Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
08/2003
08/07/2003US20030148041 First partial device comprising a first waveguide for coupling in microwave energy, a first gas supply apparatus and a first apparatus for evacuating a coating chamber; a second partial device comprising a second waveguide for coupling in microwave
08/07/2003US20030146707 Ion beam generator
08/07/2003US20030146397 Charged particle beam drawing apparatus and pattern forming method
08/07/2003US20030146382 Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application method
08/07/2003US20030146087 Using magnetrons; reducing power sources, erosion; controlling scanning position of magnet; thin film transistor, liquid crystal display
08/07/2003US20030146085 Single piece pod shield for vertical plenum wafer processing machine
08/07/2003US20030146084 Posiitoning in vacuum; magnetron sputtering ferromagnetic material on wafer
08/07/2003US20030146083 Passive bipolar arc control system and method
08/07/2003US20030145952 Method and apparatus for producing uniform process rates
08/07/2003US20030145951 Apparatus including chuck and matching box
08/07/2003US20030145950 Workpiece holding mechanism
08/07/2003US20030145788 Plasma CVD apparatus
08/06/2003EP1333475A1 Method for manufacturing semiconductor device, substrate treater, and substrate treatment system
08/06/2003EP1333466A2 Exposure apparatus, control method thereof, and device manufacturing method
08/06/2003EP1332652A2 Mechanism for prevention of neutron radiation in ion implanter beamline
08/06/2003EP1332511A1 Device for treating gas with plasma
08/06/2003EP1332510A1 Real time monitoring for simultaneous imaging and exposure in charged particle beam systems
08/06/2003EP1332509A1 Focused ion beam system
08/06/2003EP1259974A4 Through-the-lens collection of secondary particles for a focused ion beam system
08/06/2003EP1173629B1 Vacuum cathodic arc evaporation process for the preparation of wear resistant coatings
08/06/2003EP0966753B1 Ultra-high tilt specimen cryotransfer holder for electron microscope
08/06/2003CN1117390C System and method for neutralizing ion beam using water vapor
08/06/2003CN1117387C Ion-implanter having variable ion angle control
08/06/2003CN1117176C PCVD apparatus and method of manufacturing optical filber, preform rod and jacket tube as well as the optical fibre manufactured therewith
08/05/2003US6603269 Resonant chamber applicator for remote plasma source
08/05/2003US6603131 Charged-particle-beam optical systems and microlithography apparatus comprising a non-absorbing shaping aperture
08/05/2003US6603128 Charged-particle beam exposure apparatus and device manufacturing method
08/05/2003US6603120 Test method of mask for electron-beam exposure and method of electron-beam exposure
08/05/2003US6602384 Plasma processing apparatus
08/05/2003US6602381 Plasma confinement by use of preferred RF return path
07/2003
07/31/2003WO2003063196A1 Process endpoint detection in processing chambers
07/31/2003WO2003063184A1 Beam delivery system
07/31/2003WO2003062862A2 Phase transition thermometer for use in microcalorimeter for detecting x-rays
07/31/2003WO2003062806A1 Inspection device using scanning electron microscope
07/31/2003WO2003062489A1 Motorized chamber lid
07/31/2003WO2003015481A3 Suspended gas distribution manifold for plasma chamber
07/31/2003WO2002097854A3 Plasma reactor
07/31/2003WO2002021565A9 Apparatus for magnetically scanning and/or switching a charged-particle beam
07/31/2003US20030143841 Integration of titanium and titanium nitride layers
07/31/2003US20030143821 Plasma processing method and method for manufacturing semiconductor device
07/31/2003US20030143328 For performing single chamber cyclical layer deposition, combined cyclical layer deposition and plasma- enhanced chemical vapor deposition; plasma-enhanced chemical vapor deposition; and/or chemical vapor deposition
07/31/2003US20030141825 Close coupled match structure for RF drive electrode
07/31/2003US20030141822 Method and apparatus for determination and control of plasma state
07/31/2003US20030141821 Plasma processing apparatus and method capable of performing uniform plasma treatment by control of excitation power
07/31/2003US20030141820 Method and apparatus for substrate processing
07/31/2003US20030141795 Method and structure to segment RF coupling to silicon electrode
07/31/2003US20030141462 Multi-beam shaped beam lithography system
07/31/2003US20030141461 Simplified reticle stage removal system for an electron beam system
07/31/2003US20030141460 Ion beam system for irradiating tumour tissues
07/31/2003US20030141451 Method of forming a sample image and charged particle beam apparatus
07/31/2003US20030141450 Scanning electron microscope
07/31/2003US20030141449 Integrated ion focusing and gating optics for ion trap mass spectrometer
07/31/2003US20030141285 Inductively coupled plasma apparatus
07/31/2003US20030141187 Cesium vapor emitter and method of fabrication the same
07/31/2003US20030141186 Method and apparatus for ionized plasma deposition
07/31/2003US20030141184 Carrier position controlling profile; process control; optical coating
07/31/2003US20030141183 Annular cross-section; detachable target holder with screw fitting
07/31/2003US20030141017 Plasma processing apparatus
07/31/2003US20030140691 Apparatus for rotating a sample
07/30/2003EP1330846A1 Electrode and electron emission applications for n-type doped nanocrystalline materials
07/30/2003EP1330839A2 Etching of high aspect ratio features in a substrate
07/30/2003EP1330832A2 Bi mode ion implantation with non-parallel ion beams
07/30/2003CN1433566A 压力控制方法 Pressure Control Method
07/30/2003CN1433044A Micro grating for transmissive electron microscope and its making process
07/30/2003CN1116694C Sample positioning method for microscope with scanning probe
07/29/2003US6600163 In-process wafer charge monitor and control system for ion implanter
07/29/2003US6600162 Method and device for exposing a substrate to light
07/29/2003US6600156 Scanning electron microscope
07/29/2003US6600084 Method of decomposing organic halide
07/29/2003US6599759 Method for detecting end point in plasma etching by impedance change
07/29/2003US6599399 Semiconductors; activating electrons; using high density, low pressure plasma
07/29/2003US6598615 Compact independent pressure control and vacuum isolation for a turbomolecular pumped plasma reaction chamber
07/24/2003WO2003060944A1 Point source for producing electrons beams
07/24/2003WO2003060187A1 Process chamber having component with yttrium-aluminum coating
07/24/2003WO2003060185A1 Anti-corrosive metal reaction chamber for chemical vapour deposition or rapid thermal annealing process
07/24/2003WO2002061167A3 Target/backing plate assemblies
07/24/2003US20030138028 Wafer temperature detection device for ion implanter
07/24/2003US20030137314 Annular illumination method for charged particle projection optics
07/24/2003US20030137251 Method and apparatus for improved plasma processing uniformity
07/24/2003US20030137250 Segmented electrode apparatus and method for plasma processing
07/24/2003US20030137249 Plasma processing apparatus capable of performing uniform plasma treatment by preventing drift in plasma discharge current
07/24/2003US20030136923 Method and apparatus for cooling power supply wires used to drive stages in electron beam lithography machines
07/24/2003US20030136922 Projection-exposure methods and apparatus exhibiting increased throughput
07/24/2003US20030136920 System and method of detecting, neutralizing, and containing suspected contaminated articles
07/24/2003US20030136918 Soft ionization device and applications thereof
07/24/2003US20030136917 Beam delivery system
07/24/2003US20030136907 Charged particle beam apparatus
07/24/2003US20030136906 Analysis of semiconductor surfaces by secondary ion mass spectrometry and methods
07/24/2003US20030136766 MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
07/24/2003US20030136672 Cylindrical AC/DC magnetron with compliant drive system and improved electrical and thermal isolation
07/24/2003US20030136671 Magnetron sputter source
07/24/2003US20030136664 Enclosure containing water support and magnet
07/24/2003US20030136662 Cylindrical target and its production method
07/24/2003US20030136519 Matching circuit and plasma processing apparatus
07/24/2003US20030136518 Device for surface modification and/or coating of objects of quite various designs on all sides and optionally even on undercut surface regions can be achieved at low cost for plant engineering process engineering and other expenses
07/24/2003US20030136516 Gas diffussion plate for use in ICP etcher
07/24/2003US20030136425 Radiation absorption by by-products; determination, calibration; for semiconductors
07/23/2003EP1329948A1 High speed silicon etching method
07/23/2003EP1329947A1 Magnetic field generator for magnetron plasma, and plasma etching apparatus and method comprising the magnetic field generator
07/23/2003EP1329938A2 Ion irradiation system
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