Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
09/2003
09/02/2003US6614190 Ion implanter
09/02/2003US6614151 Method and apparatus for deflecting and focusing a charged particle stream
09/02/2003US6614035 Multi-beam shaped beam lithography system
09/02/2003US6614034 Charged-particle-beam microlithography apparatus and methods including shielding of the beam from extraneous magnetic fields
09/02/2003US6614033 Ion implantation apparatus, ion generating apparatus and semiconductor manufacturing method with ion implantation processes
09/02/2003US6614029 Electrostatic manipulating apparatus
09/02/2003US6614027 Method of controlling electrostatic lens and ion implantation apparatus
09/02/2003US6614026 Charged particle beam column
09/02/2003US6614022 Pattern inspection method and apparatus using electron beam
09/02/2003US6613482 Oxidation resistant covering
09/02/2003US6613442 Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof
09/02/2003US6613240 Method and apparatus for smoothing thin conductive films by gas cluster ion beam
09/02/2003US6613199 Apparatus and method for physical vapor deposition using an open top hollow cathode magnetron
09/02/2003US6613189 Apparatus for controlling the temperature of a gas distribution plate in a process reactor
08/2003
08/28/2003WO2003071840A1 Fluidized bed activated by excimer plasma and materials produced therefrom
08/28/2003WO2003071579A1 Sputtering cathode and device and method for coating a substrate with several layers
08/28/2003WO2003071578A2 Material treating system, material treating method and corresponding gas supply
08/28/2003WO2003071577A2 Channel spark source for generating a stable, focussed electron beam
08/28/2003WO2003071557A1 System and method of irradiating products being conveyed past an electron beam delivery device
08/28/2003WO2003070998A1 Method and apparatus for ion beam coating
08/28/2003WO2003070390A2 Cleaning apparatus using atmospheric pressure plasma
08/28/2003WO2003023814A3 Flat magnetron sputter apparatus
08/28/2003US20030162309 For receiving a power value setting signal to set strength of power and a power on/off instruction to set on or off of outputting of the power interrupts the supply of the power
08/28/2003US20030161970 Method and apparatus for manufacturing ultra fine three-dimensional structure
08/28/2003US20030161969 Energetic vapor deposition means are addressed through the introduction of a novel means of vapor deposition, namely, an Electron-Assisted Deposition (EAD) process and apparatus. The EAD mode of film growth disclosed is generally achieved by
08/28/2003US20030160568 Plasma processing apparatus
08/28/2003US20030160567 Method and apparatus for radio frequency (rf) metrology
08/28/2003US20030160192 Charged particle beam exposure method and method for producing charged particle beam exposure data
08/28/2003US20030160191 Beam direct-writing apparatus, imaging apparatus and method of obtaining preferable path passing through points
08/28/2003US20030160190 Ion implantation apparatus equipped with plasma shower and ion implantation method
08/28/2003US20030160179 Method reducing the effects of n2 gas contamination in an ion implanter
08/28/2003US20030160024 Plasma processing method and apparatus
08/28/2003US20030159998 Liquid substrate collector
08/28/2003US20030159926 Configurable vacuum system and method
08/28/2003US20030159782 Modified transfer function deposition baffles and high density plasma ignition therewith in semiconductor processing
08/28/2003US20030159781 Device for applying electromagnetic microwave radiation in a plasma cavity
08/28/2003US20030159778 Plasma processing apparatus, protecting layer therefor and installation of protecting layer
08/28/2003US20030159715 Plasma chamber cleaning
08/28/2003US20030159711 Detecting the endpoint of a chamber cleaning
08/28/2003US20030159657 Elements having erosion resistance
08/28/2003DE20307617U1 Combination of devices for analyzing the real structure of solid bodies analyzes the luminescent properties of all materials with cathode luminescence and scanning electron microscopes.
08/28/2003CA2477258A1 Method and apparatus for ion beam coating
08/27/2003EP1339100A1 Inspection method and apparatus using electron beam, and device production method using it
08/27/2003EP1339086A2 Method and apparatus for radio frequency (RF) metrology
08/27/2003EP1339085A2 System and method for electron beam irradiation
08/27/2003EP1339084A2 Electron beam irradiation apparatus and method
08/27/2003EP1171645A4 Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor
08/27/2003EP1042784B1 Wien filter
08/27/2003CN1439173A Methods and apparatus for determining an etch endpoint in a plasma processing system
08/27/2003CN1439166A Uniform charged particle expoxure device and method using translatable stage and Faraday cup
08/27/2003CN1438692A Semiconductor wiring formation method and apparatus, device making method and apparatus and wafer
08/26/2003US6611087 Method and apparatus for simultaneously depositing and observing materials on a target
08/26/2003US6610989 Proximity effect correction method for charged particle beam exposure
08/26/2003US6610988 Charged particle beam drawing apparatus and charged particle beam drawing method
08/26/2003US6610987 Apparatus and method of ion beam processing
08/26/2003US6610986 Soft ionization device and applications thereof
08/26/2003US6610980 Apparatus for inspection of semiconductor wafers and masks using a low energy electron microscope with two illuminating beams
08/26/2003US6610376 Particle beam processing apparatus
08/26/2003US6610257 Low RF power electrode for plasma generation of oxygen radicals from air
08/26/2003US6610184 Magnet array in conjunction with rotating magnetron for plasma sputtering
08/21/2003WO2003069964A1 Microwave plasma source
08/21/2003WO2003069271A1 Improved scanning probe microscope
08/21/2003WO2003069013A2 Plasma processing apparatus
08/21/2003WO2003068442A1 A plasma processing apparatus and method
08/21/2003WO2003068399A2 Phase plate for electron microscopy and electron microscopic imaging
08/21/2003WO2003068383A1 Method for carrying out homogeneous and heterogeneous chemical reactions using plasma
08/21/2003WO2002084702A3 Sputtering deposition apparatus and method for depositing surface films
08/21/2003WO2002054453A9 Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
08/21/2003US20030159125 Electron beam shot linearity monitoring
08/21/2003US20030158678 Charged particle measuring apparatus
08/21/2003US20030157812 Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps using RF power
08/21/2003US20030157269 Method and apparatus for precision coating of molecules on the surfaces of materials and devices
08/21/2003US20030157242 Method and apparatus for plasma processing
08/21/2003US20030157000 Electorlytic cells; high voltage radio frequency
08/21/2003US20030155534 Maskless particle-beam system for exposing a pattern on a substrate
08/21/2003US20030155533 Ion implanting method and apparatus
08/21/2003US20030155532 Electron-beam lithography
08/21/2003US20030155526 System and method of irradiating products being conveyed past an electron beam delivery device
08/21/2003US20030155525 Electron beam apparatus and high-voltage discharge prevention method
08/21/2003US20030155523 Quantum wells; etching, writing using electron beams; forming semiconductors
08/21/2003US20030155522 Electron beam generating apparatus and electron beam exposure apparatus
08/21/2003US20030155521 Optical column for charged particle beam device
08/21/2003US20030155520 Dimensionally stable ion optic component and method of manufacturing
08/21/2003US20030155509 Electron beam system and method of manufacturing devices using the system
08/21/2003US20030155508 Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application method
08/21/2003US20030155481 Scanning probe microscope
08/21/2003US20030155332 Portable apparatus and method for treating a workpiece
08/21/2003US20030155236 Sputter device
08/21/2003US20030155230 Electrolytic cells; filter passageway; controlling plasma using magnetism
08/21/2003US20030155079 Plasma processing system with dynamic gas distribution control
08/21/2003US20030155078 Plasma processing apparatus, and electrode plate, electrode supporting body, and shield ring thereof
08/21/2003US20030155075 Plasma processing apparatus and plasma processing method
08/21/2003US20030154773 Scanning atom probe and analysis method utilizing scanning atom probe
08/21/2003CA2475589A1 Method for carrying out homogeneous and heterogeneous chemical reactions using plasma
08/21/2003CA2473837A1 Microwave plasma source
08/20/2003EP1336985A1 Sputtering cathode, and device and method for coating a substrate with a plurality of layers
08/20/2003EP1336984A2 Method and apparatus for providing modulated bias power to a plasma etch reactor
08/20/2003EP1336983A2 Electron beam apparatus and high-voltage discharge prevention method
08/20/2003EP1336191A2 Stepped upper electrode for plasma processing uniformity
08/20/2003EP1336190A2 Hybrid scanning system and methods for ion implantation
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