Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
05/2003
05/15/2003WO2003041109A2 Spot grid array electron imagine system
05/15/2003WO2003040829A2 Maskless printer using photoelectric conversion of a light beam array
05/15/2003WO2003040828A2 Real-time prediction of and correction of proximity resist heating in raster scan particle beam lithography
05/15/2003WO2002101113A9 Method and device for treating a substrate
05/15/2003WO2002037906A8 Mechanism for containment of neutron radiation in ion implanter beamline
05/15/2003US20030093767 Method for fabrication of patterns and semiconductor devices
05/15/2003US20030092278 Plasma baffle assembly
05/15/2003US20030092272 Method of stabilizing oxide etch and chamber performance using seasoning
05/15/2003US20030091753 Upward distribution of reactive gases; walls coated with a protective film having layers of different dielectric constant; antideposit agents; nitride layer formed of low hydrogen content, high density; oxidation resistance; quality
05/15/2003US20030091482 High frequency plasma source
05/15/2003US20030090651 Three-dimensional micropattern profile measuring system and method
05/15/2003US20030089912 Electron bombardment of wide bandgap semiconductors for generating high brightness and narrow energy spread emission electrons
05/15/2003US20030089863 Beam-calibration methods for charged-particle-beam microlithography systems
05/15/2003US20030089860 Electrostatic manipulating apparatus
05/15/2003US20030089859 Objective lens for a charged particle beam device
05/15/2003US20030089858 Electron beam lithography system and method
05/15/2003US20030089853 Electron scatter in a thin membrane to eliminate detector saturation
05/15/2003US20030089852 Apparatus and method for observing sample using electron beam
05/15/2003US20030089851 Analytical method for electron microscopy
05/15/2003US20030089687 Susceptor with built-in electrode and manufacturing method therefor
05/15/2003US20030089686 Inductively coupled plasma source
05/15/2003US20030089685 Electronic beam drawing apparatus, method of regulating electronic beam drawing apparatus, and electronic beam drawing method
05/15/2003US20030089681 Method of modifying an RF circuit of a plasma chamber to increase chamber life and process capabilities
05/15/2003US20030089679 Apparatus and method of detecting endpoint of a dielectric etch
05/15/2003US20030089601 Magnet array in conjunction with rotating magnetron for plasma sputtering
05/15/2003US20030089457 Apparatus for controlling a thermal conductivity profile for a pedestal in a semiconductor wafer processing chamber
05/15/2003US20030089315 Metal film production apparatus
05/15/2003US20030089314 Plasma CVD film-forming device
05/15/2003DE19928053C2 Anordnung zur Erzeugung eines Niedertemperaturplasmas durch eine magnetfeldgestützte Kathodenentladung Arrangement for generating a low temperature plasma by a magnetic field-supported cathode discharge
05/15/2003DE19655207C2 Ionenimplantationsanlage mit Abbremslinsenanordnung Ion implantation system with Abbremslinsenanordnung
05/15/2003CA2463554A1 Non-thermal plasma slit discharge apparatus
05/14/2003EP1310981A1 Toroidal low-field reactive gas source
05/14/2003EP1310980A1 Toroidal low-field reactive gas source
05/14/2003EP1310979A2 Plasma impedance controlling device
05/14/2003EP1310978A1 High performance source for electron beam projection lithography
05/14/2003EP1309983A2 Spatial light modulator driven photocathode source electron beam pattern generator
05/14/2003EP1232293B1 Method for regulating sputtering processes
05/14/2003EP1144722B1 Improved corrosion resistant coating
05/14/2003EP1044459B1 Plasma device including a powered non-magnetic metal member between a plasma ac excitation source and the plasma
05/14/2003EP0871843B1 Mounting member and method for clamping a flat thin conductive workpiece
05/14/2003EP0745266B1 Chromatically compensated particle-beam column
05/14/2003CN1418453A Plasma accelerator arrangement
05/14/2003CN1417827A Field emission type electron source
05/14/2003CN1417372A 阴极溅镀装置 Cathode sputtering apparatus
05/13/2003US6564114 Intensity data, computer
05/13/2003US6563125 Charged-particle-beam microlithography apparatus and methods for preventing coulomb effects using the hollow-beam technique
05/13/2003US6563124 Electron beam apparatus having traversing circuit boards
05/13/2003US6563115 High-density recording scanning microscope
05/13/2003US6563114 Substrate inspecting system using electron beam and substrate inspecting method using electron beam
05/13/2003US6563112 Method for enhancing the contrast for a transmission electron microscope
05/13/2003US6563076 Voltage control sensor and control interface for radio frequency power regulation in a plasma reactor
05/13/2003US6562722 Method and apparatus for dry etching
05/13/2003US6562190 System, apparatus, and method for processing wafer using single frequency RF power in plasma processing chamber
05/13/2003US6562189 Plasma reactor with a tri-magnet plasma confinement apparatus
05/13/2003US6562187 Methods and apparatus for determining an etch endpoint in a plasma processing system
05/13/2003US6562150 Steel sheet for heat shrink band and manufacturing method thereof
05/08/2003WO2003038891A1 Electrostatic wafer holder device
05/08/2003WO2003038889A2 Method and apparatus for nitride spacer etch process implementing in situ interferometry endpoint detection and non-interferometry endpoint monitoring
05/08/2003WO2003038879A2 Methods and apparatus for plasma doping and ion implantation in an integrated processing system
05/08/2003WO2003038872A2 Method and system for monitoring a semiconductor wafer plasma etch process
05/08/2003WO2003038858A2 A semiconductor manufacturing apparatus having a built-in inspection apparatus and method therefor
05/08/2003WO2003038418A1 Elemental analyser, scanning transmission electron microscope, and element analyzing method
05/08/2003WO2003038086A1 Soft ionization device and applications thereof
05/08/2003WO2003037503A1 Microwave plasma generating apparatus
05/08/2003WO2003037386A2 Sterilization of articles using capillary discharge plasma
05/08/2003WO2003007327A3 Shallow-angle interference process and apparatus for determining real-time etching rate
05/08/2003WO2003003404A3 Process chamber components having textured internal surfaces and method of manufacture
05/08/2003US20030087531 Method for etching silicon carbide
05/08/2003US20030087488 Inductively coupled plasma source for improved process uniformity
05/08/2003US20030087044 Device for the regulation of a plasma impedance
05/08/2003US20030086840 To apply plasma processing on a substrate such as a semiconductor
05/08/2003US20030085663 Electron beam ion source with integral low-temperature vaporizer
05/08/2003US20030085662 Plasma process chamber monitoring method and system used therefor
05/08/2003US20030085661 Plasma apparatus
05/08/2003US20030085656 Method and apparatus for stabilizing of the glow plasma discharges
05/08/2003US20030085645 Electron gun and a method for using the same
05/08/2003US20030085365 Methods and devices for evaluating imaging characteristics of a charged-particle-beam microlithography system
05/08/2003US20030085364 High performance source for electron beam projection lithography
05/08/2003US20030085363 Methods for detecting incidence orthogonality of a patterned beam in charged-particle-beam (CPB) microlithography, and CPB microlithography systems that perform same
05/08/2003US20030085361 Phosphor coated waveguide for the efficient collection of electron-generated photons
05/08/2003US20030085360 Electron optics for multi-beam electron beam lithography tool
05/08/2003US20030085356 Ultimate analyzer, scanning transmission electron microscope and ultimate analysis method
05/08/2003US20030085355 Electron beam apparatus, and inspection instrument and inspection process thereof
05/08/2003US20030085354 Method of preventing charging, and apparatus for charged particle beam using the same
05/08/2003US20030085353 Spot grid array electron imaging system
05/08/2003US20030085352 Method and apparatus for scanned instrument calibration
05/08/2003US20030085350 Ultimate analyzer, scanning transmission electron microscope and ultimate analysis method
05/08/2003US20030085206 Susceptor with built-in plasma generation electrode and manufacturing method therefor
05/08/2003US20030085205 Using toroidal cores; forms plasma with high-density of ions along center axis of torus; for ion milling, cutting
05/08/2003US20030085204 Method for molding a polymer surface that reduces particle generation and surface adhesion forces while maintaining a high heat transfer coefficient
05/08/2003US20030085198 Method of detecting etching process end point in semiconductor fabricating equipment and detector therefor
05/08/2003US20030085123 Electro-dip coating while reducing edge migration on stoving by electro-deposition of coating containing heat-curable binder; curing with ultraviolet radiation
05/08/2003US20030085122 Sputtering device
05/08/2003US20030085121 Mesh shield in a sputter reactor
05/08/2003US20030085000 Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber
05/08/2003US20030084999 Apparatus and method for mitigating chamber resonances in plasma processing
05/08/2003US20030084850 Cathode electrode for plasma sources and plasma source of a vacuum coating device, in particular for the application of coating layers on optical substrates
05/08/2003US20030084848 Gas temperature control for a plasma process
05/07/2003EP1308986A2 Plasma etch reactor with dual sources for enhancing both etch selectivity and etch rate
05/07/2003EP1308985A1 System and method for wafer mounting and evacuation in an electron beam irradiation device
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