Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
03/2003
03/06/2003US20030042130 Target for magnetron sputtering; generating, controlling magnetism; circulating tunnel loop
03/06/2003US20030041972 Plasma processing apparatus
03/06/2003US20030041806 PCVD apparatus and a method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith
03/06/2003US20030041805 Apparatus for improved low pressure inductively coupled high density plasma reactor
03/06/2003US20030041804 HDP-CVD apparatus
03/05/2003EP1289003A1 Plasma processing apparatus
03/05/2003EP1288996A1 Particle beam apparatus
03/05/2003EP1288862A2 Image evaluation method and microscope
03/05/2003EP1287549A1 An apparatus and a method for forming a pattern using a crystal structure of material
03/05/2003EP1287548A1 Plasma etching equipment
03/05/2003EP1287546A1 Plasma etching system
03/05/2003EP1287545A2 Configurable vacuum system and method
03/05/2003EP1287544A1 Method and apparatus for controlling ion implantation during vacuum fluctuation
03/05/2003EP1287543A2 Through-the-lens sample neutralizing electron beam for focused ion beam system
03/05/2003CN1401070A Electron beam length measuring instrument and length measuring method
03/05/2003CN1102801C Method and apparatus for plasma processing
03/04/2003US6528949 Apparatus for elimination of plasma lighting inside a gas line in a strong RF field
03/04/2003US6528947 Hollow cathode array for plasma generation
03/04/2003US6528806 Charged-particle-beam microlithography apparatus, reticles, and methods for reducing proximity effects, and device-manufacturing methods comprising same
03/04/2003US6528805 Dose monitor for plasma doping system
03/04/2003US6528804 Method and apparatus for low energy ion implantation
03/04/2003US6528799 Device and method for suppressing space charge induced aberrations in charged-particle projection lithography systems
03/04/2003US6528798 Technique for manufacturing an electrostatic element for steering a charged particle beam
03/04/2003US6528787 Scanning electron microscope
03/04/2003US6528786 Analysis of semiconductor surfaces by secondary ion mass spectrometry and methods
03/04/2003US6528752 Plasma processing apparatus and plasma processing method
03/04/2003US6528751 Plasma reactor with overhead RF electrode tuned to the plasma
03/04/2003US6528435 Plasma processing
03/04/2003US6527967 Thin piece forming method
03/04/2003US6527927 Vacuum treatment system
03/04/2003US6527918 Method and apparatus for low voltage plasma doping using dual pulses
03/04/2003US6527912 Stacked RF excitation coil for inductive plasma processor
03/04/2003US6527911 Configurable plasma volume etch chamber
03/04/2003US6527910 Staggered in-situ deposition and etching of a dielectric layer for HDP-CVD
03/04/2003US6527909 Plasma processing apparatus
03/04/2003US6527908 Plasma process apparatus
03/04/2003US6526910 Apparatus and method for forming a deposited film by means of plasma CVD
03/04/2003US6526909 Biased ion beam deposition of high density carbon
02/2003
02/27/2003WO2003017738A1 Large-area plasma antenna(lapa) and plasma source for making uniform plasma
02/27/2003WO2003017737A2 Cascade arc plasma and abrasion resistant coatings made therefrom
02/27/2003WO2003017318A1 Plasma reactor with adjustable dual frequency voltage division
02/27/2003WO2003017317A1 Lithography system comprising a protected converter plate
02/27/2003WO2002091461A3 Ionized pvd with sequential deposition and etching
02/27/2003WO2002069364A3 Magnetic field for small closed-drift thruster
02/27/2003US20030040199 Photo-assisted remote plasma apparatus and method
02/27/2003US20030039951 Apparatus and process for controlling the temperature of a substrate in a plasma reactor
02/27/2003US20030039386 Image evaluation method and microscope
02/27/2003US20030038688 Device and method for coupling two circuit components which have different impedances
02/27/2003US20030038254 Slit double gap buncher and method for improved ion bunching in an ion implantation system
02/27/2003US20030038253 Method and apparatus for improved ion bunching in an ion implantation system
02/27/2003US20030038252 Shielding assembly for a semiconductor manufacturing apparatus and method of using the same
02/27/2003US20030038251 Method and apparatus for forming optical materials and devices
02/27/2003US20030038250 Process conditions change monitoring systems that use electron beams, and related monitoring methods
02/27/2003US20030038246 Helium ion generation method and apparatus
02/27/2003US20030038244 Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital e-beam direct write lithography and scanning electron microscopy
02/27/2003US20030038243 Charged-particle-beam (CPB) optical systems, and CPB Microlithography systems comprising same, that cancel external magnetic fields
02/27/2003US20030038112 Optical monitoring and control system and method for plasma reactors
02/27/2003US20030038111 Dielectric etch chamber with expanded process window
02/27/2003US20030037883 Substrate support with gas feed-through and method
02/27/2003US20030037881 Adjustable dual frequency voltage dividing plasma reactor
02/27/2003US20030037880 Dielectric etch chamber with expanded process window
02/27/2003US20030037879 Top gas feed lid for semiconductor processing chamber
02/26/2003EP1286382A2 Atmospheric pressure plasma treatment apparatus and method
02/26/2003EP1286381A2 Means for monitoring process conditions change in electron beam systems and related monitoring methods
02/26/2003EP1285456A2 High efficiency scanning in ion implanters
02/26/2003EP1285455A1 Method and apparatus for particle detection using a sensor structure having a moveable portion
02/26/2003EP1285452A1 Control system for indirectly heated cathode ion source
02/26/2003EP0650593B1 System for detecting atomic or molecular spectra of a substance, and/or threshold phenomena associated with the same
02/26/2003EP0643151B1 Apparatus and system for arc ion plating
02/26/2003CN1102087C Processing apparatus and method of plasma for processing chip
02/25/2003US6526355 Integrated full wavelength spectrometer for wafer processing
02/25/2003US6525482 Ion source and operation method thereof
02/25/2003US6525328 Electron beam lithography system and pattern writing method
02/25/2003US6525327 Ion implanter and beam stop therefor
02/25/2003US6525326 System and method for removing particles entrained in an ion beam
02/25/2003US6525324 Charged-particle-beam projection optical system
02/25/2003US6524455 Sputtering apparatus using passive arc control system and method
02/25/2003US6524448 Vapor deposition using electrical fields (magnets) for angular distribution of ionized particles
02/25/2003US6524432 Parallel-plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density
02/25/2003US6524430 Apparatus for fabricating a semiconductor device
02/25/2003US6523493 Ring-shaped high-density plasma source and method
02/25/2003US6523382 Free wheeling lock assembly
02/20/2003WO2003015481A2 Suspended gas distribution manifold for plasma chamber
02/20/2003WO2003015474A2 Auxiliary in-plane magnet inside a nested unbalanced magnetron
02/20/2003WO2003015257A2 Auxiliary vertical magnet outside a nested unbalanced magnetron
02/20/2003WO2003015137A2 Pedestal with integral shield
02/20/2003WO2003015133A2 Showerhead electrode design for semiconductor processing reactor
02/20/2003WO2003015125A1 Magnetron-spraying system with a device for preventing a rear covering of the spray target
02/20/2003WO2003015124A1 Sputtering magnetron arrangements with adjustable magnetic field strength
02/20/2003WO2003015123A2 Dual frequency plasma etch reactor with independent plasma density/chemistry and ion energy control
02/20/2003WO2003015122A1 Device for the coating of objects
02/20/2003WO2003015121A2 Slit lens arrangement for particle beams
02/20/2003WO2003015119A2 Decaborane vaporizer
02/20/2003WO2003014794A1 Electron microscope and spectroscopy system
02/20/2003WO2003014660A1 Displacement detecting method, displacement detecting device and calibrating method thereof, and recording device of information recording medium original disk
02/20/2003WO2003014413A1 Treating device and cleaning method therefor
02/20/2003WO2003014412A1 Method and device for the coating and blow moulding of a body
02/20/2003WO2003014410A1 Sputtering device
02/20/2003WO2002041355A3 Plasma processing comprising three rotational motions of an article being processed
02/20/2003WO2002031839A9 N-type doping of nanocrystalline diamond films with nitrogen and electrodes made therefrom
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