinement rings in a plasma processing chamber |
| 08/28/2002 | CN1366705A Method and apparatus for electron beam irradiation |
| 08/27/2002 | US6441620 Method for fault identification in a plasma process |
| 08/27/2002 | US6441555 Plasma excitation coil |
| 08/27/2002 | US6441554 Apparatus for generating low temperature plasma at atmospheric pressure |
| 08/27/2002 | US6441553 Electrode for glow-discharge atmospheric-pressure plasma treatment |
| 08/27/2002 | US6441384 Charged particle beam exposure device exhibiting reduced image blur |
| 08/27/2002 | US6441383 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 08/27/2002 | US6441382 Deceleration electrode configuration for ultra-low energy ion implanter |
| 08/27/2002 | US6441378 Magnetic energy filter |
| 08/27/2002 | US6440879 Physical vapor deposition apparatus with modified shutter disk and cover ring |
| 08/27/2002 | US6440866 Plasma reactor with heated source of a polymer-hardening precursor material |
| 08/27/2002 | US6440756 Reduction of plasma charge-induced damage in microfabricated devices |
| 08/27/2002 | US6440620 Electron beam lithography focusing through spherical aberration introduction |
| 08/27/2002 | US6440504 Vacuum processing apparatus having first means for evacuating vacuum vessel from atmospheric pressure to vacuum and second means for evacuating inside of vacuum vessel during generation of plasma, and vessel is movable between them |
| 08/27/2002 | US6440282 Sputtering reactor and method of using an unbalanced magnetron |
| 08/27/2002 | US6440281 Device for the prevention of arcing in vacuum sputtering installations |
| 08/27/2002 | US6440280 Multi-anode device and methods for sputter deposition |
| 08/27/2002 | US6440260 Plasma monitoring method and semiconductor production apparatus |
| 08/27/2002 | US6440221 Process chamber having improved temperature control |
| 08/27/2002 | US6439155 Remote plasma generator with sliding short tuner |
| 08/27/2002 | US6439154 Plasma processing apparatus for semiconductors |
| 08/22/2002 | WO2002065820A1 Apparatus for generating low temperature plasma at atmospheric pressure |
| 08/22/2002 | WO2002065533A1 Plasma apparatus and production method thereof |
| 08/22/2002 | WO2002065531A1 Focus ring for semiconductor treatment and plasma treatment device |
| 08/22/2002 | WO2002064850A2 Focused magnetron sputtering system |
| 08/22/2002 | US20020116697 Methods for calculating, correcting, and displaying segmented reticle patterns for use in charged-particle-beam microlithography, and screen editors utilizing such methods |
| 08/22/2002 | US20020115309 Heat-resistant core and a core covering comprising a carbon based yarn. The knitted garment is heat treated to at least partially decompose the carbon based yarn to form activated charcoal |
| 08/22/2002 | US20020115301 Pulsed plasma processing of semiconductor substrates |
| 08/22/2002 | US20020115020 Exposing photoresists using an electron beam exposure apparatus having a variable beam-shaping system |
| 08/22/2002 | US20020114897 Intermittently generating plasma; securing at least 10 mu sec as an off time of the plasma generation after the plasma-off period for processing a substrate by controlling generation of plasma |
| 08/22/2002 | US20020114886 Method of tisin deposition using a chemical vapor deposition process |
| 08/22/2002 | US20020114123 Plasma processing apparatus for processing semiconductor wafer using plasma |
| 08/22/2002 | US20020113438 Fluid-tight pipe union |
| 08/22/2002 | US20020113214 Methods and devices for evaluating beam blur in a charged-particle-beam microlithography apparatus |
| 08/22/2002 | US20020112956 Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly |