Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/2003
11/25/2003US6653632 Scanning-type instrument utilizing charged-particle beam and method of controlling same
11/25/2003US6653631 Apparatus and method for defect detection using charged particle beam
11/25/2003US6653629 Specimen inspection instrument
11/25/2003US6653029 Dual-focused ion beams for semiconductor image scanning and mask repair
11/25/2003US6652763 Method and apparatus for large-scale diamond polishing
11/25/2003US6652717 Time averaging radio frequency voltage distributions
11/25/2003US6652716 Apparatus and method for self-aligning a cover ring in a sputter chamber
11/25/2003US6652713 Pedestal with integral shield
11/25/2003US6652712 Inductive antenna for a plasma reactor producing reduced fluorine dissociation
11/25/2003US6652711 Inductively-coupled plasma processing system
11/25/2003US6652709 Plasma processing apparatus having circular waveguide, and plasma processing method
11/25/2003US6651582 Method and device for irradiating an ion beam, and related method and device thereof
11/20/2003WO2003096774A1 Plasma catalyst
11/20/2003WO2003096773A1 Plasma-assisted joining
11/20/2003WO2003096772A1 Plasma-assisted decrystallization
11/20/2003WO2003096771A1 Plasma generation and processing with multiple radiation sources
11/20/2003WO2003096770A1 Plasma-assisted coating
11/20/2003WO2003096769A1 High frequency reaction processing system
11/20/2003WO2003096768A1 Plasma assisted dry processing
11/20/2003WO2003096765A2 Apparatus and methods for minimizing arcing in a plasma processing chamber
11/20/2003WO2003096749A1 Plasma-assisted heat treatment
11/20/2003WO2003096747A2 Plasma heating apparatus and methods
11/20/2003WO2003096400A1 Plasma processing equipment and plasma processing method
11/20/2003WO2003096383A2 Cavity shapes for plasma-assisted processing
11/20/2003WO2003096382A2 Methods and apparatus for plasma processing control
11/20/2003WO2003096381A2 Plasma-assisted processing in a manufacturing line
11/20/2003WO2003096380A2 Plasma-assisted nitrogen surface-treatment
11/20/2003WO2003096370A1 Methods and apparatus for forming and using plasma jets
11/20/2003WO2003096369A1 Plasma-assisted gas production
11/20/2003WO2003095997A2 Method and apparatus for separating primary and secondary charged particle beams
11/20/2003WO2003095807A1 Plasma-assisted engine exhaust treatment
11/20/2003WO2003095700A1 Method for high purity purification of high functional material and method for deposition of high functional material by mass separation method
11/20/2003WO2003095699A1 Plasma-assisted enhanced coating
11/20/2003WO2003095591A1 Plasma-assisted doping
11/20/2003WO2003095130A1 Plasma-assisted sintering
11/20/2003WO2003095090A1 Plasma-assisted carburizing
11/20/2003WO2003095089A1 Plasma-assisted formation of carbon structures
11/20/2003WO2003095058A2 Plasma-assisted multi-part processing
11/20/2003WO2003056603A3 Self-ionized and inductively-coupled plasma for sputtering and resputtering
11/20/2003WO2003015123B1 Dual frequency plasma etch reactor with independent plasma density/chemistry and ion energy control
11/20/2003WO2002043466A9 Non-thermionic sputter material transport device, methods of use, and materials produced thereby
11/20/2003US20030216014 Monatomic boron ion source and method
11/20/2003US20030215722 Photomask repair method and apparatus
11/20/2003US20030215579 Ion beam for enhancing optical properties of materials
11/20/2003US20030215373 VHF-band circulator coupled to the amplifier and configured to isolate nonlinearities of the plasma chamber load from the amplifier.
11/20/2003US20030213919 Reaction frame apparatus and method
11/20/2003US20030213893 Electron beam apparatus and device manufacturing method using same
11/20/2003US20030213800 High-power microwave window
11/20/2003US20030213562 High density plasma CVD chamber
11/20/2003US20030213561 Atmospheric pressure plasma processing reactor
11/20/2003US20030213559 Stabilization of electronegative plasmas with feedback control of RF generator systems
11/20/2003US20030213434 Upper chamber for high density plasma CVD
11/20/2003CA2485195A1 Plasma catalyst
11/19/2003EP1363395A1 Method for manufacturing surface acoustic wave device and inspecting instrument
11/19/2003EP1363245A1 Three-dimensional verification supporting apparatus, three-dimensional structure verification method, record medium, and program
11/19/2003EP1363164A1 Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
11/19/2003EP1362931A1 Method and apparatus for fabrication of a DLC layer system
11/19/2003EP1362362A2 Wafer area pressure control
11/19/2003EP1362361A2 Particle beam system comprising a mirror corrector
11/19/2003EP1362185A2 Magnetic field for small closed-drift thruster
11/19/2003EP1185248A4 Supercritical fluid-assisted nebulization and bubble drying
11/19/2003EP0938596B1 Apparatus for reducing polymer deposition on substrate support
11/18/2003WO2005049226A1 Method and device for continuous treatment of the surface of an elongate object
11/18/2003US6650611 Master disc manufacturing apparatus
11/18/2003US6650426 Endpoint determination for recess etching to a precise depth
11/18/2003US6650424 Method and system for measuring in patterned structures
11/18/2003US6650129 Method of testing semiconductor device
11/18/2003US6650059 Method of decomposing organic halide
11/18/2003US6649920 Cell projection using an electron beam
11/18/2003US6649919 Real time monitoring simultaneous imaging and exposure in charged particle beam systems
11/18/2003US6649859 Electron beam irradiation system and electron beam irradiation method
11/18/2003US6649545 Photo-assisted remote plasma apparatus and method
11/18/2003US6649528 Local dry etching method
11/18/2003US6649491 Method of forming regular array of microscopic structures on a substrate
11/18/2003US6649449 PVD target comprising one or more of Ta, Co, CoTaZr, CoPt, Pt, FeTa, TiZr, CoNb, Mo, CoCrPt, Al, AlCuFe, FeMn or FeAl; bonding layer forming a strong diffusion bond to the target
11/18/2003US6649223 Non-conductive hollow substrate material inside of which a plasma is generated from a process gas by producing a magnetic field perpendicular to a driection of a substrate depth
11/18/2003US6649076 Method for performing plasma process on particles
11/18/2003US6649075 Method and apparatus for measuring etch uniformity of a semiconductor wafer
11/18/2003US6649036 Mirrortron sputtering apparatus
11/18/2003US6649021 Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield
11/18/2003US6648509 Friction-drive stage
11/18/2003US6647993 Surface-treated shower head for use in a substrate processing chamber
11/18/2003US6647918 Double slit-valve doors for plasma processing
11/18/2003CA2546411A1 Method and device for continuous treatment of the surface of an elongate object
11/13/2003WO2003094194A1 Ion source providing ribbon beam with controllable density profile
11/13/2003WO2002013226A8 Spatial light modulator driven photocathode source electron beam pattern generator
11/13/2003WO2001035440A8 Method and apparatus for electron beam column assembly with precise alignment using displaced semi-transparent membranes
11/13/2003US20030211758 Alignment mark shielding ring without arcing defect and method for using
11/13/2003US20030211754 Methods for use of pulsed voltage in a plasma reactor
11/13/2003US20030211751 Combined e-beam and optical exposure semiconductor lithography
11/13/2003US20030211735 Si seasoning to reduce particles, extend clean frequency, block mobile ions and increase chamber throughput
11/13/2003US20030210062 Method of testing semiconductor device
11/13/2003US20030209676 Particle multibeam lithography
11/13/2003US20030209674 Electron beam exposure apparatus and electron beam processing apparatus
11/13/2003US20030209673 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
11/13/2003US20030209667 Charged particle beam apparatus and method for inspecting samples
11/13/2003US20030209526 Method and apparatus for heating a semiconductor wafer plasma reactor vacuum chamber
11/13/2003US20030209518 Method of detecting abnormal chamber conditions in etcher
11/13/2003US20030209513 Venting apparatus and method for vacuum system
11/13/2003US20030209431 Magnetron sputtering source with improved target utilization and deposition rate
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