| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/26/2002 | US20020137350 Process of manufacturing electron microscopic sample and process of analyzing semiconductor device |
| 09/26/2002 | US20020137340 Plasma etching method for semiconductor device and etching apparatus of the same |
| 09/26/2002 | US20020136909 Fluid injector for and method of prolonged delivery and distribution of reagents into plasma |
| 09/26/2002 | US20020136674 Low RF power electrode for plasma generation of oxygen radicals from air |
| 09/26/2002 | US20020135378 Broadband design of a probe analysis system |
| 09/26/2002 | US20020135285 Electron beam emitter |
| 09/26/2002 | US20020134950 Substrate positioning system |
| 09/26/2002 | US20020134949 Through-the-lens neutralization for charged particle beam system |
| 09/26/2002 | US20020134948 Methods and apparatus for scanned beam uniformity adjustment in ion implanters |
| 09/26/2002 | US20020134946 Method and apparatus for electron beam irradiation |
| 09/26/2002 | US20020134937 Scintillator for electron microscope and method of making |
| 09/26/2002 | US20020134936 Wafer inspection system and wafer inspection process using charged particle beam |
| 09/26/2002 | US20020134912 Electron beam apparatus having traversing circuit boards |
| 09/26/2002 | US20020134671 Positioning a substrate opposite a planar target consists of crystalline semiconducor, applying direct current(DC) in presence of a gas, DC power is modulated by AC power, under uniform target erosion layer of amourphous silicon is |
| 09/26/2002 | US20020134510 Plasma processing apparatus and method |
| 09/26/2002 | US20020134509 Apparatus and method for plasma etching |
| 09/26/2002 | US20020134508 Matching unit and plasma processing system |
| 09/26/2002 | US20020134507 Gas delivery metering tube |
| 09/26/2002 | US20020134309 Gas delivering device |
| 09/25/2002 | EP1244133A2 Broadband design of a probe analysis system |
| 09/25/2002 | EP1244132A1 Scanning electron microscope |
| 09/25/2002 | EP1243017A1 Linear drive system for use in a plasma processing system |
| 09/25/2002 | EP1243016A2 Method and apparatus for ionized physical vapor deposition |
| 09/25/2002 | EP0975818B1 Method and device for pvd coating |
| 09/24/2002 | US6456642 Optical coupling device |
| 09/24/2002 | US6456019 Real time measurement of leakage current in high voltage electron guns |
| 09/24/2002 | US6456010 Discharge plasma generating method, discharge plasma generating apparatus, semiconductor device fabrication method, and semiconductor device fabrication apparatus |
| 09/24/2002 | US6455990 Apparatus for an electron gun employing a thermionic electron source |
| 09/24/2002 | US6455863 Apparatus and method for forming a charged particle beam of arbitrary shape |
| 09/24/2002 | US6455860 Resolution enhancement device for an optically-coupled image sensor using high extra-mural absorbent fiber |
| 09/24/2002 | US6455848 Particle-optical apparatus involving detection of Auger electronics |
| 09/24/2002 | US6455821 System and method to control temperature of an article |
| 09/24/2002 | US6455437 Method and apparatus for monitoring the process state of a semiconductor device fabrication process |
| 09/24/2002 | US6455233 Exposing defined area of maskless resist material to produce chemical change in property of area so it can be selectively removed or rendered inert with high energy beam of light ions having energy greater than 250 kev |
| 09/24/2002 | US6454920 Magnetron sputtering source |
| 09/24/2002 | US6454912 Method and apparatus for the fabrication of ferroelectric films |
| 09/24/2002 | US6454910 Ion-assisted magnetron deposition |
| 09/24/2002 | US6454898 Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners |
| 09/24/2002 | US6454855 Method for producing coated workpieces, uses and installation for the method |
| 09/24/2002 | US6454797 Tetracarbon |
| 09/24/2002 | US6453842 Externally excited torroidal plasma source using a gas distribution plate |
| 09/19/2002 | WO2002073676A1 Plasma treatment device |
| 09/19/2002 | WO2002073666A1 Atmospheric pressure plasma etching reactor |
| 09/19/2002 | WO2002073654A1 Plasma chamber support having dual electrodes |
| 09/19/2002 | WO2002073653A1 Focused ion beam system and machining method using it |
| 09/19/2002 | WO2002073652A2 Methods and apparatus for oxygen implantation |
| 09/19/2002 | WO2002073651A1 Thermal regulation of an ion implantation system |
| 09/19/2002 | WO2002073636A1 High-voltage electric apparatus |
| 09/19/2002 | WO2002072913A1 Variable efficiency faraday shield |
| 09/19/2002 | WO2002047109A3 Arc electrodes for synthesis of carbon nanostructures |
| 09/19/2002 | WO2002014810A3 Method and apparatus for tuning a plasma reactor chamber |
| 09/19/2002 | US20020132380 Graphic user interface, which is based on the html/xml page format, is implemented in the at least one display/operator control unit and/or the computing unit |
| 09/19/2002 | US20020130425 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
| 09/19/2002 | US20020130278 Thermal regulation of an ion implantation system |
| 09/19/2002 | US20020130277 Method and system for determining pressure compensation factors in an ion implanter |
| 09/19/2002 | US20020130275 Charging control and dosimetry system for gas cluster ion beam |
| 09/19/2002 | US20020130274 Spatial phase locking with shaped electron beam lithography |
| 09/19/2002 | US20020130271 Ion implantation method and ion implantation equipment |
| 09/19/2002 | US20020130270 Methods and apparatus for oxygen implantation |
| 09/19/2002 | US20020130262 Method for inspecting substrate, substrate inspecting system and electron beam apparatus |
| 09/19/2002 | US20020130260 Simultaneous flooding and inspection for charge control in an electron beam inspection machine |
| 09/19/2002 | US20020130110 Impedance matching circuit for inductively coupled plasma source |
| 09/19/2002 | US20020130032 Method and apparatus for the fabrication of ferroelectric films |
| 09/19/2002 | US20020129904 Plasma treatment apparatus and method of producing semiconductor device using the apparatus |
| 09/19/2002 | US20020129903 Variable efficiency faraday shield |
| 09/19/2002 | US20020129902 Low-temperature compatible wide-pressure-range plasma flow device |
| 09/19/2002 | CA2440328A1 Atmospheric pressure plasma etching reactor |
| 09/18/2002 | EP1241705A1 Process of manufacturing electron microscopic sample for analysing a semiconductor device |
| 09/18/2002 | EP1240660A1 Method of manufacturing an electrode for a plasma reactor and such electrode |
| 09/18/2002 | EP1240659A1 Arrangement for coupling microwave energy into a treatment chamber |
| 09/18/2002 | EP1240505A2 Irradiating device with highly flexible membrane bellows |
| 09/18/2002 | EP1196939A4 Object inspection and/or modification system and method |
| 09/18/2002 | EP1088332B1 Focus ring arrangement for substantially eliminating unconfined plasma in a plasma processing chamber |
| 09/18/2002 | EP0830707B1 Plasma sputter etching system with reduced particle contamination |
| 09/18/2002 | EP0726967B1 A method for generation of a discharge in own vapors of a radio frequency electrode for sustained self-sputtering and evaporation of the electrode |
| 09/18/2002 | CN2512110Y Supporter for solid ion source |
| 09/18/2002 | CN1370325A Plasma reaction chamber component having improved temp uniformity |
| 09/17/2002 | US6453063 Automatic focused ion beam imaging system and method |
| 09/17/2002 | US6452408 Impedance measurement tool |
| 09/17/2002 | US6452401 Charged particle analysis |
| 09/17/2002 | US6452338 Electron beam ion source with integral low-temperature vaporizer |
| 09/17/2002 | US6452315 Compact RF plasma device for cleaning electron microscopes and vacuum chambers |
| 09/17/2002 | US6452198 Minimized contamination of semiconductor wafers within an implantation system |
| 09/17/2002 | US6452197 Ion implantation apparatus and method of implanting ions to prevent charge build up on a substrate |
| 09/17/2002 | US6452196 Power supply hardening for ion beam systems |
| 09/17/2002 | US6452193 Electron beam exposure apparatus, electron lens, and device manufacturing method |
| 09/17/2002 | US6452178 Method and an apparatus of an inspection system using an electron beam |
| 09/17/2002 | US6452177 Atmospheric electron x-ray spectrometer |
| 09/17/2002 | US6452176 Arrangement and method for using electron channeling patterns to detect substrate damage |
| 09/17/2002 | US6452175 Column for charged particle beam device |
| 09/17/2002 | US6452174 Charged particle beam apparatus and method of controlling same |
| 09/17/2002 | US6452173 Charged particle apparatus |
| 09/17/2002 | US6452172 Composite charged particle beam apparatus |
| 09/17/2002 | US6452170 Scanning force microscope to determine interaction forces with high-frequency cantilever |
| 09/17/2002 | US6452169 Wien filter |
| 09/17/2002 | US6452165 Faraday collector for measuring ion currents in mass spectrometers |
| 09/17/2002 | US6451674 Method for introducing impurity into a semiconductor substrate without negative charge buildup phenomenon |
| 09/17/2002 | US6451217 Mixing hydrogen or ammonia to sulfur fluoride to suppress turbidity on the surfaces of silicon; spraying the mixtures from nozzles having feeding pipes; etch selectivity; quality polishing |
| 09/17/2002 | US6451184 Thin film forming apparatus and process for forming thin film using same |
| 09/17/2002 | US6451179 Coating aluminum multilayers by applying radio frequency power to coils for ionization of targets before metallization; semiconductors; robotics |