Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
06/2003
06/12/2003US20030106881 Dry surface cleaning apparatus
06/12/2003US20030106793 Electrode for plasma processing system
06/12/2003US20030106788 Dielectric with slit; segmented electrode
06/12/2003US20030106646 Plasma chamber insert ring
06/12/2003US20030106645 Vacuum plasma processor apparatus and method
06/12/2003US20030106644 Electrode apparatus and method for plasma processing
06/12/2003US20030106643 Surface treatment apparatus
06/12/2003US20030106641 Plasama processing system and method
06/12/2003DE10207835C1 Channel spark source for a stable electron beam e.g. an electron gun, has a conical sleeve in the hollow cathode with a gas feed and an adjusted pressure drop to give a large number of shots without loss of beam quality
06/12/2003CA2468760A1 Electron source
06/11/2003EP1318539A1 Corrector for the correction of first-order colour aberrations, first grade
06/11/2003EP1318430A2 Reticle chambers and reticle cassettes providing temperature control and ready exchange of reticles for exposure
06/11/2003EP1318211A1 Arrangement for monitoring a thickness of a layer depositing on a sidewall of a processing chamber
06/11/2003EP1318210A2 Method for deposition and etching of a dielectric layer
06/11/2003EP1317764A2 Faraday system for ion implanters
06/11/2003EP1015843B1 Lever arm for a scanning microscope
06/11/2003EP0992053B1 Gated photocathode for controlled single and multiple electron beam emission
06/11/2003EP0958590B1 Environmental sem with multipole fields for improved secondary electron detection
06/11/2003EP0944745B1 Process and device for forming a coating on a substrate by cathode sputtering
06/11/2003CN1423916A High frequency plasma source
06/11/2003CN1423828A Method and apparatus for controlling the volume of a plasma
06/11/2003CN1423827A Method and apparatus for producing uniform process rates
06/11/2003CN1423826A Temperature control system for plasma processing apparatus
06/11/2003CN1423825A Plasma processing system with dynamic gas distribution control
06/11/2003CN1423824A Materials and gas chemistries for processing systems
06/10/2003US6577915 To predict ion and neutral flux distributions on a substrate as a function of reactor settings using a calibrated profile simulator during semiconductor plasma processing
06/10/2003US6577113 Apparatus and method for measuring substrate biasing during plasma processing of a substrate
06/10/2003US6576981 Reduced particulate etching
06/10/2003US6576914 Redundant printing in e-beam lithography
06/10/2003US6576913 Gas injector provided with a plurality of gas supply pipes each having a nozzle at one end for ejecting a gas and a housing in which the plurality of gas supply pipes are slidably accommodated
06/10/2003US6576910 Sample holder, sample mount and sample mount jig for use in electron microscope
06/10/2003US6576909 Ion generation chamber
06/10/2003US6576908 Beam column for charged particle beam device
06/10/2003US6576902 Correction method of scanning electron microscope
06/10/2003US6576860 Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate
06/10/2003US6576564 Photo-assisted remote plasma apparatus and method
06/10/2003US6576529 Method of forming an alignment feature in or on a multilayered semiconductor structure
06/10/2003US6576202 Highly efficient compact capacitance coupled plasma reactor/generator and method
06/10/2003US6576063 Apparatus and method for use in manufacturing a semiconductor device
06/10/2003US6575552 Positive pulsed voltage and a negative pulsed voltage is applied to the article in a plasma containing ions to be implanted to implant ions in the article surface. This implants ions at right angles
06/10/2003CA2234031C Dual-walled exhaust tube for vacuum pump
06/05/2003WO2003046970A1 Low temperature compatible wide-pressure-range plasma flow device
06/05/2003WO2003046963A1 Exposure method and exposure apparatus using complementary division mask, and semiconductor device and method for making the same
06/05/2003WO2003046959A1 Plasma processing system
06/05/2003WO2003023516A3 Diagnosis of an error of a charged particle system
06/05/2003US20030104142 Generation and control of a magnetic field by a magnetic filter.
06/05/2003US20030104141 Atmospheric pressure; thin film deposits on silicon surfaces for solar cells
06/05/2003US20030104139 Apparatus for depositing a plasma chemical vapor deposition coating on the inside of an optical fiber preform
06/05/2003US20030103877 Adjustable segmented electrode apparatus and method
06/05/2003US20030102811 Plasma coil
06/05/2003US20030102443 Esposure method, electron beam exposure apparatus and fabrication method of electronic device
06/05/2003US20030102442 Circuits and methods for electron-beam control
06/05/2003US20030102438 Magnetic shunt assembly for an exposure apparatus
06/05/2003US20030102436 Column simultaneously focusing a particle beam and an optical beam
06/05/2003US20030102430 Scanning electron microscope system
06/05/2003US20030102208 Low pressure ionization; using magnet
06/05/2003US20030102087 Plasma processing apparatus and processing method
06/05/2003US20030102083 Apparatus and method for monitoring plasma processing apparatus
06/05/2003US20030101935 Dose uniformity control for plasma doping systems
06/05/2003US20030101934 Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processes
06/05/2003US20030101613 Cleaning efficiency improvement in a high density plasma process chamber using thermally hot gas
06/05/2003DE20220315U1 Device for etching semiconductor body has substrate electrode arranged in etching chamber, and units for etching semiconductor body received by electrode
06/04/2003EP1316986A1 Vacuum arc vapor deposition process and apparatus
06/04/2003EP1316105A1 Plasma enhanced gas reactor
06/04/2003EP1316104A2 Bulk gas delivery system for ion implanters
06/04/2003EP1315844A1 Gcib size diagnostics and workpiece processing
06/04/2003EP0994973B1 Apparatus and method for nucleation and deposition of diamond using hot-filament dc plasma
06/04/2003CN1422434A Apparatus and methods for actively controlling RF peak-to-peak voltage in an inductively coupled plasma etching system
06/03/2003US6574789 Exposing method and apparatus for semiconductor integrated circuits
06/03/2003US6573736 Primary ion or electron current adjustment to enhance voltage contrast effect
06/03/2003US6573735 Reliability of vias and diagnosis by e-beam probing
06/03/2003US6573731 A system for measuring at least one of a plasma density and an electron density in at least one of a plasma source, a plasma chamber and an electron source of a semiconductor processing system, the system comprising: a transmitter a
06/03/2003US6573520 Electron beam lithography system
06/03/2003US6573519 Electron beam exposure apparatus, adjusting method, and block mask for adjustment
06/03/2003US6573518 Bi mode ion implantation with non-parallel ion beams
06/03/2003US6573517 Ion implantation apparatus
06/03/2003US6573516 Electron-beam lithography method and electron-beam lithography system
06/03/2003US6573515 Charged-particle-beam projection-exposure apparatus and methods exhibiting improved alignment and registration of projected pattern portions
06/03/2003US6573514 Method for aligning electron beam projection lithography tool
06/03/2003US6573511 Electron beam irradiation system and electron beam irradiation method
06/03/2003US6573509 Detection system
06/03/2003US6573508 Electron beam exposing method
06/03/2003US6573502 Combined electron microscope
06/03/2003US6573501 Holography transmission electron microscope
06/03/2003US6573014 Dividing patterns
06/03/2003US6572744 Dual collimated deposition apparatus and method of use
06/03/2003US6572738 Vacuum treatment system and process for manufacturing workpieces
06/03/2003US6572732 Parallel-plate electrode plasma reactor having an inductive antenna coupling power through a parallel plate electrode
05/2003
05/30/2003WO2003044842A1 Etching method and apparatus
05/30/2003WO2003044837A2 Ion imlantation method and apparatus
05/30/2003WO2003044824A1 Device for controlling an apparatus generating a charged particle beam
05/30/2003WO2003044821A1 Sample imaging method and charged particle beam system
05/30/2003WO2003044240A1 Ionic plasma deposition apparatus
05/30/2003WO2002095788A3 Compact independent pressure control and vacuum isolation for a turbomolecular pumped plasma reaction chamber
05/30/2003WO2002082496A3 Method and system for controlling beam scanning in an ion implantation device
05/30/2003WO2002033725A3 System and method for rapidly controlling the output of an ion source for ion implantation
05/30/2003CA2466936A1 Device for controlling an apparatus generating a charged particle beam
05/29/2003US20030099784 To produce uniform coating on a substrate
05/29/2003US20030098424 System to reduce heat-induced distortion of photomasks during lithography
05/29/2003US20030098416 System and method for directing a miller
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