| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/23/2003 | US20030015292 Apparatus for fabricating a semiconductor device |
| 01/23/2003 | US20030015291 Semiconductor device fabrication apparatus having multi-hole angled gas injection system |
| 01/23/2003 | US20030015287 Inner wall protection member for chamber and plasma procressing apparatus |
| 01/23/2003 | US20030015137 Chemical vapor deposition apparatus and chemical vapor deposition method |
| 01/22/2003 | EP1277223A2 Highly efficient compact capacitance coupled plasma reactor/generator and method |
| 01/22/2003 | EP1277222A1 Uniform charged particle exposure device and method using translatable stage and faraday cup |
| 01/22/2003 | EP1277221A1 Electron/ion gun for electron or ion beams with high monochromasy or high current density |
| 01/22/2003 | CN1392754A Plasma processing device with very-high frequency parallel resonance antenna |
| 01/22/2003 | CN1392595A Chemical vapor deposition equipment and chemical vapor deposition method |
| 01/22/2003 | CN1392415A Powder included water elutrating instrument and its operation process |
| 01/21/2003 | US6509960 Generating signal indicative of intensity of emanated light |
| 01/21/2003 | US6509750 Apparatus for detecting defects in patterned substrates |
| 01/21/2003 | US6509572 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 01/21/2003 | US6509570 Gallium ion source |
| 01/21/2003 | US6509569 Deflection arrangement for separating two particle beams |
| 01/21/2003 | US6509568 Electrostatic deflector for electron beam exposure apparatus |
| 01/21/2003 | US6509564 Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application method |
| 01/21/2003 | US6509542 Voltage control sensor and control interface for radio frequency power regulation in a plasma reactor |
| 01/21/2003 | US6509276 Focused ion beam etching of copper with variable pixel spacing |
| 01/21/2003 | US6509127 Method of electron-beam exposure |
| 01/21/2003 | US6508990 In situ monitoring and controlling removal of contaminants from semiconductor surface using infrared radiation |
| 01/21/2003 | US6508911 Diamond coated parts in a plasma reactor |
| 01/21/2003 | US6508199 Plasma processing apparatus |
| 01/21/2003 | US6508198 Automatic tuning in a tapped RF transformer inductive source of a plasma reactor for processing a semiconductor wafer |
| 01/16/2003 | WO2003005407A2 Arrangement and method for detecting sidewall flaking in a plasma chamber |
| 01/16/2003 | WO2003005406A1 Plasma pump with inter-stage plasma source |
| 01/16/2003 | WO2002095381A3 Tandem microchannel plate and solid state electron detector |
| 01/16/2003 | WO2002061797A3 Icp window heater integrated with faraday shield or floating electrode between the source power coil and the icp window |
| 01/16/2003 | WO2002043104A3 Hybrid scanning system and methods for ion implantation |
| 01/16/2003 | WO2002041353A3 Magnetic scanning system with a nonzero field |
| 01/16/2003 | US20030013315 Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates |
| 01/16/2003 | US20030012890 Method for producing a plasma by microwave irradiation |
| 01/16/2003 | US20030011786 Methods and systems for determining overlay and flatness of a specimen |
| 01/16/2003 | US20030010937 Pattern generation method and apparatus using cached cells of hierarchical data |
| 01/16/2003 | US20030010936 Optically detectable alignment marks producing an enhanced signal-amplitude change from scanning of a detection light over the alignment mark, and associated alighment-detection methods |
| 01/16/2003 | US20030010935 Stage assembly having a follower assembly |
| 01/16/2003 | US20030010934 Lens array for electron beam lithography tool |
| 01/16/2003 | US20030010933 Mark-detection methods and charged-particle-beam microlithography methods and apparatus comprising same |
| 01/16/2003 | US20030010926 Particle beam apparatus for tilted observation of a specimen |
| 01/16/2003 | US20030010915 Emission electron microscope |
| 01/16/2003 | US20030010914 Method for determining depression/protrusion of sample and charged particle beam apparatus therefor |
| 01/16/2003 | US20030010913 Detector for a scanning electron microscope with variable pressure and scanning electron microscope with such detector |
| 01/16/2003 | US20030010750 Method for determining the endpoint of etch process steps |
| 01/16/2003 | US20030010747 Method and device for plasma-treating the surface of substrates by ion bombardment |
| 01/16/2003 | US20030010454 Method and apparatus for varying a magnetic field to control a volume of a plasma |
| 01/16/2003 | US20030010453 Plasma processing apparatus and plasma processing method |
| 01/16/2003 | US20030010448 Exhaust ring of dry etching device |
| 01/16/2003 | US20030010447 Aperture for linear control of vacuum chamber pressure |
| 01/16/2003 | US20030010355 Local and remote gas dissociators coupled to a semiconductor processing chamber |
| 01/15/2003 | EP1276356A1 Apparatus for plasma processing |
| 01/15/2003 | EP1276134A2 A method for determining depression/protrusion of sample and charged particle beam apparatus therefor |
| 01/15/2003 | EP1276031A1 Gas delivery metering tube |
| 01/15/2003 | EP1275133A1 Device and method for the etching of a substrate by means of an inductively coupled plasma |
| 01/15/2003 | EP1274876A2 Cleaning of a plasma processing system silicon roof |
| 01/15/2003 | EP1274875A2 Method and apparatus for providing uniform gas delivery to substrates in cvd and pecvd processes |
| 01/15/2003 | EP1144989B1 Nanotomography |
| 01/15/2003 | EP1012587B1 Charged particle analysis |
| 01/14/2003 | US6507473 Low voltage modular room ionization system |
| 01/14/2003 | US6507155 Inductively coupled plasma source with controllable power deposition |
| 01/14/2003 | US6507149 Plasma cell |
| 01/14/2003 | US6507034 Charge beam exposure apparatus, charge beam exposure method, and charge beam exposure mask |
| 01/14/2003 | US6507033 Versatile, high-sensitivity faraday cup array for ion implanters |
| 01/14/2003 | US6507029 Sample processing apparatus and method for removing charge on sample through light irradiation |
| 01/14/2003 | US6507027 Apparatus and methods for charged-particle-beam microlithography exhibiting reduced four-fold aberrations |
| 01/14/2003 | US6506686 Plasma processing apparatus and plasma processing method |
| 01/14/2003 | US6506685 Perforated plasma confinement ring in plasma reactors |
| 01/14/2003 | US6506312 Vapor deposition chamber components and methods of making the same |
| 01/14/2003 | US6506292 Film forming apparatus |
| 01/14/2003 | US6506290 Sputtering apparatus with magnetron device |
| 01/14/2003 | US6506287 Overlap design of one-turn coil |
| 01/14/2003 | US6506255 Apparatus for supplying gas used in semiconductor processing |
| 01/14/2003 | US6506254 Semiconductor processing equipment having improved particle performance |
| 01/09/2003 | WO2003003437A1 Method of predicting processed results and processing device |
| 01/09/2003 | WO2003003433A1 Chamber sensor port, chamber, and electron beam processor |
| 01/09/2003 | WO2003003414A2 Directed gas injection apparatus for semiconductor processing |
| 01/09/2003 | WO2003003406A1 Electron tube |
| 01/09/2003 | WO2003003405A1 Apparatus and method for radio frequency de-coupling and bias voltage control in a plasma reactor |
| 01/09/2003 | WO2003003404A2 Process chamber components having textured internal surfaces and method of manufacture |
| 01/09/2003 | WO2003003403A1 Configurable plasma volume etch chamber |
| 01/09/2003 | WO2003003402A1 Energy filter multiplexing |
| 01/09/2003 | WO2003003302A1 Three-dimensional imaging of single particles |
| 01/09/2003 | WO2003003118A2 Mask repair with electron beam-induced chemical etching |
| 01/09/2003 | WO2003002990A2 Using scatterometry to develop real time etch image |
| 01/09/2003 | WO2003002860A2 Directed gas injection apparatus for semiconductor processing |
| 01/09/2003 | WO2002093605A3 Cylinder-based plasma processing system |
| 01/09/2003 | WO2002052608A3 Charging control and dosimetry system for gas cluster ion beam |
| 01/09/2003 | US20030009233 Method and system for improving the effectiveness of artificial joints by the application of gas cluster ion beam technology |
| 01/09/2003 | US20030008503 Introducing organic gas comprising halogen into chamber, wherein organic gas forms adhesive polymers with particles and depositing polymers onto wall of chamber |
| 01/09/2003 | US20030008500 Plasma semiconductor processing system and method |
| 01/09/2003 | US20030007910 Ring shaped electrode in dielectric tube; alternating current power sources; dielectric barrier |
| 01/09/2003 | US20030007677 Method and its apparatus for inspecting a pattern |
| 01/09/2003 | US20030007444 Electron beam recorder and method thereof |
| 01/09/2003 | US20030006708 Microwave ion source |
| 01/09/2003 | US20030006381 Method and apparatus for pyroelectric lithography using patterned emitter |
| 01/09/2003 | US20030006377 Tandem acceleration electrostatic lens |
| 01/09/2003 | US20030006373 Observation apparatus and observation method using an electron beam |
| 01/09/2003 | US20030006372 Automatic focusing system for scanning electron microscope equipped with laser defect detection function |
| 01/09/2003 | US20030006371 Charged-particle beam apparatus and method for automatically correcting astigmatism of charged-particle beam apparatus |
| 01/09/2003 | US20030006130 Non-conductive hollow substrate material inside of which a plasma is generated from a process gas by producing a magnetic field perpendicular to a driection of a substrate depth |
| 01/09/2003 | US20030006019 Electrically controlled plasma uniformity in a high density plasma source |