| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 12/27/2002 | WO2002104085A2 A closed-drift hall effect plasma vacuum pump for process reactors |
| 12/27/2002 | WO2002103765A1 Electron beam exposure apparatus, electron beam exposing method, semiconductor manufacturing method, and electron beam shape measuring method |
| 12/27/2002 | WO2002103764A1 Electron beam exposure system |
| 12/27/2002 | WO2002103745A1 Ion momentum transfer plasma pump |
| 12/27/2002 | WO2002103744A1 Electron microscope and its focal point control method |
| 12/27/2002 | WO2002103337A2 Electron beam apparatus and method for using said apparatus |
| 12/27/2002 | WO2002103079A1 Plasma cvd apparatus |
| 12/27/2002 | WO2002103078A1 Method and apparatus for plasma generation |
| 12/27/2002 | WO2002103077A1 Device for vacuum metallising large surfaces by plasma activation |
| 12/27/2002 | WO2002090615A9 Duo-step plasma cleaning of chamber residues |
| 12/27/2002 | WO2002089702A3 Method and system for improving the effectiveness of artificial joints by the application of gas cluster ion beam technology |
| 12/27/2002 | WO2002037529A3 Pulsed sputtering with a small rotating magnetron |
| 12/27/2002 | WO2002003763A3 Vacuum plasma processor apparatus and method |
| 12/26/2002 | US20020198682 Method and apparatus for determining end-point in a chamber cleaning process |
| 12/26/2002 | US20020197877 Plasma treating apparatus, plasma treating method and method of manufacturing semiconductor device |
| 12/26/2002 | US20020197416 Gas jet deposition with multiple ports |
| 12/26/2002 | US20020195950 Barrier coatings produced by atmospheric glow discharge |
| 12/26/2002 | US20020195570 Electron beam patterning with a heated electron source |
| 12/26/2002 | US20020195336 System for unbalanced magnetron sputtering with AC power |
| 12/26/2002 | US20020195332 For vacuum coating articles; employs a drum work holder and a sputter source with plurality of individually controlled anodes for providing uniform coatings on articles disposed at different locations on drum work holder |
| 12/26/2002 | US20020195202 Electrode member for plasma treating apparatus, plasma treating apparatus and plasma treating method |
| 12/26/2002 | US20020194938 Sample holder and auxiliary apparatus |
| 12/25/2002 | CN1387672A Particle beam processing apparatus |
| 12/25/2002 | CN1097301C Method and apparatus for in situ removal of contaminants from ion beam neutralization and implantation apparatuses |
| 12/24/2002 | US6498349 Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital E-beam direct write lithography and scanning electron microscopy |
| 12/24/2002 | US6498348 Apparatus and method relating to charged particles |
| 12/24/2002 | US6498345 Particle beam device |
| 12/24/2002 | US6498045 Optical intensity modifier |
| 12/24/2002 | US6497803 Unbalanced plasma generating apparatus having cylindrical symmetry |
| 12/24/2002 | US6497802 Self ionized plasma sputtering |
| 12/24/2002 | US6497797 A wear profile for a sputtering target surface is determined, corresponding to shape of the target surface after it is subjected to having material sputtered therefrom; to determine maximum anticipated lifetime of the target |
| 12/24/2002 | US6497796 Apparatus and method for controlling plasma uniformity across a substrate |
| 12/24/2002 | US6497783 Plasma processing apparatus provided with microwave applicator having annular waveguide and processing method |
| 12/24/2002 | US6497744 Apparatus and method for generating indium ion beam |
| 12/24/2002 | US6497194 Focused particle beam systems and methods using a tilt column |
| 12/19/2002 | WO2002101802A1 Electron beam exposure system, electron beam exposing method, and method for fabricating semiconductor element |
| 12/19/2002 | WO2002101785A1 Magnetron atomisation source |
| 12/19/2002 | WO2002101784A1 Plasma processor |
| 12/19/2002 | WO2002101116A1 Method of and apparatus for tailoring an etch profile |
| 12/19/2002 | WO2002101113A1 Method and device for treating a substrate |
| 12/19/2002 | WO2002086932B1 Magnetic mirror plasma source |
| 12/19/2002 | WO2002078407A3 Neutral particle beam processing apparatus |
| 12/19/2002 | WO2002078040A3 Neutral particle beam processing apparatus |
| 12/19/2002 | WO2002011187A3 Method and apparatus for depositing a tantalum-containing layer on a substrate |
| 12/19/2002 | US20020192984 Method for manufacturing semiconductor device, method for processing substrate, and substrate processing apparatus |
| 12/19/2002 | US20020192971 Plasma processing apparatus and processing method using the same, and manufacturing method of semiconductor device |
| 12/19/2002 | US20020192359 System for automatic control of the wall bombardment to control wall deposition |
| 12/19/2002 | US20020190657 Wafer area pressure control for plasma confinement |
| 12/19/2002 | US20020190219 Resolution enhancement device for an optically-coupled image sensor using high extra-mural absorbent fiber |
| 12/19/2002 | US20020190218 Method and apparatus for simultaneously depositing and observing materials on a target |
| 12/19/2002 | US20020190207 Methods and systems for determining a characteristic of micro defects on a specimen |
| 12/19/2002 | US20020189939 Alternating current rotatable sputter cathode |
| 12/19/2002 | US20020189938 System and method for performing sputter deposition with multiple targets using independent ion and electron sources and independent target biasing with DC pulse signals |
| 12/19/2002 | US20020189763 Plasma processing apparatus having parallel resonance antenna for very high frequency |
| 12/19/2002 | US20020189762 Semiconductor decive fabricating equipment using radio frequency energy |
| 12/19/2002 | US20020189761 Use of pulsed grounding source in a plasma reactor |
| 12/19/2002 | US20020189760 Ashing apparatus for semiconductor device |
| 12/19/2002 | US20020189759 Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor |
| 12/19/2002 | US20020189544 Use of pulsed grounding source in a plasma reactor |
| 12/19/2002 | DE10223533A1 Ionenimplantiervorrichtung An ion implanter |
| 12/18/2002 | EP1267392A1 Electron beam lithography device and drawing method using electron beams |
| 12/18/2002 | EP1267384A2 Graphite target |
| 12/18/2002 | EP1266412A1 Method and device for transferring spin-polarized charge carriers |
| 12/18/2002 | EP1266392A2 System for imaging a cross-section of a substrate |
| 12/18/2002 | EP1266046A1 Method and implementing device for a chemical reaction |
| 12/18/2002 | EP1046186B1 Plasma treatment for producing electron emitters |
| 12/18/2002 | EP0914495B1 Target arrangement with a circular disk |
| 12/18/2002 | EP0840551B1 Microwave cvd method for deposition of robust barrier coatings |
| 12/18/2002 | CN1385872A Method for preparing solid strong acid by intermediate hole molecular sieve |
| 12/17/2002 | US6495963 Inductive coil assembly having multiple coil segments for plasma processing apparatus |
| 12/17/2002 | US6495842 Implantation of the radioactive 32P atoms |
| 12/17/2002 | US6495841 Charged beam drawing apparatus |
| 12/17/2002 | US6495840 Ion-implanting method and ion-implanting apparatus |
| 12/17/2002 | US6495838 Sample heating holder, method of observing a sample and charged particle beam apparatus |
| 12/17/2002 | US6495826 Monochrometer for electron beam |
| 12/17/2002 | US6495233 Apparatus for distributing gases in a chemical vapor deposition system |
| 12/17/2002 | US6495216 Evaporator can be rotated about the main axis of a bore to allow the evaporation point to be adapted to various vapor coating conditions and substrate shapes without removing connections and connecting lines |
| 12/17/2002 | US6495009 Auxiliary in-plane magnet inside a nested unbalanced magnetron |
| 12/17/2002 | US6495002 Vacuum arc deposition, includes a vacuum chamber, a cathode comprised of an electrically conductive ceramic material to be deposited on a substrate, an electrically insulating member about the cathode, a heater for preheating the cathode to a |
| 12/17/2002 | US6495000 System and method for DC sputtering oxide films with a finned anode |
| 12/17/2002 | US6494999 A sputtering target assembly, and an adjustable magnetron assembly. the sputtering target assembly includes heating/cooling passages within the sputtering target assembly. a first side of a heat exchanger/pressure relieving |
| 12/17/2002 | US6494998 Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma using an internal inductive element |
| 12/17/2002 | US6494986 Externally excited multiple torroidal plasma source |
| 12/17/2002 | US6494958 Plasma chamber support with coupled electrode |
| 12/17/2002 | US6494100 Circuit and apparatus for verifying a chamber seal, and method of depositing a material onto a substrate using the same |
| 12/12/2002 | WO2002099943A2 Conduction assembly for a cathode of an arc evaporation device |
| 12/12/2002 | WO2002099863A1 Plasma processing device |
| 12/12/2002 | WO2002099856A1 Electron beam exposure-use mask and electron beam exposure method |
| 12/12/2002 | WO2002099841A1 High performance magnetron for dc sputtering systems |
| 12/12/2002 | WO2002099840A2 Inductively-coupled plasma processing system |
| 12/12/2002 | WO2002099839A2 Wafer bias drive for a plasma source |
| 12/12/2002 | WO2002099838A1 Particle contamination cleaning from substrates using plasmas, reactive gases, and mechanical agitation |
| 12/12/2002 | WO2002099837A1 Arc deposition device |
| 12/12/2002 | WO2002099160A1 Gas port sealing for cvd/cvi furnace hearth plates |
| 12/12/2002 | WO2002099152A1 Electric arc evaporator |
| 12/12/2002 | WO2002086937B1 Dipole ion source |
| 12/12/2002 | WO2002083975A9 Apparatus and method for epitaxial sputter deposition of epilayers and high quality films |
| 12/12/2002 | WO2002078041A3 Neutral particle beam processing apparatus |
| 12/12/2002 | WO2002058103A3 In situ ion beam incidence angle and beam divergence monitor |
| 12/12/2002 | WO2002057507A3 Method for making a film by pulsed laser ablation |