| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/17/2002 | US6451177 Vault shaped target and magnetron operable in two sputtering modes |
| 09/17/2002 | US6451176 Electrostatic particle trap for ion beam sputter deposition |
| 09/17/2002 | US6451161 Method and apparatus for generating high-density uniform plasma |
| 09/17/2002 | US6451160 Plasma generation apparatus with a conductive connection member that electrically connects the power source to the electrode |
| 09/17/2002 | US6451159 Grounded centering ring for inhibiting polymer build-up on the diaphragm of a manometer |
| 09/17/2002 | US6451158 Apparatus for detecting the endpoint of a photoresist stripping process |
| 09/17/2002 | US6451157 Gas distribution apparatus for semiconductor processing |
| 09/17/2002 | US6450683 Optical temperature measurement as an in situ monitor of etch rate |
| 09/17/2002 | US6450117 Directing a flow of gas in a substrate processing chamber |
| 09/17/2002 | US6450116 Apparatus for exposing a substrate to plasma radicals |
| 09/17/2002 | US6449871 Semiconductor process chamber having improved gas distributor |
| 09/16/2002 | CA2366718A1 Method of and apparatus for measuring lattice-constant, and computer program |
| 09/12/2002 | WO2002071816A2 Improved double chamber ion implantation system |
| 09/12/2002 | WO2002071631A2 Apparatus and method of improving impedance matching between an rf signal and a multi-segmented electrode |
| 09/12/2002 | WO2002071463A1 Shower head gas injection apparatus with secondary high pressure pulsed gas injection |
| 09/12/2002 | WO2002071462A1 Plasma processor and plasma processing method |
| 09/12/2002 | WO2002071438A2 Capillary discharge plasma apparatus and method for surface treatment using the same |
| 09/12/2002 | WO2002071336A1 Method for localizing and identifying epitopes |
| 09/12/2002 | WO2002071031A1 Total release method for sample extraction from a charged particle instrument |
| 09/12/2002 | WO2002070777A1 Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly |
| 09/12/2002 | WO2002070401A2 Method for fabrication of silicon octopole deflectors and electron column employing same |
| 09/12/2002 | WO2002054454A3 Diamond coatings on reactor wall and method of manufacturing thereof |
| 09/12/2002 | WO2002043466A3 Non-thermionic sputter material transport device, methods of use, and materials produced thereby |
| 09/12/2002 | WO2002040736B1 Conical sputtering target |
| 09/12/2002 | WO2002031859A3 Stepped upper electrode for plasma processing uniformity |
| 09/12/2002 | WO2002023588A3 Capacitively coupled plasma reactor |
| 09/12/2002 | WO2002019364A3 Inductively coupled plasma using an internal inductive element |
| 09/12/2002 | WO2001035440A9 Method and apparatus for electron beam column assembly with precise alignment using displaced semi-transparent membranes |
| 09/12/2002 | US20020128733 Moving/guiding apparatus and exposure apparatus using the same |
| 09/12/2002 | US20020127858 Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield |
| 09/12/2002 | US20020127853 Electrode for plasma processes and method for manufacture and use thereof |
| 09/12/2002 | US20020127484 Charged particle beam exposure apparatus and exposure method |
| 09/12/2002 | US20020127050 Platform positioning system |
| 09/12/2002 | US20020126366 Particle-optical lens arrangement and method employing such a lens arrangement |
| 09/12/2002 | US20020125829 Double chamber ion implantation system |
| 09/12/2002 | US20020125828 Plasma processing apparatus and method |
| 09/12/2002 | US20020125447 Devices and methods for monitoring respective operating temperatures of components in a microlithography apparatus |
| 09/12/2002 | US20020125446 Substrate positioning system |
| 09/12/2002 | US20020125444 Illumination-beam scanning configurations and methods for charged-particle-beam microlithography |
| 09/12/2002 | US20020125442 Redundant printing in e-beam lithography |
| 09/12/2002 | US20020125441 Methods and apparatus for determining blur of an optical system |
| 09/12/2002 | US20020125440 Method for fabrication of silicon octopole deflectors and electron column employing same |
| 09/12/2002 | US20020125428 SEM provided with a secondary electron detector having a central electrode |
| 09/12/2002 | US20020125226 Toroidal low-field reactive gas source |
| 09/12/2002 | US20020125225 Toroidal low-field reactive gas source |
| 09/12/2002 | US20020125223 Radio frequency power source for generating an inductively coupled plasma |
| 09/12/2002 | US20020125213 Dry etching apparatus, etching method, and method of forming a wiring |
| 09/12/2002 | US20020125127 Magnetron sputtering system and photomask blank production method based on the same |
| 09/12/2002 | US20020124963 Plasma processing apparatus and method |
| 09/12/2002 | US20020124962 Atmospheric pressure plasma etching reactor |
| 09/12/2002 | US20020124959 Plasma monitoring method and semiconductor production apparatus |
| 09/12/2002 | US20020124866 Plasma film-forming apparatus and cleaning method for the same |
| 09/12/2002 | DE10109965A1 Teilchenoptische Linsenanordnung und Verfahren unter Einsatz einer solchen Linsenanordnung A particle-lens array and method using such a lens assembly |
| 09/11/2002 | EP1239709A2 Septum electromagnet for deflecting and splitting a beam, electromagnet for deflecting and splitting a beam, and method for deflecting a beam |
| 09/11/2002 | EP1239511A1 RF plasma processor |
| 09/11/2002 | EP1239510A1 Particle optical lensassembly and method using such a lens assembly |
| 09/11/2002 | EP1239509A1 Lens assembly for electron beam column |
| 09/11/2002 | EP1239294A2 Scanning magnetism detector and probe for the same |
| 09/11/2002 | EP1238407A1 Inductively coupled plasma process chamber with shield electrode interposed between antenna and dielectric window |
| 09/11/2002 | EP1238406A2 Gas cluster ion beam smoother apparatus |
| 09/11/2002 | EP1238405A1 Method and system for the examination of specimen using a charged particle bam |
| 09/11/2002 | EP1238119A2 Method and apparatus for smoothing thin conductive films by gas cluster ion beam |
| 09/11/2002 | CN1369021A Pulsed plasma processing method and apparatus |
| 09/11/2002 | CN1368875A Supercritical fluid-assisted nebulization and bubble drying |
| 09/11/2002 | CN1090807C Device for processing workpiece using plasma |
| 09/11/2002 | CN1090806C Method for in situ removal of sewage and ion beam implanter |
| 09/10/2002 | US6449568 Voltage-current sensor with high matching directivity |
| 09/10/2002 | US6448569 Bonded article having improved crystalline structure and work function uniformity and method for making the same |
| 09/10/2002 | US6448568 Electron beam column using high numerical aperture photocathode source illumination |
| 09/10/2002 | US6448556 Atomic focusers in electron microscopy |
| 09/10/2002 | US6448555 Electron microscope and similar instruments |
| 09/10/2002 | US6448554 Ion scattering spectrometer |
| 09/10/2002 | US6447964 Charged-particle-beam microlithography methods including chip-exposure sequences for reducing thermally induced lateral shift of exposure position on the substrate |
| 09/10/2002 | US6447853 Method and apparatus for processing semiconductor substrates |
| 09/10/2002 | US6447849 By ion injection and to a printer head provided in a printer configured for ejecting ink droplets; recording medium for supporting a signal recording layer; electrically conductive thin metal film, pulsed voltage to implant ions in the surface |
| 09/10/2002 | US6447691 Method for detecting end point of plasma etching, and plasma etching apparatus |
| 09/10/2002 | US6447655 Direct current power supply to improve yield at sputter deposition of a material layer onto a substrate, improve electrical integrity of magnetron sputtering apparatus and of said power supply |
| 09/10/2002 | US6447637 Process chamber having a voltage distribution electrode |
| 09/10/2002 | US6447636 Plasma reactor with dynamic RF inductive and capacitive coupling control |
| 09/10/2002 | US6447635 Plasma processing system and system using wide area planar antenna |
| 09/10/2002 | US6446573 Plasma process device |
| 09/10/2002 | US6446572 Embedded plasma source for plasma density improvement |
| 09/06/2002 | WO2002069380A2 Atomically thin highly resistive barrier layer in a copper via |
| 09/06/2002 | WO2002069364A2 Magnetic field for small closed-drift thruster |
| 09/06/2002 | WO2002068944A1 Method and apparatus for measuring physical properties of micro region |
| 09/06/2002 | WO2002068712A2 Removal of etchant residues |
| 09/06/2002 | WO2002068129A1 Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof |
| 09/06/2002 | WO2002068053A1 Electron beam system using multiple electron beams |
| 09/06/2002 | WO2002037906A3 Mechanism for containment of neutron radiation in ion implanter beamline |
| 09/06/2002 | WO2002037525A3 A probe assembly for detecting an ion in a plasma generated in an ion source |
| 09/06/2002 | WO2002013226A3 Spatial light modulator driven photocathode source electron beam pattern generator |
| 09/05/2002 | US20020123237 Plasma pulse semiconductor processing system and method |
| 09/05/2002 | US20020123230 Gas distribution apparatus for semiconductor processing |
| 09/05/2002 | US20020123200 Plasma processing apparatus |
| 09/05/2002 | US20020123168 Apparatus and methods for blocking highly scattered charged particles in a patterned beam in a charged-particle-beam microlithography system |
| 09/05/2002 | US20020122897 Maintaining reduced pressure in a plasma-treating chamber for treatment with a plasma in which a substrate that is to be treated is contained, introducing treating gas and microwaves into chamber wherein a metallic antenna is disposed |
| 09/05/2002 | US20020122896 Capillary discharge plasma apparatus and method for surface treatment using the same |
| 09/05/2002 | US20020121889 In situ ion beam incidence angle and beam divergence monitor |
| 09/05/2002 | US20020121615 Methods and devices for detecting and canceling magnetic fields external to a charged-particle-beam (CPB) optical system, and CPB microlithography apparatus and methods comprising same |
| 09/05/2002 | US20020121614 Total release method for sample extraction from a charged-particle instrument |