| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 07/01/2014 | US8764952 Method for smoothing a solid surface |
| 06/26/2014 | WO2014100835A1 High-speed multi-frame dynamic transmission electron microscope image acquisition system with arbitrary timing |
| 06/26/2014 | WO2014100621A1 Storage and sub-atmospheric delivery of dopant compositions for carbon ion implantation |
| 06/26/2014 | WO2014099398A1 Adjustable coil for inductively coupled plasma |
| 06/26/2014 | WO2014097621A1 Pair of electrodes for dbd plasma process |
| 06/26/2014 | WO2014097620A1 Ignition process and device for pairs of dbd electrodes |
| 06/26/2014 | WO2014097576A1 Grid assembly and ion beam etching apparatus |
| 06/26/2014 | WO2014097262A1 Pulsed plasma deposition device |
| 06/26/2014 | WO2014096755A1 Device for providing a flow of plasma |
| 06/26/2014 | WO2014096303A1 Plasma enhanced deposition arrangement for evaporation of dielectric materials, deposition apparatus and methods of operating thereof |
| 06/26/2014 | WO2014094738A2 Arc extinguishing method and power supply system having a power converter |
| 06/26/2014 | WO2014042531A4 Double tilt holder and multicontact device |
| 06/26/2014 | US20140178681 Methods of modulating tackiness |
| 06/26/2014 | US20140178679 AlON Coated Substrate with Optional Yttria Overlayer |
| 06/26/2014 | US20140178604 Dual-Zone, Atmospheric-Pressure Plasma Reactor for Materials Processing |
| 06/26/2014 | US20140175303 Charged particle beam writing apparatus |
| 06/26/2014 | US20140175302 Multi charged particle beam writing apparatus |
| 06/26/2014 | US20140175301 Ion Source, Nanofabrication Apparatus Comprising Such Source, and a Method for Emitting Ions |
| 06/26/2014 | US20140175279 Charged particle beam apparatus |
| 06/26/2014 | US20140175278 Charged particle beam apparatus |
| 06/26/2014 | US20140175277 Secondary electron optics and detection device |
| 06/26/2014 | US20140174920 Evaporation source |
| 06/26/2014 | US20140174919 Electrode having heat sinks and coating device |
| 06/26/2014 | US20140174917 Recycling Method for Tantalum Coil for Sputtering and Tantalum Coil Obtained by the Recycling Method |
| 06/26/2014 | US20140174912 Application of coating materials |
| 06/26/2014 | US20140174909 Generating a Highly Ionized Plasma in a Plasma Chamber |
| 06/26/2014 | US20140174663 Plasma stabilization method and plasma apparatus |
| 06/26/2014 | US20140174662 Plasma processing device |
| 06/26/2014 | US20140174661 Plasma processing chamber for bevel edge processing |
| 06/26/2014 | US20140174660 Plasma processing apparatus |
| 06/26/2014 | US20140174658 Etching apparatus and methods |
| 06/26/2014 | US20140174359 Plasma generator and cvd device |
| 06/26/2014 | DE112012001287T5 Gehäuse und Verfahren zum Handhaben einer Elektronenkanone oder Ionenkanone Housing and method for managing an electron gun or ion gun |
| 06/26/2014 | DE102012112995A1 Transmission electron microscope for time-resolved observation of reversible and externally triggerable process in investigation object, has cathode for emission of electrons and device for generating acceleration voltage |
| 06/26/2014 | DE102011076404B4 Verfahren zur Impedanzanpassung der Ausgangsimpedanz einer Hochfrequenzleistungsversorgungsanordnung an die Impedanz einer Plasmalast und Hochfrequenzleistungsversorgungsanordnung A method of impedance matching of the output impedance of a high frequency power supply arrangement of the impedance of a plasma load and high-frequency power supply arrangement |
| 06/25/2014 | EP2747122A1 Plasma enhanced deposition arrangement for evaporation of dielectric materials, deposition apparatus and methods of operating thereof |
| 06/25/2014 | EP2747121A1 Secondary electron optics & detection device |
| 06/25/2014 | EP2747120A1 Method of smoothing solid surface with gas cluster ion beam and solid surface smoothing apparatus |
| 06/25/2014 | EP2746852A2 Method for estimating patterns to be printed on a plate or mask by means of electron-beam lithography and corresponding printing device |
| 06/25/2014 | EP2746426A1 Vapor deposition apparatus and Method of manufacturing organic light-emitting display apparatus |
| 06/25/2014 | EP2746424A1 Evaporation source |
| 06/25/2014 | EP2745307A1 Plasma processing apparatus |
| 06/25/2014 | EP2745306A1 Plasma processing apparatus |
| 06/25/2014 | EP2745287A2 Time-dependent label |
| 06/25/2014 | EP2745096A2 Passive detectors for imaging systems |
| 06/25/2014 | EP2744925A1 Reaction chamber for deposition of a semiconductor layer on the plurality substrates in batches |
| 06/25/2014 | CN203674159U 一种用于低能荷能离子减速的抛物面减速器 A low-energy energetic ion deceleration parabolic reducer |
| 06/25/2014 | CN203674158U 一种校准装置 A method of calibrating device |
| 06/25/2014 | CN203674157U 一种扫描电镜机台内部载物台结构 A scanning electron microscope stage inside the machine structure |
| 06/25/2014 | CN1965101B 磁控管溅射方法以及磁控管溅射装置 Magnetron sputtering method and a magnetron sputtering apparatus, |
| 06/25/2014 | CN103891416A 用于提供等离子流的装置 Means for providing the plasma stream |
| 06/25/2014 | CN103890899A 微波处理系统中的等离子体调谐杆 Microwave plasma processing system tuning rod |
| 06/25/2014 | CN103890898A 采用等离子体发生器处理对象的工具和方法 Plasma generator processed using tools and methods |
| 06/25/2014 | CN103890897A 用于先进等离子体能量处理系统的离子能量控制系统 Advanced plasma ion energy is used to control the energy processing system |
| 06/25/2014 | CN103890896A 扫描电子显微镜及利用它的原电子电流量的检测方法 Scanning electron microscopy and the use of electronic detection method of its original amount of current |
| 06/25/2014 | CN103890895A 具备反射电子检测功能的扫描电子显微镜 Reflection electron detection function with a scanning electron microscope |
| 06/25/2014 | CN103887139A 用于制备低介电常数材料的等离子增强化学气相沉积装置 Low dielectric constant materials for the preparation of a plasma enhanced chemical vapor deposition apparatus |
| 06/25/2014 | CN103887138A 一种刻蚀设备的边缘环 A ring edge etching equipment |
| 06/25/2014 | CN103887137A 反应腔室及具有其的等离子体设备 The reaction chamber of the plasma equipment, and has its |
| 06/25/2014 | CN103887136A 一种适用于金属干法刻蚀半导体设备的刻蚀腔室 A suitable metal etch chamber dry etching of semiconductor devices |
| 06/25/2014 | CN103887135A 离子注入系统 Ion implantation system |
| 06/25/2014 | CN103887134A 带集成探测器的电子显微镜 Electron microscope with an integrated detector |
| 06/25/2014 | CN103887133A 一种磁场增强型线性大面积离子源 One kind of large-scale magnetic field enhanced linear ion source |
| 06/25/2014 | CN103887132A 注入装置的离子源和离子注入方法 Injection device the ion source and ion implantation method |
| 06/25/2014 | CN103887131A 一种600kw气体放电电子枪及其使用方法 One kind of 600kw gas discharge electron gun and method of use |
| 06/25/2014 | CN102762762B 真空处理装置 The vacuum processing apparatus |
| 06/25/2014 | CN102479658B 等离子体处理装置及处理系统 The plasma processing apparatus and processing system |
| 06/25/2014 | CN102468155B 等离子体处理装置 The plasma processing apparatus |
| 06/25/2014 | CN102034665B 一种离子植入装置和一种通过植入氢化硼簇离子制造半导体的方法 And a method of manufacturing a semiconductor device by the implantation of boron hydride cluster ions of an ion implantation |
| 06/24/2014 | US8759802 Automated slice milling for viewing a feature |
| 06/24/2014 | US8759801 Ion implantation apparatus and ion implantation method |
| 06/24/2014 | US8759799 Charged particle beam writing apparatus and charged particle beam writing method |
| 06/24/2014 | US8759798 Ion implantation system and ion implantation method using the same |
| 06/24/2014 | US8759797 Drawing apparatus, drawing method, and method of manufacturing article |
| 06/24/2014 | US8759796 Particle beam system |
| 06/24/2014 | US8759764 On-axis detector for charged particle beam system |
| 06/24/2014 | US8759763 Method and apparatus to measure step height of device using scanning electron microscope |
| 06/24/2014 | US8759762 Method and apparatus for identifying plug-to-plug short from a charged particle microscopic image |
| 06/24/2014 | US8757873 Method of measuring the temperature of a sample carrier in a charged particle-optical apparatus |
| 06/19/2014 | WO2014093562A2 Magnetic masks for an ion implant apparatus |
| 06/19/2014 | WO2014093529A1 Temperature monitor for devices in an ion implant apparatus |
| 06/19/2014 | WO2014093527A1 Transfer chamber and method of using transfer chamber |
| 06/19/2014 | WO2014091195A1 Charged particle beam targets |
| 06/19/2014 | WO2014090389A1 Plasma source |
| 06/19/2014 | US20140168629 Drawing apparatus, and article manufacturing method |
| 06/19/2014 | US20140168628 Drawing apparatus, and method of manufacturing article |
| 06/19/2014 | US20140167614 Arc chamber with multiple cathodes for an ion source |
| 06/19/2014 | US20140167597 Cathode interface for a plasma gun and method of making and using the same |
| 06/19/2014 | US20140166896 Irradiation Installation and Control Method for Controlling Same |
| 06/19/2014 | US20140166893 Electromagnetic lens for electron beam exposure apparatus |
| 06/19/2014 | US20140166880 On-chip thin film zernike phase plate and applications thereof |
| 06/19/2014 | US20140166879 Backscatter Reduction in Thin Electron Detectors |
| 06/19/2014 | US20140166869 Charged particle beam writing method, computer-readable recording medium, and charged particle beam writing apparatus |
| 06/19/2014 | US20140166205 Process monitoring device for use in substrate process apparatus, process monitoring method and substrate processing apparatus |
| 06/19/2014 | US20140165911 Apparatus for providing plasma to a process chamber |
| 06/18/2014 | EP2743370A1 Remote arc discharge plasma assisted processes |
| 06/18/2014 | EP2743026A2 Method of processing a material-specimen |
| 06/18/2014 | EP2742334A2 Method for processing samples held by a nanomanipulator |
| 06/18/2014 | DE69428698C9 System und vorrichtung zur elektronenstrahlbehandlung während einer operation System and device for electron beam treatment during surgery |
| 06/18/2014 | DE102013113476A1 Elektromagnetische Linse für ein Elektronenstrahl-Belichtungsgerät Electromagnetic lens for an electron beam exposure apparatus |