| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/16/2003 | US6621674 Electric supply unit for plasma installations |
| 09/16/2003 | US6621372 Impedance matching device |
| 09/16/2003 | US6621282 High resolution analytical probe station |
| 09/16/2003 | US6621227 Discharge generating apparatus and discharge generating method |
| 09/16/2003 | US6621090 Electron-beam sources exhibiting reduced spherical aberration, and microlithography apparatus comprising same |
| 09/16/2003 | US6621089 Reticle-focus detector, and charged-particle-beam microlithography apparatus and methods comprising same |
| 09/16/2003 | US6621082 Automatic focusing system for scanning electron microscope equipped with laser defect detection function |
| 09/16/2003 | US6620737 Plasma etching method |
| 09/16/2003 | US6620736 Electrostatic control of deposition of, and etching by, ionized materials in semiconductor processing |
| 09/16/2003 | US6620565 Electron beam lithography apparatus focused through spherical aberration introduction |
| 09/16/2003 | US6620558 Strength, rigidity |
| 09/16/2003 | US6620520 Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof |
| 09/16/2003 | US6620335 Plasma etch reactor and method |
| 09/16/2003 | US6620334 Etching apparatus and etching method |
| 09/16/2003 | US6620301 Method for forming a sputtered layer and apparatus therefor |
| 09/16/2003 | US6620299 Process and device for the coating of substrates by means of bipolar pulsed magnetron sputtering and the use thereof |
| 09/16/2003 | US6620298 Forming high quality films |
| 09/16/2003 | US6620290 Plasma process apparatus |
| 09/16/2003 | US6620289 Method and apparatus for asymmetric gas distribution in a semiconductor wafer processing system |
| 09/16/2003 | US6619537 Diffusion bonding of copper sputtering targets to backing plates using nickel alloy interlayers |
| 09/12/2003 | WO2003075333A1 Electrode for dry etching a wafer |
| 09/12/2003 | WO2003075305A2 Indirectly heated button cathode for an ion source |
| 09/12/2003 | WO2003075300A1 Integrated vi probe |
| 09/12/2003 | WO2003075299A2 Device for detecting charged particles and photons |
| 09/12/2003 | WO2003074754A2 Coating method and apparatus |
| 09/12/2003 | WO2003074753A1 Getter metal alloy coating and device and method for the production thereof |
| 09/11/2003 | US20030170984 Plasma processing apparatus and method |
| 09/11/2003 | US20030169060 Method and apparatus for inspecting integrated circuit pattern |
| 09/11/2003 | US20030168617 A projection apparatus for projecting a pattern formed on a mark onto a substrate and a control method for a projection apparatus |
| 09/11/2003 | US20030168616 Electron beam exposure apparatus |
| 09/11/2003 | US20030168607 Focused ion beam system enabling observation/machining of large sample |
| 09/11/2003 | US20030168606 Multi beam charged particle device |
| 09/11/2003 | US20030168595 Environmental scanning electron microscope |
| 09/11/2003 | US20030168594 Integrated measuring instrument |
| 09/11/2003 | US20030168593 Process for identifying single crystals by electron diffraction |
| 09/11/2003 | US20030168588 Ion beam mass separation filter, mass separation method thereof and ion source using the same |
| 09/11/2003 | US20030168436 Microwave plasma processing device, plasma processing method, and microwave radiating member |
| 09/11/2003 | US20030168427 Maintaining an exfoliative oil film on the surface of the drum drier to prevent contamination |
| 09/11/2003 | US20030168172 Plasma treatment apparatus with improved uniformity of treatment and method for improving uniformity of plasma treatment |
| 09/11/2003 | US20030168168 Unitary removable shield assembly |
| 09/11/2003 | US20030168012 Plasma processing device and plasma processing method |
| 09/11/2003 | US20030168011 Apparatus for treating the surface wit neutral particle beams |
| 09/11/2003 | US20030168010 Use of pulsed voltage in a plasma reactor |
| 09/11/2003 | US20030168009 Plasma processing within low-dimension cavities |
| 09/11/2003 | US20030168008 Plasma processing device |
| 09/10/2003 | EP1341948A1 Target comprising thickness profiling for an rf magnetron |
| 09/10/2003 | EP1341718A1 Method and device for electronic cyclotron resonance plasma deposit of single-wall carbon nanotubes and resulting nanotubes |
| 09/10/2003 | EP1144713B1 High target utilization magnetic arrangement for a truncated conical sputtering target |
| 09/10/2003 | CN1441958A Method and apparatus for particle detection using sensor structure having movable portion |
| 09/10/2003 | CN1441465A Method and device for regulating ion beam parallel in ion injection device |
| 09/10/2003 | CN1441255A Method and device for radio frequency metering |
| 09/10/2003 | CN1121057C General casing of vacuum processing chamber |
| 09/09/2003 | US6618850 Inspection method and inspection system using charged particle beam |
| 09/09/2003 | US6618638 To match the important etching parameters in each chamber. |
| 09/09/2003 | US6618276 Power supplies having protection circuits |
| 09/09/2003 | US6617794 Method for controlling etch uniformity |
| 09/09/2003 | US6617597 Circuits and methods for electron-beam control |
| 09/09/2003 | US6617596 On-line measurement of absorbed electron beam dosage in irradiated product |
| 09/09/2003 | US6617595 Multi-lens type electrostatic lens, electron beam exposure apparatus and charged beam applied apparatus using the lens, and device manufacturing method using these apparatuses |
| 09/09/2003 | US6617594 Method and device for ion implanting |
| 09/09/2003 | US6617593 Ion implantation system |
| 09/09/2003 | US6617592 Charged particle beam system and chamber of charged particle beam system |
| 09/09/2003 | US6617587 Electron optics for multi-beam electron beam lithography tool |
| 09/09/2003 | US6617586 Beam delivery system |
| 09/09/2003 | US6617585 Optimized curvilinear variable axis lens doublet for charged particle beam projection system |
| 09/09/2003 | US6617580 Electron holography microscope |
| 09/09/2003 | US6617579 Scanning electronic beam apparatus |
| 09/09/2003 | US6617256 Method for controlling the temperature of a gas distribution plate in a process reactor |
| 09/09/2003 | US6616987 Procedure and device for specific particle manipulation and deposition |
| 09/09/2003 | US6616818 Apparatus and method for coating substrates |
| 09/09/2003 | US6616816 Substrate processing device and method |
| 09/09/2003 | US6616767 High temperature ceramic heater assembly with RF capability |
| 09/09/2003 | US6616766 Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processes |
| 09/04/2003 | WO2003073490A1 Shower head structure for processing semiconductor |
| 09/04/2003 | WO2003073489A1 Plasma processing device and feeding unit |
| 09/04/2003 | WO2003073481A2 Feedforward and feedback control of semiconductor fabrication process using secondary electron microscopy and a focused ion beam system |
| 09/04/2003 | WO2003073460A1 Faraday shields and plasma wafer processing |
| 09/04/2003 | WO2003073448A2 Control of semiconductor fabrication process using scanning electron microscopy and a focused ion beam device |
| 09/04/2003 | WO2003073086A1 An apparatus and method for using a volume conductive electrode with ion optical elements for a time-of-flight mass spectrometer |
| 09/04/2003 | WO2002015236A3 Wafer area pressure control |
| 09/04/2003 | US20030166343 Plasma etching method |
| 09/04/2003 | US20030166328 Method of manufacturing semiconductor devices by sputter-doping |
| 09/04/2003 | US20030165639 Sputtering target assembly and sputtering apparatus using the same |
| 09/04/2003 | US20030165636 Process for plasma surface treatment and device for realizing the process |
| 09/04/2003 | US20030164460 Patterned wafer inspection method and apparatus therefor |
| 09/04/2003 | US20030164288 Magnetron sputtering target for magnetic materials |
| 09/04/2003 | US20030164287 For uniformly implanting a large amount of particles having low energy into a substrate by sputtering |
| 09/04/2003 | US20030164285 Portable, radiation-producing apparatus that can produce highly energetic electron beam radiation and X-rays from a low voltage power source., e.g., a battery; used to deactivate microbial contamination |
| 09/04/2003 | US20030164143 Batch-type remote plasma processing apparatus |
| 09/04/2003 | US20030164142 Plasma processing apparatus |
| 09/03/2003 | EP1341206A2 Liquid substrate ion collector |
| 09/03/2003 | EP1340838A1 Method and device for atmospheric plasma processing |
| 09/03/2003 | EP1340242A2 Arc electrodes for synthesis of carbon nanostructures |
| 09/03/2003 | EP1340241A1 Device and method for the examination of samples in a non-vacuum environment using a scanning electron microscope |
| 09/03/2003 | EP1339895A1 Method and device for treating the surface of electrically insulating substrates |
| 09/03/2003 | EP1086480B1 Planar electron emitter (pee) |
| 09/03/2003 | EP0968517B1 Sem provided with an electrostatic objective and an electrical scanning device |
| 09/03/2003 | EP0672296B1 Scanning techniques in particle beam devices for reducing the effects of surface charge accumulation |
| 09/02/2003 | US6614923 Pattern inspecting method and apparatus thereof, and pattern inspecting method on basis of electron beam images and apparatus thereof |
| 09/02/2003 | US6614505 Lithographic projection apparatus, device manufacturing method, and device manufactured thereby |