Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
08/2003
08/20/2003EP1336189A1 Device, set and method for carrying a gas or a liquid to a surface through a tube
08/20/2003EP1336188A2 Extraction and deceleration of low energy beam with low beam divergence
08/20/2003EP1336187A2 Radio frequency ion source
08/20/2003EP1335778A1 Device and method for adapting the size of an ion beam spot in the domain of tumor irradiation
08/20/2003EP0871975B1 Power segmented electrode
08/20/2003CN1437759A 电极组件 The electrode assembly
08/20/2003CN1437710A Diagnosting reliability of vias by E-beam probing
08/20/2003CN1437434A Electrostatic accelerator and its ion filling equipment
08/20/2003CN1437224A Gaseous diffusion plate used in induction coupling plasma etching apparatus
08/20/2003CN1437223A Plasma processing method and apparatus
08/20/2003CN1437218A Apparatus equiped with clamping chuck and matching box
08/20/2003CN1118655C Dual-walled exhaust tube assembly for vacuum pump and restructuring method thereof
08/20/2003CN1118586C Electric arc type ion plating device
08/19/2003US6608446 Method and apparatus for radio frequency (RF) metrology
08/19/2003US6608432 Cathode target mounting for cathodic arc cathodes
08/19/2003US6608318 Interior deactivation coating of metal nitride or sulfide conductive material
08/19/2003US6608317 Charged-particle-beam (CPB)-optical systems with improved shielding against stray magnetic fields, and CPB microlithography apparatus comprising same
08/19/2003US6608316 Ion implantation beam monitor
08/19/2003US6608315 Mechanism for prevention of neutron radiation in ion implanter beamline
08/19/2003US6608313 Methods and devices for achieving alignment of a beam-propagation axis with a center of an aperture in a charged-particle-beam optical system
08/19/2003US6608308 Electrostatic lens systems for secondary-electron mapping-projection apparatus, and mapping-projection apparatus and methods comprising same
08/19/2003US6608307 System and method for accurate positioning of a scanning probe microscope
08/19/2003US6608305 Selective deposition of a particle beam based on charging characteristics of a sample
08/19/2003US6607633 Plasma generating device and plasma processing apparatus comprising such a device
08/19/2003US6606802 Cleaning efficiency improvement in a high density plasma process chamber using thermally hot gas
08/19/2003CA2205221C Plasma cvd method and apparatus
08/19/2003CA2163554C Electron beam array for surface treatment
08/14/2003WO2003067939A1 Plasma processing equipment
08/14/2003WO2003067652A1 A system and method for inspecting charged particle responsive resist
08/14/2003WO2003067642A1 Device for producing inductively coupled plasma and method thereof
08/14/2003WO2003015257A3 Auxiliary vertical magnet outside a nested unbalanced magnetron
08/14/2003WO2002037523A3 Sem provided with an adjustable voltage of the final electrode in the electrostatic objective
08/14/2003US20030154461 High yield reticle with proximity effect
08/14/2003US20030153989 Fault classification in a plasma process chamber
08/14/2003US20030153459 Electron beam apparatus and device manufacturing method using the electron beam apparatus
08/14/2003US20030153195 Method and apparatus for providing modulated bias power to a plasma etch reactor
08/14/2003US20030153180 Method and system of forming semiconductor wiring, method and system of fabrication semiconductor device, and wafer
08/14/2003US20030153102 Method of controlling plasma etch process
08/14/2003US20030153101 Method for surface treatment and system for fabricating semiconductor device
08/14/2003US20030152850 Optics; microlithography; configuration, transferring pattern from optics to substrate using charged particles beams
08/14/2003US20030152841 Nano-lithography using squeezed atomic and molecular states
08/14/2003US20030152746 Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their production
08/14/2003US20030151372 RF plasma processing method and RF plasma processing system
08/14/2003US20030151371 Plasma processing apparatus and method for confining an RF plasma under very high gas flow and RF power Density conditions
08/14/2003US20030151004 Method of controlling electrostatic lens and ion implantation apparatus
08/14/2003US20030151003 Pattern writing and forming method
08/14/2003US20030151002 Apparatus for inspecting mask
08/14/2003US20030150991 Scanning electron microscope and method of detecting electrons therein
08/14/2003US20030150846 Plasma-assisted processing system and plasma-assisted processing method
08/14/2003US20030150721 Cathode arc source for generating positive carbon ions from cathode target including means arranged to generate magnetic field having direction substantially normal to front surface of target and zero field strength above target, inside chamber
08/14/2003US20030150720 Plasma processing apparatus
08/14/2003US20030150712 System and method for controlling thin film defects
08/14/2003US20030150710 Plasma production device and method and RF driver circuit
08/14/2003US20030150630 Electrical feed-through structure and method
08/14/2003US20030150562 Apparatus and method to control the uniformity of plasma by reducing radial loss
08/14/2003US20030150561 Plasma processing apparatus
08/13/2003EP1335402A2 Wien filter and electron microscope using same
08/13/2003EP1335209A1 Probe driving method, and probe apparatus
08/13/2003EP1335037A2 Plasma cvd apparatus
08/13/2003EP1334646A2 A method and an apparatus for excitation of a plasma
08/13/2003EP1334514A2 Dielectric etch chamber with expanded process window
08/13/2003EP1334507A1 An atmospheric pressure plasma assembly
08/13/2003EP1334378A1 On-line measurement of absorbed electron beam dosage in irradiated product
08/13/2003EP0992058B1 Device for the production of homogenous microwave plasma
08/13/2003CN1436361A 磁控管溅射 Magnetron sputtering
08/13/2003CN1436360A Method for fault identification in plasma process
08/13/2003CN1436359A Highly efficent compact capacitance coupled plasma reactor/generator and method
08/13/2003CN1118090C Method and device for plasma treatment
08/13/2003CN1118086C Plasma processing apparatus and method for chamber etching of same
08/13/2003CN1117889C Plasma intensified chemical vapour deposition device
08/12/2003US6606149 Optical system adjusting method for energy beam apparatus
08/12/2003US6605901 Apparatus and method for electrical insulation in plasma discharge systems
08/12/2003US6605812 Method reducing the effects of N2 gas contamination in an ion implanter
08/12/2003US6605811 Electron beam lithography system and method
08/12/2003US6605810 Device for correcting third-order spherical aberration in a lens, especially the objective lens of an electronic microscope
08/12/2003US6605805 Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method
08/12/2003US6605398 Methods and apparatus for controlling beam blur in charged-particle-beam microlithography
08/12/2003US6605198 Coaters having glow discharges, electrodes, targets, magnets, shields and power sources for filling grooves and coating wafers to form integrated circuit chips or magnetic transducer heads
08/12/2003US6605195 Source of power in electrical communication with the first target and the second target; and a switch for alternately connecting the source of power between the first target and the second target.
08/12/2003US6605177 Substrate support with gas feed-through and method
08/12/2003US6605176 Aperture for linear control of vacuum chamber pressure
08/07/2003WO2003065766A2 Heating in a vacuum atmosphere in the presence of a plasma
08/07/2003WO2003065763A1 Gating grid and method of making same
08/07/2003WO2003065424A2 Apparatus for cyclical deposition of thin films
08/07/2003WO2003065410A2 Method and apparatus for monitoring and verifying equipment status
08/07/2003WO2003065404A1 Integrated ion focusing and gating optics for ion trap mass spectrometer
08/07/2003WO2003065132A2 Method and apparatus for process monitoring and control
08/07/2003WO2003065131A2 Method and apparatus for electron density measurement and verifying process status
08/07/2003WO2003065061A1 Apparatus and method for improving microwave coupling to a resonant cavity
08/07/2003WO2003064721A2 Cesium vapor emitter and method of fabricating the same
08/07/2003WO2003064059A2 Integration of titanium and titanium nitride layers
08/07/2003WO2003063947A2 Method and apparatus for substrate processing
08/07/2003WO2003028081A3 Method for etching structures in an etching body by means of a plasma
08/07/2003WO2002078033A3 Filament having a variable cross-section, and electron beam emitter comprising such filament
08/07/2003WO2002035586A3 Monitoring substrate processing using reflected radiation
08/07/2003US20030148623 Plasma processing device
08/07/2003US20030148611 Etch rate uniformity
08/07/2003US20030148577 Controlled alignment of catalytically grown nanostructures in a large-scale synthesis process
08/07/2003US20030148220 Technique of exposing a resist using electron beams having different accelerating voltages, and method of manufacturing a photomask using the technique
08/07/2003US20030148103 Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their production
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