Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/2003
11/13/2003US20030209430 Ion beam irradiation apparatus for suppressing charge up of substrate and method for the same
11/13/2003US20030209423 System for driving multiple magnetrons with multiple phase ac
11/13/2003US20030209422 Multiple-step sputter deposition
11/13/2003US20030209324 Plasma reactor with reduced reaction chamber
11/13/2003US20030209050 Apparatus and method for calibrating the position of a wafer platform in an ion implanter
11/12/2003EP1361782A1 Plasma device and plasma generating method
11/12/2003EP1361604A1 Device and method for treatment
11/12/2003EP1360880A1 Plasma unit and method for generation of a functional coating
11/12/2003EP0758756B1 Transparent heating plate and transparent heating device
11/12/2003CN1455434A Substrate board treatment device and reaction container
11/12/2003CN1455238A Method of preparing electron microscopic film sample of macro powder-particle material
11/11/2003US6646385 Plasma excitation coil
11/11/2003US6646382 Microminiature microwave electron source
11/11/2003US6646277 Charging control and dosimetry system for gas cluster ion beam
11/11/2003US6646276 Ion implantation beam monitor
11/11/2003US6646275 Charged particle beam exposure system and method
11/11/2003US6646274 Lithographic projection apparatus
11/11/2003US6646267 Method for eliminating first, second and third-order axial image deformations during correction of the third-order spherical aberration in electron optical systems
11/11/2003US6646262 Scanning electron microscope
11/11/2003US6646261 SEM provided with a secondary electron detector having a central electrode
11/11/2003US6646224 Plasma-assisted processing system and plasma-assisted processing method
11/11/2003US6646223 Method for improving ash rate uniformity in photoresist ashing process equipment
11/11/2003US6645872 Chemically enhanced focused ion beam micro-machining of copper
11/11/2003US6645676 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus
11/11/2003US6645585 Prolongs period of time taken for reaction products such as halides generated through reaction with corrosive halide gas to exfoliate and fall as particles, decreasing frequency of periodic maintenance
11/11/2003US6645427 With micro alloy stabilizer
11/11/2003US6645358 Hollow cylindrical cathode sputtering target and process for producing it
11/11/2003US6645357 Mesh shield in a sputter reactor
11/11/2003US6645354 Rectangular cathodic arc source and method of steering an arc spot
11/11/2003US6645353 Continuous magnetic field directed at wafer pedestal
11/11/2003US6645343 Plasma reactor
11/11/2003US6645301 Ion source
11/11/2003US6644855 Stage device, exposure apparatus, device manufacturing method and movement guidance method
11/06/2003WO2003092059A1 Window type probe, plasma monitoring device, and plasma processing device
11/06/2003WO2003092039A1 Device for treating surfaces of containers with plasma
11/06/2003WO2003092033A1 Polynuclear metal molecular beam apparatus
11/06/2003WO2003041110A3 Method for molding a polymer surface
11/06/2003WO2003032007A3 Dosimeter having charge-measuring device with wide dynamic range
11/06/2003WO2003010605A3 Pattern generation method and apparatus using cached cells of hierarchical data
11/06/2003US20030207583 Method for processing wafer using single frequency RF power in plasma processing chamber
11/06/2003US20030207475 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
11/06/2003US20030207033 Method and apparatus for deposition of low dielectric constant materials
11/06/2003US20030207021 Deposited-film formation apparatus, deposited-film formation process, vacuum system, leak judgment method, and computer-readable recording medium with recorded leak-judgment- executable program
11/06/2003US20030206838 Highly efficient compact capacitance coupled plasma reactor/generator and method
11/06/2003US20030206283 Method of manufacturing a device by employing a lithographic apparatus including a sliding electron-optical element
11/06/2003US20030205958 High angular intensity Schottky electron point source
11/06/2003US20030205683 Symmetric beamline and methods for generating a mass-analyzed ribbon ion beam
11/06/2003US20030205680 Ion source and coaxial inductive coupler for ion implantation system
11/06/2003US20030205679 Ion source providing ribbon beam with controllable density profile
11/06/2003US20030205678 Apparatus and method for applying feedback control to a magnetic lens
11/06/2003US20030205669 Apparatus and method for secondary electron emission microscope
11/06/2003US20030205668 Charged particle beam control element, method of fabricating charged particle beam control element, and charged particle beam apparatus
11/06/2003US20030205557 Apparatus and method for controlling the voltage applied to an electrostatic shield used in a plasma generator
11/06/2003US20030205460 Apparatus and method for arc detection
11/06/2003US20030205328 Actively-cooled distribution plate for reducing reactive gas temperature in a plasma processing system
11/06/2003US20030205327 Apparatus and methods for minimizing arcing in a plasma processing chamber
11/06/2003US20030205326 Semiconductor processing apparatus and a diagnosis method therefor
11/06/2003US20030205202 Plasma cvd device
11/06/2003CA2385393A1 Linear magnetron arc evaporation or sputtering source
11/05/2003EP1359611A1 Method and device for plasma cvd
11/05/2003EP1359602A2 Detection apparatus, detection method and electron beam irradiation apparatus
11/05/2003EP1359601A1 Beam alignment in a scanning electron microscope
11/05/2003EP1359599A2 High angular intensity schottky electron point source
11/05/2003EP1359236A1 Spatter device and spatter film forming method
11/05/2003EP1358623A2 Method and apparatus for inspecting a substrate
11/05/2003EP1358363A2 Diamond coatings on reactor wall and method of manufacturing thereof
11/05/2003EP1198611B9 Device for treating a container with microwave plasma
11/05/2003EP0939972A4 Plasma etch reactor and method
11/05/2003EP0925605A4 Method and apparatus for etching a semiconductor wafer
11/05/2003EP0916153B1 Device for producing plasma
11/05/2003EP0806126B1 Method and apparatus for generating plasma
11/05/2003CN1454391A Method for predicting consumption of consumable part, method for predicting deposited-film thickness, and plasma processor
11/05/2003CN1453831A Plasma processing method and apparatus
11/05/2003CN1453830A Plasma etching electrode with excellent heat resistance and dry etching apparatus using the same
11/05/2003CN1453818A Ion source
11/05/2003CN1453597A Optical elements, it metal mould and method for processing optical elements
11/05/2003CN1453575A Charge testing method for insulating material
11/04/2003US6643113 Low voltage modular room ionization system
11/04/2003US6642675 Charged particle beam exposing apparatus
11/04/2003US6642662 Plasma apparatus
11/04/2003US6642661 Generating and controlling radio frequency plasma
11/04/2003US6642637 Parallel plate electron multiplier
11/04/2003US6642532 Methods for determining a pattern on a microlithography reticle to minimize proximity effects in pattern elements in chips located on substrate periphery
11/04/2003US6642530 Multiple pass write method and reticle
11/04/2003US6642528 Alignment mark detection method, and alignment method, exposure method and device, and device production method, making use of the alignment mark detection method
11/04/2003US6642525 Particle-optical component and system comprising a particle-optical component
11/04/2003US6642520 Scanning electron microscope
11/04/2003US6642518 Assembly and method for improved scanning electron microscope analysis of semiconductor devices
11/04/2003US6642512 Focused ion beam apparatus
11/04/2003US6642149 Plasma processing method
11/04/2003US6641979 Technique of exposing a resist using electron beams having different accelerating voltages
11/04/2003US6641747 Method and apparatus for determining an etch endpoint
11/04/2003US6641746 Control of semiconductor processing
11/04/2003US6641705 Apparatus and method for reducing differential sputter rates
11/04/2003US6641701 System including a stationary conduit, a hollow drive shaft rotatably coupled to the stationary conduit, and a magnetron coupled to the hollow drive shaft for sputtering and vapor deposition for wear and friction resistance
11/04/2003US6641697 Erosion resistant member that may be used in the processing of a substrate in a plasma of a processing gas
11/04/2003US6641673 Fluid injector for and method of prolonged delivery and distribution of reagents into plasma
10/2003
10/30/2003WO2003090351A2 Method and apparatus for tuning an rf matching network in a plasma enhanced semiconductor wafer processing system
10/30/2003WO2003090263A1 Silicon parts for plasma reaction chambers
10/30/2003WO2003090248A2 Reducing particle generation during sputter deposition
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