| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/20/2003 | US20030036285 Etching methods, etching apparatus and methods for fabricating semiconductor devices |
| 02/20/2003 | US20030036272 Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas |
| 02/20/2003 | US20030035599 Friction-drive stage |
| 02/20/2003 | US20030034773 Calibration method for magnetically enhanced reactive ion etcher |
| 02/20/2003 | US20030034741 System in which a rotating body is connected to a rotary shaft in an ion implanter |
| 02/20/2003 | US20030034460 Mask pattern transfer method, mask pattern transfer apparatus using the method, and device manufacturing method |
| 02/20/2003 | US20030034457 Electron-optical corrector for eliminating third-order aberations |
| 02/20/2003 | US20030034437 Method of precision calibration of magnification of scanning microscopes with the use of test diffraction gratiing |
| 02/20/2003 | US20030034244 Sealing substrate within an enclosure; applying voltage; process control |
| 02/20/2003 | US20030034130 Plasma-resistant member for semiconductor manufacturing apparatus and method for manufacturing the same |
| 02/20/2003 | DE19681165C2 Ion implanter for implantation of ions into e.g. semiconductor substrates in electronic device mfr. |
| 02/20/2003 | DE19655209C2 Ionenimplantationsanlage mit einer Substrat-Neutralisierungsvorrichtung Ion implantation system with a substrate-neutralizing device |
| 02/20/2003 | DE19655208C2 Ion implanter for implantation of ions into substrates e.g. semiconductor wafers in electronic device mfr. |
| 02/20/2003 | DE19655205C2 Ion implanter for implantation of ions into e.g. semiconductor substrates in electronic device mfr. |
| 02/19/2003 | EP1284304A2 Apparatus for implanting an ion on a target and method for the same |
| 02/19/2003 | EP1284008A2 Sample support for mass spectrometers |
| 02/19/2003 | EP0992059B1 Toroidal low-field reactive gas source |
| 02/19/2003 | EP0986092B1 Electron multiplier |
| 02/19/2003 | EP0870316B1 Composite concentric-gap magnetic lens and deflector with conical pole pieces |
| 02/19/2003 | EP0826229B1 Electrode clamping assembly and method for assembly and use thereof |
| 02/19/2003 | CN1398505A Methods and appts. for operating high energy accelerator in low energy mode |
| 02/19/2003 | CN1397755A Gas transportation metering tube |
| 02/18/2003 | US6522121 Broadband design of a probe analysis system |
| 02/18/2003 | US6522076 Process and switching arrangement for pulsing energy introduction into magnetron discharges |
| 02/18/2003 | US6522056 Method and apparatus for simultaneously depositing and observing materials on a target |
| 02/18/2003 | US6521903 Deflection noise reduction in charged particle beam lithography |
| 02/18/2003 | US6521901 System to reduce heat-induced distortion of photomasks during lithography |
| 02/18/2003 | US6521900 Alignment marks for charged-particle-beam microlithography, and alignment methods using same |
| 02/18/2003 | US6521896 Blanker assembly employing dielectric material |
| 02/18/2003 | US6521895 Wide dynamic range ion beam scanners |
| 02/18/2003 | US6521891 Focusing method and system |
| 02/18/2003 | US6521890 Focused ion beam machining method and focused ion beam machining apparatus |
| 02/18/2003 | US6521392 Methods for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical system |
| 02/18/2003 | US6521302 Method of reducing plasma-induced damage |
| 02/18/2003 | US6521106 Collimated deposition apparatus |
| 02/18/2003 | US6521105 Discharge is stable and film deposition speed and film thickness distribution are uniform even when a plurality of dielectric films are formed consecutively by using an opposing electrode, held at earth potential |
| 02/18/2003 | US6521104 Configurable vacuum system and method |
| 02/18/2003 | US6521082 Magnetically enhanced plasma apparatus and method with enhanced plasma uniformity and enhanced ion energy control |
| 02/18/2003 | US6521046 Chamber material made of Al alloy and heater block |
| 02/18/2003 | US6521010 Filter, filtering frame, and semiconductor device manufacturing method and apparatus |
| 02/13/2003 | WO2003013198A1 Antenna structure for inductively coupled plasma generator |
| 02/13/2003 | WO2003012847A1 Semiconductor production apparatus monitoring method and control method |
| 02/13/2003 | WO2003012822A1 Phase retrieval from focused and defocused electron beam images |
| 02/13/2003 | WO2003012821A2 Method and apparatus for producing uniform process rates |
| 02/13/2003 | WO2003012567A1 Plasma chamber wall segment temperature control |
| 02/13/2003 | WO2003012551A1 Electron beam processing |
| 02/13/2003 | WO2003012160A1 High frequency ion plating vapor deposition system |
| 02/13/2003 | WO2003011696A1 Device for forming carbon film on inner surface of plastic vessel, and method of producing inner surface carbon film coated plastic vessel |
| 02/13/2003 | WO2002092871A3 Device and method for coating and/or treating the surfaces of substrates using low-pressure plasma |
| 02/13/2003 | WO2002057506A3 Low contamination plasma chamber components and methods for making the same |
| 02/13/2003 | WO2002045124A3 Measurement device with remote adjustment of electron beam stigmation by using mosfet ohmic properties and isolation devices |
| 02/13/2003 | US20030032301 Showerhead electrode design for semiconductor processing reactor |
| 02/13/2003 | US20030032207 Method and apparatus for process monitoring |
| 02/13/2003 | US20030031961 Dual-focused ion beams for semiconductor image scanning and mask repair |
| 02/13/2003 | US20030031941 Multiple pass write method and reticle |
| 02/13/2003 | US20030030016 Reticles and rapid reticle-evaluation methods for use in charged-particle-beam microlithography |
| 02/13/2003 | US20030030014 Lithography system comprising a converter platc and means for protecting the converter plate |
| 02/13/2003 | US20030030013 Apparatus for implanting an ion on a target and method for the same |
| 02/13/2003 | US20030030010 Decaborane vaporizer having improved vapor flow |
| 02/13/2003 | US20030030009 Ion beam processing apparatus and method of operating ion source therefor |
| 02/13/2003 | US20030030008 Charged particle beam control system and charge partical beam optical apparatus using the system |
| 02/13/2003 | US20030030007 Charged particle beam control apparatus |
| 02/13/2003 | US20030030006 Method and apparatus for avoiding driver gas contamination in an ion implanter gas supply module |
| 02/13/2003 | US20030029998 Electron beam length measuring instrument and length measuring method |
| 02/13/2003 | US20030029837 Dielectric etch plasma chamber utilizing a magnetic filter to optimize plasma characteristics |
| 02/13/2003 | US20030029834 Method and apparatus for monitoring and controlling wafer fabrication process |
| 02/13/2003 | US20030029716 Uses quarter wavelength antenna and electron cyclotron resonance magnets to enhance the plasma density to improve the qulaity |
| 02/13/2003 | US20030029568 Pedestal with integral shield |
| 02/13/2003 | US20030029567 Dual frequency plasma processor |
| 02/13/2003 | US20030029566 Remote exposure of workpieces using a plasma |
| 02/13/2003 | US20030029565 Method and apparatus for processing semiconductor substrates |
| 02/13/2003 | US20030029564 Pedestal with integral shield |
| 02/13/2003 | US20030029563 Corrosion resistant coating for semiconductor processing chamber |
| 02/12/2003 | EP1282909A1 Enhanced electron emissive surfaces for a thin film deposition system using ion sources |
| 02/12/2003 | EP0984865B1 Diamond marking |
| 02/12/2003 | CN1397151A Plasma processing system and method |
| 02/12/2003 | CN1101593C Method and apparatus for ion beam formation in ion implanter |
| 02/11/2003 | US6518705 An antenna arrangement for generating an electric field inside a process chamber is provided. Generally, the antenna arrangement comprises a first loop disposed around an antenna axis. The first loop with a gap and the second turn is |
| 02/11/2003 | US6518582 Electron beam apparatus, and inspection instrument and inspection process thereof |
| 02/11/2003 | US6518190 Plasma reactor with dry clean apparatus and method |
| 02/11/2003 | US6518150 Method of manufacturing semiconductor device |
| 02/11/2003 | US6517913 Pumping etching exhaust gases from processing chamber to fluid conduit containing oxidizing agent; forming a plasma for conversion to less hazardous gaseous products and byproducts |
| 02/11/2003 | US6517670 Etching and cleaning apparatus |
| 02/11/2003 | US6517669 Apparatus and method of detecting endpoint of a dielectric etch |
| 02/11/2003 | US6516742 Apparatus for improved low pressure inductively coupled high density plasma reactor |
| 02/06/2003 | WO2003010809A1 Plasma treating device and substrate mounting table |
| 02/06/2003 | WO2003010799A2 Plasma ashing process |
| 02/06/2003 | WO2003010792A1 Method of measuring the performance of a scanning electron microscope |
| 02/06/2003 | WO2003010605A2 Pattern generation method and apparatus using cached cells of hierarchical data |
| 02/06/2003 | WO2003010517A1 Method and apparatus for monitoring the condition of plasma equipment |
| 02/06/2003 | WO2002069380A3 Atomically thin highly resistive barrier layer in a copper via |
| 02/06/2003 | WO2002052609A3 Compact beamline and ion implanter system using same |
| 02/06/2003 | WO2002021565A3 Apparatus for magnetically scanning and/or switching a charged-particle beam |
| 02/06/2003 | WO2002009198A9 Etching apparatus having a confinement and guide object for gas flow of plasma and method for using same |
| 02/06/2003 | US20030027428 Bypass set up for integration of remote optical endpoint for CVD chamber |
| 02/06/2003 | US20030027064 Exposure method for correcting dimension variation in electron beam lithography, and recording medium for recording the same |
| 02/06/2003 | US20030027058 For producing integrated circuit |
| 02/06/2003 | US20030026920 Generating plasma in vacuum; controlling distribution |
| 02/06/2003 | US20030026917 Process chamber components having textured internal surfaces and method of manufacture |
| 02/06/2003 | US20030025451 Gas discharge tube and method for forming electron emission layer in gas discharge tube |