| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/23/2003 | EP1329937A2 Annular illumination method for charged particle projection optics |
| 07/23/2003 | EP1329936A1 Phase contrast electron microscope with ring-shaped illumination aperture |
| 07/23/2003 | EP1329686A2 Integrated measuring instrument |
| 07/23/2003 | EP1328961A2 A probe assembly for detecting an ion in a plasma generated in an ion source |
| 07/23/2003 | EP0840941B1 Method of and apparatus for controlling reactive impedances of a matching network connected between an rf source and an rf plasma processor |
| 07/23/2003 | CN1432190A Enhanced resist strip in dielectric ethcher using downstream plasma |
| 07/23/2003 | CN1432189A Method and appts. for varying magnetic field to control volume of plasma |
| 07/23/2003 | CN1432188A Method and appts. for forming inner magnetic bucket to control volume of plasma |
| 07/23/2003 | CN1432187A Method and appts. for controlling ion implantation during vacuum fluctuation |
| 07/23/2003 | CN1115581C Heatable sample platform for scanning probe microscope |
| 07/22/2003 | US6597117 Plasma coil |
| 07/22/2003 | US6597001 Method of electron-beam exposure and mask and electron-beam exposure system used therein |
| 07/22/2003 | US6596999 High performance source for electron beam projection lithography |
| 07/22/2003 | US6596993 Method of automatically correcting magnification and non-linearity of scanning electron microscope |
| 07/22/2003 | US6596649 Method and apparatus for supplying gas used in semiconductor processing |
| 07/22/2003 | US6596550 Method for monitoring substrate biasing during plasma processing of a substrate |
| 07/22/2003 | US6596138 Sputtering apparatus |
| 07/22/2003 | US6596133 Thin film material layers; microelectronics; PVD target is offset from the central axis to provide material to the substrate at an angle; processing efficiency; copper |
| 07/17/2003 | WO2003058671A2 Target end station for the combinatory ion implantation and method of ion implantation |
| 07/17/2003 | WO2003058202A2 System and method of detecting, neutralizing, and containing suspected contaminated articles |
| 07/17/2003 | WO2003057939A2 Cathode for vacuum arc evaporators |
| 07/17/2003 | WO2002031891A9 Electrode and electron emission applications for n-type doped nanocrystalline materials |
| 07/17/2003 | US20030134051 Substrate has been coated so as to be conducting by means of gas placed in region of an electric discharge; process is especially suitable for treating band-shaped and continuously supplied substrates |
| 07/17/2003 | US20030134038 Depositing material on substrate by atomic layer processing including injecting series of gases sequentially into reactant chamber without purging one gas from chamber prior to injection of another gas |
| 07/17/2003 | US20030132397 Method of and apparatus for ensuring proper orientation of an object for ion implantion |
| 07/17/2003 | US20030132383 Electron microscope with annular illuminating aperture |
| 07/17/2003 | US20030132374 Semiconductor calibration wafer with no charge effect |
| 07/17/2003 | US20030132196 Precise, in-situ endpoint detection for charged particle beam processing |
| 07/17/2003 | US20030132195 Plasma processing method and apparatus using dynamic sensing of a plasma environment |
| 07/17/2003 | US20030132106 Controlled magnetron shape for uniformly sputtered thin film |
| 07/17/2003 | US20030131794 Motorized chamber lid |
| 07/17/2003 | US20030131469 Method of manufacturing an electrode for a plasma reactor and an electrode |
| 07/16/2003 | EP1264330B1 Method and device for the plasma-activated surface treatment and use of the inventive method |
| 07/16/2003 | EP0968524A4 Atmospheric-pressure plasma jet |
| 07/16/2003 | EP0853813B1 Resolution-enhancement device for an optically-coupled image sensor for an electron microscope |
| 07/16/2003 | CN1430257A Ion irradiating device |
| 07/16/2003 | CN1430247A Match circuit and plasma processing device |
| 07/16/2003 | CN1429929A Method and device of monitering ion concentration in etching cavity body in sputtering etching process |
| 07/16/2003 | CN1114935C Electron beam aperture element |
| 07/15/2003 | US6594337 X-ray diagnostic system |
| 07/15/2003 | US6593699 Pads comprising RTV silicone rubbers on foundations having coolant fliuds and disks on shafts for rotation, used for semiconductors dopes |
| 07/15/2003 | US6593686 Electron gun and electron beam drawing apparatus using the same |
| 07/15/2003 | US6593584 Multi-beam lithography apparatus with mutually different beam limiting apertures |
| 07/15/2003 | US6593583 Ion beam processing position correction method |
| 07/15/2003 | US6593581 Object carrier for a particle-optical apparatus |
| 07/15/2003 | US6593580 Ion source vaporizer |
| 07/15/2003 | US6593578 Wien filter for use in a scanning electron microscope or the like |
| 07/15/2003 | US6593507 Method of decomposing organic halide |
| 07/15/2003 | US6593231 Process of manufacturing electron microscopic sample and process of analyzing semiconductor device |
| 07/15/2003 | US6593153 Method of and apparatus for measuring lattice-constant, and computer program |
| 07/15/2003 | US6593152 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus |
| 07/15/2003 | US6592817 Monitoring an effluent from a chamber |
| 07/15/2003 | US6592728 Dual collimated deposition apparatus and method of use |
| 07/15/2003 | US6592726 Wear resistant coating layer excellent in bonding strength and with little surface roughness; molten particles (droplets) are not readily produced at the same time atoms are transformed to plasma by arc discharges |
| 07/15/2003 | US6592710 Apparatus for controlling the voltage applied to an electrostatic shield used in a plasma generator |
| 07/15/2003 | US6592709 Method and apparatus for plasma processing |
| 07/15/2003 | US6592707 Corrosion-resistant protective coating for an apparatus and method for processing a substrate |
| 07/10/2003 | WO2003056618A1 Plasma treatment apparatus |
| 07/10/2003 | WO2003056603A2 Self-ionized and inductively-coupled plasma for sputtering and resputtering |
| 07/10/2003 | WO2003056602A1 Portable apparatus and method for treating a workpiece |
| 07/10/2003 | WO2003056601A2 Apparatus and method for treating a workpiece using plasma generated from microwave radiation |
| 07/10/2003 | WO2003056060A1 Method of tisin deposition using a chemical vapor deposition process |
| 07/10/2003 | US20030130803 Method of analysing crystalline texture |
| 07/10/2003 | US20030129851 Plasma deposition method and system |
| 07/10/2003 | US20030129835 Efficient cleaning by secondary in-situ activation of etch precursor from remote plasma source |
| 07/10/2003 | US20030129107 Electrocconductive, monolithic electrode overcoated with dielectric; positioning within gas passageways |
| 07/10/2003 | US20030129106 Semiconductor processing using an efficiently coupled gas source |
| 07/10/2003 | US20030129104 Plate shaped substrate; perpendicular magnet |
| 07/10/2003 | US20030127606 Ion implanting apparatus and ion implanting method |
| 07/10/2003 | US20030127604 Scanning electron microscope |
| 07/10/2003 | US20030127595 Method and apparatus for scanning transmission electron microscopy |
| 07/10/2003 | US20030127594 Point source for producing electrons beams |
| 07/10/2003 | US20030127593 Apparatus and method for wafer pattern inspection |
| 07/10/2003 | US20030127433 Automated electrode replacement apparatus for a plasma processing system |
| 07/10/2003 | US20030127322 Sputtering apparatus and magnetron unit |
| 07/10/2003 | US20030127191 Plasma generation apparatus |
| 07/10/2003 | US20030127190 Channel sleeve, improved plasma processing chamber containing channel sleeve, and methods of making and using the same |
| 07/10/2003 | US20030127188 Semiconductor device manufacturing system for etching a semiconductor by plasma discharge |
| 07/10/2003 | US20030127049 Anodizing a yttrium aluminum alloy by ion implantation of oxygen to form a yttrium aluminum oxide |
| 07/10/2003 | DE10142592C2 Verfahren zur Justierung und Belichtung der zweiten Ebene einer Phasenschiebemaske Procedures for calibration and exposure of the second level of a phase shift mask |
| 07/09/2003 | EP1325969A2 Ion plating method and system for forming a wiring on a semiconductor device |
| 07/09/2003 | EP1325509A1 Method and device for treating surfaces using a glow discharge plasma |
| 07/09/2003 | EP1325304A1 Afterglow emission spectroscopy monitor |
| 07/09/2003 | EP1070155A4 Integrated ion implant scrubber system |
| 07/09/2003 | EP0892860B1 Cathodic sputtering device |
| 07/09/2003 | EP0758408B1 Rectangular vacuum-arc plasma source |
| 07/09/2003 | CN2560091Y Electronic microscope with high time resolution |
| 07/09/2003 | CN1429404A Processing device and method of maintaining device, mechanism and method for assembling processing device part, and lock mechanism and method for locking the lock mechanism |
| 07/09/2003 | CN1429399A Method of adjusting thickness of electrode in plasma processing system |
| 07/09/2003 | CN1429398A Linear drive system for use in plasma processing system |
| 07/09/2003 | CN1429397A High efficiency scanning in ion implanters |
| 07/09/2003 | CN1113978C Dual frequency excitation of plasma for film deposition |
| 07/08/2003 | US6591412 Methods for dividing a pattern in a segmented reticle for charged-particle-beam microlithography |
| 07/08/2003 | US6590344 Selectively controllable gas feed zones for a plasma reactor |
| 07/08/2003 | US6590218 Projection-exposure methods and apparatus exhibiting increased throughput |
| 07/08/2003 | US6590216 Servo control for high emittance electron source |
| 07/08/2003 | US6590212 Microelectromechanical system assembly and testing device |
| 07/08/2003 | US6590210 Scanning electron microscope |
| 07/08/2003 | US6590179 Plasma processing apparatus and method |
| 07/08/2003 | US6589868 Si seasoning to reduce particles, extend clean frequency, block mobile ions and increase chamber throughput |