Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
07/2003
07/08/2003US6589611 Forming a material along the sidewalls during the forming of the deposit over the substrate; impacting the material along the sidewalls with the activated species to treat the material and thereby decrease flaking
07/08/2003US6589437 Active species control with time-modulated plasma
07/08/2003US6589407 Aluminum deposition shield
07/08/2003US6589350 Vacuum processing chamber with controlled gas supply valve
07/08/2003US6588090 Fabrication method of high precision, thermally stable electromagnetic coil vanes
07/08/2003CA2248250C Device for generating powerful microwave plasmas
07/03/2003WO2003055287A2 Plasma reactor with overhead rf electrode tuned to the plasma with arcing suppression
07/03/2003WO2003055286A1 High-frequency power source and its control method, and plasma processor
07/03/2003WO2003054949A1 Substrate processing method and substrate processing apparatus
07/03/2003WO2003054947A1 Ring mechanism, and plasma processing device using the ring mechanism
07/03/2003WO2003054941A1 Plasma treatment apparatus and control method thereof
07/03/2003WO2003054940A1 Plasma treatment apparatus, matching box, impedance matching device, and coupler
07/03/2003WO2003054913A2 Gas distribution plate electrode for a plasma reactor
07/03/2003WO2003054912A1 Method and apparatus comprising a magnetic filter for plasma processing a workpiece
07/03/2003WO2003054911A2 Plasma process apparatus
07/03/2003WO2003054910A1 Device for treating objects by plasma deposition
07/03/2003WO2003054909A1 Scanning electron microscope assembly and method for using same
07/03/2003WO2003054248A1 Plasma chamber insert ring
07/03/2003WO2003054245A1 Device for producing pcvd coated glass tubes for the drawing of optical fibers
07/03/2003WO2003032434B1 Plasma production device and method and rf driver circuit
07/03/2003WO2002103337A3 Electron beam apparatus and method for using said apparatus
07/03/2003WO2002091453A9 High pressure wafer-less auto clean for etch applications
07/03/2003US20030125874 Method of presuming traffic conditions by using floating car data and system for presuming and presenting traffic conditions by using floating data
07/03/2003US20030124876 Apparatus and method for use in manufacturing a semiconductor device
07/03/2003US20030124846 Multi-step process for depositing copper seed layer in a via
07/03/2003US20030124442 Electron beam exposure method using variable backward scattering coefficient and computer-readable recording medium having thereof
07/03/2003US20030124250 Device for producing PCVD coated glass tubes for the drawing of optical fibers
07/03/2003US20030123992 Linear inductive plasma pump for process reactors
07/03/2003US20030122091 Maskless photon-electron spot-grid array printer
07/03/2003US20030122090 Ion beam processing method and apparatus therefor
07/03/2003US20030122089 Ion sources for ion implantation apparatus
07/03/2003US20030122088 Scan methods and apparatus for ion implantation
07/03/2003US20030122087 Exposure apparatus, control method thereof, and device manufacturing method
07/03/2003US20030122085 Field ionization ion source
07/03/2003US20030122076 Charged-particle beam apparatus equipped with aberration corrector
07/03/2003US20030122075 Design for an electron holography microscope
07/03/2003US20030122074 Scanning electron microscope
07/03/2003US20030121887 Multi-component substances and processes for preparation thereof
07/03/2003US20030121886 Method of adjusting the thickness of an electrode in a plasma processing system
07/03/2003US20030121609 Plasma etching device
07/03/2003US20030121474 Apparatus for fixing an electrode in plasma polymerizing apparatus
07/03/2003CA2469863A1 Device for treating objects by plasma deposition
07/02/2003EP1324381A1 Workpiece holding mechanism
07/02/2003EP1324371A1 Plasma processing apparatus
07/02/2003EP1324073A2 Charged particle measuring apparatus
07/02/2003EP1323671A1 Process for the fabrication of at least one nanotube between two electrically conductive elements and device for carrying out this process
07/02/2003EP1323338A1 Electrode for glow-discharge atmospheric plasma treatment
07/02/2003EP1323180A2 System, apparatus, and method for processing wafer using single frequency rf power in plasma processing chamber
07/02/2003EP1323179A2 Wafer area pressure control for plasma confinement
07/02/2003EP1322796A2 High purity sputter targets with target end-of-life indication and method of manufacture
07/02/2003EP1322444A1 Method of manufacturing sputter targets with internal cooling channels
07/02/2003EP1198611B1 Device for treating a container with microwave plasma
07/02/2003EP1053563B1 Methods for reducing mask erosion during plasma etching
07/02/2003EP0972284B1 Electric or electronic component and application as non volatile memory and device with surface acoustic waves
07/02/2003EP0822996B1 Sputtering system using cylindrical rotating magnetron electrically powered using alternating current
07/02/2003CN1428001A Control system for indirectly heated cathode ion source
07/02/2003CN1427446A Ion injection device and method thereof
07/02/2003CN1427445A Defect and conductivity processing method for conductive nano-structure
07/02/2003CN1113397C Plasma processing method and apparatus
07/01/2003US6587581 Visual inspection method and apparatus therefor
07/01/2003US6587019 Dual directional harmonics dissipation system
07/01/2003US6586887 High-frequency power supply apparatus for plasma generation apparatus
07/01/2003US6586886 Gas distribution plate electrode for a plasma reactor
07/01/2003US6586753 Electron beam apparatus and electron beam adjusting method
07/01/2003US6586746 Multipole electrostatic e-beam deflector
07/01/2003US6586737 Transmission electron microscope equipped with energy filter
07/01/2003US6586736 Scanning electron beam microscope having an electrode for controlling charge build up during scanning of a sample
07/01/2003US6586735 Method for detecting an element in a sample
07/01/2003US6586733 Apparatus and methods for secondary electron emission microscope with dual beam
07/01/2003US6586262 Etching end-point detecting method
07/01/2003US6586055 Method for depositing functionally gradient thin film
07/01/2003US6585908 Shallow angle interference process and apparatus for determining real-time etching rate
07/01/2003US6585907 Method for manufacturing a shield for an inductively-couple plasma apparatus
07/01/2003US6585871 Method of film deposition on substrate surface and substrate produced by the method
07/01/2003US6585851 Plasma etching device
06/2003
06/26/2003WO2003052807A1 Plasma processor
06/26/2003WO2003052806A1 Plasma treatment apparatus and plasma generation method
06/26/2003WO2003052801A2 Wafer pad assembly
06/26/2003WO2003052790A2 Lens array with a laterally movable optical axis for corpuscular rays
06/26/2003WO2003052161A1 Method for connecting magnetic substance target to backing plate, and magnetic substance target
06/26/2003WO2002003402A8 Device for orienting the direction of magnetization of magnetic layers
06/26/2003US20030119328 Plasma processing apparatus, and cleaning method therefor
06/26/2003US20030119215 Method and system for determining a performance of plasma etch equipment
06/26/2003US20030117080 Applied plasma duct system
06/26/2003US20030116722 Apparatus wherein ionizing radiation is generated
06/26/2003US20030116721 Electron beam drawing apparatus
06/26/2003US20030116720 Analyzer/observer
06/26/2003US20030116718 System and method for electron beam irradiation
06/26/2003US20030116717 Detector arrangement and detection method
06/26/2003US20030116710 Method for increasing the measurement information available from a transmission electron microscope and a transmission electron microscopy device
06/26/2003US20030116709 Scanning-type instrument utilizing charged-particle beam and method of controlling same
06/26/2003US20030116432 Adjustable throw reactor
06/26/2003US20030116427 Self-ionized and inductively-coupled plasma for sputtering and resputtering
06/26/2003US20030116425 Electric arc spraying; controlling film thickness, surface roughness
06/26/2003US20030116281 Atmospheric pressure plasma system
06/26/2003US20030116277 Semiconductor etching apparatus and method of etching semiconductor devices using same
06/26/2003US20030116090 Apparatus and method for direct current plasma immersion ion implantation
06/26/2003US20030116089 Plasma implantation system and method with target movement
06/25/2003EP1321963A1 Plasma processing method and plasma processing apparatus
06/25/2003EP1321959A1 Ionizing radiation generating device