H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/2002
10/17/2002	WO2002082492A1 Helium ion generation method and apparatus
10/17/2002	WO2002082491A2 Plasma source having supplemental energizer for ion enhancement
10/17/2002	WO2002082489A2 Ion source filament
10/17/2002	WO2002082187A1 Optical signal transmission for electron beam imaging apparatus
10/17/2002	WO2002081771A2 Atomic layer deposition system and method
10/17/2002	WO2002052612A3 In-process wafer charge monitor and control system for ion implanter
10/17/2002	WO2002050867A3 Centrifugal type contaminant collector trap for ion implanter
10/17/2002	WO2002043103A3 Extraction and deceleration of low energy beam with low beam divergence
10/17/2002	WO2002025722A3 Method and system for determining pressure compensation factors in an ion implanter
10/17/2002	WO2002003429A3 Integrated electronic hardware for wafer processing control and diagnostic
10/17/2002	WO2001054163A9 Shaped and low density focused ion beams
10/17/2002	WO2000036632A3 Inductive coil assembly
10/17/2002	WO2000007215A3 A method of allowing a stable power transmission into a plasma processing chamber
10/17/2002	US20020151182 Focused Ion beam etching of copper with variable pixel spacing
10/17/2002	US20020151140 Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same
10/17/2002	US20020150828 Microlithographic exposure methods using a segmented reticle defining pattern elements exhibiting reduced incidence of stitching anomalies when imaged on a substrate
10/17/2002	US20020150519 Plasma reactor electrode
10/17/2002	US20020150509 Comprising sampler body, platen having first side coupleable to end of sampler body and sampling medium coupleable to second side and configured to retain specimen of substance thereon; for testing semiconductor contamination
10/17/2002	US20020149445 Dual directional harmonics dissipation system
10/17/2002	US20020149381 Voltage contrast method and apparatus for semiconductor inspection using low voltage particle beam
10/17/2002	US20020149362 Scanning magnetism detector and probe
10/17/2002	US20020149317 Performance evaluation method for plasma processing apparatus for continuously maintaining a desired performance level
10/17/2002	US20020148978 Real-time prediction of and correction of proximity resist heating in raster scan particle beam lithography
10/17/2002	US20020148977 Ion implanter
10/17/2002	US20020148976 Thermal control of image pattern distortions
10/17/2002	US20020148975 Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
10/17/2002	US20020148973 Electromagnets for and method of deflecting and splitting a particle beam
10/17/2002	US20020148971 Lens assembly for electron beam column
10/17/2002	US20020148962 Lens system for phase plate for transmission electron microscope and transmission electron microscope
10/17/2002	US20020148961 Electron beam apparatus and device production method using the electron beam apparatus
10/17/2002	US20020148960 Scanning electron microscope
10/17/2002	US20020148941 Sputtering method and apparatus for depositing a coating onto substrate
10/17/2002	US20020148816 Method and apparatus for fabricating printed circuit board using atmospheric pressure capillary discharge plasma shower
10/17/2002	US20020148812 Method and apparatus for performing plasma process on particles
10/17/2002	US20020148811 Methods for detecting the endpoint of a photoresist stripping process
10/17/2002	US20020148725 Magnetron for a vault shaped sputtering target having two opposed sidewall magnets
10/17/2002	US20020148564 Apparatus for plasma processing
10/17/2002	US20020148562 Plasma reaction apparatus and plasma reaction method
10/17/2002	US20020148561 Plasma processing apparatus and method of processing
10/17/2002	DE4391006C2 Elektronenstrahlkanone Electron beam gun
10/16/2002	EP1249855A1 Device and method for controlling focussed electron beams
10/16/2002	EP1249734A2 Rectangle/lattice data conversion method for charged particle beam exposure mask pattern and charged particle beam exposure method
10/16/2002	EP1249033A1 Electrode assembly
10/16/2002	EP1249032A1 Plasma doping system comprising a hollow cathode
10/16/2002	EP1249031A1 Electron-optical corrector for eliminating third-order aberrations
10/16/2002	EP1203513A4 High-speed symmetrical plasma treatment system
10/16/2002	EP1080482B1 Method and apparatus for low energy ion implantation
10/16/2002	EP0773167B1 Carbon film-coated plastic container manufacturing apparatus and method
10/16/2002	CN1374664A Septum electra magnet of deflection and split beam, electromagnet and deflection beam method
10/16/2002	CN1092717C Constraining apparatus for constraining discharge in interaction space
10/15/2002	US6466881 Method for monitoring the quality of a protective coating in a reactor chamber
10/15/2002	US6466301 Transfer apparatus and transfer method
10/15/2002	US6465797 Electron beam illumination apparatus, electron beam exposure apparatus, and device manufacturing method
10/15/2002	US6465796 Charge-particle beam lithography system of blanking aperture array type
10/15/2002	US6465795 Charge neutralization of electron beam systems
10/15/2002	US6465793 Arc initiation in cathodic arc plasma sources
10/15/2002	US6465783 High-throughput specimen-inspection apparatus and methods utilizing multiple parallel charged particle beams and an array of multiple secondary-electron-detectors
10/15/2002	US6465781 Method and apparatus for inspecting or measuring a sample based on charged-particle beam imaging, and a charged-particle beam apparatus
10/15/2002	US6465780 Filters for cathodic arc plasmas
10/15/2002	US6465057 Rf power and a dc power and the dc power is applied to an electrode carrying the deposition target object; carbon nitride layer formed at the surface portion of the carbon film
10/15/2002	US6465051 Cleaning a plasma reactor by creating a vacuum in the chamber while introducing an etchant gas and applying rf energy to a ceiling electrode in the chamber while not necessarily applying rf energy to the coil antenna
10/15/2002	US6465043 Between deposition of said first and second layers, maintaining pressure within the chamber at a pressure that is sufficiently high that particles dislodged by introduction of the second process do not impact the wafer
10/15/2002	US6464891 Method for repetitive ion beam processing with a carbon containing ion beam
10/15/2002	US6464843 Silicon carbide (sic) as a consumable chamber surface material which reduces metal and/or particle contamination; plasma etching an oxide layer on a semiconductor wafer
10/15/2002	US6464841 Sputtering system for depositing a thin film onto a substrate
10/15/2002	US6464794 Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates
10/15/2002	US6463875 Multiple coil antenna for inductively-coupled plasma generation systems
10/15/2002	US6463874 Linear applicator for using microwave enhanced cvd to uniformly deposit a thin film of material over an elongated substrate; microwaves entering the first portion are prevented from entering the second portion
10/15/2002	US6463873 High density plasmas
10/10/2002	WO2002080632A1 Device and control method for micro wave plasma processing
10/10/2002	WO2002080265A2 Plasma processor and method for operating same
10/10/2002	WO2002080254A1 Microwave plasma process device, plasma ignition method, plasma forming method, and plasma process method
10/10/2002	WO2002080253A1 Device and method for plasma processing, and slow-wave plate
10/10/2002	WO2002080252A1 Plasma processing device
10/10/2002	WO2002080251A1 Plasma processing device
10/10/2002	WO2002080250A1 Plasma processing device
10/10/2002	WO2002080249A1 Plasma processing device
10/10/2002	WO2002080248A1 Plasma processing device
10/10/2002	WO2002080221A1 Inductive plasma processor having coil with plural windings and method of controlling plasma density
10/10/2002	WO2002080220A1 Inductive plasma processor including current sensor for plasma excitation coil
10/10/2002	WO2002080219A1 Stacked rf excitation coil for inductive plasma processor
10/10/2002	WO2002080218A1 Magnetic field applying sample observing system
10/10/2002	WO2002080214A2 Plasma processing method and apparatus with control of plasma excitation power
10/10/2002	WO2002079815A2 Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source
10/10/2002	WO2002079538A1 Cerium oxide containing ceramic components and coatings in semiconductor processing equipment
10/10/2002	WO2002079536A1 Sputter device
10/10/2002	WO2002067285A3 Device and method for discharging dielectric surfaces
10/10/2002	WO2002059933A3 Vertically translatable chuck assembly and method for a plasma reactor system
10/10/2002	WO2002037541A3 Etch chamber for etching dielectric layer with expanded process window
10/10/2002	WO2000024030A3 Improved alignment of a thermal field emission electron source and application in a microcolumn
10/10/2002	US20020147507 Projection electron beam lithography apparatus and method employing an estimator
10/10/2002	US20020146512 Si seasoning to reduce particles, extend clean frequency, block mobile ions and increase chamber throughput
10/10/2002	US20020146511 Chemisorption technique for atomic layer deposition
10/10/2002	US20020145396 Real time measurement of leakage current in high voltage electron guns
10/10/2002	US20020145391 Thin-film magnetic recording head manufacture using selective imaging
10/10/2002	US20020145119 Electron beam lithography system, electron beam lithography apparatus, and method of lithography
10/10/2002	US20020145118 Detection of backscattered electrons from a substrate
10/10/2002	US20020145113 Optical signal transmission for electron beam imaging apparatus
10/10/2002	US20020144983 Pulsing intelligent rf modulation controller
10/10/2002	US20020144980 Plasma processing system

1 ... 284 285 286 287 288 289 290 291 292 293 294 295 296 297 298 299 300 301 302 303 304 ... 469