Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
04/2003
04/24/2003US20030075686 Column for a charged particle beam device
04/24/2003US20030075684 Halation-prevention filter, image analysis device equipped with said halation-prevention filter, and diffraction pattern intensity analysis method and diffraction pattern intensity correction program that use said halation-prevention filter
04/24/2003US20030075527 Method and apparatus for supplying gas used in semiconductor processing
04/24/2003US20030075522 Procedure and device for the production of a plasma
04/24/2003US20030075433 Apparatus and method for self-aligning a cover ring in a sputter chamber
04/23/2003EP1304717A1 Sheet beam test apparatus
04/23/2003EP1303866A2 System and method for improving thin films by gas cluster ion be am processing
04/23/2003EP1044113A4 Plasma discharge device and method with dynamic tuning
04/23/2003EP0895652B1 Method and apparatus for run-time correction of proximity effects in pattern generation
04/23/2003EP0883891B1 Method of operating a particle-optical apparatus
04/23/2003CN1413359A Method and apparatus for detecting endpoint of photoresist stripping
04/23/2003CN1413355A Method of manufacturing electrode for plasma reactor and such electrode
04/23/2003CN1411920A Negative pressure plasma device and cleaning method
04/23/2003CN1106687C Charged particle beam exposure method and method for making patterns on wafer
04/23/2003CN1106685C Method and device for introducing foreign substance, and method for mfg. semiconductor device
04/23/2003CN1106670C Plasma generator
04/23/2003CN1106669C Driving source for vacuum treatment chamber
04/22/2003US6553335 Method and apparatus for determining end-point in a chamber cleaning process
04/22/2003US6553323 Method and its apparatus for inspecting a specimen
04/22/2003US6553277 Method and apparatus for vacuum treatment
04/22/2003US6552353 Multi-electron beam exposure method and apparatus and device manufacturing method
04/22/2003US6552340 Autoadjusting charged-particle probe-forming apparatus
04/22/2003US6552297 RF matching network with distributed outputs
04/22/2003US6552296 Plasma ignition within wider range of conditions; power efficiency; converting hazardous gases into scrubbable materials
04/22/2003US6551520 Exhausting method and means in a dry etching apparatus
04/22/2003US6551477 Interlocking cylindrical magnetron cathodes and targets
04/22/2003US6551471 Ionization film-forming method and apparatus
04/22/2003US6551470 A bonding and/or a backing plate is eliminated; physical vapor deposition
04/22/2003US6551447 Inductive plasma reactor
04/22/2003US6551446 Externally excited torroidal plasma source with a gas distribution plate
04/22/2003US6551445 Plasma processing system and method for manufacturing a semiconductor device by using the same
04/22/2003US6551444 Plasma processing apparatus and method of processing
04/22/2003US6550126 Method for mounting electrode assembly
04/17/2003WO2003032434A1 Plasma production device and method and rf driver circuit
04/17/2003WO2003032361A1 Multiple electron beam device
04/17/2003WO2003032360A1 Information acquisition apparatus, cross section evaluating apparatus, and cross section evaluating method
04/17/2003WO2003032359A2 Method and device for aligning a charged particle beam column
04/17/2003WO2003032351A2 Method and device for aligning a charged particle beam column
04/17/2003WO2003032257A1 System and method for point pushing to render polygons in environments with changing levels of detail
04/17/2003WO2003032022A2 System and method for fast focal length alterations
04/17/2003WO2003032007A2 Dosimeter having charge-measuring device with wide dynamic range
04/17/2003WO2002076511A3 Plasma surface treatment method and device for carrying out said method
04/17/2003WO2002056338A3 Device for the plasma-mediated working of surfaces on planar substrates
04/17/2003WO2002038826A9 Alternating current rotatable sputter cathode
04/17/2003WO2002025697A3 Apparatus for etching semiconductor samples and a source for providing a gas by sublimation thereto
04/17/2003US20030073314 GCIB processing to improve interconnection vias and improved interconnection via
04/17/2003US20030072881 Seposition in an expanding thermal plasma system to coat large areas of a substrate; uniformity
04/17/2003US20030071260 Susceptor with built-in electrode and manufacturing method therefor
04/17/2003US20030071231 Electron beam exposing method and exposure apparatus
04/17/2003US20030071230 Electron beam apparatus and electron beam adjusting method
04/17/2003US20030071223 Field ionizing elements and applications thereof
04/17/2003US20030071222 Charge measuring device with wide dynamic range
04/17/2003US20030071214 Method and scanning electron microscope for measuring width of material on sample
04/17/2003US20030070914 Method for manufacturing half-metallic magnetic oxide and plasma sputtering apparatus used in the same
04/17/2003US20030070761 RF plasma reactor
04/17/2003US20030070760 Method and apparatus having plate electrode for surface treatment using capillary discharge plasma
04/17/2003US20030070759 Plasma processing method and apparatus
04/17/2003US20030070620 Tunable multi-zone gas injection system
04/17/2003DE20023114U1 Joining beams of charged particles includes directing two beams on the axes into the magnetic field, and turning the beams by interaction between the field and the beams into a third beam directed on the third axis
04/17/2003CA2463528A1 Plasma production device and method and rf driver circuit
04/16/2003EP1302972A2 Method and scanning electron microscope for measuring width of material on sample
04/16/2003EP1302971A2 Method and device for aligning a charged particle beam column
04/16/2003EP1302561A1 Method and apparatus for forming a layer on a substrate by high-density plasma chemical vapor deposition (HDP-CVD)
04/16/2003EP1301938A2 A plasma reactor having a symmetric parallel conductor coil antenna
04/16/2003EP1301652A1 Improving effectiveness of artificial hip by gcib
04/16/2003EP1144717A4 Enhanced plasma mode, method, and system for plasma immersion ion implantation
04/16/2003EP0954876B1 Process and system for operating magnetron discharges
04/16/2003EP0932911B1 Control mechanisms for dosimetry control in ion implantation systems
04/16/2003CN1411515A Method and device for coating substrates
04/16/2003CN1411385A Ion beam system for irradiating tumour tissues
04/16/2003CN1411025A Charged beam apparatus, pattern testing method and pattern display method
04/16/2003CN1105945C Apertured nonplanar electrodes and forming methods
04/15/2003US6550051 Lithographic data verification method and photo mask manufacturing method
04/15/2003US6548946 Electron beam generator
04/15/2003US6548817 Miniaturized cathodic arc plasma source
04/15/2003US6548816 Stigmator assembly
04/15/2003US6548811 Transmission electron microscope apparatus with equipment for inspecting defects in specimen and method of inspecting defects in specimen using transmission electron microscope
04/15/2003US6548810 Scanning confocal electron microscope
04/15/2003US6548416 Plasma ashing process
04/15/2003US6548381 Ion beam irradiation apparatus and method of igniting a plasma for the same
04/15/2003US6547934 Reduction of metal oxide in a dual frequency etch chamber
04/15/2003US6547921 Method and apparatus for processing semiconductor substrates
04/15/2003US6547458 Optical monitoring integrated circuits
04/15/2003US6546788 Nanotomography
04/10/2003WO2003030294A1 Matching device and plasma processing apparatus
04/10/2003WO2003030241A1 Plasma processing apparatus
04/10/2003WO2003030240A2 Etching method and apparatus
04/10/2003WO2003030236A1 Electromagnetic field supply device and plasma processing device
04/10/2003WO2003030235A1 Plasma processor and plasma processing method
04/10/2003WO2003030207A1 Method and device for producing a plasma
04/10/2003WO2003030206A1 Methods and apparatus for defect localization
04/10/2003WO2003029513A1 Hybrid plasma processing apparatus
04/10/2003WO2003019624A3 Dielectric barrier discharge process for depositing silicon nitride film on substrates
04/10/2003WO2003008659A3 Collimated sputtering of cobalt
04/10/2003WO2003001219A3 Field ionizing elements and applications thereof
04/10/2003WO2002099943A3 Conduction assembly for a cathode of an arc evaporation device
04/10/2003US20030068444 Method to solve particle performance of FSG layer by using UFU season film for FSG process
04/10/2003US20030067734 Methods for electrostatically chucking an object to an electrostatic chuck that reduce uncorrectable placement error of the object
04/10/2003US20030067732 Low voltage modular room ionization system
04/10/2003US20030067273 Plasma processor coil