Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
05/2003
05/29/2003US20030098414 Electron/ion gun for electron or ion beams with high monochromasy or high current density
05/29/2003US20030098367 Processes and systems for determining the identity of metal alloys
05/29/2003US20030098290 Emission spectroscopic processing apparatus and plasma processing method using it
05/29/2003US20030098288 Plasma processing method
05/29/2003US20030098231 Vacuum treatment system and method of manufacturing same
05/29/2003US20030098127 Plasma processing apparatus
05/29/2003US20030098126 Etching apparatus using neutral beam
05/29/2003US20030097987 Plasma CVD apparatus conducting self-cleaning and method of self-cleaning
05/29/2003US20030097986 Arrangement for coupling microwave energy into a treatment chamber
05/29/2003US20030097985 Vacuum processing apparatus and control method therefor
05/29/2003US20030097984 Plasma processing apparatus, method for operating the same, designing system of matching circuit, and plasma processing method
05/28/2003EP1315201A1 Radial antenna and plasma processing apparatus comprising the same
05/28/2003EP1315194A2 Plasma CVD apparatus and method with self-cleaning capability
05/28/2003EP1314183A1 Plasma processing
05/28/2003EP1314182A2 System and method for removing particles entrained in an ion beam
05/28/2003EP1314181A2 Electrostatic trap for particles entrained in an ion beam
05/28/2003EP1314180A2 System and method for removing contaminant particles relative to an ion beam
05/28/2003EP1314179A2 Methods and apparatus for adjusting beam parallelism in ion implanters
05/28/2003EP1314178A1 Environmental scanning electron microscope
05/28/2003EP1313889A1 Method and device for continuous cold plasma deposition of metal coatings
05/28/2003EP1293588A9 Plasma cvd apparatus and method
05/28/2003CN1421043A Plasma processing system and method therefor
05/28/2003CN1420713A Antenna electrode for induction coupling plasma transmitting device
05/28/2003CN1420521A 离子源 Ion source
05/27/2003US6570320 Device for shaping an electron beam, method for producing said device and use thereof
05/27/2003US6570172 Magnetron negative ion sputter source
05/27/2003US6570171 Ion implanter
05/27/2003US6570170 Total release method for sample extraction from a charged-particle instrument
05/27/2003US6570169 Apparatus for manufacturing a semiconductor device and a method for manufacturing a semiconductor device
05/27/2003US6570166 Operation method of ion source and ion beam irradiation apparatus
05/27/2003US6570165 Radiation assisted electron emission device
05/27/2003US6570164 Resolution enhancement device for an optically-coupled image sensor using high extra-mural absorbent fiber
05/27/2003US6570163 Electron detectors
05/27/2003US6570162 Method and apparatus for electron beam irradiation
05/27/2003US6570157 Multi-pitch and line calibration for mask and wafer CD-SEM system
05/27/2003US6570156 Autoadjusting electron microscope
05/27/2003US6570155 Bi-directional electron beam scanning apparatus
05/27/2003US6570154 Scanning electron beam microscope
05/27/2003US6568346 Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply
05/22/2003WO2003043390A2 System for generating a local electron-cyclotron microwave low-pressure plasma at a predetermined location within the processing chamber
05/22/2003WO2003043072A1 Etching method and plasma etcher
05/22/2003WO2003043061A1 Apparatus and method for improving etch rate uniformity
05/22/2003WO2003043052A1 Magnet array in conjunction with rotating magnetron for plasma sputtering
05/22/2003WO2003043051A1 Measurement device for electron microscope
05/22/2003WO2003042424A1 Self-ionized and inductively-coupled plasma for sputtering and resputtering
05/22/2003WO2003018870A3 Device for reactive plasma treatment of substrates and method for the use thereof
05/22/2003WO2003017737A3 Cascade arc plasma and abrasion resistant coatings made therefrom
05/22/2003WO2003015474A3 Auxiliary in-plane magnet inside a nested unbalanced magnetron
05/22/2003WO2002099839A3 Wafer bias drive for a plasma source
05/22/2003WO2002041948A9 Device and method for adapting the size of an ion beam spot in the domain of tumor irradiation
05/22/2003WO2002031859A9 Stepped upper electrode for plasma processing uniformity
05/22/2003US20030096179 Methods and devices for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical system
05/22/2003US20030095072 Antenna electrode for inductively coupled plasma generation apparatus
05/22/2003US20030094903 Selectively controllable gas feed zones for a plasma reactor
05/22/2003US20030094902 Ion source
05/22/2003US20030094584 Charged-particle beam exposure apparatus and device manufacturing method using the same
05/22/2003US20030094583 Wafer holding apparatus for ion implanting system
05/22/2003US20030094572 Inspection system and inspection process for wafer with circuit using charged-particle beam
05/22/2003US20030094366 Plasma processing apparatus with real-time particle filter
05/22/2003US20030094365 Facing-targets-type sputtering apparatus
05/22/2003US20030094362 Source for vacuum treatment process
05/22/2003US20030094239 Apparatus and method for improving electron ecceleration
05/22/2003US20030094238 Plasma processing apparatus for spatial control of dissociation and ionization
05/22/2003US20030094135 Discharges exhaust gas generated as a result of chemical processing
05/22/2003US20030094059 Slide apparatus and its stage mechanism for use in vacuum
05/21/2003EP1313132A1 Toroidal low-field reactive gas source
05/21/2003EP1313131A1 Toroidal low-field reactive gas source
05/21/2003EP1313130A1 Toroidal low-field reactive gas source
05/21/2003EP1313129A1 Toroidal low-field reactive gas source
05/21/2003EP1313128A1 Toroidal low-field reactive gas source
05/21/2003EP1313127A1 Metal film production apparatus
05/21/2003EP1313126A2 Detector arrangement and detecting process
05/21/2003EP1313125A1 Charged-particle beam apparatus equipped with aberration corrector
05/21/2003EP1312695A1 Sputtering target producing few particles, backing plate or sputtering apparatus and sputtering method producing few particles
05/21/2003EP1105917A4 Elastomer bonded parts for plasma processes and method for manufacture and use thereof
05/21/2003EP1064416B1 Method for deposition and etching of a dielectric layer
05/21/2003EP0894332B1 Use of a connecting process and connecting process
05/21/2003CN1109129C Gas-conveying quantitative distributing pipe
05/21/2003CN1109127C Non-balance plane magnetic controlled sputtering cathode and film plating device thereof
05/20/2003US6566897 Voltage contrast method and apparatus for semiconductor inspection using low voltage particle beam
05/20/2003US6566681 Apparatus for assisting backside focused ion beam device modification
05/20/2003US6566666 Method and apparatus for pyroelectric lithography using patterned emitter
05/20/2003US6566664 Charged-particle beam exposure apparatus and device manufacturing method
05/20/2003US6566663 Charged-particle-beam optical components and systems including ferrite exhibiting reduced image displacement from temperature fluctuations
05/20/2003US6566662 Charged beam exposure system
05/20/2003US6566661 Ion implanter with wafer angle and faraday alignment checking
05/20/2003US6566658 Charged particle beam control element, method of fabricating charged particle beam control element, and charged beam apparatus
05/20/2003US6566655 Multi-beam SEM for sidewall imaging
05/20/2003US6566654 Detecting secondary electrons emitted as a result of irradiation of the circuit pattern with the electron beam, forming images of the irradiated first and second regions, extracting a difference between the formed images
05/20/2003US6565791 Method and apparatus for treating the inside surface of plastic bottles in a plasma enhanced process
05/20/2003US6565717 Exterior coil to activate plasma with radio frequency; dielectric window; shields
05/20/2003US6565662 Vacuum processing apparatus for semiconductor process
05/20/2003US6564744 Plasma CVD method and apparatus
05/15/2003WO2003041460A1 Plasma process apparatus and its processor
05/15/2003WO2003041453A1 Inorganic material evaporation apparatus
05/15/2003WO2003041136A1 Electron beam exposure device
05/15/2003WO2003041113A1 Magnetron sputtering device
05/15/2003WO2003041112A2 Non-thermal plasma slit discharge apparatus
05/15/2003WO2003041111A1 Microwave plasma generator
05/15/2003WO2003041110A2 Method for molding a polymer surface
1 ... 267 268 269 270 271 272 273 274 275 276 277 278 279 280 281 282 283 284 285 286 287 ... 469