| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/10/2003 | US20030066976 Apparatus to decelrate and control ion beams to improve the total quality of ion implantation |
| 04/10/2003 | US20030066975 Photocatalytic layer; decomposing impurities by exposure toradiation |
| 04/10/2003 | US20030066974 Charged-particle beam exposure apparatus and device manufacturing method |
| 04/10/2003 | US20030066964 Differential contrast transmission electron microscope and method of processing data about electron microscope images |
| 04/10/2003 | US20030066963 Multi-beam multi-column electron beam inspection system |
| 04/10/2003 | US20030066961 Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same |
| 04/10/2003 | US20030066817 Dry etching method and apparatus |
| 04/10/2003 | US20030066747 Pressure modulation method to obtain improved step coverage of seed layer |
| 04/10/2003 | US20030066608 Semiconductor processing apparatus and electrode member therefor |
| 04/10/2003 | US20030066607 Flexibly suspended gas distribution manifold for plasma chamber |
| 04/10/2003 | US20030066605 Air exhaust system of a chamber for manufacturing semiconductor device |
| 04/10/2003 | US20030066487 Plasma processing system and surface processing method |
| 04/10/2003 | US20030066486 Microwave heat shield for plasma chamber |
| 04/10/2003 | US20030066485 Plasma CVD apparatus |
| 04/10/2003 | US20030066484 Electrode cover, plasma apparatus utilizing the cover, and method of fitting the cover onto the plasma electrode |
| 04/09/2003 | EP1300878A1 Device and method for plasma processing, and slow-wave plate |
| 04/09/2003 | EP1300877A1 Plasma processing device |
| 04/09/2003 | EP1300876A1 Plasma processing device |
| 04/09/2003 | EP1300875A1 Plasma processing device |
| 04/09/2003 | EP1300871A2 Semiconductor processing apparatus and electrode member therefor |
| 04/09/2003 | EP1300870A1 Multiple electron beam device |
| 04/09/2003 | EP1300057A2 Vacuum plasma processor apparatus and method |
| 04/09/2003 | EP1299898A1 Particle radiation device comprising a particle source that is operated in an ultrahigh vacuum and a cascade pump assembly for a particle radiation device of this type |
| 04/09/2003 | EP1299897A1 Detector for variable pressure areas and an electron microscope comprising a corresponding detector |
| 04/09/2003 | EP1299895A1 Cathode assembly for indirectly heated cathode ion source |
| 04/09/2003 | EP1299892A1 Hot electron emission array for e-beam photolithography and display screens |
| 04/09/2003 | CN1409376A Semiconductor device and its producing method |
| 04/09/2003 | CN1105392C Thin-film electron emitter device and application using same |
| 04/09/2003 | CN1105256C Gas panel |
| 04/08/2003 | US6546544 Method of producing mask data for partial one-shot transfer exposure and exposure method |
| 04/08/2003 | US6546543 Method of displaying, inspecting and modifying pattern for exposure |
| 04/08/2003 | US6546330 Method of presuming traffic conditions by using floating car data and system for presuming and presenting traffic conditions by using floating data |
| 04/08/2003 | US6545753 Using scatterometry for etch end points for dual damascene process |
| 04/08/2003 | US6545580 Electromagnetic field generator and method of operation |
| 04/08/2003 | US6545491 Apparatus for detecting defects in semiconductor devices and methods of using the same |
| 04/08/2003 | US6545480 Method for carrying out the electrical breakdown of a gaseous dielectric in a highly non-uniform field |
| 04/08/2003 | US6545468 Includes taking magnetic field measurements outside of a closed plasma chamber and correlating such measurements to the magnetic field; semiconductors; integrated circuits |
| 04/08/2003 | US6545420 Plasma reactor using inductive RF coupling, and processes |
| 04/08/2003 | US6545419 Double chamber ion implantation system |
| 04/08/2003 | US6545282 Apparatus and methods for reducing Coulombic blur in charged-particle-beam microlithography |
| 04/08/2003 | US6545277 High efficiency, enhanced detecting in-lens light guide scintillator detector for SEM |
| 04/08/2003 | US6545275 Beam evaluation |
| 04/08/2003 | US6545274 Methods and devices for determining times for maintenance activity performed on a charged-particle-beam microlithography apparatus, and microelectronic-device-manufacturing methods comprising same |
| 04/08/2003 | US6545269 Ion source for time-of-flight mass spectrometers for analyzing gas samples |
| 04/08/2003 | US6544895 Methods for use of pulsed voltage in a plasma reactor |
| 04/08/2003 | US6544700 Charged particle beam exposure method |
| 04/08/2003 | US6544627 Method of producing recording media having protective overcoats of highly tetrahedral amorphous carbon |
| 04/08/2003 | US6544380 Plasma treatment method and apparatus |
| 04/08/2003 | US6543380 Device for the production of homogenous microwave plasma |
| 04/03/2003 | WO2003028081A2 Method for etching structures in an etching body by means of a plasma |
| 04/03/2003 | WO2003028078A1 Plasma processing device |
| 04/03/2003 | WO2003028066A1 Process chamber having a corrosion-resistant wall and method |
| 04/03/2003 | WO2003028065A2 Electrostatic manipulating apparatus |
| 04/03/2003 | WO2003027352A1 Dual-source, single-chamber method and apparatus for sputter deposition |
| 04/03/2003 | WO2003027351A1 Method and apparatus for sputter deposition of epilayers with high deposition rate |
| 04/03/2003 | WO2003008662A3 Bypass set up for integration of remote optical endpoint for cvd chambers |
| 04/03/2003 | WO2002097852A3 Plasma etching of silicon carbide |
| 04/03/2003 | US20030064299 Method for adjusting and exposing the second level of a phase-shift mask |
| 04/03/2003 | US20030064169 Having a grid for enabling a deposition to be implemented at a low temperature |
| 04/03/2003 | US20030063123 Monitoring device and monitoring method for vacuum device |
| 04/03/2003 | US20030062840 Branching RF antennas and plasma processing apparatus |
| 04/03/2003 | US20030062489 Variably shaped beam EB writing system |
| 04/03/2003 | US20030062479 Charged particle beam scanning type automatic inspecting apparatus |
| 04/03/2003 | US20030062478 Particle beam apparatus |
| 04/03/2003 | US20030062477 Methods and apparatus for defect localization |
| 04/03/2003 | US20030062476 Remote control electron microscope |
| 04/03/2003 | US20030062344 Plasma reactor with overhead RF electrode tuned to the plasma |
| 04/03/2003 | US20030062339 Control of semiconductor processing |
| 04/03/2003 | US20030062337 Shallow angle interference process and apparatus for determining real-time etching rate |
| 04/03/2003 | US20030062260 System for depositing a film |
| 04/03/2003 | US20030062129 Electron-cyclotron resonance plasma reactor with multiple exciters |
| 04/03/2003 | US20030062128 Apparatus and method for plasma treatment |
| 04/03/2003 | US20030062127 Plasma reactor |
| 04/03/2003 | CA2404582A1 Semiconductor processing apparatus and electrode member therefor |
| 04/02/2003 | EP1298513A2 Monitoring device and monitoring method for vacuum device |
| 04/02/2003 | EP1297542A1 Device for orienting the direction of magnetization of magnetic layers |
| 04/02/2003 | EP1082747B1 Acceleration and analysis architecture for ion implanter |
| 04/02/2003 | EP0740710B1 Magnetron sputtering apparatus for compound thin films |
| 04/02/2003 | CN1407602A Electronic emission photoetching device using selective-grow carbon nanometer tube and method thereof |
| 04/02/2003 | CN1407334A Manufacture for test apparatus and parts |
| 04/02/2003 | CN1407135A Surface treatment devices |
| 04/02/2003 | CN1407130A Sputtering device utilizing magnetic field to form metal film |
| 04/02/2003 | CN1104511C Temp. controlling method and apparatus for plasma processing chamber |
| 04/01/2003 | US6543044 Method of extracting characters and computer-readable recording medium |
| 04/01/2003 | US6541917 Section of pipe for a gas treatment device and device incorporating such a section of pipe |
| 04/01/2003 | US6541785 Electron-beam sources and electron-beam microlithography apparatus comprising same |
| 04/01/2003 | US6541784 Electron beam exposure system and exposing method using an electron beam |
| 04/01/2003 | US6541783 Reticle having an apertured weakly scattering membrane with selective strongly scattering regions between the apertures; provides independent exposure dosage levels that can be mixed to provide a wide range of exposure levels with high contrast |
| 04/01/2003 | US6541781 Waveguide for microwave excitation of plasma in an ion beam guide |
| 04/01/2003 | US6541780 Particle beam current monitoring technique |
| 04/01/2003 | US6541779 Charged-particle-beam microlithography apparatus including selectable systems for determining alignment-mark position, and device-fabrication methods utilizing same |
| 04/01/2003 | US6541776 Device for electrostatic deflection of a particle beam |
| 04/01/2003 | US6541771 Scanning electron microscope |
| 04/01/2003 | US6541388 Plasma etching termination detecting method |
| 04/01/2003 | US6541169 Methods for charged-particle-beam microlithography including correction of deflection aberrations, and device-manufacturing methods comprising same |
| 04/01/2003 | US6541166 Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures |
| 04/01/2003 | US6540883 Magnetron sputtering source and method of use thereof |
| 04/01/2003 | US6540814 Integrated ion implant scrubber system |
| 03/27/2003 | WO2003026364A2 Plasma processor coil |
| 03/27/2003 | WO2003025971A2 Plasma processing apparatus with coil magnet system |