| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/07/2003 | EP1308979A1 Electron gun and a method for using the same |
| 05/07/2003 | EP1307896A2 Externally excited torroidal plasma source |
| 05/07/2003 | EP1307607A1 Method and device for plasma treatment of moving metal substrates |
| 05/07/2003 | EP1192291B1 Device for monitoring intended or unavoidable layer deposits and corresponding method |
| 05/07/2003 | EP0888463B1 Means for vacuum coating of bulk material |
| 05/06/2003 | US6560768 Circuit pattern design method, circuit pattern design system, and recording medium |
| 05/06/2003 | US6559942 Monitoring substrate processing with optical emission and polarized reflected radiation |
| 05/06/2003 | US6559663 Method and apparatus for inspecting integrated circuit pattern |
| 05/06/2003 | US6559662 Semiconductor device tester and semiconductor device test method |
| 05/06/2003 | US6559650 RF power probe head with a thermally conductive bushing |
| 05/06/2003 | US6559463 Mask pattern transfer method, mask pattern transfer apparatus using the method, and device manufacturing method |
| 05/06/2003 | US6559462 Method to reduce downtime while implanting GeF4 |
| 05/06/2003 | US6559461 Wafer scanning support unit of ion implantation apparatus |
| 05/06/2003 | US6559459 Convergent charged particle beam apparatus and inspection method using same |
| 05/06/2003 | US6559458 Measuring instrument and method for measuring features on a substrate |
| 05/06/2003 | US6559457 System and method for facilitating detection of defects on a wafer |
| 05/06/2003 | US6559456 Charged particle beam exposure method and apparatus |
| 05/06/2003 | US6559454 Ion beam generation apparatus |
| 05/06/2003 | US6559445 Electron energy filter with magnetic deflecting regions |
| 05/06/2003 | US6559408 Toroidal low-field reactive gas source |
| 05/06/2003 | US6558564 Plasma energy control by inducing plasma instability |
| 05/06/2003 | US6558507 Plasma processing apparatus |
| 05/06/2003 | US6558505 Method and apparatus for processing semiconductor substrates |
| 05/06/2003 | US6558504 Plasma processing system and method |
| 05/02/2003 | EP1306893A1 Plasma processing apparatus |
| 05/02/2003 | EP1306879A2 Ion implanting method and apparatus |
| 05/02/2003 | EP1306878A2 Method and device for aligning a charged particle beam column |
| 05/02/2003 | EP1305982A1 Ferrogmagnetic resonance excitation and its use for heating substrates that are filled with particles |
| 05/02/2003 | EP1305817A1 Methods to predict and correct resist heating during lithography |
| 05/02/2003 | EP1305816A2 Collection of secondary electrons through the objective lens of a scanning electron microscope |
| 05/02/2003 | EP1305815A1 Film thickness measurement using electron-beam induced x-ray microanalysis |
| 05/02/2003 | EP1305814A1 Single tilt rotation cryotransfer holder for electron microscopes |
| 05/02/2003 | EP1305453A1 Ring-shaped high-density plasma source and method |
| 05/02/2003 | EP1305452A1 Gcib size diagnostics and workpiece processing |
| 05/02/2003 | EP1088328B1 Method and device for correcting proximity effects |
| 05/01/2003 | WO2003037047A1 Method for judging arc of glow discharger and high-frequency arc discharge suppressor |
| 05/01/2003 | WO2003036708A1 Microwave plasma substrate processing device |
| 05/01/2003 | WO2003036704A1 Method and apparatus for the etching of photomask substrates using pulsed plasma |
| 05/01/2003 | WO2003036703A1 Process and apparatus for etching of thin, damage sensitive layers using high frequency pulsed plasma |
| 05/01/2003 | WO2003036700A1 Device and method for microwave plasma processing, and microwave power supply device |
| 05/01/2003 | WO2003036681A2 Methods and apparatus for plasma doping by anode pulsing |
| 05/01/2003 | WO2003036680A1 Merie plasma reactor with showerhead rf electrode tuned to the plasma with arcing suppression |
| 05/01/2003 | WO2003036679A2 Wafer pedestal tilt mechanism and cooling system |
| 05/01/2003 | WO2003036678A2 Ion implantation systems and methods utilizing a downstream gas source |
| 05/01/2003 | WO2003036677A1 Electron microscope having x-ray spectrometer |
| 05/01/2003 | WO2003036309A1 Method and apparatus for electron density measurement |
| 05/01/2003 | WO2003036224A1 Method and apparatus for wall film monitoring |
| 05/01/2003 | WO2002079815A3 Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source |
| 05/01/2003 | WO2002068712A3 Removal of etchant residues |
| 05/01/2003 | WO2002043116A3 Etching of high aspect ratio features in a substrate |
| 05/01/2003 | WO2002041355B1 Plasma processing comprising three rotational motions of an article being processed |
| 05/01/2003 | US20030082920 Chamber-reversed dry etching |
| 05/01/2003 | US20030082891 Methods and apparatus for plasma doping and ion implantation in an integrated processing system |
| 05/01/2003 | US20030082838 Method and system for monitoring a semiconductor wafer plasma etch process |
| 05/01/2003 | US20030082835 Method and apparatus to monitor electrical states at a workpiece in a semiconductor processing chamber |
| 05/01/2003 | US20030081722 Multilayer-film mirrors for use in extreme UV optical systems, and methods for manufacturing such mirrors exhibiting improved wave aberrations |
| 05/01/2003 | US20030080301 Ion implantation systems and methods utilizing a downstream gas source |
| 05/01/2003 | US20030080300 Wafer pedestal tilt mechanism and cooling system |
| 05/01/2003 | US20030080293 Scanning electron microscope |
| 05/01/2003 | US20030079983 Multi-zone RF electrode for field/plasma uniformity control in capacitive plasma sources |
| 05/01/2003 | US20030079838 Protection of dielectric window in inductively coupled plasma generation |
| 05/01/2003 | US20030079834 Shielding system for plasma chamber |
| 05/01/2003 | US20030079688 Methods and apparatus for plasma doping by anode pulsing |
| 04/30/2003 | CN1414606A Method and equipment of ion implantation |
| 04/30/2003 | CN1414378A Detection method of dynamic micronic dust in etching reaction chamber |
| 04/29/2003 | USRE38097 In situ removal of deposits from gas apparatus; maintenance |
| 04/29/2003 | US6557162 Method for high yield reticle formation |
| 04/29/2003 | US6556703 Scanning electron microscope system and method of manufacturing an integrated circuit |
| 04/29/2003 | US6556702 Method and apparatus that determines charged particle beam shape codes |
| 04/29/2003 | US6555833 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 04/29/2003 | US6555832 Determining beam alignment in ion implantation using Rutherford Back Scattering |
| 04/29/2003 | US6555831 Ion implanting apparatus |
| 04/29/2003 | US6555830 Suppression of emission noise for microcolumn applications in electron beam inspection |
| 04/29/2003 | US6555829 High precision flexure stage |
| 04/29/2003 | US6555825 Ion implanter |
| 04/29/2003 | US6555824 Method and device for focusing a charged particle beam |
| 04/29/2003 | US6555819 Scanning electron microscope |
| 04/29/2003 | US6555818 Transmission electron microscope |
| 04/29/2003 | US6555817 Method and apparatus for correcting magnetic field distortions in electron backscatter diffraction patterns obtained in an electron microscope |
| 04/29/2003 | US6555816 Scanning electron microscope and sample observation method using the same |
| 04/29/2003 | US6555815 Apparatus and method for examining specimen with a charged particle beam |
| 04/29/2003 | US6555275 Using two stage exposure; resolution |
| 04/29/2003 | US6555224 Tetracarbon |
| 04/29/2003 | US6554979 Method and apparatus for bias deposition in a modulating electric field |
| 04/29/2003 | US6554968 Film thickness control by keeping the total current supplied to both the beam and suppressor grids of a radio frequency in beam source constant, rather than just the current supplied to the beam grid. |
| 04/29/2003 | US6554954 Conductive collar surrounding semiconductor workpiece in plasma chamber |
| 04/29/2003 | US6554953 Thin film electrostatic shield for inductive plasma processing |
| 04/29/2003 | US6553932 Reduction of plasma edge effect on plasma enhanced CVD processes |
| 04/24/2003 | WO2003034463A2 Tunable multi-zone gas injection system |
| 04/24/2003 | WO2003034462A1 Suppression of emission noise for microcolumn applications in electron beam inspection |
| 04/24/2003 | WO2002080214A3 Plasma processing method and apparatus with control of plasma excitation power |
| 04/24/2003 | WO2002037528A3 Magnetron with a rotating center magnet for a vault shaped sputtering target |
| 04/24/2003 | US20030077914 Method and apparatus for forming an anti-reflective coating on a substrate |
| 04/24/2003 | US20030077910 Etching of thin damage sensitive layers using high frequency pulsed plasma |
| 04/24/2003 | US20030077544 Cups are configured to reduce beam displacements caused by eddy currents; semiconductors; microelectronics |
| 04/24/2003 | US20030077530 Methods and devices for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-partical-beam microlithography apparatus |
| 04/24/2003 | US20030077401 System and method for deposition of coatings on a substrate |
| 04/24/2003 | US20030076023 Field emission-type electron source |
| 04/24/2003 | US20030075691 Charged particle beam apparatus, pattern measuring method and pattern writing method |
| 04/24/2003 | US20030075690 Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatus |