| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/30/2003 | US6627888 Scanning electron microscope |
| 09/30/2003 | US6627886 Secondary electron spectroscopy method and system |
| 09/30/2003 | US6627885 Method of focused ion beam pattern transfer using a smart dynamic template |
| 09/30/2003 | US6627884 Simultaneous flooding and inspection for charge control in an electron beam inspection machine |
| 09/30/2003 | US6627545 Method of forming silicon oxide layer and method of manufacturing thin film transistor thereby |
| 09/30/2003 | US6627366 Electron beam exposure method having good linearity with respect to producing fine patterns |
| 09/30/2003 | US6627056 Method and apparatus for ionized plasma deposition |
| 09/30/2003 | US6627050 Method and apparatus for depositing a tantalum-containing layer on a substrate |
| 09/30/2003 | US6626998 Plasma generator assembly for use in CVD and PECVD processes |
| 09/25/2003 | WO2003079740A1 Plasma device |
| 09/25/2003 | WO2003079427A1 Plasma processing method |
| 09/25/2003 | WO2003079404A2 An improved substrate holder for plasma processing |
| 09/25/2003 | WO2003079397A1 Vacuum plasma generator |
| 09/25/2003 | WO2003079116A1 Direct write lithography system |
| 09/25/2003 | WO2003078692A1 Method of cleaning the surface of a material coated with an organic substance and a generator and device for carrying out said method |
| 09/25/2003 | WO2003078680A1 Method of surface texturizing |
| 09/25/2003 | WO2003030240A3 Etching method and apparatus |
| 09/25/2003 | WO2003015123A3 Dual frequency plasma etch reactor with independent plasma density/chemistry and ion energy control |
| 09/25/2003 | US20030181065 Low contamination components for semiconductor processing apparatus and methods for making components |
| 09/25/2003 | US20030181026 Radiation-enhanced particle beams and related applications |
| 09/25/2003 | US20030180971 Plasma etching method and apparatus for manufacturing a semiconductor device |
| 09/25/2003 | US20030180450 Plasma plating; vacuum exposure; applying direct current signal; then radio frequency; heating, controlling temperature |
| 09/25/2003 | US20030179054 Radio frequency resonator and method for producing the same |
| 09/25/2003 | US20030178583 Field emission photo-cathode array for lithography system and lithography system provided with such an array |
| 09/25/2003 | US20030178582 System and method for electron beam irradiation |
| 09/25/2003 | US20030178581 Electron beam irradiation apparatus and electron beam irradiating method |
| 09/25/2003 | US20030178580 Method for defect and conductivity engineering of a conducting nanoscaled structure |
| 09/25/2003 | US20030178579 Stage devices exhibiting reduced deformation, and microlithography systems comprising same |
| 09/25/2003 | US20030178576 Method and system of using a scanning electron microscope in semiconductor wafer inspection with Z-stage focus |
| 09/25/2003 | US20030178390 System and method for enhanced monitoring of an etch process |
| 09/25/2003 | US20030178301 Planar magnetron targets having target material affixed to non-planar backing plates |
| 09/25/2003 | US20030178300 Method of manufacturing an object in a vacuum recipient |
| 09/25/2003 | US20030178299 Rotation-magnetron-in-magnetron (RMIM) electrode, method of manufacturing the RMIM electrode, and sputtering apparatus including the RMIM electrode |
| 09/25/2003 | US20030178144 Plasma processing device |
| 09/25/2003 | US20030178143 Plasma reactor with plural independently driven concentric coaxial waveguides |
| 09/25/2003 | US20030178140 Plasma processing apparatus capable of evaluating process performance |
| 09/24/2003 | EP1347673A1 Plasma generating apparatus using microwave |
| 09/24/2003 | EP1347491A1 Apparatus for driving the arc in a cathodic arc coater |
| 09/24/2003 | EP1347490A2 Diaphragm accessory unit for scanning electron microscope |
| 09/24/2003 | EP1346394A1 Electrode for plasma processes and method for manufacture and use thereof |
| 09/24/2003 | EP1346085A1 Methods and apparatus for producing m'n based materials |
| 09/24/2003 | EP1346080A1 Injector and method for prolonged introduction of reagents into plasma |
| 09/24/2003 | EP1346078A1 Fullerene coated component of semiconductor processing equipment |
| 09/24/2003 | EP1346076A2 Low contamination plasma chamber components and methods for making the same |
| 09/24/2003 | EP1345703A1 Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof |
| 09/24/2003 | EP1345701A2 Centrifugal type contaminant collector trap for ion implanter |
| 09/24/2003 | CN1444257A Method and system for processing radio-frequency plasma |
| 09/24/2003 | CN1122117C Plasma reactor with a deposition shield plate |
| 09/23/2003 | US6624584 Particle source for producing excited particles |
| 09/23/2003 | US6624582 Method of an apparatus for performing circuit-processing, method of and apparatus for controlling the motion of the circuit-processing performance apparatus, and information storage medium |
| 09/23/2003 | US6624430 Phase shifting using an apparatus having electron generators, focusing lenses and deflection controllers for adjustment of radiation beams |
| 09/23/2003 | US6624429 Exposure of concave photoresists using uniform radiation intensity, to form images distributed on the surfaces |
| 09/23/2003 | US6624426 Split magnetic lens for controlling a charged particle beam |
| 09/23/2003 | US6624412 Energy filter |
| 09/23/2003 | US6624084 Plasma processing equipment and plasma processing method using the same |
| 09/23/2003 | US6624082 Systems and methods for two-sided etch of a semiconductor substrate |
| 09/23/2003 | US6624081 Enhanced etching/smoothing of dielectric surfaces |
| 09/23/2003 | US6623610 Magnetron sputtering target for magnetic materials |
| 09/23/2003 | US6623606 Method and apparatus for sputter coating with variable target to substrate spacing |
| 09/23/2003 | US6623597 Focus ring and apparatus for processing a semiconductor wafer comprising the same |
| 09/23/2003 | US6623596 Plasma reactor having an inductive antenna coupling power through a parallel plate electrode |
| 09/23/2003 | US6623595 Wavy and roughened dome in plasma processing reactor |
| 09/23/2003 | US6622650 Plasma processing apparatus |
| 09/18/2003 | WO2003077304A1 Plasma processing system and method for interrupting plasma processing |
| 09/18/2003 | WO2003077302A1 Plasma processing device and plasma generating method |
| 09/18/2003 | WO2003077300A1 Plasma processing apparatus |
| 09/18/2003 | WO2003077299A1 Plasma device |
| 09/18/2003 | WO2003077294A1 Plasma processor |
| 09/18/2003 | WO2003077293A1 High-frequency power supply structure and plasma cvd device using the same |
| 09/18/2003 | WO2003077279A2 Device for activating gases in a vacuum, using a hollow cathode discharge |
| 09/18/2003 | WO2003077278A2 Ion-implantation device |
| 09/18/2003 | WO2003076683A1 Unitary removable shield assembly |
| 09/18/2003 | WO2003075965A1 Device for sterilizing objects |
| 09/18/2003 | WO2003075964A1 Portable radiant energy sterilizer |
| 09/18/2003 | WO2003041109A3 Spot grid array electron imagine system |
| 09/18/2003 | WO2003018185A3 Method of producing powder with composite grains and the device for carrying out said method |
| 09/18/2003 | WO2003015121A3 Slit lens arrangement for particle beams |
| 09/18/2003 | WO2002041356A3 Sputter cathode with magnetic shunt |
| 09/18/2003 | US20030176069 Plasma processing apparatus and plasma processing method |
| 09/18/2003 | US20030175181 Plasma enhanced gas reactor |
| 09/18/2003 | US20030173914 Electrostatic accelerator and ion implanting apparatus with the same |
| 09/18/2003 | US20030173527 Focused ion beam system and machining method using it |
| 09/18/2003 | US20030173526 Method of surface texturizing |
| 09/18/2003 | US20030173516 Semiconductor inspection system |
| 09/18/2003 | US20030173338 Processes for nanomachining using carbon nanotubes |
| 09/18/2003 | US20030173217 High-power ion sputtering magnetron |
| 09/18/2003 | US20030173215 Sputtering target with a partially enclosed vault |
| 09/18/2003 | US20030173207 Biased pulse DC reactive sputtering of oxide films |
| 09/18/2003 | US20030173030 Plasma processing apparatus |
| 09/18/2003 | US20030173028 Plasma processing apparatus for adjusting plasma processing through detecting plasma processing state within chamber |
| 09/18/2003 | US20030172953 Of a vacuum apparatus, especially one that forms films on the surface of an optical element for use in a semiconductor exposure system, etc. |
| 09/18/2003 | US20030172872 Apparatus for cyclical deposition of thin films |
| 09/18/2003 | US20030172772 High energy microwaves ionize a plasma gas, thus releasing large amounts of energy, which is utilized to initiate and sustain chemical reactions between the desired elements being pumped in a spiral pattern into the plasmatron |
| 09/18/2003 | DE20310614U1 Composite electrode for plasma etching system, e.g. for semiconductor substrate processing has locking ring for anchoring composite electrode |
| 09/18/2003 | CA2477678A1 Portable radiant energy sterilizer |
| 09/17/2003 | EP1344842A2 Method and apparatus for production of metal film |
| 09/17/2003 | EP1344242A2 In-process wafer charge monitor and control system for ion implanter |
| 09/17/2003 | EP1344018A1 Particle-optical inspection device especially for semiconductor wafers |
| 09/17/2003 | EP1019946B1 Device for coating panel-shaped substrates |
| 09/16/2003 | US6622286 Integrated electronic hardware for wafer processing control and diagnostic |