H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
12/2002
12/12/2002	US20020188417 Methods and systems for determining a property of a specimen prior to, during, or subsequent to an etch process
12/12/2002	US20020188324 Method and system for improving the effectiveness of medical devices by adhering drugs to the surface thereof
12/12/2002	US20020187715 Multi-functional vacuum processing apparatus
12/12/2002	US20020187647 Stepped upper electrode for plasma processing uniformity
12/12/2002	US20020187411 Charged-particle-beam microlithography methods exhibiting reduced coulomb effects
12/12/2002	US20020187280 Method and system for reducing damage to substrates during plasma processing with a resonator source
12/12/2002	US20020187278 Method for processing the surface of an insulating article, printer head and substrate for recording medium
12/12/2002	US20020187271 Method of forming an electrically insulating sealing structure for use in a semiconductor manufacturing apparatus
12/12/2002	US20020186357 Electron beam exposure apparatus, reduction projection system, and device manufacturing method
12/12/2002	US20020186028 Reliability of vias and diagnosis by E-beam probing
12/12/2002	US20020186018 Apparatus and method for measuring substrate biasing during plasma processing of a substrate
12/12/2002	US20020185607 Ion source filament and method
12/12/2002	US20020185599 Scanning electron microscope
12/12/2002	US20020185597 Scanning electron microscope with appropriate brightness control function
12/12/2002	US20020185374 Method and apparatus for the fabrication of ferroelectric films
12/12/2002	US20020185370 Operating a magnetron sputter reactor in two modes
12/12/2002	US20020185229 Inductively-coupled plasma processing system
12/12/2002	US20020185228 Inductive plasma processor having coil with plural windings and method of controlling plasma density
12/12/2002	US20020185227 Plasma processor method and apparatus
12/12/2002	US20020185226 Plasma processing apparatus
12/12/2002	DE10127013A1 Electric arc vaporizing device used for coating substrates with hard material has element of high relative magnetic permeability assigned to at least one annular coil of magnetic arrangement
12/12/2002	DE10127012A1 Electric arc vaporizing device used in production of hard material layers on substrates comprises anode, target, voltage, and magnet arrangement formed as one unit
12/12/2002	DE10126986A1 Treating, e.g. etching, a substrate in an electric arc vaporizing device comprises adjusting the metal ion density per target by partially covering the target
12/12/2002	DE10126985A1 Arrangement for guiding a current to a target forming the cathode of an electric arc vaporizing device comprises electrically conducting lines running from a holder and/or the target and electrically connected via a connection
12/11/2002	EP1265268A1 Treatment method in glow-discharge plasma and apparatus therefor
12/11/2002	EP1265267A2 RF power probe head with a thermally conductive bushing
12/11/2002	EP1264330A1 Method and device for the plasma-activated surface treatment and use of the inventive method
12/11/2002	EP1264329A2 Plasma deposition method and system
12/11/2002	EP1264328A1 Method and device for attenuating harmonics in semiconductor plasma processing systems
12/11/2002	EP1264220A2 Patterning methods and systems using reflected interference patterns
12/11/2002	EP1264004A1 Method and device for coating substrates
12/11/2002	CN1384604A Didirectional harmonic dissipating system
12/11/2002	CN1384525A 法拉第装置 Faraday device
12/10/2002	US6492774 Wafer area pressure control for plasma confinement
12/10/2002	US6492647 Electron guns for lithography tools
12/10/2002	US6492644 Device and method for energy and angle-resolved electron spectroscopy
12/10/2002	US6492280 Method and apparatus for etching a semiconductor wafer with features having vertical sidewalls
12/10/2002	US6492186 Method for detecting an endpoint for an oxygen free plasma process
12/10/2002	US6491801 Auxiliary vertical magnet outside a nested unbalanced magnetron
12/10/2002	US6491800 Surface smoothing the femoral heads and/or the surfaces of the acetabular cups to reduce frictional wear at the interface of the bearing surfaces
12/10/2002	US6491784 Dry etching device
12/10/2002	US6491742 ESRF coolant degassing process
12/10/2002	US6490994 Plasma processing apparatus
12/05/2002	WO2002097937A1 Inductively coupled high-density plasma source
12/05/2002	WO2002097855A1 Plasma processing apparatus and method
12/05/2002	WO2002097854A2 Plasma reactor
12/05/2002	WO2002097853A1 Methods and apparatus for ion implantation with variable spatial frequency scan lines
12/05/2002	WO2002097852A2 Plasma etching of silicon carbide
12/05/2002	WO2002097850A2 Uniform broad ion beam deposition
12/05/2002	WO2002097363A1 Position detection apparatus, position detection method, electronic part carrying apparatus, and electronic beam exposure apparatus
12/05/2002	WO2002097154A1 Plasma treatment container internal member, and plasma treatment device having the plasma treatment container internal member
12/05/2002	WO2002082491A3 Plasma source having supplemental energizer for ion enhancement
12/05/2002	WO2002080219B1 Stacked rf excitation coil for inductive plasma processor
12/05/2002	WO2001050498A9 Linear drive system for use in a plasma processing system
12/05/2002	US20020183977 Endpoint detection in substrate fabrication processes
12/05/2002	US20020182878 Pressure control method
12/05/2002	US20020182876 Semiconductor device fabrication method and apparatus
12/05/2002	US20020182865 Plasma processing apparatus and method for forming thin films using the same
12/05/2002	US20020182761 Method of manufacturing field-emission electron emitters and method of manufacturing substrates having a matrix electron emitter array formed thereon
12/05/2002	US20020182542 Electron emission lithography apparatus and method using a selectively grown carbon nanotube
12/05/2002	US20020182340 Method for processing the surface of an insulating article, printer head and substrate for recording medium
12/05/2002	US20020182131 Heated catalytic treatment of an effluent gas from a substrate fabrication process
12/05/2002	US20020182101 Vibration; surface treatment
12/05/2002	US20020181304 Method of forming regular array of microscopic structures on a substrate
12/05/2002	US20020180985 Methods and systems for determining at least one characteristic of defects on at least two sides of a specimen
12/05/2002	US20020180450 RF power probe head with a thermally conductive bushing
12/05/2002	US20020180366 Ion implanter
12/05/2002	US20020179867 Methods and systems for determining flatness, a presence of defects, and a thin film characteristic of a specimen
12/05/2002	US20020179864 Methods and systems for determining a thin film characteristic and an electrical property of a specimen
12/05/2002	US20020179857 Method of measuring and calibrating inclination of electron beam in electron beam proximity exposure apparatus, and electron beam proximity exposure apparatus
12/05/2002	US20020179856 Charged particle beam lithography apparatus for forming pattern on semi-conductor
12/05/2002	US20020179855 Charged particle beam exposure apparatus and method
12/05/2002	US20020179854 Ion implantation apparatus capable of increasing beam current
12/05/2002	US20020179851 Charged particle beam alignment method and charged particle beam apparatus
12/05/2002	US20020179850 Positioning stage with stationary actuators
12/05/2002	US20020179845 Particle-optical apparatus, illumination apparatus and projection system as well as a method employing the same
12/05/2002	US20020179812 Electron beam device and method for stereoscopic measurements
12/05/2002	US20020179577 Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate
12/05/2002	US20020179250 Inductive plasma processor including current sensor for plasma excitation coil
12/05/2002	US20020179249 Apparatus for and method of processing an object to be processed
12/05/2002	US20020179247 Nozzle for introduction of reactive species in remote plasma cleaning applications
12/05/2002	US20020179246 Removable shield arrangement for ICP-RIE reactors
12/05/2002	US20020179245 Plasma processing apparatus and maintenance method therefor
12/05/2002	US20020179015 Plasma etching system
12/05/2002	US20020179011 Gas port sealing for CVD/CVI furnace hearth plates
12/04/2002	EP1263135A2 Dual Directional Harmonics Dissipation System
12/04/2002	EP1263025A1 Removable shield arrangement for plasma reactors
12/04/2002	EP1263019A1 Electron microscope
12/04/2002	EP1263018A2 Charged particle beam alignment method and charged particle beam apparatus
12/04/2002	EP1262574A2 Method for stabilising sputtering processes
12/04/2002	EP1262093A1 Apparatus for fixing an electrode in plasma polymerizing apparatus
12/04/2002	EP1261982A1 Hollow cathode sputter ion source for generating high-intensity ion beams
12/04/2002	EP1261878A2 Precision stage
12/04/2002	EP1261755A1 Device and method for carrying out plasma enhanced surface treatment of substrates in a vacuum
12/04/2002	EP1261752A1 Method and apparatus for repairing lithography masks using a charged particle beam system
12/04/2002	EP1261394A1 Ion beam system for irradiating tumour tissues
12/04/2002	EP1012863B1 Glow plasma discharge device
12/04/2002	EP0938595B1 Process and device for coating substrates by gas flow sputtering
12/04/2002	CN1383182A Ion beam radiator and method for triggering plasma by using such radiator
12/04/2002	CN1383179A 离子源蒸发器 Ion source evaporator

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