Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/2003
10/09/2003WO2003083911A1 A system and method for determining the state of a film in a plasma reactor using an electrical property
10/09/2003WO2003083893A1 Device for confinement of a plasma within a volume
10/09/2003WO2003083892A1 Device for measuring the emission of x rays produced by an object exposed to an electron beam
10/09/2003WO2003083161A1 Sputtering apparatus comprising a concave cathode body
10/09/2003WO2003003118A3 Mask repair with electron beam-induced chemical etching
10/09/2003US20030190822 Charged particle beam adjusting method, pattern transfer method and device manufacturing method using the same method
10/09/2003US20030190761 System, method and medium for modeling, monitoring and/or controlling plasma based semiconductor manufacturing processes
10/09/2003US20030190412 Method of forming deposited film
10/09/2003US20030190070 Pattern forming method
10/09/2003US20030189524 Antenna for producing uniform process rates
10/09/2003US20030189181 Electron beam exposure method, electron beam exposure apparatus and device manufacturing method using the same
10/09/2003US20030189180 Multi-beam exposure apparatus using a multi- axis electron lens, electron lens convergencing a plurality of electron beam and fabrication method of a semiconductor device
10/09/2003US20030189172 Scanning electron microscope and sample observation method using the same
10/09/2003US20030188685 Laser drilled surfaces for substrate processing chambers
10/08/2003EP1351272A2 Electron beam exposure method and apparatus and device manufacturing method using the same
10/08/2003EP1351271A1 Manipulator for an optical or particle/optical device
10/08/2003EP1351231A2 Master disc manufacturing apparatus
10/08/2003EP1350264A1 Method for forming a pattern and a semiconductor device
10/08/2003EP1350260A1 Plasma processing apparatus
10/08/2003EP1350259A1 Sem provided with a secondary electron detector having a central electrode
10/08/2003EP1349698A1 Friction fit target assembly for high power sputtering operation
10/08/2003EP1349682A1 Low temperature sputter target/backing plate joining technique and assemblies made thereby
10/08/2003CN2578970Y Ion implantation apparatus for internal surface of tubular workpiece
10/08/2003CN1447915A Integrated full wavelengh spectromenter for wafer processing
10/08/2003CN1447410A Plasma equipment contg. plasma measurer
10/08/2003CN1447404A Monitoring chip of high current ion transplant device and method to monitor charging phenomenon with the chip
10/08/2003CN1447398A Phasma processing appts. able to evaluating artificial performance
10/08/2003CN1447397A Method for reducing impurity content in reaction chamber
10/08/2003CN1447346A Earthing cable and semiconductor mfg. equipment using such cable
10/07/2003US6630794 Method for determining an operational condition of a thermal field electron emitter, a method for operating the thermal field electron emitter and an electron beam utilizing system having the thermal field electron emitter
10/07/2003US6630774 Electron beam emitter
10/07/2003US6630681 Charged-particle-beam (CPB) microlithography apparatus includes illumination-optical and projection-optical systems and a beam correction-optical system. The beam correction optical system is connected to a control computer configured
10/07/2003US6630677 Electrostatic lens having glassy graphite electrodes
10/07/2003US6630668 Remote control of a scanning electron microscope aperture and gun alignment
10/07/2003US6630667 Compact, high collection efficiency scintillator for secondary electron detection
10/07/2003US6630364 System for automatic control of the wall bombardment to control wall deposition
10/07/2003US6630201 Providing gas in chamber for reacting with a surface of a substrate; retaining substrate on an electrostatic chuck (ESC) assembly by electrostatic attraction, supplying a DC bias voltage to electrodes to couple a DC bias voltage
10/07/2003US6630121 Supercritical fluid-assisted nebulization and bubble drying
10/07/2003US6629508 Ionizer for gas cluster ion beam formation
10/02/2003WO2003081657A1 Treating device, electrode, electrode plate, and treating method
10/02/2003WO2003081650A1 Plasma processing device and production method of thin-film forming substrate
10/02/2003WO2003081634A2 Tube magnetron
10/02/2003WO2003081632A1 3-dimensional ion scattering spectroscopic method and spectroscopic device
10/02/2003WO2003081286A2 Swinging objectif retarding immersion lens electron optics focusing, deflection and signal collection system and method
10/02/2003WO2003081171A1 Device and method for maskless afm microlithography
10/02/2003WO2003080892A1 Low contamination components for semiconductor processing apparatus and methods for making components
10/02/2003WO2003080891A1 Rotating tubular cathode
10/02/2003WO2003032351A3 Method and device for aligning a charged particle beam column
10/02/2003WO2003010799A3 Plasma ashing process
10/02/2003US20030186550 Reduced particulate etching
10/02/2003US20030186549 Endpoint control for small open area by RF source parameter Vdc
10/02/2003US20030185997 Cleaning a chamber; forming a passivation layer on an inner surface of chamber; performing at least one fabrication procedure inside chamber, wherein fabrication procedures do not react with chamber
10/02/2003US20030185983 Particles are exposed in location-selective manner to external adjustment forces and/or plasma conditions are subjected to location-selective change to apply particles onto a substrate surface mask-free and/ or subject it to plasma treatment
10/02/2003US20030185982 Method and device for treating surfaces using a glow discharge plasma
10/02/2003US20030185729 Electrode assembly for processing a semiconductor substrate and processing apparatus having the same
10/02/2003US20030184332 Probe driving method, and probe apparatus
10/02/2003US20030184235 Plasma producing apparatus and doping apparatus
10/02/2003US20030184234 Electrode device for a plasma processing system
10/02/2003US20030183906 Grounding cable and semiconductor manufacturing apparatus using the same
10/02/2003US20030183782 Technique for writing with a raster scanned beam
10/02/2003US20030183781 Method and apparatus for surface potential reflection electron mask lithography
10/02/2003US20030183780 Ion beam charge neutralizer and method therefor
10/02/2003US20030183778 Electron beam exposure apparatus and electron beam deflection apparatus
10/02/2003US20030183776 Method and apparatus for specimen fabrication
10/02/2003US20030183775 Charged particle microscope
10/02/2003US20030183773 Electron beam exposure system and electron lens
10/02/2003US20030183763 Ribbon electron beam for inspection system
10/02/2003US20030183762 Method of observing a sample by a transmission electron microscope
10/02/2003US20030183518 Concave sputtering apparatus
10/02/2003US20030183509 Method for forming a sputtered layer and apparatus therefor
10/02/2003US20030183337 Apparatus and method for use of optical diagnostic system with a plasma processing system
10/02/2003US20030183336 Plasma apparatus including plasma-measuring device
10/02/2003US20030183335 Methods and apparatus for determining an etch endpoint in a plasma processing system
10/02/2003US20030183243 Cleaning residues from surfaces in a chamber by sputtering sacrificial substrates
10/02/2003US20030183172 Vaporiser for generating feed gas for an arc chamber
10/02/2003US20030183170 Plasma processing apparatus
10/02/2003US20030183169 Internal electrode type plasma processing apparatus and plasma processing method
10/01/2003EP1349196A2 Plasma etching method and apparatus for manufacturing a semiconductor device
10/01/2003EP1348228A1 Ion source
10/01/2003EP1348227A2 Charging control and dosimetry system for gas cluster ion beam
10/01/2003EP1348226A2 Method and apparatus for improved ion acceleration in an ion implantation system
10/01/2003EP1347804A1 Ion implantation system and control method
10/01/2003EP0724652B1 Method and apparatus for sputtering magnetic target materials
10/01/2003CN2577437Y Apparatus for injecting plasma onto innerwall of tubular workpiece
10/01/2003CN2577436Y Apparatus for injecting ions onto inner surface of tubular workpiece using high-voltage glow-discharge
10/01/2003CN1445827A Electric liquid processing device
10/01/2003CN1445811A Sputtering device and its electrode and manufacturing method of the electrode
10/01/2003CN1123052C Method and apparatus for ionized physical vapor deposition
10/01/2003CN1123051C Method for ion beam transport and ion implantation apparatus
10/01/2003CN1122933C Sputtering apparatus simulation method
09/2003
09/30/2003US6628084 Method and apparatus for the excitation of a plasma
09/30/2003US6627906 Controller calculates the beam-current density on the wafer stage
09/30/2003US6627905 Charged-particle-beam mask-based exposure apparatus employing a variable mask-illumination field and alignment and calibration methods therefor
09/30/2003US6627904 Ion implantation apparatus
09/30/2003US6627903 Methods and devices for calibrating a charged-particle-beam microlithography apparatus, and microelectronic-device fabrication methods comprising same
09/30/2003US6627901 Apparatus and method for distribution of dopant gases or vapors in an arc chamber for use in an ionization source
09/30/2003US6627900 Methods, based on a genetic algorithm, for configuring parameters of an array of multiple components for cooperative operation to achieve a desired performance result
09/30/2003US6627899 Magnetic lenses, charged-particle-beam optical systems, and charged-particle-beam pattern-transfer apparatus
09/30/2003US6627890 Particle beam apparatus for tilted observation of a specimen
09/30/2003US6627889 Apparatus and method for observing sample using electron beam
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