| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 10/10/2002 | US20020144903 Focused magnetron sputtering system |
| 10/10/2002 | US20020144901 Coils for generating a plasma and for sputtering |
| 10/10/2002 | US20020144893 A vacuum chamber with an anode, a power supply, and a cathode target connected to the power supply, and has a interference fit stud with a threadless distal end |
| 10/10/2002 | US20020144892 Thin-film magnetic recording head manufacture |
| 10/10/2002 | US20020144891 Method and apparatus for sputter coating with variable target to substrate spacing |
| 10/10/2002 | US20020144786 Substrate temperature control in an ALD reactor |
| 10/10/2002 | US20020144785 Method and apparatus for micro-jet enabled, low-energy ion generation and transport in plasma processing |
| 10/10/2002 | US20020144783 Apparatus and method for accelerating process stability of high temperature vacuum processes after chamber cleaning |
| 10/10/2002 | US20020144657 ALD reactor employing electrostatic chuck |
| 10/10/2002 | US20020144655 Gas valve system for a reactor |
| 10/10/2002 | EP1145272A3 Improved alignment of a thermal field emission electron source and application in a microcolumn |
| 10/10/2002 | DE10117025A1 Teilchenoptische Vorrichtung,Beleuchtungsvorrichtung und Projektionssystem sowie Verfahren unter Verwendung derselben A particle-optical device, illumination device and projection system and method using the same |
| 10/09/2002 | EP1248353A2 Pulsing intelligent rf modulation controller |
| 10/09/2002 | EP1248282A1 Particle-optical device, illumination device and projection system, and method using them |
| 10/09/2002 | EP1248152A2 X/Y stage and exposure apparatus using the same |
| 10/09/2002 | EP1247434A2 Gas cluster ion beam low mass ion filter |
| 10/09/2002 | EP1247433A2 Enhanced etching/smoothing of dielectric surfaces |
| 10/09/2002 | EP1247295A2 Method and apparatus for detecting the endpoint of a photoresist stripping process |
| 10/09/2002 | EP1247287A1 Liner for semiconductor etching chamber |
| 10/09/2002 | CN1373899A Techniques for improving etch rate uniformity |
| 10/08/2002 | US6462489 Controller for a linear accelerator |
| 10/08/2002 | US6462483 Induction plasma processing chamber |
| 10/08/2002 | US6462482 Plasma processing system for sputter deposition applications |
| 10/08/2002 | US6462481 Plasma reactor having a symmetric parallel conductor coil antenna |
| 10/08/2002 | US6462348 Plural foils shaping intensity profile of ion beams |
| 10/08/2002 | US6462347 Charge exchanger, ion implantation system comprising the charge exchanger, and method of controlling the rate at which the polarity of ions is changed |
| 10/08/2002 | US6462346 Mask inspecting apparatus and mask inspecting method which can inspect mask by using electron beam exposure system without independently mounting another mask inspecting apparatus |
| 10/08/2002 | US6462332 Particle optical apparatus |
| 10/08/2002 | US6462331 Method for monitoring turbo pump operation in an ion implantation apparatus |
| 10/08/2002 | US6461980 Apparatus and process for controlling the temperature of a substrate in a plasma reactor chamber |
| 10/08/2002 | US6461680 Simplified fabrication method of toroidal charged particle deflector vanes |
| 10/08/2002 | US6461484 Suitable for film deposition using a plurality of targets of different materials; uniform film without need for rotation of the substrate; sputtering device rotates the target |
| 10/08/2002 | US6461483 Method and apparatus for performing high pressure physical vapor deposition |
| 10/08/2002 | US6461435 Showerhead with reduced contact area |
| 10/08/2002 | US6460482 Gas shower unit for semiconductor manufacturing apparatus and semiconductor manufacturing apparatus |
| 10/08/2002 | CA2216818C Cathode mounting for ion source with indirectly heated cathode |
| 10/03/2002 | WO2002078407A2 Neutral particle beam processing apparatus |
| 10/03/2002 | WO2002078072A1 Plasma processor and plasma processing method |
| 10/03/2002 | WO2002078045A2 Methods and apparatus for scanned beam uniformity adjustment in ion implanters |
| 10/03/2002 | WO2002078044A2 Method of processing a surface of a workpiece |
| 10/03/2002 | WO2002078043A2 Beam processing apparatus |
| 10/03/2002 | WO2002078042A2 Neutral particle beam processing apparatus |
| 10/03/2002 | WO2002078041A2 Neutral particle beam processing apparatus |
| 10/03/2002 | WO2002078040A2 Neutral particle beam processing apparatus |
| 10/03/2002 | WO2002078036A2 Device for generating an ion beam |
| 10/03/2002 | WO2002078033A2 Filament having a variable cross-section, and electron beam emitter comprising such filament |
| 10/03/2002 | WO2002077612A1 Device for preparing specimens for a cryo-electron microscope |
| 10/03/2002 | WO2002077589A2 Method and apparatus for endpoint detection using partial least squares |
| 10/03/2002 | WO2002077319A1 Diamond film depositing apparatus using microwaves and plasma |
| 10/03/2002 | WO2002077318A1 Arc evaporator with a powerful magnetic guide for targets having a large surface area |
| 10/03/2002 | WO2002076511A2 Plasma surface treatment method and device for carrying out said method |
| 10/03/2002 | US20020142615 Etching apparatus and etching method |
| 10/03/2002 | US20020142612 Shielding plate in plasma for uniformity improvement |
| 10/03/2002 | US20020142611 Corrosion resistant component of semiconductor processing equipment such as a plasma chamber |
| 10/03/2002 | US20020142599 XeF2 source chamber having a tray or ampoule for XeF2 crystals, a reservoir coupled to the chamber via a valve that allows sublimation to XeF2 gas, a flow controller fed by the reservoir |
| 10/03/2002 | US20020142496 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus |
| 10/03/2002 | US20020142238 Extracting pattern; charge particle beam exposure |
| 10/03/2002 | US20020140383 Charged particle beam exposing apparatus |
| 10/03/2002 | US20020140359 Stacked RF excitation coil for inductive plasma processor |
| 10/03/2002 | US20020140358 Apparatus for elimination of plasma lighting inside a gas line in a strong RF field |
| 10/03/2002 | US20020140334 Cathode target mounting for cathodic arc cathodes |
| 10/03/2002 | US20020139772 Adaptive GCIB for smoothing surfaces |
| 10/03/2002 | US20020139665 Plasma etch reactor and method |
| 10/03/2002 | US20020139662 Using a target comprising fused mixture of powders of low-conductivity material hot-pressed with powders of a high conductivity material functioning as conductivity-enhancement matrix; electrolyte for solid-state thin-film lithium ion |
| 10/03/2002 | US20020139658 Using electron-free ion-ion plasmas, wherein the substrate bias waveform is synched to a pulsed RF drive where there's a delay between the drive pulse and bias pulse to let the electron count drop to zero; microstructue circuitry |
| 10/03/2002 | US20020139480 Methods for actively controlling RF peak-to-peak voltage in an inductively coupled plasma etching system |
| 10/03/2002 | US20020139478 Under high pressure, in the presence of a polymer of hydroxyacrylic acid or acid salt or lactone and of potassium hydroxide, sodium hydroxide, or alkali metal or alkaline-earth metal carbonate |
| 10/03/2002 | US20020139477 Plasma processing method and apparatus with control of plasma excitation power |
| 10/03/2002 | CA2442189A1 Device for generating an ion beam |
| 10/03/2002 | CA2441932A1 Device for preparing specimens for a cryo-electron microscope |
| 10/02/2002 | EP1246226A2 Partially ionized plasma mass filter |
| 10/02/2002 | EP1246224A2 Plasma processing methods and apparatus |
| 10/02/2002 | EP1245696A2 Plasma resistant member |
| 10/02/2002 | EP1245694A1 Vacuum arc vapor deposition apparatus and vacuum arc vapor deposition method |
| 10/02/2002 | EP1245037A1 Automated high-density plasma (hdp) workpiece temperature control |
| 10/02/2002 | EP1245036A1 Ion implantation ion source, system and method |
| 10/02/2002 | EP1090409B1 High sputter and etch resistant window for plasma processing chambers |
| 10/02/2002 | EP0888464B1 Target, magnetron source with said target, and process for producing said target |
| 10/02/2002 | DE10201992A1 Device for plasma-mediated working of surfaces of planar substrates using HF/VHF low pressure discharge lamps comprises a flat electrode connected to a frequency generator in a chamber containing an electrically insulated tunnel |
| 10/02/2002 | DE10114115A1 Structure for generating plasma in a treatment area fed with microwaves from outside feeds in microwaves through an opening in a protective screen effective for microwaves and partly surrounding the treatment area |
| 10/02/2002 | CN1372230A Method for speculating traffic state by flowing car data and system for speculating and providing traffic state |
| 10/02/2002 | CN1091887C Pattern exposure method using electron beam |
| 10/01/2002 | US6459482 Grainless material for calibration sample |
| 10/01/2002 | US6459082 Focused ion beam system |
| 10/01/2002 | US6459067 Pulsing intelligent RF modulation controller |
| 10/01/2002 | US6459066 Transmission line based inductively coupled plasma source with stable impedance |
| 10/01/2002 | US6458694 High energy sputtering method for forming interconnects |
| 10/01/2002 | US6458430 Ionizing gas; reacting electrically active ions with photoresist; continuous evacuation of outgas; curing before doping |
| 10/01/2002 | US6458252 High target utilization magnetic arrangement for a truncated conical sputtering target |
| 10/01/2002 | US6458251 Pressure modulation method to obtain improved step coverage of seed layer |
| 10/01/2002 | US6458239 Plasma processing apparatus |
| 10/01/2002 | CA2254677C Apparatus for sputtering or arc evaporation |
| 09/26/2002 | WO2002075773A1 Focused ion beam system enabling observation/machining of large sample |
| 09/26/2002 | WO2002075772A2 Simultaneous flooding and inspection for charge control in an electron beam inspection machine |
| 09/26/2002 | WO2002075332A1 Impedance monitoring system and method |
| 09/26/2002 | WO2002075246A1 Method for measuring dimensions of pattern |
| 09/26/2002 | WO2001024255A9 Interferometric method for endpointing plasma etch processes |
| 09/26/2002 | WO2001024216A3 Pretreated gas distribution plate |
| 09/26/2002 | WO1999036931A3 Low ceiling temperature process for a plasma reactor with heated source of a polymer-hardening precursor material |
| 09/26/2002 | US20020137352 Selectively delignifying lignocellulosic materials and bleaching of pulp and dyes using a combination of an oxidative enzyme and a metal complex |