| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/09/2003 | US20030006009 Process chamber having a voltage distribution electrode |
| 01/09/2003 | US20030006008 Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor |
| 01/09/2003 | US20030005943 Introducing a fluorine containing gaseous mixture into a processing chamber, creating plasma, and pressurizing the chamber to a threshold ion energy to clean the inner surfaces of the chamber without leaving a residue |
| 01/09/2003 | US20030005879 Method for producing coated workpieces, uses and installation for the method |
| 01/08/2003 | EP1274114A2 Observation apparatus and observation method using an electron beam |
| 01/08/2003 | EP1274113A1 Arrangement and method for detecting sidewall flaking in a plasma chamber |
| 01/08/2003 | EP1273907A1 Wafer inspecting method, wafer inspecting instrument, and electron beam apparatus |
| 01/08/2003 | EP1273028A2 Method and apparatus for magnetron sputtering |
| 01/08/2003 | EP1273027A1 Reaction chamber with at least one hf feedthrough |
| 01/08/2003 | EP1273026A2 Plasma energy control by inducing plasma instability |
| 01/08/2003 | EP1273025A1 Method and device for plasma-treating the surface of substrates by ion bombardment |
| 01/08/2003 | EP1273024A2 Bi-directional electron beam scanning apparatus |
| 01/08/2003 | EP1272683A1 Dlc layer system and method for producing said layer system |
| 01/08/2003 | EP1097253B1 Ion energy attenuation |
| 01/08/2003 | EP0919066B1 Magnetron |
| 01/08/2003 | EP0910686B1 Temperature controlling method and apparatus for a plasma processing chamber |
| 01/07/2003 | US6504307 Application of variable bias voltage on a cylindrical grid enclosing a target |
| 01/07/2003 | US6504294 Method and apparatus for deposition of diamond-like carbon and silicon-doped diamond-like carbon coatings from a hall-current ion source |
| 01/07/2003 | US6504164 Electron beam apparatus |
| 01/07/2003 | US6504160 Stage device for an exposure apparatus and semiconductor device manufacturing method which uses said stage device |
| 01/07/2003 | US6504159 SOI plasma source ion implantation |
| 01/07/2003 | US6504126 Radio frequency |
| 01/07/2003 | US6503816 Thin film formation by inductively-coupled plasma CVD process |
| 01/07/2003 | US6503672 Lithography; higher current for faster patterning; imaging/ resolution; semiconductors |
| 01/07/2003 | US6503671 Lithography system for accomplishing a smaller size and higher performance of a semiconductor device |
| 01/07/2003 | US6503579 Plasma CVD method, plasma CVD apparatus, and electrode |
| 01/07/2003 | US6503410 Method of modifying an RF circuit of a plasma chamber to increase chamber life and process capabilities |
| 01/07/2003 | US6503367 Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma |
| 01/07/2003 | US6503364 Plasma processing apparatus |
| 01/07/2003 | US6503351 Use of a cleaning process, a cleaning process, a connection process and a workpiece pair |
| 01/07/2003 | US6503331 Tungsten chamber with stationary heater |
| 01/07/2003 | US6503118 Multi-functional vacuum processing apparatus |
| 01/07/2003 | US6502530 Design of gas injection for the electrode in a capacitively coupled RF plasma reactor |
| 01/07/2003 | US6502529 Chamber having improved gas energizer and method |
| 01/03/2003 | WO2003001578A1 Microwave plasma processing device, plasma processing method, and microwave radiating member |
| 01/03/2003 | WO2003001560A1 Device for amplifying the current of an abnormal electrical discharge and system for using an abnormal electrical discharge comprising one such device |
| 01/03/2003 | WO2003001559A1 Erosion-resistant components for plasma process chambers |
| 01/03/2003 | WO2003001558A1 Plasma treating apparatus |
| 01/03/2003 | WO2003001557A1 Electrode member for plasma treating apparatus, plasma treating apparatus and plasma treating method |
| 01/03/2003 | WO2003001219A2 Field ionizing elements and applications thereof |
| 01/03/2003 | WO2003000952A1 Gas jet deposition apparatus |
| 01/02/2003 | US20030003684 Method and apparatus for multi-frequency bonding |
| 01/02/2003 | US20030003607 Disturbance-free, recipe-controlled plasma processing system and method |
| 01/02/2003 | US20030003375 Block mask making method, block mask and exposure apparatus |
| 01/02/2003 | US20030003244 Staggered in-situ deposition and etching of a dielectric layer for HDP CVD |
| 01/02/2003 | US20030001528 Ion implanting system |
| 01/02/2003 | US20030001511 Plasma excitation coil |
| 01/02/2003 | US20030001111 Apparatus for monitoring ion-implantation input parameter in semiconductor fabricating devices and monitoring method thereof |
| 01/02/2003 | US20030001110 System and method for amplifying an angle of divergence of a scanned ion beam |
| 01/02/2003 | US20030001109 Focused ion beam equipment and focused ion beam processing method using same |
| 01/02/2003 | US20030001108 Particle beam processing apparatus and materials treatable using the apparatus |
| 01/02/2003 | US20030001102 Method for detecting geometrical-optical abberations |
| 01/02/2003 | US20030001095 Method and apparatus for multiple charged particle beams |
| 01/02/2003 | US20030000924 Apparatus and method of gas injection sequencing |
| 01/02/2003 | US20030000921 Mask repair with electron beam-induced chemical etching |
| 01/02/2003 | US20030000827 System for chemical vapor deposition at ambient temperature using electron cyclotron resonance and method for depositing metal composite film using the same |
| 01/02/2003 | US20030000648 Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates |
| 01/02/2003 | US20030000646 Plasma reactor |
| 01/02/2003 | US20030000644 Using scatterometry for etch end points for dual damascene process |
| 01/02/2003 | US20030000546 Plasma cleaning of deposition chamber residues using duo-step wafer-less auto clean method |
| 01/02/2003 | US20030000459 Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates |
| 01/02/2003 | EP1272015A1 Cyclotron resonance device for the generation of ions with variable positive charge |
| 01/02/2003 | EP1272014A1 Plasma power supply having a protection circuit |
| 01/02/2003 | EP1271607A2 Chemical vapor deposition apparatus and method |
| 01/02/2003 | EP1271606A1 Electron beam apparatus and device production method using the apparatus |
| 01/02/2003 | EP1271605A1 Electron beam apparatus and method for manufacturing semiconductor device comprising the apparatus |
| 01/02/2003 | EP1271604A1 Inspection apparatus and inspection method with electron beam, and device manufacturing method comprising the inspection apparatus |
| 01/02/2003 | EP1271603A1 Scanning electron microscope |
| 01/02/2003 | EP1271502A2 Electron beam recorder and method thereof |
| 01/02/2003 | EP1270095A2 Method of monitoring a pretreatment with a plasma jet |
| 01/02/2003 | EP1269803A2 Plasma accelerator arrangement |
| 01/02/2003 | EP1269516A2 Method and apparatus for forming inner magnetic bucket to control a volume of a plasma |
| 01/02/2003 | EP1269515A2 Method and apparatus for varying a magnetic field to control a volume of a plasma |
| 01/02/2003 | EP1269514A2 An enhanced resist strip in a dielectric etcher using downstream plasma |
| 01/02/2003 | EP1269513A2 Inductively coupled plasma etching apparatus |
| 01/02/2003 | EP1269512A2 Apparatus and methods for actively controlling rf peak-to-peak voltage in an inductively coupled plasma etching system |
| 01/02/2003 | EP1269511A2 Plasma reactor with overhead rf electrode tuned to the plasma |
| 01/02/2003 | EP1269165A2 Integrated full wavelength spectrometer for wafer processing |
| 01/02/2003 | EP1268885A1 Method and apparatus for large-scale diamond polishing |
| 01/02/2003 | EP1197124A4 Method and apparatus for forming polycrystalline particles |
| 01/02/2003 | EP0954875B1 Modulator for plasma-immersion ion implantation |
| 01/01/2003 | CN1097491C Plasma processing method and method for cleaning plasma processing system |
| 12/31/2002 | US6501083 Methods for calculating cumulative dose of exposure energy from regions of a microlithography reticle for use in correcting proximity effects |
| 12/31/2002 | US6501082 Plasma deposition apparatus and method with controller |
| 12/31/2002 | US6501081 Electron flood apparatus for neutralizing charge build up on a substrate during ion implantation |
| 12/31/2002 | US6501080 Ion implanting apparatus and sample processing apparatus |
| 12/31/2002 | US6501078 Ion extraction assembly |
| 12/31/2002 | US6501077 Scanning electron microscope |
| 12/31/2002 | US6500742 Construction of a film on a semiconductor wafer |
| 12/31/2002 | US6500496 Increasing throughput and uniformity of ion implantations in target wafers using pulsed plasma processing system |
| 12/31/2002 | US6500389 Plasma arcing sensor |
| 12/31/2002 | US6500321 Control of erosion profile and process characteristics in magnetron sputtering by geometrical shaping of the sputtering target |
| 12/31/2002 | US6500315 Physical vapor deposition chamber with electrically isolated coil and shield; increasing power while preventing overheating |
| 12/31/2002 | US6500314 Precise control and increased density range of the plasma |
| 12/31/2002 | US6500300 Plasma reactor |
| 12/31/2002 | US6500299 Chamber having improved gas feed-through and method |
| 12/31/2002 | US6499492 Plasma process apparatus with in situ monitoring, monitoring method, and in situ residue cleaning |
| 12/31/2002 | US6499427 Plasma CVD apparatus |
| 12/31/2002 | US6499425 Quasi-remote plasma processing method and apparatus |
| 12/31/2002 | US6499424 Plasma processing apparatus and method |