H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/2002
11/19/2002	US6483120 Control system for a charged particle exposure apparatus
11/19/2002	US6483117 Symmetric blanking for high stability in electron beam exposure systems
11/19/2002	US6483110 Electron beam energy filter
11/19/2002	US6482744 Two step plasma etch using variable electrode spacing
11/19/2002	US6482722 Process of crystallizing semiconductor thin film and laser irradiation system
11/19/2002	US6482331 Method for preventing contamination in a plasma process chamber
11/19/2002	US6482301 Target shields for improved magnetic properties of a recording medium
11/19/2002	US6481886 Apparatus for measuring pedestal and substrate temperature in a semiconductor wafer processing system
11/19/2002	US6481370 Plasma processsing apparatus
11/14/2002	WO2002091461A2 Ionized pvd with sequential deposition and etching
11/14/2002	WO2002091453A1 High pressure wafer-less auto clean for etch applications
11/14/2002	WO2002091422A2 Raster shaped beam, electron beam exposure strategy using a two dimensional multiplexel flash field
11/14/2002	WO2002091421A1 Electron beam apparatus and device manufacturing method using the electron beam apparatus
11/14/2002	WO2002090615A1 Duo-step plasma cleaning of chamber residues
11/14/2002	WO2002090612A1 Electrode arrangement for the plasma-supported magnetically-guided deposition of thin layers in vacuo
11/14/2002	WO2002089702A2 Method and system for improving the effectiveness of artificial joints by the application of gas cluster ion beam technology
11/14/2002	WO2002078036A3 Device for generating an ion beam
11/14/2002	WO2002077589A3 Method and apparatus for endpoint detection using partial least squares
11/14/2002	WO2002071816A3 Improved double chamber ion implantation system
11/14/2002	WO2002064850A3 Focused magnetron sputtering system
11/14/2002	WO2001045134A9 Method and apparatus for producing uniform process rates
11/14/2002	US20020168814 Such as for dry etching, sputtering, plasma chemical vapor deposition, which utilize plasma excited with the use of a VHF or UHF-band high frequency power
11/14/2002	US20020168787 Irradiating circuit pattern; scattering radiation detects defects
11/14/2002	US20020168468 Diffusion barrier; protective coatings; reacting titanium nitride with organosilicon compound
11/14/2002	US20020168467 Plasma vacuum substrate treatment process and system
11/14/2002	US20020166980 Apparatus and method for introducing impurity
11/14/2002	US20020166976 Beam as well as method and equipment for specimen fabrication
11/14/2002	US20020166975 Gaseous ion source feed for oxygen ion implantation
11/14/2002	US20020166966 Low-vacuum scanning electron microscope
11/14/2002	US20020166965 Method of and apparatus for measuring lattice-constant, and computer program
11/14/2002	US20020166964 Detection of defects in patterned substrates
11/14/2002	US20020166963 Combined electron microscope
11/14/2002	US20020166762 Sputtering apparatus that allows the use of a shutter and shutter arm assembly that do not require long down time to transfer a wafer or shutter disk into the pasting or cleaning position
11/14/2002	DE10119834A1 Stabilizing coupled DC-, MF- or RF-excited reactive sputtering processes with different targets comprises measuring reactive gas partial pressure and discharge parameter; and regulating discharge streams or reactive gas flow
11/13/2002	EP1256978A2 Method of forming low dielectric constant insulation film for semiconductor device
11/13/2002	EP1256123A2 Low input power schottky emitter
11/13/2002	EP0681616B1 Cylindrical magnetron shield structure
11/13/2002	EP0263876B1 Ion beam scanning method and apparatus
11/12/2002	US6481004 Circuit pattern design method, exposure method, charged-particle beam exposure system
11/12/2002	US6479831 Process for the irradiation of strand-shaped irradiated material, and an irradiating device for the performance of the said process
11/12/2002	US6479819 Object observation apparatus and object observation
11/12/2002	US6479390 Method of etching material film formed on semiconductor wafer using surface wave coupled plasma etching apparatus
11/12/2002	US6479098 Method to solve particle performance of FSG layer by using UFU season film for FSG process
11/12/2002	US6478923 Vacuum operation apparatus
11/12/2002	US6478876 Apparatus for coating a body by using ion plating
11/12/2002	US6477980 Flexibly suspended gas distribution manifold for plasma chamber
11/12/2002	CA2121892C Ion beam gun
11/07/2002	WO2002089537A1 Production of nanocrystal beams
11/07/2002	WO2002089173A1 Plasma confinement by use of preferred rf return path
11/07/2002	WO2002088421A1 Self-renewing coating for plasma enhanced processing systems
11/07/2002	WO2002088420A1 Method and apparatus for sequential plasma treatment
11/07/2002	WO2002088417A1 Assemblies comprising molybdenum and aluminum; and methods of utilizing interlayers in forming target/backing plate assemblies
11/07/2002	WO2002088416A1 Multi-material target backing plate
11/07/2002	WO2002067286A3 Particle beam system comprising a mirror corrector
11/07/2002	US20020164883 Dielectric plates; transmitting microwaves; generating high density plasma
11/07/2002	US20020164845 Ion beam irradiation apparatus and method of igniting a plasma for the same
11/07/2002	US20020163637 Method for using an in situ particle sensor for monitoring particle performance in plasma deposition processes
11/07/2002	US20020163628 Transfer apparatus and transfer method
11/07/2002	US20020163398 Impedance matching device
11/07/2002	US20020162961 Sample mount for a scanning electron microscope
11/07/2002	US20020162822 Method for detecting end point in plasma etching by impedance change
11/07/2002	US20020162741 Multi-material target backing plate
11/07/2002	US20020162629 Apparatus for manufacturing semiconductor device
11/07/2002	US20020162508 Ionizer for gas cluster ion beam formation
11/07/2002	US20020162507 Self-renewing coating for plasma enhanced processing systems
11/06/2002	EP1255278A1 Scanning particle mirror microscope
11/06/2002	EP1255277A1 Ionizer for gas cluster ion beam formation
11/06/2002	EP1254591A1 Methods and apparatus for operating high energy accelerator in low energy mode
11/06/2002	EP1254277A2 System and method for deposition of coatings on a substrate
11/06/2002	EP1123422B1 Electron beam physical vapor deposition apparatus and method
11/06/2002	EP1101123B1 Particle beam current monitoring technique
11/05/2002	US6476402 Apparatus for pyroelectric emission lithography using patterned emitter
11/05/2002	US6476401 Moving photocathode with continuous regeneration for image conversion in electron beam lithography
11/05/2002	US6476400 Method of adjusting a lithography system to enhance image quality
11/05/2002	US6476399 System and method for removing contaminant particles relative to an ion beam
11/05/2002	US6476398 Beam automation in charged-particle-beam systems
11/05/2002	US6476390 Method and apparatus for inspecting integrated circuit pattern using a plurality of charged particle beams
11/05/2002	US6476389 X-ray analyzer having an absorption current calculating section
11/05/2002	US6476387 Method and apparatus for observing or processing and analyzing using a charged beam
11/05/2002	US6476340 Electron beam gun with grounded shield to prevent arc-down and gas bleed to protect the filament
11/05/2002	US6475918 Plasma treatment apparatus and plasma treatment method
11/05/2002	US6475814 Method for improved low pressure inductively coupled high density plasma reactor
11/05/2002	US6475353 Apparatus and method for sputter depositing dielectric films on a substrate
11/05/2002	US6475335 RF plasma reactor with hybrid conductor and multi-radius dome ceiling
11/05/2002	US6475334 Dry etching device and dry etching method
11/05/2002	US6475333 Discharge plasma processing device
11/05/2002	US6474700 Gas panel
11/05/2002	US6474258 Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma
11/05/2002	US6474257 High density plasma chemical vapor deposition chamber
11/04/2002	CA2346277A1 Multi-functional vacuum processing apparatus
10/2002
10/31/2002	WO2002087295A1 Method and apparatus for fabricating printed circuit board using atmospheric pressure capillary discharge plasma shower
10/31/2002	WO2002086943A1 Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma
10/31/2002	WO2002086942A1 Scanning electron microscope
10/31/2002	WO2002086941A1 Detector optics for electron beam inspection system
10/31/2002	WO2002086937A1 Dipole ion source
10/31/2002	WO2002086932A1 Magnetic mirror plasma source
10/31/2002	WO2002086477A1 Structure determination of materials using electron microscopy
10/31/2002	WO2002086193A1 Plasma treatment apparatus
10/31/2002	WO2002086185A1 Penning discharge plasma source
10/31/2002	WO2002029848A3 Wafer area pressure control for plasma confinement

1 ... 282 283 284 285 286 287 288 289 290 291 292 293 294 295 296 297 298 299 300 301 302 ... 469