Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/2003
10/22/2003EP1354336A2 Plasma generation apparatus and method
10/22/2003EP1354335A2 Sem provided with an adjustable final electrode in the electrostatic objective
10/22/2003EP1354072A1 Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof
10/22/2003CN1451175A Magnetic field generator for magnetron plasma and plasma etching apparatus and method comprising the magnetic field generator
10/22/2003CN1451174A Operation monitoring method for treatment apparatus
10/22/2003CN1451172A Use of pulsed votage in a plasma reactor
10/22/2003CN1451171A Configurable vacuum system and method
10/22/2003CN1451169A Control system for indirectly heated cathode ion source
10/22/2003CN1450847A Plasma process apparatus and method
10/22/2003CN1125190C Jet plasma process and apparatus for deposition of coatings and obtd. coating
10/21/2003US6636824 Method of and apparatus for inspecting semiconductor device
10/21/2003US6635998 Ion beam processing apparatus and method of operating ion source therefor
10/21/2003US6635997 Microwave plasma generator, method of decomposing organic halide, and system for decomposing organic halide
10/21/2003US6635996 Plasma generating apparatus, plasma generating method and gas processing method by plasma reaction
10/21/2003US6635891 Hollow-beam apertures for charged-particle-beam microlithography apparatus and methods for making and using same
10/21/2003US6635890 Slit double gap buncher and method for improved ion bunching in an ion implantation system
10/21/2003US6635889 Ion implantation apparatus suited for low energy ion implantation and tuning method for ion source system thereof
10/21/2003US6635888 High resolution electron beam exposure machines
10/21/2003US6635884 Method for directing an electron beam onto a target position on a substrate surface
10/21/2003US6635883 Gas cluster ion beam low mass ion filter
10/21/2003US6635881 Charged-particle-beam projection-lens system exhibiting reduced blur and geometric distortion, and microlithography apparatus including same
10/21/2003US6635880 High transmission, low energy beamline architecture for ion implanter
10/21/2003US6635873 Scanning electron microscope with voltage applied to the sample
10/21/2003US6635578 Method of operating a dual chamber reactor with neutral density decoupled from ion density
10/21/2003US6635402 Electron beam microlithography; resolution; improved measuring and adjusting the distribution of current density
10/21/2003US6635395 Method for exposing a layout comprising multiple layers on a wafer
10/21/2003US6635392 Computer corrected pattern
10/21/2003US6635228 Reactor including inner electrode having outer surface, outer electrode having inner surface, liquid dielectric configured to flow as film over outer surface of inner electrode and inner surface of outer electrode, preventing arcing
10/21/2003US6635156 Sputtering using gases generated in vacuum gas discharges, then flowing the gases through toroids having electromagnetic coils on the surfaces, electrodes and power sources; high quality coatings
10/21/2003US6635117 Actively-cooled distribution plate for reducing reactive gas temperature in a plasma processing system
10/21/2003US6634313 High-frequency electrostatically shielded toroidal plasma and radical source
10/21/2003CA2277394C Plasma jet chemical vapor deposition system having a plurality of distribution heads
10/16/2003WO2003086032A1 Ecr plasma source and ecr plasma device
10/16/2003WO2003085718A1 Plasma processing system
10/16/2003WO2003085715A1 Method for suppressing charging of component in vacuum processing chamber of plasma processing system and plasma processing system
10/16/2003WO2003085693A1 An atmospheric pressure plasma assembly
10/16/2003WO2003085454A2 Technique for writing with a raster scanned beam
10/16/2003WO2003052790A3 Lens array with a laterally movable optical axis for corpuscular rays
10/16/2003WO2003049139A9 Electron source
10/16/2003WO2003044837A3 Ion imlantation method and apparatus
10/16/2003WO2003040829A3 Maskless printer using photoelectric conversion of a light beam array
10/16/2003WO2003038889A3 Method and apparatus for nitride spacer etch process implementing in situ interferometry endpoint detection and non-interferometry endpoint monitoring
10/16/2003WO2003038858A3 A semiconductor manufacturing apparatus having a built-in inspection apparatus and method therefor
10/16/2003WO2003015119A3 Decaborane vaporizer
10/16/2003WO2002097850A3 Uniform broad ion beam deposition
10/16/2003US20030194652 Charged-particle-beam microlithography apparatus and methods for exposing a segmented reticle
10/16/2003US20030194508 Deposition methods utilizing microwave excitation, and deposition apparatuses
10/16/2003US20030193031 Filtered ion source
10/16/2003US20030193026 Electron microscope, method for operating the same, and computer-readable medium
10/16/2003US20030193025 Electron microscope, method for operating the same, and computer-readable medium
10/16/2003US20030193024 Electron microscope charge-up prevention method and electron microscope
10/16/2003US20030193023 Analysis of semiconductor surfaces by secondary ion mass spectrometry and methods
10/16/2003US20030193022 Calibration standard for high resolution electron microscopy
10/16/2003US20030193010 Method and apparatus for early detection of material accretion and peeling in plasma system
10/16/2003US20030192864 Plasma processing apparatus and method
10/16/2003US20030192857 Method of etching and apparatus for doing same
10/16/2003US20030192778 Method of forming deposited film
10/16/2003US20030192646 Plasma processing chamber having magnetic assembly and method
10/16/2003US20030192645 Method and apparatus for creating circumferential process gas flow in a semiconductor wafer plasma reactor chamber
10/16/2003US20030192644 Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply
10/16/2003US20030192478 Plasma CVD apparatus comprising susceptor with ring
10/16/2003US20030192475 Method and apparatus for routing harmonics in a plasma to ground within a plasma enhanced semiconductor wafer processing chamber
10/16/2003US20030192474 Multi-directional scanning of movable member and ion beam monitoring arrangement therefor
10/15/2003EP1353356A2 Electron microscope charge-up prevention method and electron microscope
10/15/2003EP1353188A2 High resolution analytical probe station
10/15/2003EP1352417A2 Device for the plasma-mediated working of surfaces on planar substrates
10/15/2003EP1352415A2 Monitoring substrate processing using reflected radiation
10/15/2003EP1352411A2 Adjustable conductance limiting aperture for ion implanters
10/15/2003EP1352410A1 Electrostatic corrector
10/15/2003EP1352211A1 A method and system for measuring in patterned structures
10/15/2003EP1352104A2 Target/backing plate assemblies
10/15/2003EP1036214B1 Mixed frequency cvd process and apparatus
10/15/2003CN1449572A 转换的均匀性控制 Conversion of uniformity control
10/15/2003CN1449514A Integrated electronic hardware for wafer processing control and diagnostic
10/15/2003CN1448991A High speed simulation method of ion implantation including dose effect
10/15/2003CN1448980A Femto second heavy current high brightness electron microscope device
10/14/2003USRE38273 Baseband RF voltage-current probe
10/14/2003US6633831 Methods and systems for determining a critical dimension and a thin film characteristic of a specimen
10/14/2003US6633366 Lithographic apparatus, device manufacturing method, and device manufactured thereby
10/14/2003US6633133 Ion source
10/14/2003US6633132 Plasma gereration apparatus and method
10/14/2003US6633114 Mass spectrometer with electron source for reducing space charge effects in sample beam
10/14/2003US6633047 Apparatus and method for introducing impurity
10/14/2003US6633045 Assembly part with wiring and for manufacturing system, method of manufacturing such assembly part, and semiconductor manufacturing system constituted using assembly part
10/14/2003US6633040 Solenoid electron beam lenses with high demagnification and low aberrations
10/14/2003US6633039 Electromagnets for and method of deflecting and splitting a particle beam
10/14/2003US6633034 Method and apparatus for imaging a specimen using low profile electron detector for charged particle beam imaging apparatus including electrostatic mirrors
10/14/2003US6633017 System for plasma ignition by fast voltage rise
10/14/2003US6632722 Fiducial mark bodies for charged-particle-beam (CPB) microlithography, methods for making same, and CPB microlithography apparatus comprising same
10/14/2003US6632482 Very short high voltage, low duty cycle ionization pulses, in conjunction with a synchronously produced electron flow to neutralize positively charged semiconductor wafer surfaces; shallow junction devices
10/14/2003US6632324 System for the plasma treatment of large area substrates
10/14/2003US6632323 Method and apparatus having pin electrode for surface treatment using capillary discharge plasma
10/14/2003US6632322 Switched uniformity control
10/14/2003US6632321 Method and apparatus for monitoring and controlling wafer fabrication process
10/14/2003US6632284 Apparatus and method for forming deposited film
10/14/2003US6631693 Absorptive filter for semiconductor processing systems
10/14/2003US6631692 Plasma CVD film-forming device
10/14/2003CA2162529C Arc assisted cvd coating and sintering method and apparatus
10/09/2003WO2003083923A1 Plasma processing device and baffle plate thereof
10/09/2003WO2003083922A1 Plasma processor electrode and plasma processor
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