Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
06/2003
06/25/2003EP1321537A1 Cylindrical target and method of manufacturing the cylindrical target
06/25/2003EP1320882A2 Method and system for determining pressure compensation factors in an ion implanter
06/25/2003EP1320867A2 Reducing deposition of process residues on a surface in a chamber
06/25/2003EP1320866A2 An apparatus for the backside gas cooling of a wafer in a batch ion implantation system
06/25/2003EP1320865A2 System and method for delivering cooling gas from atmospheric pressure to a high vacuum through a rotating seal in a batch ion implanter
06/25/2003EP1320784A1 Method for high yield reticle formation
06/25/2003EP0894320B1 Thin-film magnetic recording heads and systems and methods for manufacturing the same
06/25/2003CN1426671A High-frequency matching network
06/25/2003CN1426461A Method of producing membrane vesicles
06/25/2003CN1426090A Inductive coupling type plasma device
06/24/2003US6583597 Stage apparatus including non-containing gas bearings and microlithography apparatus comprising same
06/24/2003US6583572 Inductive plasma processor including current sensor for plasma excitation coil
06/24/2003US6583544 Ion source having replaceable and sputterable solid source material
06/24/2003US6583431 Charged particle beam lithography apparatus for forming pattern on semi-conductor
06/24/2003US6583430 Electron beam exposure method and apparatus
06/24/2003US6583429 Method and apparatus for improved ion bunching in an ion implantation system
06/24/2003US6583428 Apparatus for the backside gas cooling of a wafer in a batch ion implantation system
06/24/2003US6583427 Extended life source arc chamber liners
06/24/2003US6583426 Projection ion beam machining apparatus
06/24/2003US6583421 Charge measuring device with wide dynamic range
06/24/2003US6583413 Method of inspecting a circuit pattern and inspecting instrument
06/24/2003US6583411 Multiple local probe measuring device and method
06/24/2003US6583064 Low contamination high density plasma etch chambers and methods for making the same
06/24/2003US6582778 Method of treatment with a microwave plasma
06/24/2003US6582618 Method of determining etch endpoint using principal components analysis of optical emission spectra
06/24/2003US6582569 A DC magnetron sputter reactor for sputtering copper, its method of use, and shields and other parts promoting self-ionized plasma (SIP) sputtering. Also, a method of coating copper into a narrow and deep via or trench using SIP
06/24/2003US6582551 Apparatus for plasma etching having rotating coil responsive to slide valve rotation
06/19/2003WO2003050924A1 Restricted getter
06/19/2003WO2003050842A1 Method and device for removing harmonics in semiconductor plasma processing systems
06/19/2003WO2003050841A1 A photoelectron emission microscope for wafer and reticle inspection
06/19/2003WO2003034463A3 Tunable multi-zone gas injection system
06/19/2003WO2003015133A3 Showerhead electrode design for semiconductor processing reactor
06/19/2003US20030113945 Disturbance-free, recipe-controlled plasma processing system and method
06/19/2003US20030113479 Atmospheric pressure plasma treatmet apparatus and atmospheric pressure plasma treatment method
06/19/2003US20030112485 Light scanning system
06/19/2003US20030111963 Inductively coupled plasma system
06/19/2003US20030111962 Plasma reactor with spoke antenna having a VHF mode with the spokes in phase
06/19/2003US20030111961 Gas distribution plate electrode for a plasma reactor
06/19/2003US20030111948 Method and apparatus for deflecting and focusing a charged particle stream
06/19/2003US20030111619 Electron beam exposure apparatus and exposing method using an electron beam
06/19/2003US20030111618 Methods and devices for detecting a distribution of charged-particle density of a charged-particle beam in charged-particle-beam microlithography systems
06/19/2003US20030111617 Wafer pedestal tilt mechanism
06/19/2003US20030111616 Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application method
06/19/2003US20030111614 Stage devices including linear motors that produce reduced beam-perturbing stray magnetic fields, and charged-particle-beam microlithography systems comprising same
06/19/2003US20030111613 Corrector for correcting first-order chromatic aberrations of the first degree
06/19/2003US20030111602 Method of forming a sample image and charged particle beam apparatus
06/19/2003US20030111601 Photoelectron emission microscope for wafer and reticle inspection
06/19/2003US20030111442 Method for controlling chamber inner wall surface of an inductively coupled plasma etching apparatus
06/19/2003US20030111342 Sputter coating apparatus
06/19/2003US20030111337 Sensing and outputting a signal indicating an amplitude of a direct current bias
06/19/2003US20030111181 Inductive antenna for a plasma reactor producing reduced fluorine dissociation
06/19/2003US20030111179 Etcher for semiconductor manufacturing
06/19/2003US20030111015 Reaction chamber with at least one HF feedthrough
06/18/2003EP1320118A2 Reactor for simultaneously coating both sides of spectacle glasses
06/18/2003EP1320117A2 Method for defect and conductivity engineering of a conducting nanoscaled structure
06/18/2003EP1319239A2 Apparatus for etching semiconductor samples and a source for providing a gas by sublimation thereto
06/18/2003EP1319238A2 Apparatus for magnetically scanning and/or switching a charged-particle beam
06/18/2003DE19937859C2 Elektrische Versorgungseinheit für Plasmaanlagen Electrical supply unit for plasma systems
06/18/2003CN1425188A 半导体处理设备 Semiconductor processing equipment
06/18/2003CN1425187A Method and apparatus for ionized physical vapor deposition
06/18/2003CN1425186A Method and device for separating ion mass, and ion doping device
06/18/2003CN1424867A Ion beam radiation device and method for choking basis charge accumulation
06/18/2003CN1424627A Exposure method and device
06/18/2003CN1424428A Method and device for vacuum arc vapour deposition
06/17/2003US6580083 High efficiency scanning in ion implanters
06/17/2003US6580082 System and method for delivering cooling gas from atmospheric pressure to a high vacuum through a rotating seal in a batch ion implanter
06/17/2003US6580076 Micro-manipulation method
06/17/2003US6580075 Charged particle beam scanning type automatic inspecting apparatus
06/17/2003US6580074 Charged particle beam emitting device
06/17/2003US6580073 Monochromator for charged particles
06/17/2003US6580069 Atom probe
06/17/2003US6579811 Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps through wafer heating
06/17/2003US6579665 Focused particle beam system for milling a recording head pole-tip without irradiating a read head
06/17/2003US6579426 Use of variable impedance to control coil sputter distribution
06/17/2003US6579424 Method for the production of substrates, magnetron source and sputter-coating chamber
06/17/2003US6579421 Transverse magnetic field for ionized sputter deposition
06/17/2003US6578881 Fluid-tight pipe union
06/17/2003US6578515 Film formation apparatus comprising movable gas introduction members
06/17/2003US6578514 Modular device of tubular plasma source
06/13/2003CA2414390A1 Volume-optimized reactor for simultaneously coating eyeglasses on both sides
06/12/2003WO2003049171A1 Exhaust ring mechanism, and plasma treatment device using the exhaust ring mechanism
06/12/2003WO2003049170A1 Plasma processing device
06/12/2003WO2003049169A1 Plasma etching method and plasma etching device
06/12/2003WO2003049142A1 Uniformity control for plasma doping systems
06/12/2003WO2003049141A2 Device for applying an electromagnetic microwave to a plasma container
06/12/2003WO2003049140A1 Optical particle corrector
06/12/2003WO2003049139A1 Electron source
06/12/2003WO2003048415A1 Arrangement for monitoring a thickness of a layer depositing on a sidewall of a processing chamber
06/12/2003WO2003048409A1 Apparatus for depositing a plasma chemical vapor deposition coating on the inside of an optical fiber preform
06/12/2003WO2003048407A1 Gcib processing to improve interconnection vias and improved interconnection via
06/12/2003WO2002099840A3 Inductively-coupled plasma processing system
06/12/2003WO2002079815B1 Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source
06/12/2003US20030109147 Method of forming silicon oxide layer and method of manufacturing thin film transistor thereby
06/12/2003US20030109092 Surface smoothing device and method thereof
06/12/2003US20030107317 Restricted getter
06/12/2003US20030107009 Electron beam exposure apparatus and electron beam exposure method
06/12/2003US20030107008 Lithographic method using variable-area electron-beam lithography machine
06/12/2003US20030107007 Electron exposure device and method and electronic characteristics evaluation device using scanning probe
06/12/2003US20030107006 Charged particle beam exposure method and apparatus
06/12/2003US20030106999 Process conditions change monitoring systems that use electron beams, and related monitoring methods
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