H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
12/2002
12/04/2002	CN1095546C Auxiliary device for testing electronic microscope
12/03/2002	US6490536 Integrated load simulator
12/03/2002	US6489792 Charge-up measuring apparatus
12/03/2002	US6489622 Apparatus for decelerating ion beams with minimal energy contamination
12/03/2002	US6489621 Particle beam system with a device for reducing the energy width of a particle beam
12/03/2002	US6489620 Astigmatism-correction device and charged-particle-beam microlithography apparatus and methods comprising same
12/03/2002	US6489612 Method of measuring film thickness
12/03/2002	US6489585 Comprising an electrode substrate and a protection layer formed by heat-fusion coating a glass-based material on at least an outer surface exposed to plasma of said electrode substrate, wherein said protection layer
12/03/2002	US6489249 Elimination/reduction of black silicon in DT etch
12/03/2002	US6489245 Methods for reducing mask erosion during plasma etching
12/03/2002	US6488825 Optically coupled sputter apparatus
12/03/2002	US6488824 Dielectric and semiconductor coatinsg
11/2002
11/28/2002	WO2002095789A1 Real-time plasma charging voltage measurement
11/28/2002	WO2002095788A2 Compact independent pressure control and vacuum isolation for a turbomolecular pumped plasma reaction chamber
11/28/2002	WO2002095381A2 Tandem microchannel plate and solid state electron detector
11/28/2002	WO2002080221B1 Inductive plasma processor having coil with plural windings and method of controlling plasma density
11/28/2002	WO2001045141A9 Method and apparatus for smoothing thin conductive films by gas cluster ion beam
11/28/2002	US20020177321 Plasma etching of silicon carbide
11/28/2002	US20020177056 Rectangle/lattice data conversion method for charged particle beam exposure mask pattern and charged particle beam exposure method
11/28/2002	US20020177055 Charged particle processing for forming pattern boundaries at a uniform thickness
11/28/2002	US20020177001 Plasma processing container internal member and production method thereof
11/28/2002	US20020175869 Method and apparatus for producing uniform process rates
11/28/2002	US20020175297 Methods and apparatus for ion implantation with variable spatial frequency scan lines
11/28/2002	US20020175296 Apparatus and method of ion beam processing
11/28/2002	US20020175295 Method for aligning electron beam projection lithography tool
11/28/2002	US20020175283 Tandem microchannel plate and solid state electron detector
11/28/2002	US20020175282 Electron microscope
11/28/2002	US20020175074 Tubular magnet as center pole in unbalanced sputtering magnetron
11/28/2002	US20020174952 Integrated processing system having multiple reactors connected to a central chamber
11/28/2002	DE10123583A1 Device for coating and/or surface treating substrates using a low pressure plasma comprises a cathode, an anode, and an auxiliary electrode with passages arranged between the substrate and the cathode forming an outer chamber
11/28/2002	DE10122431A1 Elektrodenanordnung für die magnetfeldgeführte plasmagestützte Abscheidung dünner Schichten im Vakuum Electrode assembly for the magnetic field led plasma-assisted deposition of thin layers in a vacuum
11/27/2002	EP1261022A1 Apparatus for detecting defect in device and method of detecting defect
11/27/2002	EP1261016A1 Electron beam device and semiconductor device production method using the device
11/27/2002	EP1259975A1 An atmospheric pressure plasma system
11/27/2002	EP1259974A1 Through-the-lens collection of secondary particles for a focused ion beam system
11/27/2002	EP1212692A4 Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasma
11/27/2002	EP0842307B1 System for the plasma treatment of large area substrates
11/27/2002	CN1382303A Vacuum circuit for device for treating receptacle with low pressure plasma
11/26/2002	US6486953 Accurate real-time landing angle and telecentricity measurement in lithographic systems
11/26/2002	US6486941 Guideless stage
11/26/2002	US6486593 Plasma accelerator
11/26/2002	US6486480 Plasma formed ion beam projection lithography system
11/26/2002	US6486479 Charged particle beam exposure system and method
11/26/2002	US6486478 Gas cluster ion beam smoother apparatus
11/26/2002	US6486472 Inspecting system using electron beam and inspecting method using same
11/26/2002	US6486471 Composite charge particle beam apparatus
11/26/2002	US6486431 Toroidal low-field reactive gas source
11/26/2002	US6486081 Gas distribution system for a CVD processing chamber
11/26/2002	US6486045 Apparatus and method for forming deposited film
11/26/2002	US6485618 Integrated copper fill process
11/26/2002	US6485617 Sputtering method utilizing an extended plasma region
11/26/2002	US6485604 Substrate processing apparatus
11/26/2002	US6485602 Plasma processing apparatus
11/26/2002	US6485572 Use of pulsed grounding source in a plasma reactor
11/26/2002	US6485534 Contaminant collector trap for ion implanter
11/26/2002	CA2089149C Shielding for arc suppression in rotating magnetron sputtering systems
11/22/2002	WO2001091154A2 Sample support for mass spectrometers
11/22/2002	CA2409840A1 Sample support for mass spectrometers
11/21/2002	WO2002093988A1 Method and system for improving the effectiveness of medical devices by adhering drugs to the surface thereof
11/21/2002	WO2002093906A1 A tdi detecting device, a feed-through equipment and electron beam apparatus using these devices
11/21/2002	WO2002093632A1 Plasma processing device, and method of cleaning the same
11/21/2002	WO2002093631A1 Plasma processor
11/21/2002	WO2002093616A1 Hollow anode plasma reactor and method
11/21/2002	WO2002093615A1 Scanning atom probe and analysis method using scanning atom probe
11/21/2002	WO2002093610A2 Deflection system for a particle beam device
11/21/2002	WO2002093605A2 Cylinder-based plasma processing system
11/21/2002	WO2002093534A1 Electromagnetic wave shielding light-transmitting window member, its manufacturing method, and display panel
11/21/2002	WO2002092873A2 Relationship to other applications and patents
11/21/2002	WO2002092871A2 Device and method for coating and/or treating the surfaces of substrates using low-pressure plasma
11/21/2002	WO2002059934A3 Plasma generation apparatus and method
11/21/2002	WO2002056332A8 Inspection apparatus and inspection method with electron beam, and device manufacturing method comprising the inspection apparatus
11/21/2002	WO2002054443A3 Ion accelaration method and apparatus in an ion implantation system
11/21/2002	US20020173149 Local dry etching method
11/21/2002	US20020173059 Measuring plasma vartiations using aluminum pad contactor
11/21/2002	US20020172890 Electron beam projection utilizing multiple exposures with different current densities
11/21/2002	US20020172780 Generating a gaseous plasma within a spatially-localized region of space by electron cyclotron resonance, and exposing at least a portion of a surface of the tubular article to said plasma to treat surface
11/21/2002	US20020171051 Image classification method, obervation method, and apparatus thereof
11/21/2002	US20020171050 Gas injector in which one of a plurality of nozzles can be selectively driven for elevation
11/21/2002	US20020171049 High-energy ion implanter for fabricating a semiconductor device
11/21/2002	US20020171044 Sample mount for a scanning electron microscope
11/21/2002	US20020171030 Phosphor coated waveguide for efficient collection of electron-generated photons
11/21/2002	US20020170881 sensor ro emit energy beam and detect second beam from target for measurment of sputtering on the target and/or other surface; quantitative or qualitative characteristics, such as roughness
11/21/2002	US20020170822 Sputtering system
11/21/2002	US20020170678 Plasma processing apparatus
11/21/2002	US20020170677 RF power process apparatus and methods
11/21/2002	US20020170676 Segmented electrode apparatus and method for plasma processing
11/21/2002	US20020170675 Focused particle beam systems and methods using a tilt column
11/21/2002	US20020170497 Device for forming nanostructures on the surface of a semiconductor wafer by means of ion beams
11/21/2002	US20020170496 Continuous processing apparatus by plasma polymerization with vertical chamber
11/21/2002	DE10145201C1 Device for coating substrates having a curved surface contains a pair of rectangular magnetron sources and substrate holders arranged in an evacuated chamber
11/21/2002	DE10145050C1 Device for coating substrates having a curved surface contains a pair of rectangular magnetron sources and substrate holders arranged in an evacuated chamber
11/21/2002	DE10122957A1 Deflection system for particle beam equipment passes charged particles with defined energy level through corrector with retained direction irrespective of defined deflection angle.
11/20/2002	EP1258903A2 Ion source
11/20/2002	EP1258026A1 Method for controlling plasma density or the distribution thereof
11/20/2002	EP1257780A1 Method for increasing the measurement information available from a transmission electron microscope and a transmission electron microscopy device
11/20/2002	EP1050056B1 Magnetic engraving method, in particular for magnetic or magneto-optical recording
11/20/2002	CN1380747A Pulse intelligent radio-frequency modulation controller
11/20/2002	CN1380685A Plasma treatment device and plasma treatment method
11/20/2002	CN1380440A Tubular target and its producing method
11/19/2002	US6483678 Arc-extinguishing circuit and arc-extinguishing method

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