Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
03/2003
03/27/2003WO2002101113B1 Method and device for treating a substrate
03/27/2003WO2002082489A3 Ion source filament
03/27/2003WO2002080265A3 Plasma processor and method for operating same
03/27/2003WO2002027062A9 Plasma processing system with gas permeable electrode
03/27/2003WO2002025696A9 Reducing deposition of process residues on a surface in a chamber
03/27/2003US20030060048 Chemically enhanced focused ion beam micro-machining of copper
03/27/2003US20030059716 Methods for reducing blur and variation in blur in projected images produced by charged-particle-beam microlithography
03/27/2003US20030058663 Power supplies having protection circuits
03/27/2003US20030057971 Inspection method using a charged particle beam and inspection device based thereon
03/27/2003US20030057848 Plasma processing apparatus
03/27/2003US20030057847 Method to affect spatial distribution of harmonic generation in a capacitive discharge reactor
03/27/2003US20030057846 Plasma accelarator arrangement
03/27/2003US20030057845 Plasma processing apparatus
03/27/2003US20030057844 Method and device for attenuating harmonics in semiconductor plasma processing systems
03/27/2003US20030057381 Apparatus and methods for mask/substrate alignment in charged-particle-beam pattern-transfer
03/27/2003US20030057378 Ion source for time-of-flight mass spectrometers for analyzing gas samples
03/27/2003US20030057377 Electron detection device
03/27/2003US20030057182 Window for allowing end point of etching process to be detected and etching device comprising the same
03/27/2003US20030056901 Plasma processing apparatus and plasma processing system with reduced feeding loss, and method for stabilizing the apparatus and system
03/27/2003US20030056899 Semiconductor processing apparatus and manufacturing method of semiconductor device
03/27/2003US20030056897 Process chamber having a corrosion-resistant wall and method
03/26/2003EP1296353A2 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam
03/26/2003EP1296352A1 Charged particle beam inspection apparatus and method for fabricating device using that inspection apparatus
03/26/2003EP1296351A1 Charged particle beam inspection apparatus and method for fabricating device using that inspection apparatus
03/26/2003EP1295316A2 Integrated electronic hardware for wafer processing control and diagnostic
03/26/2003EP1295309A2 Switched uniformity control
03/26/2003EP1280192A4 Device for forming nanostructures on the surface of a semiconductor wafer by means of ion beams
03/26/2003EP1050064B1 Implantation of radioactive ?32 p atoms
03/26/2003CN1406391A Optical column for charged particle beam device
03/26/2003CN1406015A Deposition system of close wave-division multiplexer filter
03/26/2003CN1405857A Plasma etching device using plasma confining device
03/26/2003CN1405848A Surface processing device
03/26/2003CN1405836A Apparatus and method for charging ions on target
03/26/2003CN1405835A Voltage allocation mode of piezoelectric scanner for scanning-probe microscope
03/25/2003US6539106 Feature-based defect detection
03/25/2003US6538388 Plasma processing apparatus suitable for power supply of higher frequency
03/25/2003US6538256 Electron beam lithography system using a photocathode with a pattern of apertures for creating a transmission resonance
03/25/2003US6538255 Electron gun and electron-beam optical systems and methods including detecting and adjusting transverse beam-intensity profile, and device manufacturing methods including same
03/25/2003US6538254 Method and apparatus for sample fabrication
03/25/2003US6538249 Image-formation apparatus using charged particle beams under various focus conditions
03/25/2003US6538248 Charged particle beam scanning type automatic inspecting apparatus
03/25/2003US6537668 Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their production
03/25/2003US6537606 System and method for improving thin films by gas cluster ion beam processing
03/25/2003US6537460 Method for detecting an end point of etching in a plasma-enhanced etching process
03/25/2003US6537429 Diamond coatings on reactor wall and method of manufacturing thereof
03/25/2003US6537428 Stable high rate reactive sputtering
03/25/2003US6537421 RF bias control in plasma deposition and etch systems with multiple RF power sources
03/25/2003US6537419 Gas distribution plate assembly for providing laminar gas flow across the surface of a substrate
03/25/2003US6537418 Spatially uniform gas supply and pump configuration for large wafer diameters
03/25/2003US6537417 Apparatus for processing samples
03/25/2003US6537415 Apparatus for processing samples
03/25/2003US6536449 Semiconductor wafer residues left after photoresist ashing and/or reactive ion etching processes; halogen containing gas (fluorocarbon) and ammonia and substantially no oxygen
03/20/2003WO2003023835A1 Plasma enhanced atomic layer deposition (peald) equipment and method of forming a conducting thin film using the same thereof
03/20/2003WO2003023814A2 Flat magnetron sputter apparatus
03/20/2003WO2003023813A1 Device for coating substrates with a curved surface by pulsed magnetron sputtering
03/20/2003WO2003023516A2 Diagnosis of an error of a charged particle system
03/20/2003WO2003023085A1 Spiral gas flow plasma reactor
03/20/2003WO2003003414A3 Directed gas injection apparatus for semiconductor processing
03/20/2003WO2003002860A3 Directed gas injection apparatus for semiconductor processing
03/20/2003WO2002093610A3 Deflection system for a particle beam device
03/20/2003WO2002078045A3 Methods and apparatus for scanned beam uniformity adjustment in ion implanters
03/20/2003WO2002012587A3 Processing apparatus and cleaning method
03/20/2003US20030055588 Method of determination of true nonlinearity of scan along a selected direction X or Y in scan microscope
03/20/2003US20030054657 Semiconductor manufacturing apparatus
03/20/2003US20030054647 Plasma processing method
03/20/2003US20030054580 Semiconductor device and a manufacturing method of the same
03/20/2003US20030053048 Electron microscope and spectroscopy system
03/20/2003US20030052612 Microminiature microwave electron source
03/20/2003US20030052342 Method for forming a pattern and a semiconductor device
03/20/2003US20030052283 Ion implanting apparatus and sample processing apparatus
03/20/2003US20030052270 Electron beam length-measurement apparatus and measurement method
03/20/2003US20030052087 Plasma generating apparatus and SiO2 thin film etching method using the same
03/20/2003US20030052086 Etching method of organic insulating film
03/20/2003US20030052085 Control of power delivered to a multiple segment inject electrode
03/20/2003US20030052083 Treatment and evaluation of a substrate processing chamber
03/20/2003US20030052001 Sputtering apparatus for forming a metal film using a magnetic field
03/20/2003US20030051994 Partial turn coil for generating a plasma
03/20/2003US20030051814 Manufacturing apparatus of a semiconductor device having a sensing system
03/20/2003US20030051811 Plasma resistant member
03/20/2003US20030051792 Use of a cleaning process, a cleaning process, a connection process and a workpiece pair
03/20/2003US20030051666 Impedance adapted microwave energy coupling device
03/20/2003US20030051665 High temperature ceramic heater assembly with rf capability
03/20/2003CA2459343A1 Flat magnetron sputter apparatus
03/19/2003EP1293588A1 Plasma cvd apparatus and method
03/19/2003EP1293586A2 Apparatus for coating substrates with curved surfaces by pulsed magnetron sputtering
03/19/2003EP1292965A1 Column simultaneously focusing a particle beam and an optical beam
03/19/2003EP1292838A2 Diagnosting reliability of vias by e-beam probing
03/19/2003EP1292819A1 Ion beam milling system and method for electron microscopy specimen preparation
03/19/2003EP1292717A1 Pulsed highly ionized magnetron sputtering
03/19/2003EP1060288B1 Pcvd apparatus and a method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith
03/19/2003EP0797838B1 Method and apparatus for plasma processing
03/19/2003EP0772225B1 Electronic energy filter
03/19/2003CN1404620A Apparatus for evaporation of materials for coating of objects
03/19/2003CN1404619A An atmospheric pressure plasma system
03/19/2003CN1404618A Column for a charged particle beam device
03/19/2003CN1404617A Objective lens for a charged particle beam device
03/19/2003CN1404108A RF probe with thermal conducting sleeve
03/19/2003CN1403808A High-resolution electroacoustic imaging detection system
03/19/2003CN1403627A High-density plasma chemical vapour-phase deposition equipment
03/19/2003CN1103382C Plasma chemical vapour phase deposition apparatus
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