Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
12/2003
12/04/2003US20030224539 Method for etching a semiconductor element, its use for etching end point detection and a device for carrying it out
12/04/2003US20030223536 Element-specific X-ray fluorescence microscope and method of operation
12/04/2003US20030223055 Method and system for event detection in plasma processes
12/04/2003US20030222742 Magnetic field generator for magnetron plasma
12/04/2003US20030222586 Apparatus and method for forming a high pressure plasma discharge column
12/04/2003US20030222227 Beam stop for use in an ion implantation system
12/04/2003US20030222226 Ion implantation system having an energy probe
12/04/2003US20030222221 Apparatus for tilting a beam system
12/04/2003US20030221782 Structural improvement for wafer supporting apparatus
12/04/2003US20030221781 Milling apparatus
12/04/2003US20030221626 Shaft cooling mechanisms
12/03/2003EP1367639A1 Plasma apparatus and production method thereof
12/03/2003EP1367630A2 Improvements in or relating to particle detectors
12/03/2003EP1367629A2 Apparatus for tilting a beam system
12/03/2003EP1367609A1 High-voltage electric apparatus
12/03/2003EP1366647A1 Apparatus for generating low temperature plasma at atmospheric pressure
12/03/2003EP1366468A1 Method for localizing and identifying epitopes
12/03/2003EP1366209A1 Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge
12/03/2003EP1138055B1 Semiconductor processing equipment having tiled ceramic liner
12/03/2003EP1046184B1 Quadrupole device for projection lithography by means of charged particles
12/03/2003EP0913074A4 Plasma etch reactor and method for emerging films
12/03/2003CN1460289A Plasma processing device and semiconductor mfg. device
12/03/2003CN1460288A Device and method for plasma processing and slow-wave plate
12/03/2003CN1460287A 等离子体处理装置 Plasma processing apparatus
12/03/2003CN1460286A 等离子体处理装置 Plasma processing apparatus
12/03/2003CN1460285A 等离子体处理装置 Plasma processing apparatus
12/03/2003CN1460130A System and method for depositing inorganic/organic dielectric films
12/03/2003CN1129962C Semiconductor wafer temperature control apparatus and method in procedure
12/03/2003CN1129951C Ion source for ion mixer and cathode structure for ion source to generate ion beam
12/03/2003CN1129948C Electronic gun
12/02/2003US6658172 Optical system with 1×N interleaver and methods of making and using same
12/02/2003US6657395 Close coupled match structure for RF drive electrode
12/02/2003US6657221 Image classification method, observation method, and apparatus thereof with different stage moving velocities
12/02/2003US6657211 Process for electron beam lithography, and electron-optical lithography system
12/02/2003US6657210 Electron beam exposure method, a method of constructing exposure control data, and a computer-readable medium
12/02/2003US6657209 Method and system for determining pressure compensation factors in an ion implanter
12/02/2003US6657207 Charged-particle-beam microlithography apparatus and methods including optical corrections made during subfield exposures
12/02/2003US6657203 Misalignment inspection method, charge beam exposure method, and substrate for pattern observation
12/02/2003US6657193 Scanning electron microscope
12/02/2003US6657192 Method of determining degree of charge-up induced by plasma used for manufacturing semiconductor device and apparatus therefor
12/02/2003US6657151 Plasma processing device
12/02/2003US6656849 Plasma reactor
12/02/2003US6656848 Plasma chamber conditioning
12/02/2003US6656846 Apparatus for processing samples
12/02/2003US6656663 Microlithographic exposure methods using a segmented reticle defining pattern elements exhibiting reduced incidence of stitching anomalies when imaged on a substrate
12/02/2003US6656323 Plasma processing apparatus
12/02/2003US6656322 Plasma processing apparatus
12/02/2003US6656284 Semiconductor device manufacturing apparatus having rotatable gas injector and thin film deposition method using the same
12/02/2003US6656283 Channelled chamber surface for a semiconductor substrate processing chamber
11/2003
11/27/2003WO2003098669A1 Baffle plate and plasma etching device having same
11/27/2003WO2003098149A1 Sample dimension measuring method and scanning electron microscope
11/27/2003WO2003097896A1 Sputter method or device for the production of natural voltage optimized coatings
11/27/2003WO2003097894A2 Sputtering cathode adapter
11/27/2003WO2003097892A2 System and apparatus for control of sputter deposition process
11/27/2003WO2003097891A2 High-power microwave window
11/27/2003WO2003097521A1 Inductively coupled plasma reactor for producing nano-powder
11/27/2003WO2003075305A3 Indirectly heated button cathode for an ion source
11/27/2003WO2003070390A3 Cleaning apparatus using atmospheric pressure plasma
11/27/2003WO2003069013A3 Plasma processing apparatus
11/27/2003WO2003005407A3 Arrangement and method for detecting sidewall flaking in a plasma chamber
11/27/2003US20030219658 Method of observing exposure condition for exposing semiconductor device and its apparatus and method of manufacturing semiconductor device
11/27/2003US20030219572 Direct write lithography system
11/27/2003US20030218872 Superconducting magnetic shield
11/27/2003US20030218429 Ion source, method of operating the same, and ion source system
11/27/2003US20030218428 Indirectly heated cathode ion source
11/27/2003US20030218427 Capacitively coupled plasma reactor with magnetic plasma control
11/27/2003US20030218140 Array structure and method of manufacturing the same, charged particle beam exposure apparatus, and device manufacturing method
11/27/2003US20030218135 Electron beam apparatus
11/27/2003US20030218133 Charged particle beam column and method for directing a charged particle beam
11/27/2003US20030217914 Radial sputtering profile; semiconductor, integrated circuits
11/27/2003US20030217913 Small planetary magnetron
11/27/2003US20030217813 Plasma processing apparatus comprising radio frequency power circuit providing enhanced plasma control
11/27/2003US20030217812 Plasma etching equipment and method for manufacturing semiconductor device
11/27/2003US20030217810 Baffle device
11/27/2003US20030217474 Method and apparatus for aligning an extraction electrode to an arc chamber
11/26/2003EP1365446A1 Plasma treatment device and plasma treatment method
11/26/2003EP1365436A2 Cylindrical AC/DC Magnetron with compliant drive system and electrical and thermal isolation
11/26/2003EP1365260A1 Electron beam detector, scanning type electron microscope, mass spectrometer, and ion detector
11/26/2003EP1365229A1 Method and apparatus for measuring physical properties of micro region
11/26/2003EP1364385A2 Sputter cathode with magnetic shunt
11/26/2003EP1364384A2 Device and method for discharging dielectric surfaces
11/26/2003EP1364075A1 Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof
11/26/2003EP1046185B1 Projection lithography device utilizing charged particles
11/26/2003EP0972299B1 Method and apparatus for control of deposit build-up on an inner surface of a plasma processing chamber
11/26/2003EP0643151B9 Apparatus and system for arc ion plating
11/26/2003CN2588367Y Digital image receiving processing system for transmission electron microscope
11/26/2003CN1459125A High speed silicon etching method
11/26/2003CN1129172C Aperture apparatus used for photo litho-graphy and munafacturing method thereof
11/25/2003US6654106 Methods and apparatus for determining blur of an optical system
11/25/2003US6653803 Integrated resonator and amplifier system
11/25/2003US6653792 Ion implanting system
11/25/2003US6653791 Method and apparatus for producing uniform process rates
11/25/2003US6653645 Deflection lens device for electron beam lithography
11/25/2003US6653644 Pattern exposure method and apparatus
11/25/2003US6653643 Method and apparatus for improved ion acceleration in an ion implantation system
11/25/2003US6653642 Methods and apparatus for operating high energy accelerator in low energy mode
11/25/2003US6653639 Chuck for mounting reticle to a reticle stage
11/25/2003US6653637 X-ray detector and charged-particle apparatus
11/25/2003US6653634 Method of measuring length with scanning type electron microscope
11/25/2003US6653633 Charged particle beam apparatus
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