| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 12/18/2003 | US20030230726 Apparatus and method for using a volume conductive electrode with ion optical elements for a time-of-flight mass spectrometer |
| 12/18/2003 | US20030230714 Electron beam apparatus |
| 12/18/2003 | US20030230713 Raster electron microscope |
| 12/18/2003 | US20030230554 Radial pulsed arc discharge gun for synthesizing nanopowders |
| 12/18/2003 | US20030230483 Coating method and apparatus |
| 12/18/2003 | US20030230482 Magnetic control oscillating-scanning sputter |
| 12/18/2003 | US20030230386 Magnetic neutral line discharge plasma processing system |
| 12/17/2003 | EP1371751A1 Film forming device |
| 12/17/2003 | EP1371271A1 Plasma installation and method for producing a functional coating |
| 12/17/2003 | EP1371080A2 Methods and apparatus for scanned beam uniformity adjustment in ion implanters |
| 12/17/2003 | EP1370846A1 Device for preparing specimens for a cryo-electron microscope |
| 12/17/2003 | EP1161574B1 Method and apparatus for arc deposition |
| 12/17/2003 | EP0894332B8 Use of a connecting process and connecting process |
| 12/16/2003 | US6664739 Enhanced electron emissive surfaces for a thin film deposition system using ion sources |
| 12/16/2003 | US6664738 Plasma processing apparatus |
| 12/16/2003 | US6664737 Dielectric barrier discharge apparatus and process for treating a substrate |
| 12/16/2003 | US6664551 Methods for detecting incidence orthogonality of a patterned beam in charged-particle-beam (CPB) microlithography, and CPB microlithography systems that perform same |
| 12/16/2003 | US6664548 Ion source and coaxial inductive coupler for ion implantation system |
| 12/16/2003 | US6664547 Ion source providing ribbon beam with controllable density profile |
| 12/16/2003 | US6664546 In-situ probe for optimizing electron beam inspection and metrology based on surface potential |
| 12/16/2003 | US6664544 Magnetic immersion lense with detection arrangement |
| 12/16/2003 | US6664541 Methods and apparatus for defect localization |
| 12/16/2003 | US6664532 Method of precision calibration of magnification of scanning microscopes with the use of test diffraction grating |
| 12/16/2003 | US6664497 Plasma chamber that may be formed from a metallic material and a transformer having a magnetic core surrounding a portion of the plasma chamber and having a primary winding for dissociation gases |
| 12/16/2003 | US6664496 Plasma processing system |
| 12/16/2003 | US6663791 Detection method of coating film thickness and ion implantation equipment using this method |
| 12/16/2003 | US6663755 Filtered cathodic arc deposition method and apparatus |
| 12/16/2003 | US6663754 Tubular magnet as center pole in unbalanced sputtering magnetron |
| 12/16/2003 | US6663715 Plasma CVD apparatus for large area CVD film |
| 12/11/2003 | WO2003103348A1 Discharging power source, sputtering power source, and sputtering device |
| 12/11/2003 | WO2003103138A1 Transresistance amplifier for a charged particle detector |
| 12/11/2003 | WO2003103017A2 Method and system of determining chamber seasoning condition by optical emission |
| 12/11/2003 | WO2003103004A2 A cathode pedestal for a plasma etch reactor |
| 12/11/2003 | WO2003103003A1 Device for production of a plasma sheet |
| 12/11/2003 | WO2003103002A2 Ion implantation system having an energy probe |
| 12/11/2003 | WO2003102993A2 Beam stop for use in an ion implantation system |
| 12/11/2003 | WO2003102724A2 Method and system for data handling, storage and manipulation |
| 12/11/2003 | WO2003102564A2 Element-specific x-ray fluorescence microscope using multiple imaging systems comprising a zone plate |
| 12/11/2003 | WO2003102545A2 Fragmentation methods for mass spectrometry |
| 12/11/2003 | WO2003102261A1 Cooling mechanisms for shaft coupled to a rotary seal |
| 12/11/2003 | WO2003101635A1 Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas |
| 12/11/2003 | WO2003038879A3 Methods and apparatus for plasma doping and ion implantation in an integrated processing system |
| 12/11/2003 | WO2003025971A3 Plasma processing apparatus with coil magnet system |
| 12/11/2003 | WO2003007326A3 Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing |
| 12/11/2003 | WO2001088946A8 Cathode assembly for indirectly heated cathode ion source |
| 12/11/2003 | US20030229294 Multilayered polymer tubing with braided layer and methods of making and using same |
| 12/11/2003 | US20030228527 Method for compensating for scatter/reflection effects in particle beam lithography |
| 12/11/2003 | US20030227283 Non-intrusive plasma probe |
| 12/11/2003 | US20030227259 Simultaneous discharge apparatus |
| 12/11/2003 | US20030227258 Method and apparatus for tuning a plasma reactor chamber |
| 12/11/2003 | US20030226976 Stage-actuators that do not generate fluctuating magnetic fields, and stage devices comprising same |
| 12/11/2003 | US20030226975 Wien filter and electron microscope using same |
| 12/11/2003 | US20030226822 Composite shadow ring assembled with dowel pins and method of using |
| 12/11/2003 | US20030226821 Integrated stepwise statistical process control in a plasma processing system |
| 12/11/2003 | US20030226641 adding cellulytic enzyme composition and cationic polymer composition to pulp within 5 minutes of each to form a treated pulp; polyacrylamide polymer |
| 12/11/2003 | US20030226504 Vacuum coating apparatus |
| 12/11/2003 | US20030226503 Comprises evaporating film, ionizing the film with radio frequency power, then depositing on substrate as bias voltage incorporates halogen ions into the film |
| 12/10/2003 | EP1369898A2 Magnetic field generator for magnetron plasma |
| 12/10/2003 | EP1369897A2 Electron beam exposure apparatus and method, and device manufacturing method |
| 12/10/2003 | EP1369896A2 Electron beam exposure apparatus and method and device manufacturing method |
| 12/10/2003 | EP1369895A2 Electron beam exposure apparatus and method, and device manufacturing method |
| 12/10/2003 | EP1088319B1 Device for shaping an electron beam, method for producing said device and use thereof |
| 12/10/2003 | CN1461494A 等离子体处理装置及排气环 Plasma processing apparatus, and an exhaust ring |
| 12/10/2003 | CN1461036A Ion source, operating method of ion source, and ion source system |
| 12/10/2003 | CN1460896A Energy beam exposure method and device |
| 12/10/2003 | CN1130753C Method and device for pattern writing by electron beam |
| 12/10/2003 | CN1130750C Ion source |
| 12/10/2003 | CN1130243C Electron beam radiation device |
| 12/09/2003 | US6661165 Inductively coupled high-frequency electron source with a reduced power requirement as a result of an electrostatic inclusion of electrons |
| 12/09/2003 | US6661017 Ion implantation system having an energy probe |
| 12/09/2003 | US6661016 Ion implantation uniformity correction using beam current control |
| 12/09/2003 | US6661015 Pattern lock system |
| 12/09/2003 | US6661014 Methods and apparatus for oxygen implantation |
| 12/09/2003 | US6661013 Device and method for two-dimensional detection of particles or electromagnetic radiation |
| 12/09/2003 | US6661009 Apparatus for tilting a beam system |
| 12/09/2003 | US6661008 Electron-optical system and inspection method using the same |
| 12/09/2003 | US6661007 Method of diagnosing magnification, linearity and stability of scanning electron microscope |
| 12/09/2003 | US6661005 Method of examining and/or modifying surface structures of a sample |
| 12/09/2003 | US6660959 Processes for nanomachining using carbon nanotubes |
| 12/09/2003 | US6660342 Depositing highly adhesive, uniform films with small power consumption; high density plasma chemical vapor deposition |
| 12/09/2003 | US6660140 Sputtering apparatus |
| 12/09/2003 | US6660134 Feedthrough overlap coil |
| 12/09/2003 | US6660127 Apparatus for plasma etching at a constant etch rate |
| 12/09/2003 | US6660095 Single wafer LPCVD apparatus |
| 12/04/2003 | WO2003101160A2 Method and apparatus for vhf plasma processing |
| 12/04/2003 | WO2003100819A1 Planetary magnetron |
| 12/04/2003 | WO2003100818A1 Capacitively coupled plasma reactor with magnetic plasma control |
| 12/04/2003 | WO2003100817A1 Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a mutli-part electrode |
| 12/04/2003 | WO2003100816A2 Energetic neutral particle lithographic apparatus and process |
| 12/04/2003 | WO2003100815A2 Charged particle beam column and method for directing a charged particle beam |
| 12/04/2003 | WO2003100814A1 Particle beam processing apparatus and materials treatable using the apparatus |
| 12/04/2003 | WO2003100806A1 Indirectly heated cathode ion source |
| 12/04/2003 | WO2003100114A1 Replaceable target sidewall insert with texturing |
| 12/04/2003 | WO2003100113A1 Reactive sputtering method and device |
| 12/04/2003 | WO2003026364B1 Plasma processor coil |
| 12/04/2003 | WO2002078043A3 Beam processing apparatus |
| 12/04/2003 | US20030226130 Method for making an OPC mask and an OPC mask manufactured using the same |
| 12/04/2003 | US20030224601 Method and apparatus for forming a trench through a semiconductor substrate |
| 12/04/2003 | US20030224543 Method and apparatus for determining thickness of a semiconductor substrate at the floor of a trench |
| 12/04/2003 | US20030224541 Method of monitoring high tilt angle of medium current implant |