Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/2003
10/30/2003WO2003090247A2 Method and apparatus for routing harmonics in a plasma to ground within a plasma enchanced semiconductor wafer processing chamber
10/30/2003WO2003089386A1 Coated silicon carbide cermet used in a plasma reactor
10/30/2003WO2003065132A3 Method and apparatus for process monitoring and control
10/30/2003WO2003054913A3 Gas distribution plate electrode for a plasma reactor
10/30/2003WO2003054911A3 Plasma process apparatus
10/30/2003WO2003041112A3 Non-thermal plasma slit discharge apparatus
10/30/2003WO2003036681A3 Methods and apparatus for plasma doping by anode pulsing
10/30/2003WO2003026364A3 Plasma processor coil
10/30/2003WO2002099943B1 Conduction assembly for a cathode of an arc evaporation device
10/30/2003WO2001093303A3 High throughput multipass printing with lithographic quality
10/30/2003US20030204826 Inspection method and inspection system using charged particle beam
10/30/2003US20030203641 Plasma treatment apparatus and method of producing semiconductor device using the apparatus
10/30/2003US20030203640 Plasma etching apparatus
10/30/2003US20030203287 Such as a photo mask and a reticle, and particularly to a method of forming a required pattern on the original plate by means of an electron beam exposure
10/30/2003US20030203139 Free-standing and aligned carbon nanotubes and synthesis thereof
10/30/2003US20030203125 Plasma treatment method and method of manufacturing optical parts using the same
10/30/2003US20030202449 Detection apparatus, detection method and electron beam irradiation apparatus
10/30/2003US20030201724 Method for molding a polymer surface that reduces particle generation and surface adhesion forces while maintaining a high heat transfer coefficient
10/30/2003US20030201723 Gas distribution plate electrode for a plasma reactor
10/30/2003US20030201722 Plasma processing apparatus
10/30/2003US20030201720 Electron beam, generating device, and testing device
10/30/2003US20030201402 Method and system for ion beam containment in an ion beam guide
10/30/2003US20030201397 Method and apparatus for simultaneously depositing and observing materials on a target
10/30/2003US20030201393 Electron microscope
10/30/2003US20030201392 Beam alignment in a lower column of a scanning electron microscope or the like
10/30/2003US20030201391 Method of inspecting a circuit pattern and inspecting instrument
10/30/2003US20030201387 Mass spectrometer
10/30/2003US20030201256 Plasma processing method and plasma processing apparatus
10/30/2003US20030201240 Maintenance method and system for plasma processing apparatus
10/30/2003US20030201174 Magnetron sputtering source and chamber therefor
10/30/2003US20030201165 Concurrent sputtering; vacuum deposition; generating glow discharges
10/30/2003US20030201162 Monitoring optical emission; determination power spectra
10/30/2003US20030201069 Tunable focus ring for plasma processing
10/30/2003US20030200930 Apparatus for ion beam implantation
10/30/2003US20030200929 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film
10/29/2003EP1357583A1 Sheet-fed treating device
10/29/2003EP1357577A1 Arc-coating process with rotating cathodes
10/29/2003EP1357576A2 Highly heat-resistant plasma etching electrode and dry etching device including the same
10/29/2003EP1357042A1 Production device for dlc film-coated plastic container and production method therefor
10/29/2003EP1356501A2 Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
10/29/2003EP1356497A2 Icp window heater integrated with faraday shield or floating electrode between the source power coil and the icp window
10/29/2003EP1356496A1 Apparatus for evaporation of materials for coating of objects
10/29/2003CN1452668A Cylindrical target and method of mfg. same
10/29/2003CN1452014A Charge beam exposure device, exposure method by charge beam, charge beam controlling method and method for mfg. semiconductor device
10/29/2003CN1125890C Apparatus and method for nucleotion and deposition of diamond using hot filament DC plasma
10/28/2003US6639320 Reticle for creating resist-filled vias in a dual damascene process
10/28/2003US6639233 Apparatus for implanting an ion on a target and method for the same
10/28/2003US6639232 Pattern writing method employing electron beam writing device of variable-shaped vector scan system
10/28/2003US6639231 Method of obtaining a performance parameter for an ion implanter and an ion implanter employing the method
10/28/2003US6639230 High-energy ion implanter for fabricating a semiconductor device
10/28/2003US6639228 Method for molecular nitrogen implantation dosage monitoring
10/28/2003US6639227 Apparatus and method for charged particle filtering and ion implantation
10/28/2003US6639226 Focused ion beam equipment and focused ion beam processing method using same
10/28/2003US6639224 Specimen-carrier accessory device for the stereoscopic analysis by a scanning electron microscope
10/28/2003US6639223 Gaseous ion source feed for oxygen ion implantation
10/28/2003US6639221 Annular illumination method for charged particle projection optics
10/28/2003US6639219 Electron scatter in a thin membrane to eliminate detector saturation
10/28/2003US6639218 Electron spin analyzer
10/28/2003US6638665 Method and apparatus for designing EB mask
10/28/2003US6638403 Plasma processing apparatus with real-time particle filter
10/28/2003US6638392 Plasma process apparatus
10/28/2003US6638359 Deposited film forming apparatus and deposited film forming method
10/23/2003WO2003088445A2 Apparatus and method for arc detection
10/23/2003WO2003088342A1 Method for producing material of electronic device
10/23/2003WO2003088338A1 Plasma processing device and plasma processing method
10/23/2003WO2003088304A1 Plasma processing chamber having magnetic assembly and method
10/23/2003WO2003088303A2 Multi-directional scanning of movable member and ion beam monitoring arrangement therefor
10/23/2003WO2003088299A2 A method of implanting a substrate and an ion implanter for performing the method
10/23/2003WO2003087431A2 Deposition methods utilizing phased array microwave excitation, and deposition apparatuses
10/23/2003WO2003087427A2 Laser drilled surfaces for substrate processing chambers
10/23/2003WO2003087425A1 Filtered ion source
10/23/2003WO2003087018A2 Specimen holding apparatus
10/23/2003WO2003043390A3 System for generating a local electron-cyclotron microwave low-pressure plasma at a predetermined location within the processing chamber
10/23/2003WO2002004691A9 Systems and methods for remote plasma clean
10/23/2003WO2001009915A8 Diamond supported photocathodes for electron sources
10/23/2003US20030199170 Plasma etching of silicon carbide
10/23/2003US20030199168 Local dry etching method
10/23/2003US20030198755 Scanning ion beams; filling aperture; process control
10/23/2003US20030198749 Protective coatings; overcoating cermets; vapor deposition
10/23/2003US20030197906 Optical element, metal mold therefor and optical element producing method
10/23/2003US20030197873 Shape measurement method and apparatus
10/23/2003US20030197135 Electron beam exposure apparatus, electron beam exposure method, semiconductor device manufacturing method, and electron beam shape measuring method
10/23/2003US20030197134 Electron beam drawing apparatus
10/23/2003US20030197133 Method and apparatus for scanning a workpiece in a vacuum chamber
10/23/2003US20030197132 Method and apparatus for measuring inclination angle of ion beam
10/23/2003US20030197131 Multi-beam hybrid solenoid lens electron beam system
10/23/2003US20030197130 Convergent charged particle beam apparatus and inspection method using same
10/23/2003US20030197129 Ion sources for ion implantation apparatus
10/23/2003US20030196890 Placing substrate in chamber; providing a deposition shield having a textured surface about substrate; providing isostatically pressed and sintered sputtering target facing substrate; applying electrical power and magnteic field
10/23/2003US20030196760 Plasma treatment system
10/23/2003US20030196759 Highly heat-resistant plasma etching electrode and dry etching device including the same
10/23/2003US20030196758 Semiconductor process recording apparatus
10/23/2003US20030196757 Method and apparatus for tuning an RF matching network in a plasma enhanced semiconductor wafer processing system
10/23/2003US20030196756 Twist-N-Lock wafer area pressure ring and assembly for reducing particulate contaminant in a plasma processing chamber
10/23/2003US20030196755 Confinement ring support assembly
10/23/2003US20030196601 Plasma processing method and plasma processing apparatus
10/22/2003EP1355343A2 Ion sputtering magnetron
10/22/2003EP1355342A2 Plasma treatment system
10/22/2003EP1355341A1 Electron beam projector provided with a linear thermionic emitting cathode for electron beam heating.
10/22/2003EP1355192A2 Array structure for charged particle beam exposure apparatus and device manufacturing method
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